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    • 1. 发明申请
    • SEMICONDUCTOR DEVICE HAVING POWER METAL-OXIDE-SEMICONDUCTOR TRANSISTOR
    • 具有功率金属氧化物半导体晶体管的半导体器件
    • US20130341714A1
    • 2013-12-26
    • US13921412
    • 2013-06-19
    • SAMSUNG ELECTRONICS CO., LTD.
    • Jae-june JANGKyu-heon CHOMin-hwan KIMDong-eun JANGHoon CHANG
    • H01L29/78
    • H01L29/7816H01L29/0653H01L29/0878H01L29/402H01L29/4238H01L29/4983H01L29/66681
    • A semiconductor device includes a power metal-oxide-semiconductor (MOS) transistor including a semiconductor substrate, an impurity region on the semiconductor substrate, the impurity region having a first conductivity, a drift region in the impurity region, the drift region having the first conductivity, a body region in the impurity region adjacent to the drift region, the body region having a second conductivity different from the first conductivity, a drain extension insulating layer on the drift region, a gate insulating layer and a gate electrode sequentially stacked across a portion of the body region and a portion of the drift region, a drain extension electrode on the drain extension insulating layer, a drain region contacting a side of the drift region opposite to the body region, the drain region having the first conductivity, and a source region in the body region, the source region having the second conductivity.
    • 半导体器件包括:包含半导体衬底的功率金属氧化物半导体(MOS)晶体管,半导体衬底上的杂质区域,具有第一导电性的杂质区域,杂质区域中的漂移区域,具有第一 电导率,与漂移区相邻的杂质区域中的体区,具有不同于第一导电性的第二电导率的体区,漂移区上的漏极延伸绝缘层,顺序地层叠在栅极绝缘层上的栅电极 所述体区的一部分和所述漂移区的一部分,所述漏极延伸绝缘层上的漏极延伸电极,与所述体区的相反侧的所述漂移区的漏极区域,所述漏极区具有所述第一导电性,以及 源区域,源区域具有第二导电性。