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1. 发明申请

US20060238736A1 Measuring apparatus and exposure apparatus having the same 失效
标题翻译：测量装置和具有该测量装置的曝光装置
公开(公告)号：US20060238736A1
公开(公告)日：2006-10-26
申请号：US11405472
申请日：2006-04-18
申请人： Takafumi Miyaharu , Takahisa Shiozawa
发明人： Takafumi Miyaharu , Takahisa Shiozawa
IPC分类号： G03B27/54
CPC分类号： G03F7/70133 , G03F7/706
摘要： A measuring apparatus used for an exposure apparatus that includes an illumination optical system that illuminates a reticle using light from a light source, a reticle stage that supports and drives the reticle, and a projection optical system that projects a pattern of the reticle onto a plate measures an effective light source distribution as an incident angular distribution of the light on a reticle plane of the reticle includes a relaying optical system configured to guide the light that has passed the illumination optical system, and a housing that contains the relaying optical system and is mounted on the reticle stage in place of the reticle.
摘要翻译：一种用于曝光装置的测量装置，包括使用来自光源的光照亮标线片的照明光学系统，支撑并驱动光罩的标线片台，以及投影光学系统，该投影光学系统将标线图案投影到板上测量有效的光源分布，因为光在光罩的掩模版平面上的入射角分布包括被配置为引导已经通过照明光学系统的光的中继光学系统和包含中继光学系统的壳体，安装在分划板台上以代替光罩。

2. 发明申请

US20110001946A1 EXPOSURE APPARATUS AND METHOD OF MANUFACTURING DEVICE 失效
标题翻译：曝光装置及其制造方法
公开(公告)号：US20110001946A1
公开(公告)日：2011-01-06
申请号：US12827729
申请日：2010-06-30
申请人： Takafumi Miyaharu
发明人： Takafumi Miyaharu
IPC分类号： G03B27/54
CPC分类号： G03F7/7085 , G03F7/70566
摘要： An exposure apparatus includes an illumination system which illuminates an original, a projection optical system which projects a pattern of the original onto a substrate, a measurement device configured to measure optical characteristics of at least one of the illumination system and the projection optical system, and a control unit configured to correct, the measurement results obtained by said measurement device, depending on a polarization state included in illumination light from the illumination system.
摘要翻译：曝光装置包括照亮原稿的照明系统，将原稿的图案投影到基板上的投影光学系统，被配置为测量照明系统和投影光学系统中的至少一个的光学特性的测量装置，以及控制单元，被配置为根据包括在来自照明系统的照明光中的偏振状态来校正由所述测量装置获得的测量结果。

3. 发明授权

US08253931B2 Exposure apparatus and device manufacturing method 有权
标题翻译：曝光装置和装置制造方法
公开(公告)号：US08253931B2
公开(公告)日：2012-08-28
申请号：US12607774
申请日：2009-10-28
申请人： Takafumi Miyaharu
发明人： Takafumi Miyaharu
IPC分类号： G01B9/00
CPC分类号： G03F7/70516 , G03B27/54 , G03F1/44 , G03F7/7085
摘要： An apparatus includes an optical system for illuminating an original, a measurement device which includes an image sensor arranged on a substrate stage, and is configured to measure a characteristic of the optical system based on a light intensity distribution that is formed on an image sensing plane of the image sensor via the optical system and a measurement pattern, a calibration pattern arranged to form a light intensity distribution having a known shape on the image sensing plane, and a controller configured to calibrate the measurement device based on the light intensity distribution by the calibration pattern, and a theoretical light intensity distribution that is expected to be formed on the image sensing plane by the calibration pattern, wherein the calibration pattern is arranged around a region where the measurement pattern is arranged.
摘要翻译：一种装置，包括用于照亮原件的光学系统，包括布置在基板台上的图像传感器的测量装置，并且被配置为基于形成在图像感测平面上的光强度分布来测量光学系统的特性的图像传感器和测量图案，布置成在图像感测平面上形成具有已知形状的光强度分布的校准图案，以及控制器，被配置为基于由所述光学系统的光强度分布校准测量装置校准图案和预期由校准图案在图像感测平面上形成的理论光强度分布，其中校准图案围绕布置测量图案的区域布置。

4. 发明授权

US08013976B2 Exposure apparatus, exposure method, and device fabrication method 失效
标题翻译：曝光装置，曝光方法和装置制造方法
公开(公告)号：US08013976B2
公开(公告)日：2011-09-06
申请号：US12120747
申请日：2008-05-15
申请人： Takafumi Miyaharu
发明人： Takafumi Miyaharu
IPC分类号： G03B27/68
CPC分类号： G03F7/7085 , G03F7/70258 , G03F7/70341 , G03F7/70508 , G03F7/70666
摘要： The present invention provides an exposure apparatus which exposes a substrate via a liquid, comprising a measurement substrate including a transmission part configured to transmit a light beam having passed through a projection optical system, a light-receiving unit including a light-receiving surface configured to receive the light beam transmitted through the liquid and the transmission part, and a calculator configured to arithmetically convert a light intensity distribution, on the light-receiving surface, of the light beam received by the light-receiving surface into a light intensity distribution on a pupil plane of the projection optigottacal system, based on information indicating a correlation between a position coordinate on the light-receiving surface and a position coordinate on the pupil of the projection optical system.
摘要翻译：本发明提供了一种通过液体曝光基板的曝光装置，包括：测量基板，包括被配置为透射通过投影光学系统的光束的透射部分;光接收单元，包括受光面，接收通过液体和透射部分透射的光束，以及计算器，被配置为将由光接收表面接收的光束的受光面上的光强度分布计算成光强度分布基于指示光接收表面上的位置坐标与投影光学系统的光瞳上的位置坐标之间的相关性的信息，投影光学系统的光瞳平面。

5. 发明授权

US08497978B2 Exposure apparatus and method of manufacturing device 失效
标题翻译：曝光装置及其制造方法
公开(公告)号：US08497978B2
公开(公告)日：2013-07-30
申请号：US12827729
申请日：2010-06-30
申请人： Takafumi Miyaharu
发明人： Takafumi Miyaharu
IPC分类号： G03B27/54 , G03B27/68 , G03B27/52 , G03B27/58 , G03B27/72 , G03B27/32
CPC分类号： G03F7/7085 , G03F7/70566
摘要： An exposure apparatus includes an illumination system which illuminates an original, a projection optical system which projects a pattern of the original onto a substrate, a measurement device configured to measure optical characteristics of at least one of the illumination system or the projection optical system, and a control unit configured to correct, the measurement results obtained by the measurement device, depending on a polarization state included in illumination light from the illumination system.
摘要翻译：曝光装置包括照亮原稿的照明系统，将原稿的图案投影到基板上的投影光学系统，被配置为测量照明系统或投影光学系统中的至少一个的光学特性的测量装置，以及控制单元，被配置为根据包括在来自照明系统的照明光中的偏振状态来校正由测量装置获得的测量结果。

6. 发明申请

US20080291421A1 EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE FABRICATION METHOD 失效
标题翻译：曝光装置，曝光方法和装置制造方法
公开(公告)号：US20080291421A1
公开(公告)日：2008-11-27
申请号：US12120747
申请日：2008-05-15
申请人： Takafumi Miyaharu
发明人： Takafumi Miyaharu
IPC分类号： G03F7/20 , G01J1/00 , G01J1/42
CPC分类号： G03F7/7085 , G03F7/70258 , G03F7/70341 , G03F7/70508 , G03F7/70666
摘要： The present invention provides an exposure apparatus which exposes a substrate via a liquid, comprising a measurement substrate includes a transmission part configured to transmit a light beam having passed through a projection optical system, a light-receiving unit including a light-receiving surface configured to receive the light beam transmitted through the liquid and the transmission part, and a calculator configured to arithmetically convert a light intensity distribution, on the light-receiving surface, of the light beam received by the light-receiving surface into a light intensity distribution on a pupil plane of the projection optical system, based on information indicating a correlation between a position coordinate on the light-receiving surface and a position coordinate on the pupil of the projection optical system.
摘要翻译：本发明提供了一种通过液体曝光基板的曝光装置，包括测量基板，包括被配置为透射通过投影光学系统的光束的透射部分，包括受光面的光接收单元，所述光接收单元被配置为接收通过液体和透射部分透射的光束，以及计算器，被配置为将由光接收表面接收的光束的受光面上的光强度分布计算成光强度分布基于指示受光面的位置坐标与投影光学系统的光瞳上的位置坐标之间的相关性的信息，投影光学系统的光瞳面。

7. 发明申请

US20100112469A1 EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD 有权
标题翻译：曝光装置和装置制造方法
公开(公告)号：US20100112469A1
公开(公告)日：2010-05-06
申请号：US12607774
申请日：2009-10-28
申请人： Takafumi Miyaharu
发明人： Takafumi Miyaharu
IPC分类号： G03F7/20 , G03B27/54
CPC分类号： G03F7/70516 , G03B27/54 , G03F1/44 , G03F7/7085
摘要： An apparatus includes an optical system for illuminating an original, a measurement device which includes an image sensor arranged on a substrate stage, and is configured to measure a characteristic of the optical system based on a light intensity distribution that is formed on an image sensing plane of the image sensor via the optical system and a measurement pattern, a calibration pattern arranged to form a light intensity distribution having a known shape on the image sensing plane, and a controller configured to calibrate the measurement device based on the light intensity distribution by the calibration pattern, and a theoretical light intensity distribution that is expected to be formed on the image sensing plane by the calibration pattern, wherein the calibration pattern is arranged around a region where the measurement pattern is arranged.
摘要翻译：一种装置，包括用于照亮原稿的光学系统，包括布置在基板台上的图像传感器的测量装置，并且被配置为基于形成在图像感测平面上的光强度分布来测量光学系统的特性的图像传感器和测量图案，布置成在图像感测平面上形成具有已知形状的光强度分布的校准图案，以及控制器，被配置为基于由所述光学系统的光强度分布校准测量装置校准图案和预期由校准图案在图像感测平面上形成的理论光强度分布，其中校准图案围绕布置测量图案的区域布置。

8. 发明授权

US07671967B2 Exposure apparatus and exposure method 失效
标题翻译：曝光装置和曝光方法
公开(公告)号：US07671967B2
公开(公告)日：2010-03-02
申请号：US11405472
申请日：2006-04-18
申请人： Takafumi Miyaharu , Takahisa Shiozawa
发明人： Takafumi Miyaharu , Takahisa Shiozawa
IPC分类号： G03B27/54 , G01B11/00
CPC分类号： G03F7/70133 , G03F7/706
摘要： An exposure method includes the steps of (a) calculating a pupil transmittance distribution in a projection optical system based on a first effective light source distribution of the projection optical system acquired by a measuring apparatus of an exposure apparatus, and a second effective light source distribution derived from a pupil plane light intensity distribution measured on a plate plane using light that has passed the projection optical system without a reticle, (b) calculating an imaging performance by using a result of the pupil transmittance distribution calculating step and the first or second effective light source distributions, (c) adjusting at least one of the effective light source distribution or the projection optical system by using the imaging performance, and (d) exposing the plate based on at least one of the effective light source distribution and the projection optical system that have been adjusted.
摘要翻译：曝光方法包括以下步骤：（a）基于由曝光装置的测量装置获取的投影光学系统的第一有效光源分布和第二有效光源分布来计算投影光学系统中的光瞳透射率分布（b）通过使用瞳孔透射率分布计算步骤的结果和第一或第二有效值计算成像性能，该平均光强度分布是使用已经通过没有标线的投影光学系统的光在平板平面上测量的光瞳平面光强度分布光源分布，（c）通过使用成像性能来调整有效光源分布或投影光学系统中的至少一个，以及（d）基于有效光源分布和投影光学中的至少一个曝光该板系统已调整。

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