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1. 发明申请

US20050256275A1 Polymer alloy, thermoplastic resin composition, and molded article 有权
标题翻译：聚合物合金，热塑性树脂组合物和模制品
公开(公告)号：US20050256275A1
公开(公告)日：2005-11-17
申请号：US11020564
申请日：2004-12-27
申请人： Sadayuki Kobayashi , Shinichiro Ochiai , Akiko Tanaka
发明人： Sadayuki Kobayashi , Shinichiro Ochiai , Akiko Tanaka
IPC分类号： C08J5/00 , C08L67/02 , C08L69/00 , D01F6/92 , C08F8/34
CPC分类号： C08L69/00 , C08L67/02 , Y10T428/1352 , C08L2666/18
摘要： The present invention is a polycarbonate resin composition containing a polycarbonate resin and comprising at least two resins contained as components, wherein the intensity ratio of the absorption peak appearing in a range of 2933±5 cm−1 to the absorption peak appearing in a range of 2965±5 cm−1 is 0.43 or more. The polymer alloy of this invention can be used to obtain a material with excellent impact resistance.
摘要翻译：本发明是含有聚碳酸酯树脂的聚碳酸酯树脂组合物，其含有作为成分的至少两种树脂，其中出现在2933±5cm -1范围内的吸收峰的强度比与出现在2965±5cm -1范围内的吸收峰为0.43以上。本发明的聚合物合金可用于获得具有优异抗冲击性的材料。

2. 发明授权

US07960464B2 Thermoplastic resin composition and molded article 有权
标题翻译：热塑性树脂组合物和模制品
公开(公告)号：US07960464B2
公开(公告)日：2011-06-14
申请号：US12153525
申请日：2008-05-20
申请人： Sadayuki Kobayashi , Shinichiro Ochiai , Akiko Tanaka
发明人： Sadayuki Kobayashi , Shinichiro Ochiai , Akiko Tanaka
IPC分类号： C08L69/00 , C08L67/02
CPC分类号： C08L69/00 , C08L67/02 , Y10T428/1352 , C08L2666/18
摘要： The present invention is a polycarbonate resin composition containing a polycarbonate resin and comprising at least two resins contained as components, wherein the intensity ratio of the absorption peak appearing in a range of 2933±5 cm−1 to the absorption peak appearing in a range of 2965±5 cm−1 is 0.43 or more. The polymer alloy of this invention can be used to obtain a material with excellent impact resistance.
摘要翻译：本发明是一种聚碳酸酯树脂组合物，其含有聚碳酸酯树脂，含有作为成分的至少两种树脂，其中出现在2933±5cm -1范围内的吸收峰与吸收峰的强度比出现在 2965±5cm-1为0.43以上。本发明的聚合物合金可用于获得具有优异抗冲击性的材料。

3. 发明申请

US20080226857A1 Thermoplastic resin composition and molded article 有权
标题翻译：热塑性树脂组合物和模制品
公开(公告)号：US20080226857A1
公开(公告)日：2008-09-18
申请号：US12153525
申请日：2008-05-20
申请人： Sadayuki Kobayashi , Shinichiro Ochiai , Akiko Tanaka
发明人： Sadayuki Kobayashi , Shinichiro Ochiai , Akiko Tanaka
IPC分类号： B32B1/00 , C08K3/34 , C08K3/36 , C08K3/26
CPC分类号： C08L69/00 , C08L67/02 , Y10T428/1352 , C08L2666/18
摘要： The present invention is a polycarbonate resin composition containing a polycarbonate resin and comprising at least two resins contained as components, wherein the intensity ratio of the absorption peak appearing in a range of 2933±5 cm−1 to the absorption peak appearing in a range of 2965±5 cm−1 is 0.43 or more. The polymer alloy of this invention can be used to obtain a material with excellent impact resistance.
摘要翻译：本发明是含有聚碳酸酯树脂的聚碳酸酯树脂组合物，其含有作为成分的至少两种树脂，其中出现在2933±5cm -1范围内的吸收峰的强度比与出现在2965±5cm -1范围内的吸收峰为0.43以上。本发明的聚合物合金可用于获得具有优异抗冲击性的材料。

4. 发明授权

US07385013B2 Polymer alloy, thermoplastic resin composition, and molded article 有权
标题翻译：聚合物合金，热塑性树脂组合物和模制品
公开(公告)号：US07385013B2
公开(公告)日：2008-06-10
申请号：US11020564
申请日：2004-12-27
申请人： Sadayuki Kobayashi , Shinichiro Ochiai , Akiko Tanaka
发明人： Sadayuki Kobayashi , Shinichiro Ochiai , Akiko Tanaka
IPC分类号： C08L69/00 , C08L67/02 , C08J3/00
CPC分类号： C08L69/00 , C08L67/02 , Y10T428/1352 , C08L2666/18
摘要： The present invention is a polycarbonate resin composition containing a polycarbonate resin and comprising at least two resins contained as components, wherein the intensity ratio of the absorption peak appearing in a range of 2933±5 cm−1 to the absorption peak appearing in a range of 2965±5 cm−1 is 0.43 or more. The polymer alloy of this invention can be used to obtain a material with excellent impact resistance.
摘要翻译：本发明是含有聚碳酸酯树脂的聚碳酸酯树脂组合物，其含有作为成分的至少两种树脂，其中出现在2933±5cm -1范围内的吸收峰的强度比与出现在2965±5cm -1范围内的吸收峰为0.43以上。本发明的聚合物合金可用于获得具有优异抗冲击性的材料。

5. 发明申请

US20140065417A1 PRESSURE-SENSITIVE ADHESIVE, PRESSURE-SENSITIVE ADHESIVE LAYER, AND PRESSURE-SENSITIVE ADHESIVE SHEET 审中-公开
标题翻译：压敏粘合剂，压敏胶粘剂和压力敏感胶粘剂
公开(公告)号：US20140065417A1
公开(公告)日：2014-03-06
申请号：US14115228
申请日：2012-04-23
申请人： Masatsugu Higashi , Akiko Tanaka , Aimi Matsuura , Kiyoe Shigetomi , Tetsuo Inoue
发明人： Masatsugu Higashi , Akiko Tanaka , Aimi Matsuura , Kiyoe Shigetomi , Tetsuo Inoue
IPC分类号： C09J135/02 , C09J7/02
CPC分类号： C09J135/02 , C09J4/06 , C09J7/385 , C09J133/066 , C09J2203/318 , G02B5/30 , Y10T428/2891 , C08F2220/1875 , C08F220/20
摘要： A pressure-sensitive adhesive of the invention include a (meth)acryl-based polymer obtained by polymerization of a monomer component including 19 to 99.5% by weight of an alkyl (meth)acrylate having a branched alkyl group of 10 to 24 carbon atoms at an ester end. The pressure-sensitive adhesive has a satisfactory level of adhesive performance and can form a pressure-sensitive adhesive layer with a lower dielectric constant.
摘要翻译：本发明的压敏粘合剂包括通过聚合含有19〜99.5重量％的碳原子数为10〜24的具有支链烷基的（甲基）丙烯酸烷基酯的单体成分得到的（甲基）丙烯酸系聚合物，酯末端。该粘合剂具有令人满意的粘合性能，可形成介电常数较低的压敏粘合剂层。

6. 发明申请

US20130143999A1 ADHESIVE COMPOSITION, ADHESIVE LAYER AND ADHESIVE SHEET 有权
标题翻译：胶粘组合物，粘合层和粘合片
公开(公告)号：US20130143999A1
公开(公告)日：2013-06-06
申请号：US13814696
申请日：2011-08-09
申请人： Akiko Tanaka , Yutaka Moroishi , Fumiko Nakano
发明人： Akiko Tanaka , Yutaka Moroishi , Fumiko Nakano
IPC分类号： C09J133/10
CPC分类号： C09J133/10 , C08F220/18 , C08F2220/1825 , C08K7/00 , C08K9/06 , C08K2003/2237 , C08K2201/011 , C08L33/14 , C09J7/381 , C09J125/06 , C09J133/066 , C09J151/003 , C09J2203/318 , C09J2205/102 , C09J2425/00 , C09J2433/00 , C09J2451/00 , Y10T428/14 , Y10T428/28 , C08F220/20
摘要： Provided are: an adhesive composition that is capable of providing an adhesive layer in which titanium-based nanoparticles are stably dispersed, said adhesive layer having more enhanced mechanical characteristics, excellent refractive index and excellent adhesive force; and an adhesive sheet or the like which uses the adhesive composition. An adhesive composition is prepared so as to contain: a (meth)acryl-based polymer that contains, as a monomer component, 50% by weight or more of a (meth)acrylate represented by the formula CH2═C(R1)COOR2 (wherein R1 represents hydrogen or a methyl group, and R2 represents a substituted or unsubstituted alkyl group of 1 to 20 carbon atoms), has a weight average molecular weight of from 500,000 to 3,000,000 as determined by gel permeation chromatography, and does not substantially contain an acid component; an aromatic polymer that has a weight average molecular weight of from 200 to 900 as determined by gel permeation chromatography in an amount of 120-400 parts by weight per 100 parts by weight of the (meth)acrylic polymer; and titanium-based nanoparticles that has an average particle size of 5 to 100 nm in an amount of 150 to 600 parts by weight per 100 parts by weight of the (meth)acrylic polymer.
摘要翻译：提供：能够提供其中钛基纳米粒子稳定分散的粘合剂层的粘合剂组合物，所述粘合剂层具有更强的机械特性，优异的折射率和优异的粘合力; 以及使用该粘合剂组合物的粘合片等。制备粘合剂组合物以包含：（甲基）丙烯酸基聚合物，其包含作为单体成分的50重量％以上由式CH 2 = C（R 1）COOR 2表示的（甲基）丙烯酸酯其中R1表示氢或甲基，R2表示取代或未取代的碳原子数为1〜20的烷基），通过凝胶渗透色谱法测定的重均分子量为500,000〜3,000,000，基本上不含有酸组分; 通过凝胶渗透色谱测定的重均分子量为200-900的芳族聚合物，每100重量份的（甲基）丙烯酸聚合物的量为120-400重量份; 和相对于（甲基）丙烯酸系聚合物100重量份，平均粒径为5〜100nm的钛系纳米粒子为150〜600重量份。

7. 发明授权

US08377625B2 Method for producing a copolymer solution with a uniform concentration for semiconductor lithography 有权
标题翻译：用于半导体光刻的具有均匀浓度的共聚物溶液的制备方法
公开(公告)号：US08377625B2
公开(公告)日：2013-02-19
申请号：US12607324
申请日：2009-10-28
申请人： Takanori Yamagishi , Ichiro Kato , Akiko Tanaka , Miyako Asano
发明人： Takanori Yamagishi , Ichiro Kato , Akiko Tanaka , Miyako Asano
IPC分类号： G03F7/00
CPC分类号： G03F7/0392 , C08F220/10 , C08J3/09 , C08J2333/06 , G03F7/0382 , G03F7/091
摘要： A method of producing a copolymer solution for semiconductor lithography having a copolymer and a solvent for coating film formation, which copolymer contains at least one repeating unit selected from the group consisting of: a repeating unit (A) having a hydroxyl group; a repeating unit (B) having a structure in which a hydroxyl group is protected by a group which suppresses dissolution into an alkaline developer and which dissociates in the action of an acid; a repeating unit (C) having a lactone structure; and a repeating unit (D) having a cyclic ether structure, the difference in the copolymer concentration among a plurality of containers which were filled with copolymer solution from the same manufacturing lot is not more than a certain range, or the method includes a certain production step.
摘要翻译：一种制备用于半导体光刻的共聚物溶液的方法，其具有共聚物和用于涂膜形成的溶剂，该共聚物含有至少一种选自由以下组成的组的重复单元：具有羟基的重复单元（A）重复单元（B），其具有羟基被抑制溶解于碱性显影剂中并在酸作用中解离的基团保护的结构; 具有内酯结构的重复单元（C）; 和具有环醚结构的重复单元（D），填充有来自同一制造批次的共聚物溶液的多个容器中的共聚物浓度的差异不大于一定范围，或者该方法包括一定的生产步。

8. 发明申请

US20120064336A1 ULTRAVIOLET-CURABLE ADHESIVE AGENT COMPOSITE, ADHESIVE AGENT LAYER, ADHESIVE SHEET, AND MANUFACTURING METHOD THEREFOR 审中-公开
标题翻译：超耐热粘合剂复合材料，粘合剂层，粘合片及其制造方法
公开(公告)号：US20120064336A1
公开(公告)日：2012-03-15
申请号：US13321364
申请日：2010-05-18
申请人： Akiko Tanaka , Yutaka Moroishi , Fumiko Nakano
发明人： Akiko Tanaka , Yutaka Moroishi , Fumiko Nakano
IPC分类号： C09J7/02 , B05D3/06 , B05D3/02 , C09J133/08 , B05D5/10 , B82Y99/00
CPC分类号： C09J4/06 , C08K3/08 , C08K5/0025 , C08K7/18 , C09J7/385 , C09J135/06 , C09J2205/102 , C09J2205/31 , Y10T428/2809
摘要： An ultraviolet-curable pressure-sensitive adhesive composition, comprising one or more monomer components comprising an acrylic monomer; an aromatic low-molecular-weight polymer having a weight-average molecular weight of 500 to 4000 inclusive, the molecular weight being according to gel permeation chromatography; and a photopolymerization initiator; wherein when the composition is turned into a pressure-sensitive adhesive layer, the haze value of the composition is 10% or less.
摘要翻译：一种紫外线固化型压敏粘合剂组合物，其包含一种或多种包含丙烯酸类单体的单体组分; 重均分子量为500〜4000的芳族低分子量聚合物，分子量为凝胶渗透色谱法; 和光聚合引发剂; 其中当组合物变成压敏粘合剂层时，组合物的雾度值为10％以下。

9. 发明申请

US20100304134A1 METHOD FOR PEELING PRESSURE-SENSITIVE ADHESIVE OPTICAL FILM, AND PRESSURE-SENSITIVE ADHESIVE OPTICAL FILM 有权
标题翻译：压敏粘合光学膜的方法和压敏粘合光学膜
公开(公告)号：US20100304134A1
公开(公告)日：2010-12-02
申请号：US12864047
申请日：2009-01-20
申请人： Fumiko Nakano , Yutaka Moroishi , Aimi Matsuura , Toshitsugu Hosokawa , Akiko Tanaka
发明人： Fumiko Nakano , Yutaka Moroishi , Aimi Matsuura , Toshitsugu Hosokawa , Akiko Tanaka
IPC分类号： B32B17/04 , B32B38/10
CPC分类号： C09J5/06 , C08F2220/1825 , C08K5/14 , C08L33/08 , C09J7/385 , C09J133/08 , C09J2201/606 , C09J2205/302 , G02F1/1335 , G02F2202/28 , Y10T156/1126 , Y10T156/1153 , Y10T156/1911 , Y10T428/28 , C08F220/06 , C08F2220/281
摘要： An object of the invention is to provide a pressure-sensitive adhesive optical film-peeling method capable of easily detaching the pressure-sensitive adhesive optical film from a glass substrate with no damage to the glass substrate or no adhesive deposit on the glass substrate, and to provide a pressure-sensitive adhesive optical film suitable for use in such a peeling method. The invention is directed to a method for peeling a pressure-sensitive adhesive optical film from an optical film-carrying glass substrate including a glass substrate and the pressure-sensitive adhesive optical film bonded thereto, which includes: exposing the optical film-carrying glass substrate to an environment at a temperature of 40 to 98° C. and a relative humidity of 60 to 99% for three minutes or more; and then peeling the pressure-sensitive adhesive optical film from the glass substrate under the environment.
摘要翻译：本发明的目的是提供一种能够容易地从玻璃基板上分离玻璃基板的粘合型光学膜剥离方法，而不会损伤玻璃基板，也可以不在玻璃基板上粘合，以提供适合用于这种剥离方法的压敏粘合剂光学膜。本发明涉及一种剥离由粘合有玻璃基板和粘合型光学膜的玻璃基板的带光学薄膜玻璃基板的粘合型光学薄膜的方法，该方法包括：将带光学薄膜的玻璃基板温度为40〜98℃，相对湿度为60〜99％的环境3分钟以上; 然后在环境下从玻璃基板剥离压敏粘合剂光学膜。

10. 发明申请

US20100143842A1 METHOD FOR PRODUCING A COPOLYMER SOLUTION WITH A UNIFORM CONCENTRATION FOR SEMICONDUCTOR LITHOGRAPHY 有权
标题翻译：用于半导体层析的均匀浓度的共聚物溶液的制备方法
公开(公告)号：US20100143842A1
公开(公告)日：2010-06-10
申请号：US12607324
申请日：2009-10-28
申请人： Takanori YAMAGISHI , Ichiro Kato , Akiko Tanaka , Miyako Asano
发明人： Takanori YAMAGISHI , Ichiro Kato , Akiko Tanaka , Miyako Asano
IPC分类号： G03F7/004
CPC分类号： G03F7/0392 , C08F220/10 , C08J3/09 , C08J2333/06 , G03F7/0382 , G03F7/091
摘要： A method of producing a copolymer solution for semiconductor lithography having a copolymer and a solvent for coating film formation, which copolymer contains at least one repeating unit selected from the group consisting of: a repeating unit (A) having a hydroxyl group; a repeating unit (B) having a structure in which a hydroxyl group is protected by a group which suppresses dissolution into an alkaline developer and which dissociates in the action of an acid; a repeating unit (C) having a lactone structure; and a repeating unit (D) having a cyclic ether structure, the difference in the copolymer concentration among a plurality of containers which were filled with copolymer solution from the same manufacturing lot is not more than a certain range, or the method includes a certain production step.
摘要翻译：一种制备用于半导体光刻的共聚物溶液的方法，其具有共聚物和用于涂膜形成的溶剂，该共聚物含有至少一种选自由以下组成的组的重复单元：具有羟基的重复单元（A）重复单元（B），其具有羟基被抑制溶解于碱性显影剂中并在酸作用中解离的基团保护的结构; 具有内酯结构的重复单元（C）; 和具有环醚结构的重复单元（D），填充有来自同一制造批次的共聚物溶液的多个容器中的共聚物浓度的差异不大于一定范围，或者该方法包括一定的生产步。

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