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1. 发明授权

US09399818B2 Method and device for continuously coating substrates 有权
标题翻译：连续涂布基材的方法和装置
公开(公告)号：US09399818B2
公开(公告)日：2016-07-26
申请号：US14131055
申请日：2012-07-09
申请人： Stefan Reber , Norbert Schillinger , David Pocza , Martin Arnold
发明人： Stefan Reber , Norbert Schillinger , David Pocza , Martin Arnold
IPC分类号： C23C16/54 , C23C16/458 , C23C16/44
CPC分类号： C23C16/458 , C23C16/4401 , C23C16/4587 , C23C16/54
摘要： The invention relates to a method for continuous coating of substrates, in which the substrates are transported continuously through a deposition chamber and, at the same time, measures are adopted for reducing parasitic deposits as well as possible. Likewise, the invention relates to a corresponding device for continuous coating of substrates.
摘要翻译：本发明涉及一种用于连续涂覆基板的方法，其中基板通过沉积室连续输送，同时采用措施来减少寄生沉积物。同样地，本发明涉及用于连续涂覆基材的相应装置。

2. 发明申请

US20120018368A1 Device and Process for Removing Floating Material from a Liquid 有权
标题翻译：从液体中清除浮动材料的装置和工艺
公开(公告)号：US20120018368A1
公开(公告)日：2012-01-26
申请号：US13190924
申请日：2011-07-26
申请人： Christian Frommann , Franz Spenger , Stefan Reber
发明人： Christian Frommann , Franz Spenger , Stefan Reber
IPC分类号： B01D33/00 , B01D35/26
CPC分类号： E03F5/14 , B01D29/70 , B01D29/88 , B01D29/925 , B01D33/0009 , B01D33/0064 , B01D33/0077 , B01D33/06 , B01D33/073 , B01D33/60 , B01D33/70 , B01D33/801
摘要： The invention refers to a device for removing floating material from a liquid, especially from sewage (2), with at least one sieve element shaped like a filter basket (4), for example, that in a front side has an inlet opening through which liquid can flow into the interior of the sieve element, and is equipped with a drive so the sieve element can rotate around a rotation axis. The invention suggests arranging a collection device (17) within the sieve element for collecting the liquid and/or floating material, in which case the collection device (17) is attached to a pumping-out device (20) for the liquid and/or the floating material. Another object of the invention is a process for removing floating material from a liquid, especially from sewage (2), in which case a sieve device is used that contains at least one sieve element that can be shaped like a filter basket (4), for example, and is equipped with a drive so it can rotate around a rotating axis. The process is characterized by the fact that liquid and/or floating material is collected with the help of a collection device (17) arranged within the sieve element for subsequent withdrawal from the collecting device (17) with a pumping-out device (20).
摘要翻译：本发明涉及一种用于从液体，特别是污水（2）中除去浮动材料的装置，其中至少一个筛子元件形状像过滤篮（4），例如在前侧具有入口，通过该入口开口液体可以流入筛元件的内部，并且配备有驱动器，使得筛子元件可以围绕旋转轴线旋转。本发明提出将收集装置（17）布置在筛子元件内用于收集液体和/或浮动材料，在这种情况下，收集装置（17）附接到用于液体和/或浮动材料的抽出装置（20）浮动材料。本发明的另一个目的是从液体，特别是污水（2）中去除浮动材料的方法，在这种情况下，使用含有至少一个能形成过滤篮（4）的筛子元件的筛装置，例如，并且配备有驱动器，使得其可绕旋转轴线旋转。该方法的特征在于，借助于布置在筛元件内的收集装置（17）收集液体和/或浮动材料，以便随后用抽出装置（20）从收集装置（17）中取出，。

3. 发明授权

US09506236B2 Device and process for removing floating material from a liquid 有权
标题翻译：用于从液体中去除浮动材料的装置和工艺
公开(公告)号：US09506236B2
公开(公告)日：2016-11-29
申请号：US13190924
申请日：2011-07-26
申请人： Christian Frommann , Franz Spenger , Stefan Reber
发明人： Christian Frommann , Franz Spenger , Stefan Reber
IPC分类号： B01D21/00 , B01D21/24 , B01D24/28 , E03F5/14 , B01D29/88 , B01D29/92 , B01D29/70 , B01D33/00 , B01D33/073
CPC分类号： E03F5/14 , B01D29/70 , B01D29/88 , B01D29/925 , B01D33/0009 , B01D33/0064 , B01D33/0077 , B01D33/06 , B01D33/073 , B01D33/60 , B01D33/70 , B01D33/801
摘要： A device for removing floating material from a liquid, especially from sewage, has at least one sieve element shaped like a filter basket, for example, that in a front side has an inlet opening through which liquid can flow into the interior of the sieve element. The device is equipped with a drive so the sieve element can rotate around a rotation axis. A collection device is arranged within the sieve element for collecting the liquid and/or floating material, in which case the collection device is attached to a pumping-out device for the liquid and/or the floating material. A process for removing floating material from a liquid, especially from sewage, uses a sieve device that contains at least one sieve element that may be shaped like a filter basket, for example, and is equipped with a drive so it can rotate around a rotating axis. Liquid and/or floating material is collected with the help of a collection device arranged within the sieve element for subsequent withdrawal from the collecting device with a pumping-out device.
摘要翻译：用于从液体，特别是污水中除去浮动材料的装置具有至少一个类似过滤篮的筛子元件，例如在前侧具有入口，液体可以通过该入口开口流入筛子内部。该装置配备有驱动装置，使得筛子元件能够绕旋转轴线旋转。集尘装置设置在筛子内用于收集液体和/或浮动材料，在这种情况下，收集装置连接到用于液体和/或浮动材料的抽出装置。用于从液体，特别是污水中除去浮动材料的方法使用筛装置，该筛装置包含至少一个可以形状像过滤篮的筛元件，并且配备有驱动器，使得其可绕旋转轴。借助于布置在筛元件内的收集装置来收集液体和/或浮动材料，以便随后用抽出装置从收集装置中取出。

4. 发明授权

US09347563B2 Gas lock, and coating apparatus comprising a gas lock 有权
标题翻译：气锁和包括气锁的涂覆装置
公开(公告)号：US09347563B2
公开(公告)日：2016-05-24
申请号：US13881068
申请日：2011-10-20
申请人： David Pocza , Stefan Reber , Martin Arnold , Norbert Schillinger
发明人： David Pocza , Stefan Reber , Martin Arnold , Norbert Schillinger
IPC分类号： F16K11/20 , F16J15/14 , C23C14/56 , C23C16/455 , C23C16/52 , C23C16/54
CPC分类号： F16J15/14 , C23C14/56 , C23C16/45506 , C23C16/45589 , C23C16/45591 , C23C16/52 , C23C16/54 , Y10T137/0318 , Y10T137/2224
摘要： The present invention relates to a gas lock for separating two gas chambers, which while taking up minimal space makes it possible to achieve the separation of gases without contact with the product/educt/transporting system. The gas lock according to the invention is distinguished in that at least one means for manipulation of the flow is present in a flow passage of the gas lock. Also, the present invention relates to a coating device which comprises a gas lock according to the invention. Also provided are possibilities for using the gas lock according to the invention.
摘要翻译：本发明涉及一种用于分离两个气室的气锁，其在占用最小空间的同时，可以实现气体的分离，而不与产品/喷射/输送系统接触。根据本发明的气锁的特征在于，在气锁的流动通道中存在至少一个用于操纵流动的装置。此外，本发明涉及一种包括根据本发明的气锁的涂覆装置。还提供了使用根据本发明的气锁的可能性。

5. 发明申请

US20080289690A1 Process For Producing a Silicon Film on a Substrate Surface By Vapor Deposition 审中-公开
标题翻译：通过气相沉积在衬底表面上生产硅膜的方法
公开(公告)号：US20080289690A1
公开(公告)日：2008-11-27
申请号：US12097645
申请日：2006-12-07
申请人： Raymund Sonnenschein , Hartwig Rauleder , Hans Juergen Hoene , Stefan Reber , Norbert Schillinger
发明人： Raymund Sonnenschein , Hartwig Rauleder , Hans Juergen Hoene , Stefan Reber , Norbert Schillinger
IPC分类号： H01L31/0264 , H01L31/18 , C23C16/42
CPC分类号： H01L31/03921 , C23C16/24 , H01L31/04 , H01L31/182 , Y02E10/546 , Y02P70/521
摘要： The present invention relates to a process for producing a silicon film on a substrate surface by vapor deposition, starting from a silicon-based precursor, characterized in that the precursor used is silicon tetrachloride. The present invention also relates to thin-film solar cells or crystalline silicon thin-film solar cells obtainable by the process according to the invention. The invention also relates to the use of silicon tetrachloride for producing a film deposited on a substrate from the vapor phase.
摘要翻译：本发明涉及从硅系前驱体开始，通过气相沉积在基板表面上制造硅膜的方法，其特征在于所用的前体是四氯化硅。本发明还涉及通过本发明的方法获得的薄膜太阳能电池或晶体硅薄膜太阳能电池。本发明还涉及使用四氯化硅来制造从气相沉积在基材上的膜。

6. 发明申请

US20080268566A1 Method For Re-Crystallization Of Layer Structures By Means Of Zone Melting, A Device For This Purpose And Use Thereof 失效
标题翻译：通过区域熔融重结晶层结构的方法，用于此目的的设备和用途
公开(公告)号：US20080268566A1
公开(公告)日：2008-10-30
申请号：US12065742
申请日：2006-09-04
申请人： Stefan Reber , Achim Eyer , Fridolin Haas
发明人： Stefan Reber , Achim Eyer , Fridolin Haas
IPC分类号： H01L31/0368 , B01D9/00
CPC分类号： H01L21/02675 , C30B13/24 , H01L21/2022 , H01L21/268 , H01L31/1872 , Y02E10/50 , Y02P70/521
摘要： The invention relates to a method for re-crystallization of layer structures by means of zone melting, in which, as a result of convenient arrangement of a plurality of heat sources, a significant acceleration of the zone melting method can be achieved. The method is based on the fact that a continuous recrystallisation of the layer is ensured as a result of overlaps being produced. According to the invention, a device is likewise provided with which the method according to the invention can be achieved. The method according to the invention is used in particular in the production of crystalline silicon thin layer solar cells or for example in SOI technology. However the application likewise relates also in general to the processing of metals, plastic materials or adhesives and here in particular to the production of thin layers.
摘要翻译：本发明涉及通过区域熔融重结晶层结构的方法，其中由于多个热源的方便布置，可以实现区域熔融方法的显着加速。该方法基于由于产生重叠而确保层的连续重结晶的事实。根据本发明，同样提供了可以实现根据本发明的方法的装置。根据本发明的方法特别用于制造晶体硅薄层太阳能电池，或者例如在SOI技术中。然而，该应用同样也涉及金属，塑料材料或粘合剂的加工，并且这里尤其涉及薄层的生产。

7. 发明申请

US20120073676A1 Device and Process for Removing Screenings from Liquid Flowing in a Channel 审中-公开
标题翻译：用于从通道中流动的液体中去除筛选的装置和过程
公开(公告)号：US20120073676A1
公开(公告)日：2012-03-29
申请号：US13238474
申请日：2011-09-21
申请人： Christian Frommann , Franz Spenger , Stefan Reber
发明人： Christian Frommann , Franz Spenger , Stefan Reber
IPC分类号： F15D1/00
CPC分类号： B01D33/11 , B01D33/50 , E03F5/14 , Y10T137/598
摘要： The invention refers to a device for removing screenings from liquid flowing in a channel (1), especially from sewage (2), the device comprising a tilted screening drum (4) being at least partly immersed in the liquid, being drivable around a rotating axis with the help of a drive and having an open face (5) on the inflow side, the device further comprising an extractor for the screenings, preferably in form of a screw conveyor (11) or suction device (17), whereas the extractor is arranged at least partially inside the screening drum (4) and comprises a feeding section for the screenings, preferably in form of a feeding funnel (15), that is arranged inside the screening drum (4). According to the invention, it is suggested for the screening drum (4) to have a folded sieve wall (19).
摘要翻译：本发明涉及一种用于去除在通道（1）中流动的液体的筛选的装置，特别是从污水（2）中移出的装置，该装置包括至少部分地浸没在液体中的倾斜筛分鼓（4），可围绕旋转轴线在驱动器的帮助下并且在流入侧具有开口面（5），该装置还包括用于筛选的提取器，优选地以螺旋输送机（11）或抽吸装置（17）的形式，而提取器至少部分地布置在所述筛网滚筒（4）内，并且包括布置在所述筛分滚筒（4）内部的用于筛选的进料部分，优选地以进料漏斗（15）的形式。根据本发明，建议筛分滚筒（4）具有折叠的筛壁（19）。

8. 发明申请

US20100206371A1 REFLECTIVELY COATED SEMICONDUCTOR COMPONENT, METHOD FOR PRODUCTION AND USE THEREOF 审中-公开
标题翻译：反射涂层半导体元件，其生产和使用方法
公开(公告)号：US20100206371A1
公开(公告)日：2010-08-19
申请号：US12598351
申请日：2008-05-14
申请人： Stefan Janz , Stefan Reber
发明人： Stefan Janz , Stefan Reber
IPC分类号： H01L31/0232 , H01L21/20 , H01L31/0312
CPC分类号： H01L31/056 , H01L31/02327 , Y02E10/52
摘要： The invention relates to a reflectively coated semiconductor component which has a semiconductor layer, a functional layer which substantially comprises silicon and carbon, and at least one further layer which substantially comprises silicon and carbon. This further layer functions as reflector for light incident upon the semiconductor component. The invention also relates to a method for the production of semiconductor components of this type. Semiconductor components are used in particular as solar cells or as components of sensors or optical filters.
摘要翻译：本发明涉及一种反射涂覆的半导体元件，其具有半导体层，基本上包括硅和碳的功能层，以及至少一个基本上包含硅和碳的另外的层。该另外的层用作入射到半导体部件上的光的反射器。本发明还涉及一种用于生产这种类型的半导体部件的方法。半导体元件特别用作太阳能电池或用作传感器或滤光器的组件。

9. 发明申请

US20090197049A1 METHOD FOR DRY CHEMICAL TREATMENT OF SUBSTRATES AND ALSO USE THEREOF 有权
标题翻译：用于干燥化学处理基材的方法，并且还使用它们
公开(公告)号：US20090197049A1
公开(公告)日：2009-08-06
申请号：US12096271
申请日：2006-12-06
申请人： Stefan Reber , Gerhard Willeke
发明人： Stefan Reber , Gerhard Willeke
IPC分类号： B32B3/00 , C23F1/00 , H01L21/322 , H01L21/306
CPC分类号： C04B41/91 , C03C15/00 , C04B41/009 , C04B41/5346 , H01L21/02046 , H01L21/3221 , H01L31/1804 , Y02E10/547 , Y02P70/521 , Y10T428/24479 , C04B35/00 , C04B35/16 , C04B35/185 , C04B35/58 , C04B35/56
摘要： The invention relates to a method for dry chemical treatment of substrates selected from the group comprising silicon, ceramic, glass, and quartz glass, in which the substrate is treated in a heated reaction chamber with a gas which contains hydrogen chloride as etching agent, and also to a substrate which can be produced in this way. The invention likewise relates to uses of the previously mentioned method.
摘要翻译：本发明涉及一种用于干燥化学处理的方法，所述方法选自硅，陶瓷，玻璃和石英玻璃，其中基板在加热的反应室中用含有氯化氢作为蚀刻剂的气体进行处理，以及也可以以这种方式生产的基底。本发明同样涉及前述方法的用途。

10. 发明申请

US20080317956A1 Device and Method for Continuous Chemical Vapour Deposition Under Atmospheric Pressure and Use Thereof 有权
标题翻译：在大气压下连续化学气相沉积的装置和方法及其应用
公开(公告)号：US20080317956A1
公开(公告)日：2008-12-25
申请号：US12067233
申请日：2006-09-22
申请人： Stefan Reber , Albert Hurrle , Norbert Schillinger
发明人： Stefan Reber , Albert Hurrle , Norbert Schillinger
IPC分类号： C23C16/455 , C23C16/453 , C23C16/54
CPC分类号： C23C16/4405 , C23C16/4401 , C23C16/4412 , C23C16/453 , C23C16/455 , C23C16/45502 , C23C16/45563 , C23C16/45574 , C23C16/4583 , C23C16/54 , C23C16/545
摘要： The invention relates to a device and a method for continuous chemical vapour deposition under atmospheric pressure on substrates. The device is hereby based on a reaction chamber, along the open sides of which the substrates are guided, as a result of which the corresponding coatings can be effected on the side of the substrates which is orientated towards the chamber interior.
摘要翻译：本发明涉及在大气压下在基片上进行连续化学气相沉积的装置和方法。因此，该装置基于反应室，沿其开口侧引导基板，由此可以在朝向室内部取向的基板侧进行相应的涂层。

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