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1. 发明申请

US20140105367A1 X-RAY GENERATING APPARATUS 有权
标题翻译： X射线发生装置
公开(公告)号：US20140105367A1
公开(公告)日：2014-04-17
申请号：US14055453
申请日：2013-10-16
申请人： RIGAKU CORPORATION
发明人： Martin HORVARTH , Jiri MARSIK , Ladislav PINA , Vaclav JELINEK , Naohisa OSAKA , Kazuhiko OMOTE , Makoto KAMBE , Licai JIANG , Bonglea KIM
IPC分类号： H01J35/14
CPC分类号： H01J35/14 , H01J2235/081 , H01J2235/083
摘要： The X-ray generating apparatus 100 applies an electron beam e1 onto a target 150 to generate X-rays x1, and includes a permanent magnet lens 120 configured to focus the electron beam e1, a correction coil 130 provided on a side of the electron beam e1 with respect to the permanent magnet lens 120 and configured to correct a focus position formed by the permanent magnet lens 120 in a traveling direction of the electron beam e1, and a target 150 onto which the focused electron beam is applied. Accordingly, the apparatus configuration can be extremely compact and lightweight in comparison with general apparatuses. Furthermore, by the correction coil 130, the intensity of the magnetic field can be finely adjusted and the focus position in the traveling direction of the electron beam e1 can be finely adjusted.
摘要翻译： X射线产生装置100将电子束e1施加到靶150上以产生X射线x1，并且包括被配置为聚焦电子束e1的永磁体透镜120，设置在电子束侧的校正线圈130 e1相对于永磁体透镜120，并且被配置为在电子束e1的行进方向上校正由永久磁铁透镜120形成的聚焦位置，以及被施加聚焦电子束的目标150。因此，与一般装置相比，装置结构可以非常紧凑和重量轻。此外，通过校正线圈130，可以精细地调节磁场的强度，并且可以精细地调整电子束e1的行进方向上的聚焦位置。

2. 发明申请

US20130259200A1 X-RAY TOPOGRAPHY APPARATUS 有权
标题翻译： X-RAY地形设备
公开(公告)号：US20130259200A1
公开(公告)日：2013-10-03
申请号：US13845744
申请日：2013-03-18
申请人： RIGAKU CORPORATION
发明人： Kazuhiko OMOTE , Yoshinori UEJI , Ryuji MATSUO , Tetsuo KIKUCHI
IPC分类号： G01N23/207
CPC分类号： G01N23/207 , B82Y10/00 , G21K1/062
摘要： Provided is an X-ray topography apparatus capable of separating a desired characteristic X-ray which enters a sample from an X-ray which is radiated from an X-ray source, and increasing an irradiation region of the desired characteristic X-ray. The X-ray topography apparatus includes: the X-ray source for radiating the X-ray from a fine focal point, the X-ray containing a predetermined characteristic X-ray; an optical system including a multilayer mirror with a graded multilayer spacing which corresponds to the predetermined characteristic X-ray, the optical system being configured to cause the X-ray reflected on the multilayer mirror to enter the sample; and an X-ray detector for detecting a diffracted X-ray. The multilayer mirror includes a curved reflective surface having a parabolic cross section, and the fine focal point of the X-ray source is provided onto a focal point of the curved reflective surface.
摘要翻译：本发明提供一种能够从X射线源照射的X射线分离进入样品的期望特征X射线并增加所需特征X射线的照射区域的X射线形貌设备。 X射线形状摄影装置包括：X射线源，用于从微细焦点照射X射线，X射线含有预定的特征X射线; 光学系统，其包括对应于预定特征X射线的具有渐变多层间隔的多层反射镜，所述光学系统被配置为使得所述多层反射镜上反射的X射线进入所述样品; 以及用于检测衍射X射线的X射线检测器。多层反射镜包括具有抛物面截面的弯曲反射表面，并且将X射线源的细焦点设置在弯曲反射表面的焦点上。

3. 发明公开

US20230400423A1 TOTAL REFLECTION X-RAY FLUORESCENCE SPECTROMETER 审中-公开
公开(公告)号：US20230400423A1
公开(公告)日：2023-12-14
申请号：US18034886
申请日：2021-11-01
申请人： Rigaku Corporation
发明人： Makoto KAMBE , Kazuhiko OMOTE , Toshifumi HIGUCHI , Tsutomu TADA , Hajime FUJIMURA , Masahiro NONOGUCHI , Licai JIANG , Boris VERMAN , Yuriy PLATONOV
IPC分类号： G01N23/223
CPC分类号： G01N23/223
摘要： Provided is a total reflection X-ray fluorescence spectrometer which has high analysis sensitivity and analysis speed. The total reflection X-ray fluorescence spectrometer includes: an X-ray source that has an electron beam focal point having an effective width in a direction parallel to a surface of a sample, and orthogonal to an X-ray irradiation direction, that is larger than a dimension in the irradiation direction; a reflective optic that has an effective width in the orthogonal direction that is larger than that of the electron beam focal point, and has a curved surface in the irradiation direction; and a plurality of detectors that are arranged in a row in the orthogonal direction, and are configured to measure intensities of fluorescent X-rays emitted from the sample irradiated with primary X-rays focused by the reflective optic.

4. 发明申请

US20130259207A1 TARGET FOR X-RAY GENERATOR, METHOD OF MANUFACTURING THE SAME AND X-RAY GENERATOR 有权
标题翻译： X射线发生器的目标，其制造方法和X射线发生器
公开(公告)号：US20130259207A1
公开(公告)日：2013-10-03
申请号：US13759686
申请日：2013-02-05
申请人： RIGAKU CORPORATION
发明人： Kazuhiko OMOTE , Kazuaki SHIMIZU , Naohisa OSAKA
IPC分类号： H01J35/12
CPC分类号： H01J35/12 , A61B6/4488 , H01J35/105 , H01J35/108 , H01J35/32 , H01J2235/081 , H01J2235/083 , H05G1/02 , H05G1/025
摘要： There is provided a target for an X-ray generator, including: a holder part made of an electrically conductive material and having an opening part; a diamond plate air-tightly joined to the holder part so as to close the opening part; a thin film target provided on a surface of the diamond plate, with its outer peripheral part extending to the holder part to be electrically connected to the holder part, wherein the holder part is configured to be electrically connected to a power supply of the X-ray generator, and the diamond plate is incorporated into the X-ray generator with one side disposed in a vacuum atmosphere where the thin film target is formed, and an opposite side thereto disposed at a side where the diamond plate is brought into thermal contact with a refrigerant and cooled.
摘要翻译：提供了一种用于X射线发生器的目标，包括：由导电材料制成并具有开口部分的保持器部分; 气密地接合到保持器部分以闭合开口部分的金刚石板; 设置在金刚石板的表面上的薄膜靶，其外周部分延伸到保持器部分以电连接到保持器部分，其中保持器部分被构造成电连接到X射线管的电源，并且将金刚石板结合到X射线发生器中，其一侧设置在形成有薄膜靶的真空气氛中，并且相对侧设置在金刚石板与该金刚石板的热接触的一侧制冷剂冷却。

5. 发明公开

US20230304948A1 DAMAGE MEASUREMENT METHOD, APPARATUS AND PROGRAM, AND X-RAY DIFFRACTION APPARATUS 审中-公开
公开(公告)号：US20230304948A1
公开(公告)日：2023-09-28
申请号：US18124585
申请日：2023-03-22
申请人： Rigaku Corporation , Chubu Electric Power Company, Incorporated
发明人： Ryouichi YOKOYAMA , Kazuhiko OMOTE , Daisuke KOBAYASHI
IPC分类号： G01N23/2055
CPC分类号： G01N23/2055
摘要： A damage measurement technique capable of measuring damage of a sample in a single crystal state, regardless of the surrounding condition, includes irradiating microbeam white X-rays to a sample in a single crystal state, diffraction of a spot generated by the irradiation is detected, a coefficient on variance of an intensity distribution in a specific direction in the detected diffraction spot is calculated, and a damaged state of the sample is specified based on the calculated coefficient.

6. 发明申请

US20210200922A1 Scattering Measurement Analysis Method, Scattering Measurement Analysis Device, And Non-Transitory Computer-Readable Storage Medium Storing Scattering Measurement Analysis Program 有权
公开(公告)号：US20210200922A1
公开(公告)日：2021-07-01
申请号：US17132095
申请日：2020-12-23
申请人： Rigaku Corporation
发明人： Tomoyuki IWATA , Kazuhiko OMOTE , Kazuki ITO , Tetsuya OZAWA
IPC分类号： G06F30/25 , G01N23/201
摘要： Provided is a scattering measurement analysis method including obtaining a theoretical scattering intensity from a structural model that contains a lot of scatterers, wherein the obtaining of a theoretical scattering intensity includes obtaining a contribution to the theoretical scattering intensity of a pair of a scatterer “m” and a scatterer “n” existing at a distance “r” from the scatterer “m” among a plurality of scatterers by at least one of calculations in accordance with the distance “r”, the calculations including a first calculation of calculating contributions of the scatterer “m” and the scatterer “n” from respective scattering factors fm(q) and fn*(q) and a center-to-center distance rmn between the scatterer “m” and the scatterer “n”, and a second calculation of substituting the scattering factor fn*(q) of the scatterer “n” by a first representative value and substituting a probability density function of the number of scatterers existing at the distance “r” by a constant value.

7. 发明申请

US20200333268A1 ANALYSIS METHOD FOR FINE STRUCTURE, APPARATUS, AND PROGRAM 审中-公开
公开(公告)号：US20200333268A1
公开(公告)日：2020-10-22
申请号：US16854428
申请日：2020-04-21
申请人： Rigaku Corporation
发明人： Yoshiyasu ITO , Kazuhiko OMOTE
IPC分类号： G01N23/201 , G01B15/04 , G01N23/20008
摘要： Provided is an analysis method for a fine structure, that is capable of determining shapes of scattering bodies that are long in a thickness direction of a plate-shaped sample; and provided are an apparatus and a program thereof. There is provided an analysis method for a fine structure of a plate-shaped sample formed to have scattering bodies that are long in a thickness direction and periodically arranged, comprising the steps of preparing data of a scattering intensity from the plate-shaped sample measured via transmission of X-rays at a plurality of co rotation angles; calculating a scattering intensity of the X-rays scattered by the plate-shaped sample under a specific condition; fitting the calculated scattering intensity to the prepared scattering intensity; and determining shapes of the scattering bodies for the plate-shaped sample, based on a result of the fitting.

8. 发明申请

US20220128487A1 IMAGING TYPE X-RAY MICROSCOPE 有权
公开(公告)号：US20220128487A1
公开(公告)日：2022-04-28
申请号：US17501378
申请日：2021-10-14
申请人： Rigaku Corporation
发明人： Kazuhiko OMOTE , Raita HIROSE , Shuichi KATO , Yuriy PLATONOV
IPC分类号： G01N23/04
摘要： An imaging type X-ray microscope capable of enlarging a numerical aperture even with high energy X-rays and acquiring a magnified image with sufficient intensity even in a laboratory. The imaging type X-ray microscope comprises an X-ray irradiation unit having a microfocal and high-power X-ray source and a condenser mirror for focusing and irradiating the emitted X-rays toward a sample, a sample holding unit for holding the sample, a reflecting mirror type X-ray lens unit for imaging X-rays transmitted through the sample, and an imaging unit for acquiring the imaged X-ray image, wherein each mirror constituting the condenser mirror and the reflecting mirror type X-ray lens unit has a reflecting surface formed with a multilayer film having a high reflectivity in X-rays of a specific wavelength.

9. 发明申请

US20170074809A1 X-RAY SMALL ANGLE OPTICAL SYSTEM 审中-公开
标题翻译： X射线小角度光学系统
公开(公告)号：US20170074809A1
公开(公告)日：2017-03-16
申请号：US15259581
申请日：2016-09-08
申请人： Rigaku Corporation
发明人： Kazuki ITO , Kazuhiko OMOTE , Licai Jiang
IPC分类号： G01N23/201
摘要： Provided is an X-ray small angle optical system, which easily achieves a desired angular resolution, including: an X-ray source having a microfocus; a multilayer mirror having an elliptical reflection surface, and being configured to collect X-rays emitted from the X-ray source and to irradiate a sample; and an X-ray detector configured to detect scattered X-rays generated from the sample, in which the elliptical reflection surface of the multilayer mirror has a focal point A and a focal point B, in which the X-ray source is arranged such that the microfocus includes the focal point A, and in which the X-ray detector is arranged on the multilayer mirror side of the focal point B.
摘要翻译：本发明提供一种X射线小角度光学系统，其容易实现期望的角度分辨率，包括：具有微焦点的X射线源; 多层反射镜，具有椭圆反射面，并且被配置为收集从X射线源发射的X射线并照射样品; 以及X射线检测器，被配置为检测从样品产生的散射的X射线，其中多层反射镜的椭圆反射表面具有焦点A和焦点B，其中X射线源被布置成使得微焦点包括焦点A，其中X射线检测器布置在焦点B的多层反射镜侧。

10. 发明公开

US20240120036A1 PROCESSING APPARATUS, SYSTEM, METHOD, AND PROGRAM FOR CALCULATING A STRUCTURAL FACTOR 审中-公开
公开(公告)号：US20240120036A1
公开(公告)日：2024-04-11
申请号：US18373967
申请日：2023-09-28
申请人： Rigaku Corporation
发明人： Masatsugu YOSHIMOTO , Kazuhiko OMOTE , Kazuki ITO
IPC分类号： G16C60/00 , G01N23/20016
CPC分类号： G16C60/00 , G01N23/20016
摘要： A processing apparatus for processing a structure factor including total scattering data and data of a structural model are provided comprises a structure factor acquiring section for acquiring a first structure factor based on measured total scattering data; a data converting section for separating the first structure factor into a short-range correlation and a long-range correlation; and a scattering intensity calculating section for acquiring a structural model indicating an atomic arrangement in a finite region, calculating a short-range scattering intensity of the structural model and calculating a second structure factor from the short-range scattering intensity and the long-range correlation.

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