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    • 4. 发明授权
    • Display device and method of manufacturing the same
    • 显示装置及其制造方法
    • US09151976B2
    • 2015-10-06
    • US13940486
    • 2013-07-12
    • Samsung Display Co., Ltd.
    • Ji Seong YangWon Tae KimKyung Tae ChaeSeok-Joon Hong
    • G02F1/1333G02F1/1337G02F1/1341
    • G02F1/133377G02F1/133707G02F1/1341
    • A display device includes a substrate, a thin film transistor disposed on the substrate, a pixel electrode connected to the thin film transistor, a common electrode disposed opposite to the pixel electrode and spaced apart from the pixel electrode, where a microcavity is defined between the common electrode and the pixel electrode, and a cutout is defined in the common electrode, an insulating layer disposed on the common electrode, a roof layer disposed on the insulating layer, where a liquid crystal injection hole is defined through the common electrode and the roof layer such that the common electrode and the roof layer expose a portion of the microcavity, a liquid crystal layer disposed in the microcavity, and an encapsulation layer disposed on the roof layer, where the encapsulation layer covers the liquid crystal injection hole, and seals the microcavity.
    • 显示装置包括基板,设置在基板上的薄膜晶体管,连接到薄膜晶体管的像素电极,与像素电极相对设置并与像素电极间隔开的公共电极,其中微腔定义在 公共电极和像素电极,并且在公共电极中限定切口,设置在公共电极上的绝缘层,设置在绝缘层上的屋顶层,其中通过公共电极和屋顶限定液晶注入孔 使得公共电极和屋顶层露出微腔的一部分,设置在微腔中的液晶层和设置在屋顶层上的封装层,其中封装层覆盖液晶注入孔,并且密封 微腔
    • 9. 发明授权
    • Liquid crystal display and manufacturing method thereof
    • 液晶显示及其制造方法
    • US09268164B2
    • 2016-02-23
    • US14209263
    • 2014-03-13
    • Samsung Display Co., Ltd.
    • Tae Woo LimKyung Tae ChaeSung Hwan WonSeon Uk LeeJun Heui Lee
    • G02F1/1333
    • G02F1/133377G02F1/133345G02F1/1341G02F1/134309G02F2001/134318
    • A manufacturing method of a liquid crystal display includes: providing a pixel electrode on an insulation substrate; providing a sacrificial layer on the pixel electrode; providing a common electrode on the sacrificial layer; providing a photoresist layer on the common electrode; exposing a portion of the photoresist layer, common electrode and the sacrificial layer with light; developing the portion of the photoresist layer exposed with the light; etching a layer between the photoresist layer and the sacrificial layer using the developed photoresist layer as a mask to expose the portion of the sacrificial layer exposed with the light; removing the portion of the sacrificial layer exposed with the light; providing a roof layer on the insulation substrate and etching the roof layer to form a liquid crystal injection hole therein; and removing the sacrificial layer exposed through the liquid crystal injection hole to form a microcavity.
    • 液晶显示器的制造方法包括:在绝缘基板上设置像素电极; 在像素电极上提供牺牲层; 在牺牲层上提供公共电极; 在公共电极上提供光致抗蚀剂层; 用光使一部分光致抗蚀剂层,公共电极和牺牲层曝光; 显影用光曝光的光致抗蚀剂层的部分; 使用显影的光致抗蚀剂层作为掩模蚀刻光致抗蚀剂层和牺牲层之间的层,以暴露由光暴露的牺牲层的部分; 去除用光暴露的牺牲层的部分; 在所述绝缘基板上设置屋顶层,并蚀刻所述屋顶层以在其中形成液晶注入孔; 以及去除通过液晶注入孔暴露的牺牲层以形成微腔。