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    • 2. 发明授权
    • Organic light emitting diode display and manufacturing method thereof
    • 有机发光二极管显示及其制造方法
    • US07897270B2
    • 2011-03-01
    • US11647880
    • 2006-12-29
    • Tae-Whan KimDong-Chul ChooChang-Uk Kim
    • Tae-Whan KimDong-Chul ChooChang-Uk Kim
    • H01L51/52H01L51/54
    • H01L51/5012Y10T428/24942
    • According to an embodiment of the present invention, an OLED display includes a substrate, a first electrode, a hole transport layer, a hole blocking layer, an emitting layer, and a second electrode. The first electrode is formed on the substrate. The hole transport layer is formed on the first electrode and includes a first material having a first highest occupied molecular orbital (HOMO) level and a first lowest unoccupied molecular orbital (LUMO) level. The hole blocking layer is formed on the hole transport layer and includes a second material having a second HOMO level and a second LUMO level. The emitting layer is formed on the hole blocking layer and includes a third material having a third HOMO level and a third LUMO level. The second electrode is formed on the emitting layer. Herein, the second HOMO level is higher than the first HOMO level and the third HOMO level.
    • 根据本发明的实施例,OLED显示器包括基板,第一电极,空穴传输层,空穴阻挡层,发光层和第二电极。 第一电极形成在基板上。 空穴传输层形成在第一电极上并且包括具有第一高占据分子轨道(HOMO)水平和第一最低未占分子轨道(LUMO)水平的第一材料。 空穴阻挡层形成在空穴传输层上,并且包括具有第二HOMO能级和第二LUMO能级的第二材料。 发光层形成在空穴阻挡层上,并且包括具有第三HOMO能级和第三LUMO能级的第三材料。 第二电极形成在发光层上。 这里,第二HOMO级别高于第一HOMO级别和第三HOMO级别。
    • 5. 发明申请
    • Organic light emitting diode display and manufacturing method thereof
    • 有机发光二极管显示及其制造方法
    • US20080007170A1
    • 2008-01-10
    • US11647880
    • 2006-12-29
    • Tae-Whan KimDong-Chul ChooChang-Uk Kim
    • Tae-Whan KimDong-Chul ChooChang-Uk Kim
    • H01L51/52H01L51/54
    • H01L51/5012Y10T428/24942
    • According to an embodiment of the present invention, an OLED display includes a substrate, a first electrode, a hole transport layer, a hole blocking layer, an emitting layer, and a second electrode. The first electrode is formed on the substrate. The hole transport layer is formed on the first electrode and includes a first material having a first highest occupied molecular orbital (HOMO) level and a first lowest unoccupied molecular orbital (LUMO) level. The hole blocking layer is formed on the hole transport layer and includes a second material having a second HOMO level and a second LUMO level. The emitting layer is formed on the hole blocking layer and includes a third material having a third HOMO level and a third LUMO level. The second electrode is formed on the emitting layer. Herein, the second HOMO level is higher than the first HOMO level and the third HOMO level.
    • 根据本发明的实施例,OLED显示器包括基板,第一电极,空穴传输层,空穴阻挡层,发光层和第二电极。 第一电极形成在基板上。 空穴传输层形成在第一电极上并且包括具有第一高占据分子轨道(HOMO)水平和第一最低未占分子轨道(LUMO)水平的第一材料。 空穴阻挡层形成在空穴传输层上,并且包括具有第二HOMO能级和第二LUMO能级的第二材料。 发光层形成在空穴阻挡层上,并且包括具有第三HOMO能级和第三LUMO能级的第三材料。 第二电极形成在发光层上。 这里,第二HOMO级别高于第一HOMO级别和第三HOMO级别。
    • 9. 发明申请
    • SOLAR CELL USING P-I-N NANOWIRE
    • 太阳能电池使用P-I-N NANOWIRE
    • US20120097232A1
    • 2012-04-26
    • US13382134
    • 2010-07-06
    • Tae-Whan KimJoo-Hyung YouJae-Hun JungJae-Seok YiWon-Il Park
    • Tae-Whan KimJoo-Hyung YouJae-Hun JungJae-Seok YiWon-Il Park
    • H01L31/075B82Y99/00
    • H01L31/03529H01L31/035281Y02E10/50
    • A solar cell using a p-i-n nanowire that may generate light by absorbing solar light in a wide wavelength region efficiently without generating light loss and may be manufactured with a simplified process and low cost. The solar cell includes: a semiconductor layer formed of a semiconductor material; and a photoelectromotive layer including a semiconductor structure including a core-nanowire that extends long in an upward direction of the semiconductor layer and is formed of an intrinsic semiconductor material, and a shell-nanowire that is formed to surround a periphery of the core-nanowire and is formed of a semiconductor material, wherein the semiconductor material that is used for forming the semiconductor layer includes an n-type semiconductor material, or the semiconductor material that is used for forming the shell-nanowire includes a p-type semiconductor material, and the semiconductor material that is used for forming the semiconductor layer includes a p-type semiconductor material, and the semiconductor material that is used for forming the shell-nanowire includes an n-type semiconductor material.
    • 使用p-i-n纳米线的太阳能电池,其可以通过在宽波长区域中有效吸收太阳光而不产生光损耗而产生光,并且可以以简化的工艺和低成本制造。 太阳能电池包括:由半导体材料形成的半导体层; 以及包含半导体结构的光电动势层,所述半导体结构包括在所述半导体层的向上方向上延伸并且由本征半导体材料形成的核 - 纳米线,并且形成为包围所述核 - 纳米线的周围的壳 - 纳米线 并且由半导体材料形成,其中用于形成半导体层的半导体材料包括n型半导体材料或用于形成壳 - 纳米线的半导体材料包括p型半导体材料,以及 用于形成半导体层的半导体材料包括p型半导体材料,用于形成壳 - 纳米线的半导体材料包括n型半导体材料。