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    • 6. 发明申请
    • SEMICONDUCTOR DEVICE
    • 半导体器件
    • US20150140734A1
    • 2015-05-21
    • US14585918
    • 2014-12-30
    • Semiconductor Energy Laboratory Co., Ltd.
    • Takayuki CHOShunsuke KOSHIOKAMasatoshi YOKOYAMAShunpei YAMAZAKI
    • H01L29/786H01L29/66
    • H01L29/78693H01L29/4908H01L29/513H01L29/517H01L29/66742H01L29/66969H01L29/7869
    • To provide a highly reliable semiconductor device which includes a transistor including an oxide semiconductor, in a semiconductor device including a staggered transistor having a bottom-gate structure provided over a glass substrate, a gate insulating film in which a first gate insulating film and a second gate insulating film, whose compositions are different from each other, are stacked in this order is provided over a gate electrode layer. Alternatively, in a staggered transistor having a bottom-gate structure, a protective insulating film is provided between a glass substrate and a gate electrode layer. A metal element contained in the glass substrate has a concentration lower than or equal to 5×1018 atoms/cm3 at the interface between the first gate insulating film and the second gate insulating film or the interface between the gate electrode layer and a gate insulating film.
    • 为了提供一种高可靠性的半导体器件,其包括具有氧化物半导体的晶体管,在包括设置在玻璃基板上的具有底栅结构的交错晶体管的半导体器件中,栅极绝缘膜,其中第一栅极绝缘膜和第二栅极绝缘膜 其栅极绝缘膜的组成彼此不同,按栅极电极层设置。 或者,在具有底栅结构的交错晶体管中,在玻璃基板和栅电极层之间设置保护绝缘膜。 包含在玻璃基板中的金属元素在第一栅极绝缘膜和第二栅极绝缘膜之间的界面处或者栅极电极层和栅极绝缘膜之间的界面处具有低于或等于5×1018原子/ cm3的浓度 。