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    • 5. 发明授权
    • Creating default states for non-volatile memory elements
    • 为非易失性存储器元素创建默认状态
    • US09589653B1
    • 2017-03-07
    • US15070499
    • 2016-03-15
    • International Business Machines Corporation
    • Karl R. EricksonRobert E. KilkerPhil C. PaoneDavid P. PaulsenGregory J. Uhlmann
    • G11C11/34G11C16/24G11C16/10G11C16/26
    • G11C16/26G11C16/08G11C16/10
    • A circuit has a wordline with an NVM element utilizing a first FET coupled to bitline true and a second FET coupled to bitline complement. A NFET coupled to the bitline complement is configured to pull bitline true toward ground in response to bitline complement reaching a first voltage. One or more wordline drivers are coupled to the NVM element such that a first path from a wordline driver is coupled to the first FET while a second path from a wordline driver is coupled to the second FET. The first path is current-limited in comparison to the second path, such that a first slew rate between a wordline driver and the first FET is slower than a second slew rate between a wordline driver and the second FET. The slew rate disparity allows the bitline complement to reach the first voltage.
    • 电路具有一个字线,其中NVM元件利用耦合到位线的第一FET和耦合到位线补码的第二FET。 耦合到位线补码的NFET被配置为响应于位线补码达到第一电压而将位线真向地拉。 一个或多个字线驱动器耦合到NVM元件,使得来自字线驱动器的第一路径耦合到第一FET,而来自字线驱动器的第二路径耦合到第二FET。 与第二路径相比,第一路径是电流限制的,使得字线驱动器和第一FET之间的第一转换速率比字线驱动器和第二FET之间的第二转换速率慢。 转换速率差异允许位线补码达到第一个电压。
    • 9. 发明申请
    • INTERDIGITATED FINFETS
    • US20150076615A1
    • 2015-03-19
    • US14031202
    • 2013-09-19
    • International Business Machines Corporation
    • Karl R. EricksonPhil C. PaoneDavid P. PaulsenJohn E. Sheets, IIGregory J. UhlmannKelly L. Williams
    • H01L27/092H01L21/8238
    • H01L27/0924H01L21/823821H01L29/66803
    • A semiconductor device includes a first fin rising out of a semiconductor base. It further includes a second fin rising out of the semiconductor base. The second fin is substantially parallel to the first fin that forms a span between the first fin and the second fin. A first dielectric layer is deposited on exposed surfaces of a first gate body area of the first fin, a second gate body area of the second fin, and an adjacent surface of the semiconductor base that defines the span between the first and second gate body areas. A gate electrode layer is sandwiched between the first dielectric layer and a second dielectric layer. The semiconductor device includes a third fin interdigitated between the first fin and the second fin within the span. Exposed surfaces of the gate body area of the third fin are in contact with the second dielectric layer.
    • 半导体器件包括从半导体基底上升出的第一鳍片。 它还包括从半导体基地升起的第二个鳍。 第二翅片基本上平行于在第一翅片和第二翅片之间形成跨距的第一翅片。 第一电介质层沉积在第一鳍片的第一栅极主体区域,第二鳍片的第二栅极主体区域和半导体基底的相邻表面的暴露表面上,该相邻表面限定第一和第二栅极体区域之间的跨距 。 栅极电极层被夹在第一电介质层和第二电介质层之间。 半导体器件包括在跨度内在第一鳍片和第二鳍片之间交错的第三鳍片。 第三鳍片的门体区域的露出面与第二电介质层接触。