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1. 发明授权

US07585341B2 Polishing material comprising diamond clusters 有权
标题翻译：包括金刚石簇的抛光材料
公开(公告)号：US07585341B2
公开(公告)日：2009-09-08
申请号：US11805458
申请日：2007-05-23
申请人： Noriyuki Kumasaka , Yuji Horie , Mitsuru Saito , Kazuei Yamaguchi
发明人： Noriyuki Kumasaka , Yuji Horie , Mitsuru Saito , Kazuei Yamaguchi
IPC分类号： C09K3/14 , C09G1/02 , C01B31/06
CPC分类号： G11B5/8404 , B24D11/00 , C01B32/25 , C09K3/1436 , C09K3/1463
摘要： Diamond clusters are used as a polishing material of free abrading particles, each being a combination of artificial diamond particles having primary particle diameters of 20 nm or less and impurities that are attached around these diamond particles. The density of non-diamond carbon contained in the impurities is in the range of 95% or more and 99% or less, and the density of chlorine contained in other than non-diamond carbon in the impurities is 0.5% or more and preferably 3.5% or less. The diameters of these diamond clusters are in the range of 30 nm or more and 500 nm or less, and their average diameter is in the range of 30 nm or more and 200 nm or less.
摘要翻译：金刚石簇用作自由研磨颗粒的抛光材料，每个颗粒是一次粒径为20nm以下的人造金刚石颗粒和附着在这些金刚石颗粒周围的杂质的组合。杂质中含有的非金刚石碳的密度在95％以上且99％以下的范围，杂质以外的非金刚石碳以外的氯的密度为0.5％以上，优选为3.5 ％或更少。这些金刚石簇的直径在30nm以上且500nm以下的范围内，其平均直径为30nm以上且200nm以下的范围。

2. 发明申请

US20090188170A1 METHOD OF PRODUCING POLISHING MATERIAL COMPRISING DIAMOND CLUSTERS 有权
标题翻译：生产包含金刚石簇的抛光材料的方法
公开(公告)号：US20090188170A1
公开(公告)日：2009-07-30
申请号：US12420557
申请日：2009-04-08
申请人： Noriyuki Kumasaka , Yuji Horie , Mitsuru Saito , Kazuei Yamaguchi
发明人： Noriyuki Kumasaka , Yuji Horie , Mitsuru Saito , Kazuei Yamaguchi
IPC分类号： C09K3/14
CPC分类号： G11B5/8404 , B24D11/00 , C01B32/25 , C09K3/1436 , C09K3/1463
摘要： Diamond clusters are used as a polishing material of free abrading particles, each being a combination of artificial diamond particles having primary particle diameters of 20 nm or less and impurities that are attached around these diamond particles. The density of non-diamond carbon contained in the impurities is in the range of 95% or more and 99% or less, and the density of chlorine contained in other than non-diamond carbon in the impurities is 0.5% or more and preferably 3.5% or less. The diameters of these diamond clusters are in the range of 30 nm or more and 500 nm or less, and their average diameter is in the range of 30 nm or more and 200 nm or less. Such polishing material is produced first by an explosion shock method to obtain diamond clusters and then removing the impurities such that density of non-diamond carbon contained in the impurities and density of chlorine contained in other than non-diamond carbon in the impurities become adjusted.
摘要翻译：金刚石簇用作自由研磨颗粒的抛光材料，每个颗粒是一次粒径为20nm以下的人造金刚石颗粒和附着在这些金刚石颗粒周围的杂质的组合。杂质中含有的非金刚石碳的密度在95％以上且99％以下的范围，杂质以外的非金刚石碳以外的氯的密度为0.5％以上，优选为3.5 ％或更少。这些金刚石簇的直径在30nm以上且500nm以下的范围内，其平均直径为30nm以上且200nm以下的范围。首先通过爆炸冲击法制造这种抛光材料，以获得金刚石簇，然后除去杂质，从而调节杂质中包含的非金刚石碳的密度和杂质中除非金刚石碳以外的其它的密度。

3. 发明授权

US07857876B2 Method of producing polishing material comprising diamond clusters 有权
标题翻译：制造包含金刚石簇的抛光材料的方法
公开(公告)号：US07857876B2
公开(公告)日：2010-12-28
申请号：US12420557
申请日：2009-04-08
申请人： Noriyuki Kumasaka , Yuji Horie , Mitsuru Saito , Kazuei Yamaguchi
发明人： Noriyuki Kumasaka , Yuji Horie , Mitsuru Saito , Kazuei Yamaguchi
IPC分类号： B24D3/02 , C09C1/68 , C09K3/14 , H01L21/302 , C09G1/02 , B24B1/00 , B24B7/19
CPC分类号： G11B5/8404 , B24D11/00 , C01B32/25 , C09K3/1436 , C09K3/1463
摘要： Diamond clusters are used as a polishing material of free abrading particles, each being a combination of artificial diamond particles having primary particle diameters of 20 nm or less and impurities that are attached around these diamond particles. The density of non-diamond carbon contained in the impurities is in the range of 95% or more and 99% or less, and the density of chlorine contained in other than non-diamond carbon in the impurities is 0.5% or more and preferably 3.5% or less. The diameters of these diamond clusters are in the range of 30 nm or more and 500 nm or less, and their average diameter is in the range of 30 nm or more and 200 nm or less. Such polishing material is produced first by an explosion shock method to obtain diamond clusters and then removing the impurities such that density of non-diamond carbon contained in the impurities and density of chlorine contained in other than non-diamond carbon in the impurities become adjusted.
摘要翻译：金刚石簇用作自由研磨颗粒的抛光材料，每个颗粒是一次粒径为20nm以下的人造金刚石颗粒和附着在这些金刚石颗粒周围的杂质的组合。杂质中含有的非金刚石碳的密度在95％以上且99％以下的范围，杂质以外的非金刚石碳以外的氯的密度为0.5％以上，优选为3.5 ％或更少。这些金刚石簇的直径在30nm以上且500nm以下的范围内，其平均直径为30nm以上且200nm以下的范围。首先通过爆炸冲击法制造这种抛光材料，以获得金刚石簇，然后除去杂质，从而调节杂质中包含的非金刚石碳的密度和杂质中除非金刚石碳以外的其它的密度。

4. 发明授权

US07374473B2 Texturing slurry and texturing method by using same 有权
标题翻译：使用相同的纹理和纹理化方法
公开(公告)号：US07374473B2
公开(公告)日：2008-05-20
申请号：US11605497
申请日：2006-11-27
申请人： Noriyuki Kumasaka , Yuji Horie , Mitsuru Saito , Kazuei Yamaguchi
发明人： Noriyuki Kumasaka , Yuji Horie , Mitsuru Saito , Kazuei Yamaguchi
IPC分类号： B24B29/00 , B24B21/04
CPC分类号： C09K3/1463 , B24B21/12 , B24B37/044 , C09G1/02
摘要： Texturing slurry for texturing a substrate for a magnetic hard disk is obtained by dispersing abrading particles of a specified kind in a specified kind of dispersant. The abrading particles include diamond clusters formed with artificial diamond particles with primary particle diameter of 20 nm or less and surrounded by impurities containing chlorine at a certain ratio. The cluster diameter and the average cluster diameter of the diamond clusters are each within a specified range. For texturing a substrate surface, the substrate is rotated, texturing slurry of this invention is supplied to the surface and a texturing tape of a specified kind is pressed against the substrate surface while it is caused to run.
摘要翻译：通过将指定种类的研磨颗粒分散在指定种类的分散剂中，获得用于磁化硬盘基片的纹理化浆料。研磨颗粒包括由一次粒径为20nm以下的人造金刚石颗粒形成的金刚石簇，并以一定比例包含含氯的杂质。金刚石簇的簇直径和平均簇直径均在规定的范围内。为了使衬底表面纹理化，衬底旋转，本发明的纹理浆料被提供给表面，并且指定类型的纹理带在其被运行时被压靠在衬底表面上。

5. 发明申请

US20070231245A1 Polishing material and production method therefor 有权
标题翻译：抛光材料及其制作方法
公开(公告)号：US20070231245A1
公开(公告)日：2007-10-04
申请号：US11805458
申请日：2007-05-23
申请人： Noriyuki Kumasaka , Yuji Horie , Mitsuru Saito , Kazuei Yamaguchi
发明人： Noriyuki Kumasaka , Yuji Horie , Mitsuru Saito , Kazuei Yamaguchi
IPC分类号： C09K3/14 , B01J3/06
CPC分类号： G11B5/8404 , B24D11/00 , C01B32/25 , C09K3/1436 , C09K3/1463
摘要： Diamond clusters are used as a polishing material of free abrading particles, each being a combination of artificial diamond particles having primary particle diameters of 20 nm or less and impurities that are attached around these diamond particles. The density of non-diamond carbon contained in the impurities is in the range of 95% or more and 99% or less, and the density of chlorine contained in other than non-diamond carbon in the impurities is 0.5% or more and preferably 3.5% or less. The diameters of these diamond clusters are in the range of 30 nm or more and 500 nm or less, and their average diameter is in the range of 30 nm or more and 200 nm or less. Such polishing material is produced first by an explosion shock method to obtain diamond clusters and then removing the impurities such that density of non-diamond carbon contained in the impurities and density of chlorine contained in other than non-diamond carbon in the impurities become adjusted.
摘要翻译：金刚石簇用作自由研磨颗粒的抛光材料，每个颗粒是一次粒径为20nm以下的人造金刚石颗粒和附着在这些金刚石颗粒周围的杂质的组合。杂质中含有的非金刚石碳的密度在95％以上且99％以下的范围，杂质以外的非金刚石碳以外的氯的密度为0.5％以上，优选为3.5 ％或更少。这些金刚石簇的直径在30nm以上且500nm以下的范围内，其平均直径为30nm以上且200nm以下的范围。首先通过爆炸冲击法制造这种抛光材料，以获得金刚石簇，然后除去杂质，从而调节杂质中包含的非金刚石碳的密度和杂质中除非金刚石碳以外的其它的密度。

6. 发明申请

US20070123153A1 Texturing slurry and texturing method by using same 有权
标题翻译：使用相同的纹理和纹理化方法
公开(公告)号：US20070123153A1
公开(公告)日：2007-05-31
申请号：US11605497
申请日：2006-11-27
申请人： Noriyuki Kumasaka , Yuji Horie , Mitsuru Saito , Kazuei Yamaguchi
发明人： Noriyuki Kumasaka , Yuji Horie , Mitsuru Saito , Kazuei Yamaguchi
IPC分类号： B24B7/30
CPC分类号： C09K3/1463 , B24B21/12 , B24B37/044 , C09G1/02
摘要： Texturing slurry for texturing a substrate for a magnetic hard disk is obtained by dispersing abrading particles of a specified kind in a specified kind of dispersant. The abrading particles include diamond clusters formed with artificial diamond particles with primary particle diameter of 20 nm or less and surrounded by impurities containing chlorine at a certain ratio. The cluster diameter and the average cluster diameter of the diamond clusters are each within a specified range. For texturing a substrate surface, the substrate is rotated, texturing slurry of this invention is supplied to the surface and a texturing tape of a specified kind is pressed against the substrate surface while it is caused to run.
摘要翻译：通过将指定种类的研磨颗粒分散在指定种类的分散剂中，获得用于磁化硬盘基片的纹理化浆料。研磨颗粒包括由一次粒径为20nm以下的人造金刚石颗粒形成的金刚石簇，并以一定比例包含含氯的杂质。金刚石簇的簇直径和平均簇直径均在规定的范围内。为了使衬底表面纹理化，衬底旋转，本发明的纹理浆料被提供给表面，并且指定类型的纹理带在其被运行时被压靠在衬底表面上。

7. 发明申请

US20060270328A1 Method of producing polishing cloth 失效
标题翻译：抛光布生产方法
公开(公告)号：US20060270328A1
公开(公告)日：2006-11-30
申请号：US11501493
申请日：2006-08-08
申请人： Yuji Horie , Hiromitsu Okuyama , Kazuei Yamaguchi
发明人： Yuji Horie , Hiromitsu Okuyama , Kazuei Yamaguchi
IPC分类号： B24D11/00
CPC分类号： B24B37/22 , Y10T428/24149 , Y10T428/24314
摘要： A polishing cloth to be produced has a surface layer stacked over a base material. The surface layer is made of a foamed layer and a non-foamed layer, the foamed layer including air bubble cells and the non-foamed layer having an externally exposed surface where linear cuts are formed. These linear cuts reach the air bubble cells such that the air bubble cells communicate with the exterior through the linear cuts. These linear cuts are controlled to be 10 μm or less in length. Such a polishing cloth is produced by applying a foamable coating material such as a foamable resin over a surface of the base material, foaming the foamable coating material to form the surface layer, and forming the linear cuts through the non-foamed layer.
摘要翻译：待制造的抛光布具有层叠在基材上的表面层。表面层由发泡层和非发泡层制成，发泡层包括气泡泡孔，非发泡层具有形成线形切口的外露表面。这些线性切口到达气泡单元，使得气泡单元通过线性切口与外部连通。这些线性切割的长度控制在10um以下。这种抛光布通过在基材的表面上涂布可发泡的涂料如发泡树脂，使可发泡的涂料发泡以形成表面层，并通过非发泡层形成线形切口来制造。

8. 发明授权

US07267601B2 Method of producing polishing cloth 失效
标题翻译：抛光布生产方法
公开(公告)号：US07267601B2
公开(公告)日：2007-09-11
申请号：US11501493
申请日：2006-08-08
申请人： Yuji Horie , Hiromitsu Okuyama , Kazuei Yamaguchi
发明人： Yuji Horie , Hiromitsu Okuyama , Kazuei Yamaguchi
IPC分类号： B32B3/10 , B24D11/00 , B24B1/00
CPC分类号： B24B37/22 , Y10T428/24149 , Y10T428/24314
摘要： A polishing cloth to be produced has a surface layer stacked over a base material. The surface layer is made of a foamed layer and a non-foamed layer, the foamed layer including air bubble cells and the non-foamed layer having an externally exposed surface where linear cuts are formed. These linear cuts reach the air bubble cells such that the air bubble cells communicate with the exterior through the linear cuts. These linear cuts are controlled to be 10 μm or less in length. Such a polishing cloth is produced by applying a foamable coating material such as a foamable resin over a surface of the base material, foaming the foamable coating material to form the surface layer, and forming the linear cuts through the non-foamed layer.
摘要翻译：待制造的抛光布具有层叠在基材上的表面层。表面层由发泡层和非发泡层制成，发泡层包括气泡泡孔，非发泡层具有形成线形切口的外露表面。这些线性切口到达气泡单元，使得气泡单元通过线性切口与外部连通。这些线性切割的长度控制在10um以下。这种抛光布通过在基材的表面上涂布可发泡的涂料如发泡树脂，使可发泡的涂料发泡以形成表面层，并通过非发泡层形成线形切口来制造。

9. 发明授权

US07134952B2 Polishing cloth 失效
标题翻译：抛光布
公开(公告)号：US07134952B2
公开(公告)日：2006-11-14
申请号：US10666987
申请日：2003-09-19
申请人： Yuji Horie , Hiromitsu Okuyama , Kazuei Yamaguchi
发明人： Yuji Horie , Hiromitsu Okuyama , Kazuei Yamaguchi
IPC分类号： B32B3/10 , B24D11/00
CPC分类号： B24B37/22 , Y10T428/24149 , Y10T428/24314
摘要： A polishing cloth has a surface layer stacked over a base material. The surface layer is made of a foamed layer and a non-foamed layer, the foamed layer including air bubble cells and the non-foamed layer having an externally exposed surface where linear cuts are formed. These linear cuts reach the air bubble cells such that the air bubble cells communicate with the exterior through the linear cuts. These linear cuts are controlled to be 10 μm or less in length.
摘要翻译：抛光布具有层叠在基材上的表层。表面层由发泡层和非发泡层制成，发泡层包括气泡泡孔，非发泡层具有形成线形切口的外露表面。这些线性切口到达气泡单元，使得气泡单元通过线性切口与外部连通。这些线性切割的长度控制在10um以下。

10. 发明申请

US20080076327A1 Polishing slurry and polishing method using same 审中-公开
标题翻译：抛光浆和抛光方法使用相同
公开(公告)号：US20080076327A1
公开(公告)日：2008-03-27
申请号：US11893830
申请日：2007-08-17
申请人： Kazuei Yamaguchi , Yasuyuki Yokota , Sanaki Horimoto
发明人： Kazuei Yamaguchi , Yasuyuki Yokota , Sanaki Horimoto
IPC分类号： B24B29/02
CPC分类号： C09G1/02 , C09K3/1463
摘要： Polishing slurry is caused to be present between a surface of a soft magnetic layer and a polishing tool such as a polishing pad and the surface of the soft magnetic layer and the polishing tool are moved relative to each other. The polishing slurry contains silica particles as abrading particles, compounds containing carboxylic acid and amino polycarboxylic acid and an oxidizing agent as a polishing accelerator, organic and/or inorganic compound of phosphoric acid, nitride and/or nitrite as an anti-corrosion agent and a pH conditioner such that the slurry has pH value between 4 and 11.
摘要翻译：导致抛光浆料存在于软磁性层的表面和抛光工具如抛光垫之间，并且软磁性层和抛光工具的表面相对于彼此移动。研磨浆料含有作为研磨粒子的二氧化硅粒子，含有羧酸和氨基多元羧酸的化合物和作为研磨促进剂的氧化剂，作为防锈剂的磷酸，氮化物和/或亚硝酸盐的有机和/或无机化合物，以及 pH调节剂使得浆料的pH值在4和11之间。

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