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1. 发明申请

US20220252866A1 MEMs Based Spatial Light Modulators With Improved Thermal Control 有权
公开(公告)号：US20220252866A1
公开(公告)日：2022-08-11
申请号：US17591834
申请日：2022-02-03
申请人： SILICON LIGHT MACHINES CORPORATION
发明人： Alexander Payne , Gregory Jacob
IPC分类号： G02B26/08 , G02B26/02
摘要： Microelectromechanical systems (MEMS) based spatial light modulators (SLMs) enclosed in a package filled with a gas to enhance the reliability and lifetime of the SLM, and methods for operating the same in various applications are described. Generally, the SLM includes a number of MEMS modulators, each including a number of light reflective surfaces, at least one light reflective surface coupled to an electrostatically deflectable element suspended above a substrate, and each adapted to reflect and modulate a light beam incident thereon. The package enclosing the SLM includes an optically transparent cover through which the reflective surfaces are exposed to the light beam, and a cavity is filled a low molar mass fill gas having an atomic number of two or less and a thermal conductivity of greater than 100 mW/(m·K). The SLM can include electrostatically deflectable ribbons suspended over a substrate, or a linear array of two-dimensional MEMS modulators.

2. 发明申请

US20220250188A1 Laser Marking System and Method 有权
公开(公告)号：US20220250188A1
公开(公告)日：2022-08-11
申请号：US17591884
申请日：2022-02-03
申请人： SILICON LIGHT MACHINES CORPORATION
发明人： Gregory Jacob , Stephen Hamann , Alexander Payne , Lars Eng , James Hunter
IPC分类号： B23K26/064 , B81B3/00
摘要： A laser marking system including a spatial light modulator (SLM) with a multi-pixel, linear array of is microelectromechanical systems (MEMS) based diffractors, and methods of operating the same are disclosed. Generally, the system includes, in addition to the SLM, a laser operable to illuminate the SLM; imaging optics operable to focus a substantially linear swath of modulated light onto a surface of a workpiece, the linear swath including light from multiple pixels of the SLM, and a controller operable to control the SLM, laser and imaging optics to mark the surface of the workpiece to record a two-dimensional image thereon. In one embodiment, the diffractors include a number of electrostatically deflectable ribbons suspended over a substrate. In another, each diffractor is two-dimensional including an electrostatically deflectable first reflective operable to brought into optical interference with light reflected from a second reflective surface on a faceplate, or an adjacent diffractor.

3. 发明申请

US20210072531A1 MEMs Phased-Array for LiDAR Applications 有权
公开(公告)号：US20210072531A1
公开(公告)日：2021-03-11
申请号：US17001477
申请日：2020-08-24
申请人： SILICON LIGHT MACHINES CORPORATION
发明人： Yuki Ashida , Stephen Hamann , Olav Solgaard , Alexander Payne , Lars Eng , James Hunter
IPC分类号： G02B26/08 , G02B5/18 , B81B7/02 , B81B7/00 , B81B3/00 , G01S7/481
摘要： An optical scanner including micro-electromechanical system phased-arrays suitable for use in a LiDAR system, and methods of operating the same are described. Generally, the scanner includes an optical transmitter having first phased-arrays to receive light from a light source, form a swath of illumination in a far field scene and to modulate phases of the light to sweep or steer the swath over the scene in two-dimensions (2D). An optical receiver in the scanner includes second phased-arrays to receive light from the far field scene and direct at least some of the light onto a detector. The second phased-arrays are configured to de-scan the received light by directing light reflected from the far field scene onto the detector while rejecting background light. In one embodiment the second phased-arrays direct light from a slice of the far field scene onto a 1D detector array.

4. 发明授权

US10746983B2 Spatial light modulators for phased-array applications 有权
公开(公告)号：US10746983B2
公开(公告)日：2020-08-18
申请号：US16008772
申请日：2018-06-14
申请人： SILICON LIGHT MACHINES CORPORATION
发明人： Alexander Payne , James Hunter , Lars Eng
IPC分类号： G02B26/08 , G01S7/481 , G02B27/00
摘要： A capacitive micro-electromechanical system (MEMS) structure or device and methods of making and operating the same are described. Generally, the MEMS device provides a large stroke while maintaining good damping, enabling fast beam steering and large scan angles. In one embodiment, the capacitive MEMS device includes a bottom electrode formed over a substrate; an electrically permeable damping structure formed over the bottom electrode, the electrically permeable damping structure including a first air-gap and a dielectric layer suspended above and separated from the bottom electrode by the first air-gap; and a plurality of movable members suspended above the damping structure and separated therefrom by a second air-gap, each of the plurality of movable members including a top electrode and being configured to deflect towards the bottom electrode by electrostatic force. Other embodiments are also described.

5. 发明申请

US20170269350A1 CIRCUIT AND METHOD FOR DRIVING ELECTROSTATIC MEMS 审中-公开
公开(公告)号：US20170269350A1
公开(公告)日：2017-09-21
申请号：US15071096
申请日：2016-03-15
申请人： SILICON LIGHT MACHINES CORPORATION
发明人： Hyung KYU Lee , Alexander Payne , Michael Yeung
IPC分类号： G02B26/00 , H02N1/00
CPC分类号： G02B26/001 , G02B26/0841 , G09G3/346 , G09G2310/0275
摘要： A circuit and method for driving electrostatic microelectomechanical systems (MEMS) are provided. In one embodiment, the circuit includes a first electrode in a movable element of the MEMS and a second electrode on a surface of a substrate of the MEMS over which the movable element is suspended, and a driver electrically coupled to the first and the second electrodes. The driver supplies a voltage differential between the first and second electrodes to vary an electrostatic force between the electrodes thereby moving the movable element. The driver is configured to supply a voltage pulse having a leading edge in which a first voltage intermediate between an initial, minimum voltage and a maximum voltage is maintained for a first time before rising to the maximum voltage timed to dampen oscillations of the movable element. Other embodiments are also described.

6. 发明申请

US20230068044A1 System and Method for Wavelength-Selective Attenuation and Modulation 有权
公开(公告)号：US20230068044A1
公开(公告)日：2023-03-02
申请号：US17893057
申请日：2022-08-22
申请人： SILICON LIGHT MACHINES CORPORATION
发明人： Alexander Payne
IPC分类号： G02F1/19 , G02B27/10
摘要： A system and method are provided for spectral shaping of light from a broadband source including multiple wavelengths. The system includes a beam splitter (BS) to receive and transmit an input beam, a dispersive element to disperse the input beam into dispersed beams separated by wavelength, and optic-elements to direct the dispersed beams onto a spatial light modulator (SLM). The SLM selectively modulates the dispersed beams reflected from the SLM, and the optic elements transmit a 0th-order of the reflected light through the dispersive element, which recombines the beams to form a reflected beam directed toward the BS. The BS separates the reflected beam from the input beam and directs it to an optical output of the system. The SLM includes multiple electrostatically deflectable reflective ribbons suspended over a reflective surface of a substrate, wherein the ribbons are separated by a distance equal to a width of the ribbons.

7. 发明授权

US11579439B2 MEMS based spectral shaper using a broadband source 有权
公开(公告)号：US11579439B2
公开(公告)日：2023-02-14
申请号：US16878540
申请日：2020-05-19
申请人： SILICON LIGHT MACHINES CORPORATION
发明人： Lars Eng , Alexander Payne , Daniel Eng , Satoshi Yamashita
IPC分类号： G02B26/08 , G02B5/18 , G02B27/30 , G01J3/02 , G02B27/16
摘要： A system and method are provided for spectral shaping of light from a broadband source using a linear spatial light modulator (SLM). The system includes an illumination source generating light including a plurality of wavelengths, a lens to collimate the light and an aperture to define its angular spread, a diffraction grating to disperse the beam by wavelength, and a focusing element to focus the dispersed beams from the diffraction grating onto a plurality of pixels of the SLM. The SLM is configured to individually modulate the dispersed beams by diffracting light output therefrom into higher orders, where a diffraction angle of output light is greater than an input cone angle of incoming light from the illumination source.

8. 发明申请

US20160085067A1 HIGH POWER HANDLING OPTICAL SPATIAL LIGHT MODULATOR 审中-公开
标题翻译：高功率处理光学空间光调制器
公开(公告)号：US20160085067A1
公开(公告)日：2016-03-24
申请号：US14673276
申请日：2015-03-30
申请人： SILICON LIGHT MACHINES CORPORATION
发明人： Alexander Payne , James Hunter , Lars Eng
IPC分类号： G02B26/08 , B23K26/06
CPC分类号： G02B26/0841 , B23K26/0643 , G02B5/0825
摘要： Laser-based material processing systems including a Micro-Electromechanical System devices (MEMs) based reflective, optical modulator with dielectric mirrors for high power handling and methods of manufacturing and using the same are described. Generally, the system includes a workpiece support, a laser, a workpiece support, a laser, a MEMs based reflective, optical modulator to modulate a beam generated by the laser; and imaging optics to direct modulated light from the optical modulator onto a workpiece on the workpiece support. The optical modulator includes a number of surfaces with dielectric mirrors formed thereon to modulate the beam generated by the laser. Other embodiments are also described.
摘要翻译：描述了基于激光的材料处理系统，其包括基于微机电系统装置（MEM）的反射式，具有用于高功率处理的电介质反射镜的光学调制器以及制造和使用它们的方法。通常，该系统包括工件支撑件，激光器，工件支撑件，激光器，基于MEM的反射型光学调制器以调制由激光器产生的光束; 以及成像光学器件，用于将来自光学调制器的调制光引导到工件支撑件上的工件上。光调制器包括多个表面，其上形成有电介质镜，以调制由激光产生的光束。还描述了其它实施例。

9. 发明申请

US20220252862A1 MEMS Based Spatial Light Modulators and Applications 有权
公开(公告)号：US20220252862A1
公开(公告)日：2022-08-11
申请号：US17591898
申请日：2022-02-03
申请人： SILICON LIGHT MACHINES CORPORATION
发明人： Stephen Hamann , Alexander Payne , Lars Eng , James Hunter , Tianbo Liu , Gregory Jacob
IPC分类号： G02B26/02 , G03F7/20
摘要： Spatial light modulators (SLMs) and systems using same are described. Generally, the system includes a laser, a fixture holding a workpiece to be processed using the laser, illumination optics to illuminate the SLM with laser light, imaging optics to focus modulated light from the SLM onto the workpiece, and a controller to control the laser, the SLM, imaging optics and the fixture to scan the modulated light across a workpiece surface. The SLM includes an array of microelectromechanical system based diffractors, each including an electrostatically deflectable member coupled to a first light reflective surface and to bring light reflected from the first light reflective surface into interference with light reflected from a second light reflective surface in the SLM. The controller is operable to provide analog gray-scale control of an intensity of modulated light reflected from each diffractor by controlling an electrostatic force generated by a driver coupled thereto.

10. 发明授权

US11016287B2 High étendue spatial light modulator 有权
公开(公告)号：US11016287B2
公开(公告)日：2021-05-25
申请号：US16184303
申请日：2018-11-08
申请人： SILICON LIGHT MACHINES CORPORATION
发明人： Alexander Payne
IPC分类号： G02B26/08 , B33Y30/00 , B29C64/135 , B29C64/268 , B22F10/20
摘要： A spatial light modulator (SLM) having improved étendue, and methods of fabricating and operating the same are described. Generally, the SLM includes pixels each including a tensile membrane suspended over a surface of a substrate by posts at corners thereof. The tensile membrane includes an electrostatically deflectable piston and flexures through which the piston is coupled to the posts. A platform having first light reflective surfaces is supported above and separated from the piston by one or more central posts extending from the piston to the platform, and a face-plate including a second light reflective surface is suspended over the platform. The face-plate includes plurality of apertures through which the first light reflective surfaces are exposed. Electrostatic deflection of the piston brings light reflected from the first light reflective surfaces into constructive or destructive interference with light reflected from the second light reflective surface. Other embodiments are also described.

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