专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

US20180301356A1 SUBSTRATE PROCESSING APPARATUS 审中-公开
公开(公告)号：US20180301356A1
公开(公告)日：2018-10-18
申请号：US16012073
申请日：2018-06-19
申请人： SCREEN Holdings Co., Ltd.
发明人： Hitoshi Nakai , Yasuhiko Ohashi
IPC分类号： H01L21/67 , H01L21/687 , H01L21/02 , B05C11/10 , B08B3/04 , H01L21/306 , B08B11/00 , B05C9/04 , H01L21/00 , B05C5/02
摘要： A substrate processing apparatus includes a chamber, a substrate holding part, a substrate rotating mechanism, and a processing liquid supply part. The chamber includes a chamber body and a chamber cover, and the chamber cover is moved up and down by a chamber opening and closing mechanism. A top plate is attached to the chamber cover. While the chamber cover is in contact with the chamber body, a sealed space is formed and processing is performed. When the chamber cover is moved up, an annular opening is formed between the chamber cover and the chamber body. A cup part is positioned outside the annular opening. A processing liquid spattering from a substrate is received by the cup part.

2. 发明授权

US10707096B2 Substrate processing apparatus 有权
公开(公告)号：US10707096B2
公开(公告)日：2020-07-07
申请号：US16012073
申请日：2018-06-19
申请人： SCREEN Holdings Co., Ltd.
发明人： Hitoshi Nakai , Yasuhiko Ohashi
IPC分类号： H01L21/67 , B05C11/10 , H01L21/687 , B08B3/04 , B08B11/00 , H01L21/02 , H01L21/306 , B05C5/02 , B05C9/04 , H01L21/00
摘要： A substrate processing apparatus includes a chamber, a substrate holding part, a substrate rotating mechanism, and a processing liquid supply part. The chamber includes a chamber body and a chamber cover, and the chamber cover is moved up and down by a chamber opening and closing mechanism. A top plate is attached to the chamber cover. While the chamber cover is in contact with the chamber body, a sealed space is formed and processing is performed. When the chamber cover is moved up, an annular opening is formed between the chamber cover and the chamber body. A cup part is positioned outside the annular opening. A processing liquid spattering from a substrate is received by the cup part.

3. 发明授权

US11621176B2 Substrate processing apparatus 有权
公开(公告)号：US11621176B2
公开(公告)日：2023-04-04
申请号：US17095954
申请日：2020-11-12
申请人： SCREEN Holdings Co., Ltd.
发明人： Yasuhiko Ohashi
IPC分类号： H01L21/67 , H01L21/687
摘要： In a substrate processing apparatus (1), an enlarged sealed space (100) is formed by bringing a cup part (161) that forms a lateral space (160) around the outer periphery of a chamber (12) into contact with a chamber lid part (122) separated from a chamber body (121). A scan nozzle (188) is attached to the cup part (161) in the lateral space (160) and supplies a chemical solution onto a substrate after moving to above the substrate through an annular opening (81). During processing for cleaning the substrate and processing for drying the substrate, the scan nozzle (188) is housed in the lateral space (160) and an upper opening of the chamber body (121) is closed by the chamber lid part (122) to isolate the chamber space (120) from the lateral space (160) and seal the chamber space (120). Thus, the chamber space (120) can be isolated from the scan nozzle (188). This consequently prevents a mist or the like of the chemical solution supplied from the scan nozzle (188) from adhering to the substrate.

4. 发明授权

US10734252B2 Substrate processing apparatus 有权
公开(公告)号：US10734252B2
公开(公告)日：2020-08-04
申请号：US16012337
申请日：2018-06-19
申请人： SCREEN Holdings Co., Ltd.
发明人： Hitoshi Nakai , Yasuhiko Ohashi
IPC分类号： H01L21/67 , B05C11/10 , H01L21/687 , B08B3/04 , B08B11/00 , H01L21/02 , H01L21/306 , B05C5/02 , B05C9/04 , H01L21/00
摘要： A substrate processing apparatus includes a chamber, a substrate holding part, a substrate rotating mechanism, and a processing liquid supply part. The chamber includes a chamber body and a chamber cover, and the chamber cover is moved up and down by a chamber opening and closing mechanism. A top plate is attached to the chamber cover. While the chamber cover is in contact with the chamber body, a sealed space is formed and processing is performed. When the chamber cover is moved up, an annular opening is formed between the chamber cover and the chamber body. A cup part is positioned outside the annular opening. A processing liquid spattering from a substrate is received by the cup part.

5. 发明授权

US10707097B2 Substrate processing apparatus 有权
公开(公告)号：US10707097B2
公开(公告)日：2020-07-07
申请号：US16012170
申请日：2018-06-19
申请人： SCREEN Holdings Co., Ltd.
发明人： Hitoshi Nakai , Yasuhiko Ohashi
IPC分类号： H01L21/67 , B05C11/10 , H01L21/687 , B08B3/04 , B08B11/00 , H01L21/02 , H01L21/306 , B05C5/02 , B05C9/04 , H01L21/00
摘要： A substrate processing apparatus includes a chamber, a substrate holding part, a substrate rotating mechanism, and a processing liquid supply part. The chamber includes a chamber body and a chamber cover, and the chamber cover is moved up and down by a chamber opening and closing mechanism. A top plate is attached to the chamber cover. While the chamber cover is in contact with the chamber body, a sealed space is formed and processing is performed. When the chamber cover is moved up, an annular opening is formed between the chamber cover and the chamber body. A cup part is positioned outside the annular opening. A processing liquid spattering from a substrate is received by the cup part.

6. 发明授权

US10026627B2 Substrate processing apparatus 有权
公开(公告)号：US10026627B2
公开(公告)日：2018-07-17
申请号：US15383718
申请日：2016-12-19
申请人： SCREEN Holdings Co., Ltd.
发明人： Hitoshi Nakai , Yasuhiko Ohashi
IPC分类号： H01L21/67 , B05C11/10 , H01L21/687 , B08B3/04 , B08B11/00 , H01L21/02 , H01L21/306 , B05C5/02 , B05C9/04 , H01L21/00
摘要： A substrate processing apparatus includes a chamber, a substrate holding part, a substrate rotating mechanism, and a processing liquid supply part. The chamber includes a chamber body and a chamber cover, and the chamber cover is moved up and down by a chamber opening and closing mechanism. A top plate is attached to the chamber cover. While the chamber cover is in contact with the chamber body, a sealed space is formed and processing is performed. When the chamber cover is moved up, an annular opening is formed between the chamber cover and the chamber body. A cup part is positioned outside the annular opening. A processing liquid spattering from a substrate is received by the cup part.

你已经成功收藏专利！

检索式保存成功!

IPRDB