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1. 发明授权

US09910370B2 Environmental system including a transport region for an immersion lithography apparatus 有权
公开(公告)号：US09910370B2
公开(公告)日：2018-03-06
申请号：US15486419
申请日：2017-04-13
申请人： Nikon Corporation
发明人： W. Thomas Novak , Andrew J. Hazelton , Douglas C. Watson
IPC分类号： G03F7/20
CPC分类号： G03F7/70866 , G03F7/70341 , G03F7/7095
摘要： An immersion lithography apparatus includes an optical assembly including an optical element, and configured to project a beam onto a substrate through immersion liquid, a containment member surrounding a path of the beam, a stage on which the substrate is held and moved below a bottom surface of the containment member with the substrate spaced from the bottom surface of the containment member, and a support system having an actuator to support and move the containment member. The containment member includes a first supply opening via which water as the immersion liquid is released, a recovery opening via which the immersion liquid is recovered from a gap between the containment member and the substrate and/or the stage, and a second supply opening via which the water is released to the gap, the second supply opening being provided radially inward of the recovery opening.

2. 发明授权

US09086636B2 Optical arrangement of autofocus elements for use with immersion lithography 有权
标题翻译：用于浸没光刻的自动对焦元件的光学布置
公开(公告)号：US09086636B2
公开(公告)日：2015-07-21
申请号：US14589399
申请日：2015-01-05
申请人： NIKON CORPORATION
发明人： W. Thomas Novak
IPC分类号： G03F7/20 , G03F9/00
CPC分类号： G03F7/70258 , G03F7/2041 , G03F7/70341 , G03F7/70641 , G03F7/70958 , G03F9/7026 , G03F9/7034
摘要： A lithographic projection apparatus includes a projection optics having a last element, by which an exposure light is projected onto an upper surface of a wafer through liquid covering a portion of the upper surface. The last element has a convex-shape incident surface, an exit surface from which the exposure light is emitted, and an outer surface arranged above the exit surface. The outer surface of the last element has a lower portion, and extends radially-outwardly and upwardly from the lower portion. The apparatus also includes a gap along the outer surface of the last element, the gap being defined between the outer surface of the last element and an opposing surface.
摘要翻译：平版印刷投影设备包括具有最后元件的投影光学元件，曝光光通过覆盖上表面的一部分的液体投射到晶片的上表面上。最后一个元件具有凸形入射表面，从其出射曝光光的出射表面和布置在出射表面上方的外表面。最后一个元件的外表面具有下部，并且从下部径向向外和向上延伸。该装置还包括沿着最后一个元件的外表面的间隙，该间隙限定在最后一个元件的外表面和相对的表面之间。

3. 发明授权

US08810915B2 Optical arrangement of autofocus elements for use with immersion lithography 有权
标题翻译：用于浸没光刻的自动对焦元件的光学布置
公开(公告)号：US08810915B2
公开(公告)日：2014-08-19
申请号：US14066315
申请日：2013-10-29
申请人： Nikon Corporation
发明人： W. Thomas Novak
IPC分类号： G02B3/12
CPC分类号： G03F7/70258 , G03F7/2041 , G03F7/70341 , G03F7/70641 , G03F7/70958 , G03F9/7026 , G03F9/7034
摘要： A lithographic projection apparatus includes a projection system having a last element from which an exposure light is projected onto a wafer through liquid in a space under the last element. A light incident surface of the last element has a convex shape. A liquid retaining member is disposed adjacent to a surface of the last element through which the exposure light does not pass. The liquid retaining member has an undersurface under which liquid is retained. A gap is formed between the liquid retaining member and the surface of the last element, the gap being in fluidic communication with the space. The liquid is retained between the last element and the undersurface of the liquid retaining member on one side and an upper surface of the wafer on the other side. The liquid locally covers a portion of the upper surface of the wafer.
摘要翻译：光刻投影设备包括具有最后元件的投影系统，曝光光从该元件的最后元件下方的空间中通过液体投射到晶片上。最后一个元件的光入射表面具有凸形。液体保持构件被布置成与曝光光不通过的最后一个元件的表面相邻。液体保持构件具有下表面，液体保持在该下表面下方。在液体保持构件和最后一个元件的表面之间形成间隙，间隙与空间流体连通。液体保持在液体保持构件的最后一个元件和下表面之间，另一侧保持在晶片的一侧和上表面上。液体局部覆盖晶片上表面的一部分。

4. 发明授权

US09632427B2 Environmental system including a transport region for an immersion lithography apparatus 有权
公开(公告)号：US09632427B2
公开(公告)日：2017-04-25
申请号：US14955968
申请日：2015-12-01
申请人： NIKON CORPORATION
发明人： W. Thomas Novak , Andrew J. Hazelton , Douglas C. Watson
IPC分类号： G03F7/20
CPC分类号： G03F7/70866 , G03F7/70341 , G03F7/7095
摘要： An immersion lithography apparatus includes an optical assembly that projects a beam onto a substrate through an immersion liquid, a containment member surrounding a path of the beam, a stage holding the substrate, an isolator having a first actuator which limits vibrations of the optical assembly, and a support system having a second actuator to support the containment member and move it by the second actuator. The containment member includes a first supply opening via which water as the immersion liquid is released, a recovery opening via which the immersion liquid is recovered from a gap between the containment member and the substrate and/or the stage, and a second supply opening via which the water is released to the gap between the containment member and the substrate and/or the stage, the second supply opening being provided radially inward of the recovery opening.

5. 发明授权

US09587977B2 Boresight error monitor for laser radar integrated optical assembly 有权
标题翻译：激光雷达集成光学组件的视轴误差监视器
公开(公告)号：US09587977B2
公开(公告)日：2017-03-07
申请号：US14010375
申请日：2013-08-26
申请人： Nikon Corporation
发明人： Daniel G. Smith , W. Thomas Novak
IPC分类号： G01J1/00 , G01S7/497 , G01S7/481
CPC分类号： G01J1/00 , G01S7/481 , G01S7/497
摘要： Boresight and other pointing errors are detected based on a monitor beam formed by diverting a portion of a probe beam. The monitor beam is directed to a position sensitive photodetector, and the optical power received at the position sensitive photodetector is used to estimate or correct such pointing errors.
摘要翻译：基于通过转移探测光束的一部分而形成的监视光束来检测视轴和其他指向误差。监视器光束被引导到位置敏感光电检测器，并且在位置敏感光电检测器处接收的光功率用于估计或校正这种指向误差。

6. 发明授权

US08953250B2 Optical arrangement of autofocus elements for use with immersion lithography 有权
标题翻译：用于浸没光刻的自动对焦元件的光学布置
公开(公告)号：US08953250B2
公开(公告)日：2015-02-10
申请号：US14330263
申请日：2014-07-14
申请人： Nikon Corporation
发明人： W. Thomas Novak
IPC分类号： G02B3/12 , G03F7/20
CPC分类号： G03F7/70258 , G03F7/2041 , G03F7/70341 , G03F7/70641 , G03F7/70958 , G03F9/7026 , G03F9/7034
摘要： A lithographic projection apparatus includes a projection system having a last element, by which an exposure light is projected onto an upper surface of a wafer through liquid locally covering a portion of the upper surface of the wafer. The last element has a lower surface from which the exposure light is emitted. The last element also has an outer surface which extends upwardly from an edge portion of the lower surface. The apparatus also includes a space along the outer surface of the last element, to which the liquid is supplied from above the lower surface of the last element. The space is defined by the outer surface of the last element and a surface opposing the outer surface of the last element.
摘要翻译：光刻投影装置包括具有最后元件的投影系统，通过该投影系统，曝光光通过局部覆盖晶片上表面的一部分的液晶投射到晶片的上表面。最后一个元件具有从其发射曝光光的较低表面。最后一个元件还具有从下表面的边缘部分向上延伸的外表面。该装置还包括沿着最后一个元件的外表面的空间，液体从最后一个元件的下表面上方供应到该空间。该空间由最后一个元件的外表面和与最后一个元件的外表面相对的表面限定。

7. 发明申请

US20130241761A1 BEAM STEERING FOR LASER RADAR AND OTHER USES 审中-公开
标题翻译：用于激光雷达和其他用途的光束转向
公开(公告)号：US20130241761A1
公开(公告)日：2013-09-19
申请号：US13840093
申请日：2013-03-15
申请人： NIKON CORPORATION
发明人： Alexander Cooper , Daniel G. Smith , W. Thomas Novak
IPC分类号： G02B26/10 , G06F17/50 , G01S13/86
CPC分类号： G02B26/10 , G01S7/4812 , G01S7/4817 , G01S13/865 , G01S17/42 , G02B5/122 , G02B26/108 , G06F17/50
摘要： Optical systems suitable for use as or in laser radar systems and other uses include a beam-forming unit, a beam-scan unit, and a controller. The beam-forming unit includes a first optical element, and the beam-scan unit includes a second optical element. The first optical element is movable to shape and direct a substantially collimated optical beam along a nominal propagation axis to a target, and the second optical element includes at least one movable beam deflector that moves the optical beam in a scanning manner relative to the nominal propagation axis. The controller is coupled to the beam-forming unit and beam-scan unit, and is configured to induce movement of the first optical element required for shaping and directing the optical beam along the nominal propagation axis and to induce independent motion of the beam deflector of the second optical element as required to scan the optical beam relative to the nominal propagation axis. The beam deflector can be refractive or reflective.
摘要翻译：适用于或用于激光雷达系统和其他用途的光学系统包括波束形成单元，波束扫描单元和控制器。波束形成单元包括第一光学元件，并且波束扫描单元包括第二光学元件。第一光学元件可移动以使基本上准直的光束沿着标称传播轴线定向到目标，并且第二光学元件包括至少一个可移动光束偏转器，其以相对于标称传播的扫描方式移动光束轴。控制器耦合到波束形成单元和波束扫描单元，并且被配置为引起第一光学元件的移动，该第一光学元件成形并沿着标称传播轴线引导光束，并且引导光束偏转器的独立运动所需的第二光学元件相对于标称传播轴扫描光束。光束偏转器可以是折射或反射的。

8. 发明授权

US10185222B2 Liquid jet and recovery system for immersion lithography 有权
公开(公告)号：US10185222B2
公开(公告)日：2019-01-22
申请号：US15723628
申请日：2017-10-03
申请人： NIKON CORPORATION
发明人： W. Thomas Novak , Andrew J. Hazelton , Douglas C. Watson
IPC分类号： G03B27/52 , G03B27/42 , G03F7/20
摘要： An immersion lithography apparatus includes a projection system having a last optical element, a plurality of liquid supply openings that surround a path of exposure light that exits an end surface of the last optical element and face downwardly, and a plurality of liquid recovery openings that surround the path of the exposure light, are arranged radially outward of the liquid supply openings, and face downwardly. An upper surface of a substrate is opposite to the liquid supply openings and the liquid recovery openings. A portion of the upper surface of the substrate is covered with immersion liquid, which flows across the end surface of the last optical element. The substrate is exposed with the exposure light through the immersion liquid between the end surface of the last optical element and the upper surface the substrate.

9. 发明授权

US09244363B2 Environmental system including a transport region for an immersion lithography apparatus 有权
标题翻译：环境系统包括浸没式光刻设备的传送区域
公开(公告)号：US09244363B2
公开(公告)日：2016-01-26
申请号：US14463066
申请日：2014-08-19
申请人： NIKON CORPORATION
发明人： W. Thomas Novak , Andrew J. Hazelton , Michael Sogard
IPC分类号： G03F7/20
CPC分类号： G03F7/70866 , G03F7/70341 , G03F7/7095
摘要： An immersion lithography apparatus includes (i) an optical assembly including an optical element, and configured to project a beam onto a substrate through an immersion liquid; (ii) a containment member that surrounds a path of the beam; and (iii) a stage on which the substrate is held, the substrate on the stage being moved below and spaced from a bottom surface of the containment member. The containment member includes: (1) a nozzle outlet via which water as the immersion liquid is released, (2) a recovery channel via which the immersion liquid is recovered from a gap between the containment member and the substrate and/or the stage, and (3) a fluid channel via which water is released to the gap between the containment member and the substrate and/or the stage, the fluid channel being provided radially inward of the recovery channel.
摘要翻译：浸没光刻设备包括（i）包括光学元件的光学组件，并且被配置为通过浸没液体将光束投射到基板上; （ii）围绕梁的路径的容纳构件; 和（iii）保持基板的阶段，台架上的基板移动到容纳构件的底表面下方并与其隔开。容纳构件包括：（1）喷嘴出口，通过该喷嘴出口释放作为浸没液体的水，（2）回收通道，通过该回收通道从容纳构件与基底和/或载物台之间的间隙回收浸液，和（3）流体通道，水被释放到容纳构件与基底和/或载物台之间的间隙，流体通道设置在回收通道的径向内侧。

10. 发明申请

US20140063491A1 BORESIGHT ERROR MONITOR FOR LASER RADAR INTEGRATED OPTICAL ASSEMBLY 有权
标题翻译：激光雷达集成光学组件的BORESIGHT ERROR MONITOR
公开(公告)号：US20140063491A1
公开(公告)日：2014-03-06
申请号：US14010375
申请日：2013-08-26
申请人： Nikon Corporation
发明人： Daniel G. Smith , W. Thomas Novak
IPC分类号： G01J1/00
CPC分类号： G01J1/00 , G01S7/481 , G01S7/497
摘要： Boresight and other pointing errors are detected based on a monitor beam formed by diverting a portion of a probe beam. The monitor beam is directed to a position sensitive photodetector, and the optical power received at the position sensitive photodetector is used to estimate or correct such pointing errors.
摘要翻译：基于通过转移探测光束的一部分而形成的监视光束来检测视轴和其他指向误差。监视器光束被引导到位置敏感光电检测器，并且在位置敏感光电检测器处接收的光功率用于估计或校正这种指向误差。

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