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1. 发明授权

US11322629B2 Method and optoelectronic structure providing polysilicon photonic devices with different optical properties in different regions 有权
公开(公告)号：US11322629B2
公开(公告)日：2022-05-03
申请号：US17145301
申请日：2021-01-09
申请人： Micron Technology, Inc. , Massachusetts Institute of Technology
发明人： Roy Meade , Karan Mehta , Efraim Megged , Jason Orcutt , Milos Popovic , Rajeev Ram , Jeffrey Shainline , Zvi Sternberg , Vladimir Stojanovic , Ofer Tehar-Zahav
IPC分类号： H01L31/0232 , H01L31/0368 , H01L27/144 , H01L31/18
摘要： Method and structural embodiments are described which provide an integrated structure using polysilicon material having different optical properties in different regions of the structure.

2. 发明授权

US11002914B2 Active alignment of optical fiber to chip using liquid crystals 有权
公开(公告)号：US11002914B2
公开(公告)日：2021-05-11
申请号：US15701262
申请日：2017-09-11
申请人： Micron Technology, Inc.
发明人： Roy Meade , Gurtej Sandhu
IPC分类号： G02B6/30 , G02B6/34 , G02F1/29 , G02F1/139 , G02B5/30 , G02B6/12 , G02B6/27 , G02B6/42 , G02B6/124 , G02F1/13363
摘要： Devices and systems to perform optical alignment by using one or more liquid crystal layers to actively steer a light beam from an optical fiber to an optical waveguide integrated on a chip. An on-chip feedback mechanism can steer the beam between the fiber and a grating based waveguide to minimize the insertion loss of the system.

3. 发明申请

US20190013452A1 METHODS AND APPARATUS PROVIDING THERMAL ISOLATION OF PHOTONIC DEVICES 审中-公开
公开(公告)号：US20190013452A1
公开(公告)日：2019-01-10
申请号：US16105755
申请日：2018-08-20
申请人： Micron Technology, Inc.
发明人： Roy Meade , Gurtej Sandhu
IPC分类号： H01L33/64 , G02F1/313 , G02B6/12 , G02F1/01
CPC分类号： H01L33/64 , G02B6/12 , G02B6/12004 , G02B6/12007 , G02B2006/121 , G02B2006/12135 , G02F1/0147 , G02F1/3132 , G02F1/3133 , G02F2203/15 , H01L2933/0075
摘要： Described embodiments include photonic integrated circuits and systems with photonic devices, including thermal isolation regions for the photonic devices. Methods of fabricating such circuits and systems are also described.

4. 发明授权

US10109640B2 Transistors having dielectric material containing non-hydrogenous ions and methods of their fabrication 有权
公开(公告)号：US10109640B2
公开(公告)日：2018-10-23
申请号：US15867089
申请日：2018-01-10
申请人： MICRON TECHNOLOGY, INC.
发明人： Roy Meade
IPC分类号： G11C11/34 , H01L27/11568 , H01L29/423 , H01L21/02 , H01L21/28 , H01L29/792 , H01L29/51 , H01L27/115 , H01L27/11521 , H01L21/326 , H01L29/788 , H01L29/78
摘要： Methods for fabricating a transistor include forming a dielectric material adjacent to a semiconductor, introducing non-hydrogenous ions into the dielectric material, and forming a control gate adjacent to the dielectric material. Transistors include source/drain regions in a semiconductor, a dielectric material adjacent to the semiconductor and containing non-hydrogenous ions, and a control gate adjacent to the dielectric material.

5. 发明授权

US09958624B2 Apparatus providing simplified alignment of optical fiber in photonic integrated circuits 有权
公开(公告)号：US09958624B2
公开(公告)日：2018-05-01
申请号：US15640041
申请日：2017-06-30
申请人： Micron Technology, Inc.
发明人： Gurtej Sandhu , Roy Meade , Lei Bi , John Smythe
IPC分类号： G02B6/30 , G02B6/32 , G02B6/42
CPC分类号： G02B6/4226 , G02B6/30 , G02B6/32 , G02B6/4204 , G02B6/4206 , G02B6/4225 , G02B6/4227 , G02B6/4239 , Y10T29/42 , Y10T29/49
摘要： A structure for optically aligning an optical fiber to a protonic device and method of fabrication of same. The structure optically aligns an optical fiber to the protonic device using a lens between the two which is moveable by actuator heads. The lens is moveable by respective motive sources associated with the actuator heads.

6. 发明授权

US09791629B2 Active alignment of optical fiber to chip using liquid crystals 有权
公开(公告)号：US09791629B2
公开(公告)日：2017-10-17
申请号：US14972376
申请日：2015-12-17
申请人： Micron Technology, Inc.
发明人： Roy Meade , Gurtej Sandhu
IPC分类号： G02B6/30 , G02B6/34 , G02F1/139 , G02F1/29 , G02B5/30 , G02B6/12 , G02B6/27 , G02B6/42 , G02B6/124 , G02F1/13363
CPC分类号： G02B6/30 , G02B5/3016 , G02B6/12004 , G02B6/124 , G02B6/2706 , G02B6/34 , G02B6/4221 , G02F1/1393 , G02F1/292 , G02F2001/133638 , G02F2203/24
摘要： Devices and systems to perform optical alignment by using one or more liquid crystal layers to actively steer a light beam from an optical fiber to an optical waveguide integrated on a chip. An on-chip feedback mechanism can steer the beam between the fiber and a grating based waveguide to minimize the insertion loss of the system.

7. 发明申请

US20170139163A1 APPARATUS PROVIDING SIMPLIFIED ALIGNMENT OF OPTICAL FIBER IN PHOTONIC INTEGRATED CIRCUITS 有权
公开(公告)号：US20170139163A1
公开(公告)日：2017-05-18
申请号：US15362578
申请日：2016-11-28
申请人： Micron Technology, Inc.
发明人： Gurtej Sandhu , Roy Meade , Lei Bi , John Smythe
IPC分类号： G02B6/42 , G02B6/30 , G02B6/32
CPC分类号： G02B6/4226 , G02B6/30 , G02B6/32 , G02B6/4204 , G02B6/4206 , G02B6/4225 , G02B6/4227 , G02B6/4239 , Y10T29/42 , Y10T29/49
摘要： A structure for optically aligning an optical fiber to a photonic device and method of fabrication of same. The structure optically aligns an optical fiber to the photonic device using a lens between the two which is moveable by actuator heads. The lens is moveable by respective motive sources associated with the actuator heads.

8. 发明申请

US20150243546A1 SEMICONDUCTOR SUBSTRATE FOR PHOTONIC AND ELECTRONIC STRUCTURES AND METHOD OF MANUFACTURE 有权
标题翻译：用于光电子和电子结构的半导体衬底及其制造方法
公开(公告)号：US20150243546A1
公开(公告)日：2015-08-27
申请号：US14698091
申请日：2015-04-28
申请人： MICRON TECHNOLOGY, INC.
发明人： Roy Meade , Gurtej Sandhu
IPC分类号： H01L21/762 , G02B6/13 , H01L21/308
CPC分类号： H01L21/76229 , G02B6/1225 , G02B6/13 , G02B6/136 , G02B2006/121 , H01L21/3086 , H01L21/76232 , H01L21/76283 , H01L27/092 , H01L27/14689 , H01L29/0649
摘要： A method of forming a substrate with isolation areas suitable for integration of electronic and photonic devices is provided. A common reticle and photolithographic technique is used to fabricate a mask defining openings for etching first and second trench isolation areas in a substrate, with the openings for the second trench isolation areas being wider than the openings for the first trench isolation areas. The first and second trench isolation areas are etched in the substrate through the mask. The second trench isolation areas are further etched to the deeper than the first trench isolation areas. The trench isolation areas are filled with oxide material. Electrical devices can be formed on the substrate and electrically isolated by the first trench isolation areas and photonic devices can be formed over the second trench isolation areas and be optically isolated from the substrate.
摘要翻译：提供了一种形成具有适用于电子和光子器件集成的隔离区的衬底的方法。常用的掩模版和光刻技术用于制造掩模，其限定用于蚀刻衬底中的第一和第二沟槽隔离区的开口，其中用于第二沟槽隔离区的开口比第一沟槽隔离区的开口宽。通过掩模在衬底中蚀刻第一和第二沟槽隔离区域。第二沟槽隔离区域被进一步蚀刻到比第一沟槽隔离区域更深的位置。沟槽隔离区填充氧化物材料。电子器件可以形成在衬底上并由第一沟槽隔离区域电隔离，并且光子器件可以形成在第二沟槽隔离区域上并且与衬底光学隔离。

9. 发明申请

US20150063826A1 OPTICAL WAVEGUIDE WITH CASCADED MODULATOR CIRCUITS 有权
标题翻译：带调制器电路的光波导
公开(公告)号：US20150063826A1
公开(公告)日：2015-03-05
申请号：US14534635
申请日：2014-11-06
申请人： Micron Technology, Inc.
发明人： Roy Meade , Gurtej Sandhu
IPC分类号： H04B10/516
CPC分类号： H04B10/516 , G02B6/12007 , G02B6/122 , G02B6/29343 , G02F1/035 , G02F1/2252
摘要： An optical waveguide for transmitting an optical signal input to the optical waveguide with a first frequency. The optical waveguide includes a plurality of modulator circuits configured along an optical transmission channel. Each modulator circuit includes at least one resonant structure that resonates at the first frequency when the modulator circuit that includes the at least one resonant structure is at a resonant temperature. Each modulator circuit has a different resonant temperature.
摘要翻译：一种光波导，用于以第一频率传输输入到光波导的光信号。光波导包括沿着光传输通道配置的多个调制器电路。每个调制器电路包括当包括至少一个谐振结构的调制器电路处于共振温度时以第一频率谐振的至少一个谐振结构。每个调制器电路具有不同的谐振温度。

10. 发明申请

US20140341503A1 SEMICONDUCTOR SUBSTRATE FOR PHOTONIC AND ELECTRONIC STRUCTURES AND METHOD OF MANUFACTURE 有权
标题翻译：用于光电子和电子结构的半导体衬底及其制造方法
公开(公告)号：US20140341503A1
公开(公告)日：2014-11-20
申请号：US14446744
申请日：2014-07-30
申请人： MICRON TECHNOLOGY, INC.
发明人： Roy Meade , Gurtej Sandhu
IPC分类号： G02B6/122
CPC分类号： H01L21/76229 , G02B6/1225 , G02B6/13 , G02B6/136 , G02B2006/121 , H01L21/3086 , H01L21/76232 , H01L21/76283 , H01L27/092 , H01L27/14689 , H01L29/0649
摘要： A method of forming a substrate with isolation areas suitable for integration of electronic and photonic devices is provided. A common reticle and photolithographic technique is used to fabricate a mask defining openings for etching first and second trench isolation areas in a substrate, with the openings for the second trench isolation areas being wider than the openings for the first trench isolation areas. The first and second trench isolation areas are etched in the substrate through the mask. The second trench isolation areas are further etched to the deeper than the first trench isolation areas. The trench isolation areas are filled with oxide material. Electrical devices can be formed on the substrate and electrically isolated by the first trench isolation areas and photonic devices can be formed over the second trench isolation areas and be optically isolated from the substrate.
摘要翻译：提供了一种形成具有适用于电子和光子器件集成的隔离区的衬底的方法。常用的掩模版和光刻技术用于制造掩模，其限定用于蚀刻衬底中的第一和第二沟槽隔离区的开口，其中用于第二沟槽隔离区的开口比第一沟槽隔离区的开口宽。通过掩模在衬底中蚀刻第一和第二沟槽隔离区域。第二沟槽隔离区域被进一步蚀刻到比第一沟槽隔离区域更深的位置。沟槽隔离区填充氧化物材料。电子器件可以形成在衬底上并由第一沟槽隔离区域电隔离，并且光子器件可以形成在第二沟槽隔离区域上并且与衬底光学隔离。

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