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1. 发明授权

US11410863B2 Substrate processing device including heater between substrate and spin base 有权
公开(公告)号：US11410863B2
公开(公告)日：2022-08-09
申请号：US16328771
申请日：2017-05-25
申请人： SCREEN Holdings Co., Ltd.
发明人： Motoyuki Shimai , Toyohide Hayashi , Akito Hatano
IPC分类号： H01L21/67 , H01L21/677 , H01L21/687 , H05B6/10
摘要： A substrate processing device is provided with: a spin base disposed below a substrate grasped by a plurality of chuck members, the spin base transmitting the drive force of a spin motor to the chuck members; and a nozzle for supplying a processing fluid for processing the substrate to the top surface and/or bottom surface of the substrate. An IH heating mechanism of the substrate processing device has: a heat-generating member disposed between the substrate and the spin base; a heating coil disposed below the spin base; and an IH circuit for supplying electric power to the heating coil, whereby an alternating magnetic field applied to the heat-generating member is generated, and the heat-generating member is caused to generate heat.

2. 发明授权

US10115588B2 Substrate treating apparatus and substrate treating method 有权
公开(公告)号：US10115588B2
公开(公告)日：2018-10-30
申请号：US15515768
申请日：2015-07-06
申请人： SCREEN Holdings Co., Ltd.
发明人： Koji Hashimoto , Akito Hatano
IPC分类号： H01L21/677 , H01L21/02 , C03C15/00 , C23C16/458 , H01L21/67 , H01L27/12 , H01L29/66 , B65G49/06
摘要： A substrate treating apparatus including an unloading order changing unit. The unloading order changing unit reverses an order, in regard to unloading of substrates in a carrier from the top, between a poor inclined substrate and a substrate at least immediately above the poor inclined substrate when the poor inclined substrate is present whose inclination is determined larger than a pre-set threshold by a poor inclination determining unit. That is, the order is reversed such that the poor inclined substrate whose surface may be possibly be scratched with a hand is unloaded prior to the substrate immediately above the poor inclined substrate. Accordingly, this inhibits damages on the substrate caused by scratching a substrate surface with the hand of a substrate transport mechanism.

3. 发明授权

US10381249B2 Substrate container, load port apparatus, and substrate treating apparatus 有权
公开(公告)号：US10381249B2
公开(公告)日：2019-08-13
申请号：US15512317
申请日：2015-07-28
申请人： SCREEN Holdings Co., Ltd.
发明人： Kazuhiro Honsho , Mitsukazu Takahashi , Akito Hatano , Koji Hashimoto
IPC分类号： H01L21/673 , H01L21/677 , B65D85/00
摘要： A substrate container includes a casing, a rack, a lid, a lid holder, and a substrate separating mechanism. The casing has on its front face an opening. The substrate separating mechanism has a contact part that directly contacts substrates. The contact part is movable relative to the lid holder. The lid moves forward to the opening, and the contact part moves backward relative to the lid holder, whereby the lid holder holds ends of the substrates. The lid moves backward from the opening, and the contact part moves forward to the lid holder, whereby the substrate separating mechanism separates the substrates from the lid holder.

4. 发明授权

US10748795B2 Substrate processing method and substrate processing apparatus 有权
公开(公告)号：US10748795B2
公开(公告)日：2020-08-18
申请号：US15699196
申请日：2017-09-08
申请人： SCREEN Holdings Co., Ltd.
发明人： Kota Sotoku , Toyohide Hayashi , Akito Hatano , Takayuki Gohara , Hiroaki Takahashi
IPC分类号： H01L21/67 , H01L21/677 , H01L21/687
摘要： A substrate processing apparatus including a plurality of baking chambers stacked in a prescribed direction, each baking chamber carrying out heat treatment of a substrate in its interior, a processing unit having a liquid processing chamber separate from the baking chambers and carrying out liquid processing of the substrate using the processing liquid, and an enclosing isolating space that encloses the sides of the plurality of baking chambers and isolates the baking chambers from the surrounding area.

5. 发明授权

US10297476B2 Substrate processing apparatus 有权
公开(公告)号：US10297476B2
公开(公告)日：2019-05-21
申请号：US15051034
申请日：2016-02-23
申请人： SCREEN Holdings Co., Ltd.
发明人： Jun Sawashima , Akito Hatano , Kenji Kobayashi , Yuta Nishimura , Motoyuki Shimai , Toyohide Hayashi
IPC分类号： H01L21/67
摘要： A supply flow passage branches into a plurality of upstream flow passages. A plurality of discharge ports are respectively disposed at a plurality of positions differing in distance from a rotational axis of a substrate. A return flow passage is connected to the upstream flow passage. A downstream heater heats liquid flowing through the upstream flow passage. A downstream switching unit supplies the liquid, supplied to the plurality of upstream flow passages from the supply flow passage, to one of the plurality of discharge ports and the return flow passage, selectively.

6. 发明授权

US09449861B2 Substrate processing apparatus 有权
标题翻译：基板加工装置
公开(公告)号：US09449861B2
公开(公告)日：2016-09-20
申请号：US14426783
申请日：2013-06-18
申请人： SCREEN Holdings Co., Ltd.
发明人： Akito Hatano , Toyohide Hayashi , Koji Hashimoto
IPC分类号： H01L21/677 , H01L21/67
CPC分类号： H01L21/67742 , H01L21/67178 , H01L21/67196 , H01L21/67706 , H01L21/67745 , H01L21/67748 , H01L21/6776
摘要： An object of the present invention is to provide a technique capable of reducing a volume occupied exclusively by a substrate processing apparatus. In order to achieve this object, a substrate processing apparatus includes: multiple processing parts that process a substrate W; a transport robot that makes rectilinear motion along one rectilinear axis or each of more rectilinear axes and rotative motion about a vertical axis to transport a substrate to each of the processing parts; a transport chamber defined as operating space for the transport robot; and a transport controller that controls operation of the transport robot. A first partial area defined in the transport chamber has a width (specifically, a width extending along a horizontal axis perpendicular to the one rectilinear axis or the more rectilinear axes) is smaller than a rotative diameter of the transport robot. The transport controller prohibits the rotative motion of the transport robot in the first partial area.
摘要翻译：本发明的目的是提供一种能够减少仅由基板处理装置占据的体积的技术。为了实现该目的，基板处理装置包括：处理基板W的多个处理部; 运送机器人，沿着一个直线轴线或每个更直线的轴线进行直线运动，并围绕垂直轴线进行旋转运动，以将衬底运送到每个处理部件; 运输室被定义为运输机器人的操作空间; 以及控制运输机器人的运转的运输控制器。在传送室中限定的第一部分区域具有宽度（具体地，沿垂直于一个直线轴线的水平轴线或更多直线轴线延伸的宽度）小于传送机器人的旋转直径。运输控制器禁止运输机器人在第一部分区域中的旋转运动。

7. 发明授权

US11610790B2 Substrate processing apparatus 有权
公开(公告)号：US11610790B2
公开(公告)日：2023-03-21
申请号：US17245079
申请日：2021-04-30
申请人： SCREEN Holdings Co., Ltd.
发明人： Kenji Kobayashi , Jun Sawashima , Yuta Nishimura , Akito Hatano , Motoyuki Shimai , Toyohide Hayashi
IPC分类号： H01L21/67
摘要： A supply flow passage branches into a plurality of upstream flow passages. The plurality of upstream flow passages include a branching upstream flow passage that branches into a plurality of downstream flow passages. A plurality of discharge ports are respectively disposed at a plurality of positions differing in distance from a rotational axis and discharge processing liquids, supplied via the plurality of upstream flow passages, toward an upper surface of a substrate held by a substrate holding unit.

8. 发明授权

US10910247B2 Substrate container, load port apparatus, and substrate treating apparatus 有权
公开(公告)号：US10910247B2
公开(公告)日：2021-02-02
申请号：US15508688
申请日：2015-07-28
申请人： SCREEN Holdings Co., Ltd.
发明人： Kazuhiro Honsho , Mitsukazu Takahashi , Akito Hatano , Koji Hashimoto
IPC分类号： H01L21/673 , H01L21/677 , B65D43/02 , B65D85/30
摘要： A substrate container including a casing, a rack, a casing holder, a casing lifting mechanism, a lid, and a lid holder. When holding of substrates with the rack shifts to holding of the substrates with the casing holder and the lid holder, the casing lifting mechanism moves the casing holder upward, whereby the casing holder moves the substrates upward. When the holding of the substrates with the casing holder and the lid holder shifts to the holding of the substrates with the rack, the casing lifting mechanism moves the casing holder downward, whereby the casing holder moves the substrates downward.

9. 发明授权

US10332761B2 Substrate processing apparatus 有权
公开(公告)号：US10332761B2
公开(公告)日：2019-06-25
申请号：US15019246
申请日：2016-02-09
申请人： SCREEN Holdings Co., Ltd.
发明人： Kenji Kobayashi , Jun Sawashima , Yuta Nishimura , Akito Hatano , Motoyuki Shimai , Toyohide Hayashi
IPC分类号： H01L21/67
摘要： A supply flow passage branches into a plurality of upstream flow passages. The plurality of upstream flow passages include a branching upstream flow passage that branches into a plurality of downstream flow passages. A plurality of discharge ports are respectively disposed at a plurality of positions differing in distance from a rotational axis and discharge processing liquids, supplied via the plurality of upstream flow passages, toward an upper surface of a substrate held by a substrate holding unit.

10. 发明授权

US11075095B2 Substrate processing apparatus 有权
公开(公告)号：US11075095B2
公开(公告)日：2021-07-27
申请号：US16406419
申请日：2019-05-08
申请人： SCREEN Holdings Co., Ltd.
发明人： Kenji Kobayashi , Jun Sawashima , Yuta Nishimura , Akito Hatano , Motoyuki Shimai , Toyohide Hayashi
IPC分类号： H01L21/67
摘要： A supply flow passage branches into a plurality of upstream flow passages. The plurality of upstream flow passages include a branching upstream flow passage that branches into a plurality of downstream flow passages. A plurality of discharge ports are respectively disposed at a plurality of positions differing in distance from a rotational axis and discharge processing liquids, supplied via the plurality of upstream flow passages, toward an upper surface of a substrate held by a substrate holding unit.

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