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1. 发明申请

US20170317356A1 SYSTEM AND METHOD FOR MANUFACTURING A MICROPILLAR ARRAY 审中-公开
公开(公告)号：US20170317356A1
公开(公告)日：2017-11-02
申请号：US15523555
申请日：2015-11-19
申请人： Nederlandse Organisatie voor toegepast-natuurwetenschappelijk onderzoek TNO
发明人： Sandeep UNNIKRISHNAN , Rob Jacob HENDRIKS
IPC分类号： H01M4/70 , H01M4/04 , C09D11/52 , G03F7/004 , G03F7/00 , C25D7/00 , G03F7/09 , G03F7/095 , H01M4/02
CPC分类号： H01M4/70 , B81B2203/0361 , B81C1/00111 , C09D11/52 , C25D7/00 , G03F7/0037 , G03F7/0043 , G03F7/094 , G03F7/095 , G03F7/2004 , G03F7/36 , G03F7/40 , H01M4/0452 , H01M4/0471 , H01M2004/025
摘要： A system and method for manufacturing a micropillar array (20). A carrier (11) is provided with a layer of metal ink (20i). A high energy light source (14) irradiates the metal ink (20i) via a mask (13) between the carrier (11) and the light source. The mask is configured to pass a cross-section illuminated image of the micropillar array onto the metal ink (20i), thereby causing a patterned sintering of the metal ink (20i) to form a first subsection layer (21) of the micropillar array (20) in the layer of metal ink (20i). A further layer of the metal ink (20i) is applied on top of the first subsection layer (21) of the micropillar array (20) and irradiated via the mask (13) to form a second subsection layer (21) of the micropillar array on top. The process is repeated to achieve high aspect ratio micropillars 20p.

2. 发明申请

US20160259250A1 METHOD AND SYSTEM FOR FORMING A PATTERNED STRUCTURE ON A SUBSTRATE 审中-公开
标题翻译：在基板上形成图案结构的方法和系统
公开(公告)号：US20160259250A1
公开(公告)日：2016-09-08
申请号：US15032950
申请日：2014-10-29
申请人： NEDERLANDSE ORGANISATIE VOOR TOEGEPAST- NATUURWETENSCHAPPELIJK ONDERZOEK TNO
发明人： Rob Jacob HENDRIKS , Gari ARUTINOV , Edsger Constant Pieter SMITS
IPC分类号： G03F7/20
CPC分类号： G03F7/2008 , B41M3/006 , B41M5/46 , B41M2205/14 , G03F7/7015 , H01L51/0013
摘要： The present disclosure concerns a method and system for providing a patterned structure (3p) on an acceptor substrate (4). The method comprises providing a donor substrate (10) arranged between a light source (5) and an acceptor substrate (4). A mask (7) is arranged between the light source (5) and the donor substrate (10). The mask (7) comprises a mask pattern (7p) for patterning light (6). The patterned light (6p) impinging the donor substrate (10) causes the donor material (3) to be released from the donor substrate (10) and transfer to the acceptor substrate (4) to form the patterned structure (3p) thereon. The patterned light (6p) is divided by the mask pattern (7p) into a plurality of separate homogeneously sized beams (6b) simultaneously impinging the donor substrate (10) for causing the donor material (3) to be released from the donor substrate (10) in the form of separate homogeneously sized droplets (3d).
摘要翻译：本公开涉及一种用于在受主衬底（4）上提供图案化结构（3p）的方法和系统。该方法包括提供布置在光源（5）和受主衬底（4）之间的施主衬底（10）。在光源（5）和供体衬底（10）之间布置有掩模（7）。掩模（7）包括用于构图光（6）的掩模图案（7p）。撞击施主衬底（10）的图案化光（6p）导致供体材料（3）从施主衬底（10）释放并转移到受体衬底（4）上以在其上形成图案化结构（3p）。图案化光（6p）被掩模图案（7p）分成多个分开的均匀尺寸的光束（6b），同时撞击供体衬底（10），以使供体材料（3）从供体衬底 10）以分开的均匀尺寸的液滴（3d）的形式。

3. 发明申请

US20230136483A1 CONTROLLED DEPOSITION OF A FUNCTIONAL MATERIAL ONTO A TARGET SURFACE 有权
公开(公告)号：US20230136483A1
公开(公告)日：2023-05-04
申请号：US17915290
申请日：2021-03-31
申请人： Nederlandse Organisatie voor toegepast-natuurwetenschappelijk onderzoek TNO
发明人： Rob Jacob HENDRIKS
IPC分类号： C03C17/34 , C23C14/28 , C23C14/10 , C23C14/08
摘要： A plate including functional material to be deposited onto a target surface using monochromatic radiation having a wavelength is described. The plate further includes a substrate with a first surface directed towards the target surface and with a second surface to receive the monochromatic radiation. The first surface is patterned with recessed areas that have a dielectric coating and that are filled with the functional material. The dielectric coating includes a sequence of dielectric coating layers alternating in refractive index. The dielectric coating therewith has a relatively high reflectivity for said monochromatic radiation incident perpendicular to the dielectric coating in comparison to a reflectivity for said monochromatic radiation incident at an angle of 45 degrees to the dielectric coating. As such shear forces are mitigated without requiring a high alignment accuracy. The present application further describes a deposition device including the plate and a method involving the plate.

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