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    • 3. 发明授权
    • Electric power conversion device
    • 电力转换装置
    • US09564802B2
    • 2017-02-07
    • US14478445
    • 2014-09-05
    • Kabushiki Kaisha Toshiba
    • Kazuto TakaoTakashi Shinohe
    • H02M7/537H02M3/155H02M1/44H02M7/5387
    • H02M3/155H02M1/44H02M7/5387H02M2003/1555Y02B70/1441
    • An electric power conversion device of an embodiment includes the electric power conversion device expressed as an equivalent circuit including, a power supply, a first parasitic inductance, a first diode; a second parasitic inductance connected to the first diode in series, a second diode connected to the first diode in parallel, a third parasitic inductance connected to the second diode in series, a switching element, a gate circuit, and a load. The equivalent circuit includes a first circuit loop and a second circuit loop. The first circuit loop includes the power supply, the first parasitic inductance, the first diode, the second parasitic inductance, the switching element, and the gate circuit. The second circuit loop includes the power supply, the first parasitic inductance, the second diode, the third parasitic inductance, the switching element, and the gate circuit.
    • 一个实施例的电力转换装置包括表示为等效电路的电力转换装置,包括电源,第一寄生电感,第一二极管; 串联连接到第一二极管的第二寄生电感,并联连接到第一二极管的第二二极管,串联连接到第二二极管的第三寄生电感,开关元件,门电路和负载。 等效电路包括第一电路回路和第二回路回路。 第一电路回路包括电源,第一寄生电感,第一二极管,第二寄生电感,开关元件和门电路。 第二电路回路包括电源,第一寄生电感,第二二极管,第三寄生电感,开关元件和门电路。
    • 5. 发明申请
    • SEMICONDUCTOR DEVICE
    • 半导体器件
    • US20150263000A1
    • 2015-09-17
    • US14465583
    • 2014-08-21
    • Kabushiki Kaisha Toshiba
    • Hiroshi KonoKazuto Takao
    • H01L27/07H01L49/02H01L29/78
    • H01L27/0733H01L28/60H01L29/42372H01L29/7803
    • According to one embodiment, semiconductor device includes: a first semiconductor region of a first conductive type; a second semiconductor region of a second conductive type provided on the first semiconductor region; a third semiconductor region of the first conductive type provided on the second semiconductor region, the third semiconductor region having a higher impurity concentration than the impurity concentration of the first semiconductor region; a third electrode in contact with the third semiconductor region, the second semiconductor region, and the first semiconductor region via a first dielectric film; and a capacitance element unit having a fourth electrode provided above the second semiconductor region, a fifth electrode provided above the fourth electrode, and a second dielectric film provided between the fourth electrode and the fifth electrode.
    • 根据一个实施例,半导体器件包括:第一导电类型的第一半导体区域; 设置在第一半导体区域上的第二导电类型的第二半导体区域; 设置在所述第二半导体区域上的所述第一导电类型的第三半导体区域,所述第三半导体区域的杂质浓度高于所述第一半导体区域的杂质浓度; 经由第一电介质膜与第三半导体区域,第二半导体区域和第一半导体区域接触的第三电极; 以及具有设置在第二半导体区域上方的第四电极的电容元件单元,设置在第四电极上方的第五电极和设置在第四电极和第五电极之间的第二电介质膜。