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    • 5. 发明申请
    • METHOD FOR PERMANENTLY BONDING WAFERS
    • 永久粘结方法
    • US20140073112A1
    • 2014-03-13
    • US14110220
    • 2011-04-08
    • Thomas PlachKurt HingerlMarkus WimplingerChristoph Flötgen
    • Thomas PlachKurt HingerlMarkus WimplingerChristoph Flötgen
    • H01L21/20
    • H01L21/20H01L21/2007H01L21/3105H01L21/76251
    • A method for bonding of a first contact surface of a first substrate to a second contact surface of a second substrate. The method comprises: forming at least one reservoir in at least one reservoir formation layer on the first substrate and/or the second substrate, the reservoir comprised of an amorphous material, at least partial filling of the reservoir/reservoirs with a first educt or a first group of educts, forming or applying a reaction layer which contains a second educt or a second group of educts to the reservoir and/or the reservoir, the first contact surface making contact with the second contact surface for formation of a prebond connection, and forming a permanent bond between the first and second contact surface, at least partially strengthened by the reaction of the first educt or the first group with the second educt or the second group.
    • 一种用于将第一基板的第一接触表面接合到第二基板的第二接触表面的方法。 该方法包括:在第一基板和/或第二基板上的至少一个储层形成层中形成至少一个储存器,储存器由非晶态材料构成,至少部分地填充储存器/储存器与第一流出物或 第一组离子,将包含第二喷射或第二组离子的反应层形成或施加到储存器和/或储存器,第一接触表面与第二接触表面接触以形成预先连接的连接,以及 在所述第一和第二接触表面之间形成永久性接合,至少部分地通过所述第一溶出物或所述第一组与所述第二溶剂或所述第二组的反应来加强。