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    • 1. 发明申请
    • MASK PLATE, EXPOSURE METHOD THEREOF AND LIQUID CRYSTAL DISPLAY PANEL INCLUDING THE SAME
    • 掩模板,其接触方法和液晶显示面板包括它们
    • US20150177610A1
    • 2015-06-25
    • US14241820
    • 2014-01-21
    • SHENZHEN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.
    • Meng LiJinjie Wang
    • G03F1/38G02F1/1335G02F1/1368
    • G03F1/38G02F1/133514G02F1/133516G02F1/13439G02F1/1368G03F1/00G03F7/0007
    • The present disclosure relates to a mask plate, an exposure method thereof, and a liquid crystal display panel including the mask plate. On the mask plate, a plurality of pattern regions is arranged in a gradient variation from the center of the mask plate to the edges thereof according to the deformation degree of the exposure mask. The method for exposing the mask plate comprises the following steps of, (a) providing an exposure mask in a horizontal state, and measuring the deformation degree of the exposure mask; (b) arranging, on the mask plate, a plurality of pattern regions, the dimensions of which change in a gradient manner from the center of the mask plate to the edges thereof according to the deformation degree of the exposure mask; and (c) completing the exposure of the mask plate. The mask plate according to the present disclosure can compensate the effect of deformation of the exposure mask on the exposure area of the mask plate.
    • 本发明涉及一种掩模板及其曝光方法以及包括掩模板的液晶显示面板。 在掩模板上,根据曝光掩模的变形程度,从掩模板的中心到其边缘的梯度变化中布置多个图案区域。 曝光掩模板的方法包括以下步骤:(a)以水平状态提供曝光掩模,并测量曝光掩模的变形程度; (b)根据曝光掩模的变形程度,在掩模板上布置多个图案区域,其尺寸从掩模板的中心到其边缘以梯度方式变化; 和(c)完成掩模板的曝光。 根据本公开的掩模板可以补偿曝光掩模的变形对掩模板的曝光区域的影响。
    • 4. 发明授权
    • Mask plate, exposure method thereof and liquid crystal display panel including the same
    • 掩模板,曝光方法和包括其的液晶显示面板
    • US09298082B2
    • 2016-03-29
    • US14241820
    • 2014-01-21
    • SHENZHEN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.
    • Meng LiJinjie Wang
    • G03F1/38G02F1/1335G02F1/1368G03F7/00G02F1/1343
    • G03F1/38G02F1/133514G02F1/133516G02F1/13439G02F1/1368G03F1/00G03F7/0007
    • The present disclosure relates to a mask plate, an exposure method thereof, and a liquid crystal display panel including the mask plate. On the mask plate, a plurality of pattern regions is arranged in a gradient variation from the center of the mask plate to the edges thereof according to the deformation degree of the exposure mask. The method for exposing the mask plate comprises the following steps of, (a) providing an exposure mask in a horizontal state, and measuring the deformation degree of the exposure mask; (b) arranging, on the mask plate, a plurality of pattern regions, the dimensions of which change in a gradient manner from the center of the mask plate to the edges thereof according to the deformation degree of the exposure mask; and (c) completing the exposure of the mask plate. The mask plate according to the present disclosure can compensate the effect of deformation of the exposure mask on the exposure area of the mask plate.
    • 本发明涉及一种掩模板及其曝光方法以及包括掩模板的液晶显示面板。 在掩模板上,根据曝光掩模的变形程度,从掩模板的中心到其边缘的梯度变化中布置多个图案区域。 曝光掩模板的方法包括以下步骤:(a)以水平状态提供曝光掩模,并测量曝光掩模的变形程度; (b)根据曝光掩模的变形程度,在掩模板上布置多个图案区域,其尺寸从掩模板的中心到其边缘以梯度方式变化; 和(c)完成掩模板的曝光。 根据本公开的掩模板可以补偿曝光掩模的变形对掩模板的曝光区域的影响。