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    • 1. 发明授权
    • Array substrate for use in displays, and method of manufacturing the same
    • 用于显示器的阵列基板及其制造方法
    • US08625040B2
    • 2014-01-07
    • US13044824
    • 2011-03-10
    • Norishige Iwanami
    • Norishige Iwanami
    • G02F1/136
    • G02F1/136227G02F1/1345G02F1/13458G02F1/136259G02F2001/13629G02F2001/136295G02F2201/50H01L27/124
    • An array substrate for displays, includes a first conductive film pattern, a first insulating layer, a second conductive film pattern, a second insulating layer, a contact hole, and a transparent conductive film. The first conductive film pattern is pattern-formed on a transparent substrate. The first insulating layer is formed on the first conductive film pattern. The second conductive film pattern is pattern-formed upper the first insulating layer and overlapping the first conductive film pattern. The second insulating layer is formed upper the first insulating layer and the second conductive film pattern. The contact hole is made from the first insulating layer to the second insulating layer. The transparent conductive film electrically connects the first conductive film pattern and the second conductive film pattern in the contact hole. The contact hole is made in a region where an edge of the second conductive film pattern overlaps the first conductive film pattern.
    • 用于显示器的阵列基板包括第一导电膜图案,第一绝缘层,第二导电膜图案,第二绝缘层,接触孔和透明导电膜。 第一导电膜图案在透明基板上图案形成。 第一绝缘层形成在第一导电膜图案上。 第二导电膜图案是图案形成在第一绝缘层的上方并且与第一导电膜图案重叠。 第二绝缘层形成在第一绝缘层和第二导电膜图案之上。 接触孔由第一绝缘层到第二绝缘层制成。 透明导电膜在接触孔中电连接第一导电膜图案和第二导电膜图案。 接触孔在第二导电膜图案的边缘与第一导电膜图案重叠的区域中制成。