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1. 发明授权

US08541116B2 Patterned perpendicular magnetic recording disk drive and medium with patterned exchange bridge layer below the data islands 有权
标题翻译：图案化的垂直磁记录磁盘驱动器和介质，在数据岛下方有图案交换桥接层
公开(公告)号：US08541116B2
公开(公告)日：2013-09-24
申请号：US12906909
申请日：2010-10-18
申请人： Olav Hellwig , Dan Saylor Kercher , Ernesto E. Marinero , Manfred Ernst Schabes , Dieter K. Weller , Gabriel Zeltzer
发明人： Olav Hellwig , Dan Saylor Kercher , Ernesto E. Marinero , Manfred Ernst Schabes , Dieter K. Weller , Gabriel Zeltzer
IPC分类号： G11B5/66
CPC分类号： G11B5/855 , G11B5/746 , G11B2005/0021
摘要： A patterned perpendicular magnetic recording disk with discrete data islands of recording layer (RL) material includes a substrate, a patterned exchange bridge layer of magnetic material between the substrate and the islands, and an optional exchange-coupling control layer (CCL) between the exchange bridge layer and the islands. The exchange bridge layer has patterned pedestals below the islands. The exchange bridge layer controls exchange interactions between the RLs in adjacent islands to compensate the dipolar fields between islands, and the pedestals concentrate the flux from the write head. The disk may include a soft underlayer (SUL) of soft magnetically permeable material on the substrate and a nonmagnetic exchange break layer (EBL) on the SUL between the SUL and the exchange bridge layer. In a thermally-assisted recording (TAR) disk a heat sink layer may be located below the exchange bridge layer and the SUL may be optional.
摘要翻译：具有记录层（RL）材料的离散数据岛的图案化垂直磁记录盘包括衬底，在衬底和岛之间的图案化的磁性材料交换桥接层，以及在交换器之间的任选的交换耦合控制层（CCL）桥梁层和岛屿。交换桥层在岛屿下方有图案化的基座。交换桥接层控制相邻岛中的RL之间的交换相互作用以补偿岛之间的偶极场，并且基座集中来自写头的磁通。盘可以包括在衬底上的软磁性可渗透材料的软底层（SUL）和在SUL和交换桥接层之间的SUL上的非磁性交换断层（EBL）。在热辅助记录（TAR）盘中，散热层可以位于交换桥接层下方，并且SUL可以是可选的。

2. 发明申请

US20120092790A1 PATTERNED PERPENDICULAR MAGNETIC RECORDING DISK DRIVE AND MEDIUM WITH PATTERNED EXCHANGE BRIDGE LAYER BELOW THE DATA ISLANDS 有权
标题翻译：图形数字岛上的图形交换电路板图形磁记录磁盘驱动器和介质
公开(公告)号：US20120092790A1
公开(公告)日：2012-04-19
申请号：US12906909
申请日：2010-10-18
申请人： Olav Hellwig , Dan Saylor Kercher , Ernesto E. Marinero , Manfred Ernst Schabes , Dieter K. Weller , Gabriel Zeltzer
发明人： Olav Hellwig , Dan Saylor Kercher , Ernesto E. Marinero , Manfred Ernst Schabes , Dieter K. Weller , Gabriel Zeltzer
IPC分类号： G11B5/82 , G11B5/02 , G11B5/706 , G11B5/127
CPC分类号： G11B5/855 , G11B5/746 , G11B2005/0021
摘要： A patterned perpendicular magnetic recording disk with discrete data islands of recording layer (RL) material includes a substrate, a patterned exchange bridge layer of magnetic material between the substrate and the islands, and an optional exchange-coupling control layer (CCL) between the exchange bridge layer and the islands. The exchange bridge layer has patterned pedestals below the islands. The exchange bridge layer controls exchange interactions between the RLs in adjacent islands to compensate the dipolar fields between islands, and the pedestals concentrate the flux from the write head. The disk may include a soft underlayer (SUL) of soft magnetically permeable material on the substrate and a nonmagnetic exchange break layer (EBL) on the SUL between the SUL and the exchange bridge layer. In a thermally-assisted recording (TAR) disk a heat sink layer may be located below the exchange bridge layer and the SUL may be optional.
摘要翻译：具有记录层（RL）材料的离散数据岛的图案化垂直磁记录盘包括衬底，在衬底和岛之间的图案化的磁性材料交换桥接层，以及在交换器之间的任选的交换耦合控制层（CCL）桥梁层和岛屿。交换桥层在岛屿下方有图案化的基座。交换桥接层控制相邻岛中的RL之间的交换相互作用以补偿岛之间的偶极场，并且基座集中来自写头的磁通。盘可以包括在衬底上的软磁性可渗透材料的软底层（SUL）和在SUL和交换桥接层之间的SUL上的非磁性交换断层（EBL）。在热辅助记录（TAR）盘中，散热层可以位于交换桥接层下方，并且SUL可以是可选的。

3. 发明授权

US08481245B2 System, method and apparatus for pattern clean-up during fabrication of patterned media using forced assembly of molecules 失效
标题翻译：使用强制组装分子的图案化介质制造期间图案清理的系统，方法和装置
公开(公告)号：US08481245B2
公开(公告)日：2013-07-09
申请号：US13333109
申请日：2011-12-21
申请人： Qing Dai , Dan Saylor Kercher , Huey-Ming Tzeng
发明人： Qing Dai , Dan Saylor Kercher , Huey-Ming Tzeng
IPC分类号： G03F7/20
CPC分类号： G03F7/40 , B82Y10/00 , G11B5/743 , G11B5/82 , G11B5/855
摘要： A pattern clean-up for fabrication of patterned media using a forced assembly of molecules is disclosed. E-beam lithography is initially used to write the initial patterned bit media structures, which have size and positioning errors. Nano-sized protein molecules are then forced to assemble of on top of the bits. The protein molecules have a very uniform size distribution and assemble into a lattice structure above the e-beam patterned areas. The protein molecules reduce the size and position errors in e-beam patterned structures. This process cleans the signal from the e-beam lithography and lowers the noise in the magnetic reading and writing. This process may be used to fabricate patterned bit media directly on hard disk, or to create a nano-imprint master for mass production of patterned bit media disks.
摘要翻译：公开了使用分子的强制组装制造图案化介质的图案清理。电子束光刻最初用于写入具有尺寸和定位误差的初始图案化的位介质结构。然后将纳米级蛋白质分子强制装配在顶部的位上。蛋白质分子具有非常均匀的尺寸分布并且组装成电子束图案区域上方的晶格结构。蛋白质分子减小电子束图案结构中的尺寸和位置误差。该过程清除电子束光刻中的信号，并降低磁读取和写入中的噪声。该过程可用于直接在硬盘上制造图案化的位介质，或者用于创建用于批量生产图案化位媒体盘的纳米压印母版。

4. 发明申请

US20090136873A1 SYSTEM, METHOD AND APPARATUS FOR PATTERN CLEAN-UP DURING FABRICATION OF PATTERNED MEDIA USING FORCED ASSEMBLY OF MOLECULES 有权
标题翻译：系统，方法和设备在使用强制组装分子的图形化介质中进行图案清洁
公开(公告)号：US20090136873A1
公开(公告)日：2009-05-28
申请号：US11946423
申请日：2007-11-28
申请人： Qing Dai , Dan Saylor Kercher , Huey-Ming Tzeng
发明人： Qing Dai , Dan Saylor Kercher , Huey-Ming Tzeng
IPC分类号： G03F7/20 , G03F7/40
CPC分类号： G03F7/40 , B82Y10/00 , G11B5/743 , G11B5/82 , G11B5/855
摘要： A pattern clean-up for fabrication of patterned media using a forced assembly of molecules is disclosed. E-beam lithography is initially used to write the initial patterned bit media structures, which have size and positioning errors. Nano-sized protein molecules are then forced to assemble of on top of the bits. The protein molecules have a very uniform size distribution and assemble into a lattice structure above the e-beam patterned areas. The protein molecules reduce the size and position errors in e-beam patterned structures. This process cleans the signal from the e-beam lithography and lowers the noise in the magnetic reading and writing. This process may be used to fabricate patterned bit media directly on hard disk, or to create a nano-imprint master for mass production of patterned bit media disks.
摘要翻译：公开了使用分子的强制组装制造图案化介质的图案清理。电子束光刻最初用于写入具有尺寸和定位误差的初始图案化的位介质结构。然后将纳米级蛋白质分子强制装配在顶部的位上。蛋白质分子具有非常均匀的尺寸分布并且组装成电子束图案区域上方的晶格结构。蛋白质分子减小电子束图案结构中的尺寸和位置误差。该过程清除电子束光刻中的信号，并降低磁读取和写入中的噪声。该过程可用于直接在硬盘上制造图案化的位介质，或者用于创建用于批量生产图案化位媒体盘的纳米压印母版。

5. 发明授权

US07517463B1 Perpendicular pole with bilayer gap 有权
标题翻译：垂直极与双层间隙
公开(公告)号：US07517463B1
公开(公告)日：2009-04-14
申请号：US12005572
申请日：2007-12-26
申请人： Christian Rene Bonhote , Dan Saylor Kercher , Jeffrey S. Lille
发明人： Christian Rene Bonhote , Dan Saylor Kercher , Jeffrey S. Lille
IPC分类号： B44C1/22
CPC分类号： G11B5/3163 , G11B5/1278 , G11B5/315 , Y10T29/49041
摘要： A perpendicular write pole having dual gap layers is disclosed. An outer gap layer, resistant to etching and corrosion in alkaline solutions protects the inner gap layer during photo resist development. An inner gap layer, resistant to acid etch conditions, protects the magnetic pole materials during removal of portions of the outer gap layer prior to electroplating of the pole to form the flare point.
摘要翻译：公开了具有双间隙层的垂直写入极。碱性溶液中耐腐蚀和腐蚀的外间隙层在光致抗蚀剂显影过程中保护内间隙层。在酸蚀刻条件下耐受的内间隙层在电极极之前在去除外间隙层的部分期间保护磁极材料以形成扩张点。

6. 发明申请

US20120138567A1 NANOIMPRINT LITHOGRAPHY METHOD FOR MAKING A PATTERNED MAGNETIC RECORDING DISK USING IMPRINT RESIST WITH ENLARGED FEATURE SIZE 审中-公开
标题翻译：使用具有扩展特征尺寸的印刷电阻制作图形磁记录盘的纳米印刷法
公开(公告)号：US20120138567A1
公开(公告)日：2012-06-07
申请号：US12957514
申请日：2010-12-01
申请人： Toshiki Hirano , Dan Saylor Kercher , Jeffrey S. Lille , Kanaiyalal Chaturdas Patel
发明人： Toshiki Hirano , Dan Saylor Kercher , Jeffrey S. Lille , Kanaiyalal Chaturdas Patel
IPC分类号： G11B5/84
CPC分类号： G11B5/8404 , G11B5/855
摘要： A method for making a patterned-media magnetic recording disk using nanoimprint lithography (NIL) enlarges the size of the imprint resist features after the imprint resist has been patterned by NIL. The layer of imprint resist material is deposited on a disk blank, which may have the magnetic layer already deposited on it. The imprint resist layer is patterned by NIL, resulting in a plurality of spaced-apart resist pillars with sloped sidewalls from the top to the base. An overlayer of a material like a fluorocarbon polymer is deposited over the patterned resist layer, including over the sloped resist pillar sidewalls. This enlarges the lateral dimension of the resist pillars. The overlayer is then etched to leave the overlayer on the sloped resist pillar sidewalls while exposing the disk blank in the spaces between the resist pillars. The resist pillars with overlayer on the sloped resist pillar sidewalls is then used as a mask for etching the disk blank, leaving a plurality of discrete islands on the disk blank.
摘要翻译：使用纳米压印光刻（NIL）制造图案化介质磁记录盘的方法在印记抗蚀剂已经被NIL图案化之后扩大了抗印刷抗蚀剂特征的尺寸。印版抗蚀剂材料层沉积在可能具有已经沉积在其上的磁性层的盘坯上。抗蚀刻层通过NIL进行图案化，从而形成多个间隔开的抗蚀剂柱，其具有从顶部到底部的倾斜的侧壁。诸如氟碳聚合物的材料的覆盖层沉积在图案化的抗蚀剂层上，包括在倾斜的抗蚀剂柱侧壁上。这增加了抗蚀柱的横向尺寸。然后对覆盖层进行蚀刻以将覆盖层留在倾斜的抗蚀剂柱侧壁上，同时在抗蚀剂柱之间的空间中露出盘坯。然后将具有覆盖层的抗蚀剂柱用于倾斜的抗蚀剂柱侧壁上，用作蚀刻盘坯的掩模，在盘坯上留下多个离散的岛。

7. 发明申请

US20120091096A1 SYSTEM, METHOD AND APPARATUS FOR PATTERN CLEAN-UP DURING FABRICATION OF PATTERNED MEDIA USING FORCED ASSEMBLY OF MOLECULES 失效
标题翻译：系统，方法和设备在使用强制组装分子的图形化介质中进行图案清洁
公开(公告)号：US20120091096A1
公开(公告)日：2012-04-19
申请号：US13333109
申请日：2011-12-21
申请人： Qing Dai , Dan Saylor Kercher , Huey-Ming Tzeng
发明人： Qing Dai , Dan Saylor Kercher , Huey-Ming Tzeng
IPC分类号： B05D3/14
CPC分类号： G03F7/40 , B82Y10/00 , G11B5/743 , G11B5/82 , G11B5/855
摘要： A pattern clean-up for fabrication of patterned media using a forced assembly of molecules is disclosed. E-beam lithography is initially used to write the initial patterned bit media structures, which have size and positioning errors. Nano-sized protein molecules are then forced to assemble of on top of the bits. The protein molecules have a very uniform size distribution and assemble into a lattice structure above the e-beam patterned areas. The protein molecules reduce the size and position errors in e-beam patterned structures. This process cleans the signal from the e-beam lithography and lowers the noise in the magnetic reading and writing. This process may be used to fabricate patterned bit media directly on hard disk, or to create a nano-imprint master for mass production of patterned bit media disks.
摘要翻译：公开了使用分子的强制组装制造图案化介质的图案清理。电子束光刻最初用于写入具有尺寸和定位误差的初始图案化的位介质结构。然后将纳米级蛋白质分子强制装配在顶部的位上。蛋白质分子具有非常均匀的尺寸分布并且组装成电子束图案区域上方的晶格结构。蛋白质分子减小电子束图案结构中的尺寸和位置误差。该过程清除电子束光刻中的信号，并降低磁读取和写入中的噪声。该过程可用于直接在硬盘上制造图案化的位介质，或者用于创建用于批量生产图案化位媒体盘的纳米压印母版。

8. 发明申请

US20090305081A1 METHOD FOR PLANARIZING A MAGNETIC RECORDING DISK HAVING PRE-PATTERNED SURFACE FEATURES AND DISK WITH PLANARIZED SURFACE 有权
标题翻译：用于平面化具有平面化表面的预先绘制的表面特征和磁盘的磁记录盘的方法
公开(公告)号：US20090305081A1
公开(公告)日：2009-12-10
申请号：US12136640
申请日：2008-06-10
申请人： Qing Dai , Xing-Cai Guo , Dan Saylor Kercher , Mike Suk
发明人： Qing Dai , Xing-Cai Guo , Dan Saylor Kercher , Mike Suk
IPC分类号： G11B5/66 , G11B5/84
CPC分类号： G11B5/855 , B82Y10/00 , G11B5/743 , G11B5/8408
摘要： A method for planarizing a magnetic recording disk that has surface features of elevated lands and recessed grooves includes forming two coatings of cured perfluorinated polyether (PFPE) polymers over the surface features. The disk may have a protective carbon overcoat with a surface that replicates the topography of lands and grooves. A liquid functionalized-PFPE is applied over the disk surface and then cured to form a first coating with the functionalized end groups bonding to the carbon overcoat. A liquid non-functionalized-PFPE polymer is then applied over the functionalized-PFPE coating and cured to form a second coating. The combined coatings substantially planarize the disk surface so that there is minimal recession between the top of the coating over the lands and the top of the coating over the grooves.
摘要翻译：用于平面化磁记录盘的方法，其具有升高的平台和凹槽的表面特征，包括在表面特征上形成固化的全氟化聚醚（PFPE）聚合物的两个涂层。盘可以具有保护性碳覆盖层，其具有复制土地和沟槽的形貌的表面。将液体官能化的PFPE施加在盘表面上，然后固化以形成具有与碳外涂层结合的官能化端基的第一涂层。然后将液体非官能化-PFPE聚合物施加到官能化-PFPE涂层上并固化以形成第二涂层。组合的涂层基本上使盘表面平坦化，使得在涂层的顶部与焊盘顶部之间存在最小的凹陷。

9. 发明授权

US08338006B2 Magnetic recording disk having pre-patterned surface features and planarized surface 有权
标题翻译：具有预图案化表面特征和平坦化表面的磁记录盘
公开(公告)号：US08338006B2
公开(公告)日：2012-12-25
申请号：US12136640
申请日：2008-06-10
申请人： Qing Dai , Xing-Cai Guo , Dan Saylor Kercher , Mike Suk
发明人： Qing Dai , Xing-Cai Guo , Dan Saylor Kercher , Mike Suk
IPC分类号： G11B5/65
CPC分类号： G11B5/855 , B82Y10/00 , G11B5/743 , G11B5/8408
摘要： A method for planarizing a magnetic recording disk that has surface features of elevated lands and recessed grooves includes forming two coatings of cured perfluorinated polyether (PFPE) polymers over the surface features. The disk may have a protective carbon overcoat with a surface that replicates the topography of lands and grooves. A liquid functionalized-PFPE is applied over the disk surface and then cured to form a first coating with the functionalized end groups bonding to the carbon overcoat. A liquid non-functionalized-PFPE polymer is then applied over the functionalized-PFPE coating and cured to form a second coating. The combined coatings substantially planarize the disk surface so that there is minimal recession between the top of the coating over the lands and the top of the coating over the grooves.
摘要翻译：用于平面化磁记录盘的方法，其具有升高的平台和凹槽的表面特征，包括在表面特征上形成固化的全氟化聚醚（PFPE）聚合物的两个涂层。盘可以具有保护性碳覆盖层，其具有复制土地和沟槽的形貌的表面。将液体官能化的PFPE施加在盘表面上，然后固化以形成具有与碳外涂层结合的官能化端基的第一涂层。然后将液体非官能化-PFPE聚合物施加到官能化-PFPE涂层上并固化以形成第二涂层。组合的涂层基本上使盘表面平坦化，使得在涂层的顶部与焊盘顶部之间存在最小的凹陷。

10. 发明授权

US08105753B2 System, method and apparatus for pattern clean-up during fabrication of patterned media using forced assembly of molecules 有权
标题翻译：使用强制组装分子的图案化介质制造期间图案清理的系统，方法和装置
公开(公告)号：US08105753B2
公开(公告)日：2012-01-31
申请号：US11946423
申请日：2007-11-28
申请人： Qing Dai , Dan Saylor Kercher , Huey-Ming Tzeng
发明人： Qing Dai , Dan Saylor Kercher , Huey-Ming Tzeng
IPC分类号： G03F7/20
CPC分类号： G03F7/40 , B82Y10/00 , G11B5/743 , G11B5/82 , G11B5/855
摘要： A pattern clean-up for fabrication of patterned media using a forced assembly of molecules is disclosed. E-beam lithography is initially used to write the initial patterned bit media structures, which have size and positioning errors. Nano-sized protein molecules are then forced to assemble of on top of the bits. The protein molecules have a very uniform size distribution and assemble into a lattice structure above the e-beam patterned areas. The protein molecules reduce the size and position errors in e-beam patterned structures. This process cleans the signal from the e-beam lithography and lowers the noise in the magnetic reading and writing. This process may be used to fabricate patterned bit media directly on hard disk, or to create a nano-imprint master for mass production of patterned bit media disks.
摘要翻译：公开了使用分子的强制组装制造图案化介质的图案清理。电子束光刻最初用于写入具有尺寸和定位误差的初始图案化的位介质结构。然后将纳米级蛋白质分子强制装配在顶部的位上。蛋白质分子具有非常均匀的尺寸分布并且组装成电子束图案区域上方的晶格结构。蛋白质分子减小电子束图案结构中的尺寸和位置误差。该过程清除电子束光刻中的信号，并降低磁读取和写入中的噪声。该过程可用于直接在硬盘上制造图案化的位介质，或者用于创建用于批量生产图案化位媒体盘的纳米压印母版。

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