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    • 10. 发明授权
    • Method to form a via
    • 形成通孔的方法
    • US07932175B2
    • 2011-04-26
    • US11807745
    • 2007-05-29
    • Ritwik ChatterjeeEddie AcostaSam S. GarciaVarughese Mathew
    • Ritwik ChatterjeeEddie AcostaSam S. GarciaVarughese Mathew
    • H01L21/4763
    • H01L21/76898
    • A method for forming a via, comprising (a) providing a structure comprising a mask (210) disposed on a semiconductor substrate (203), wherein the structure has an opening (215) defined therein which extends through the mask and into the substrate, and wherein the mask comprises a first electrically conductive layer; (b) depositing a second electrically conductive layer (219) such that the second conductive layer is in electrical contact with the first conductive layer, the second conductive layer having a first portion which extends over the surfaces of the opening and a second portion which extends over a portion of the mask adjacent to the opening; (c) removing the second portion of the second conductive layer; and (d) depositing a first metal (221) over the first portion of the second conductive layer.
    • 一种用于形成通孔的方法,包括(a)提供包括设置在半导体衬底(203)上的掩模(210)的结构,其中所述结构具有限定在其中的开口(215),所述开口延伸穿过所述掩模并进入所述衬底, 并且其中所述掩模包括第一导电层; (b)沉积第二导电层(219),使得所述第二导电层与所述第一导电层电接触,所述第二导电层具有在所述开口的表面上延伸的第一部分,所述第二部分延伸 在面罩的与开口相邻的一部分上方; (c)去除第二导电层的第二部分; 和(d)在第二导电层的第一部分上沉积第一金属(221)。