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1. 发明授权

US10155284B2 Systems and methods for preventing or reducing contamination enhanced laser induced damage (C-LID) to optical components using gas phase additives 有权
公开(公告)号：US10155284B2
公开(公告)日：2018-12-18
申请号：US14446209
申请日：2014-07-29
申请人： The Aerospace Corporation
发明人： Bruce H. Weiller , Randy M. Villahermosa , Jesse D. Fowler
IPC分类号： B23K26/12 , H01S3/22 , H01S3/23
摘要： Systems and methods for preventing or reducing contamination enhanced laser induced damage (C-LID) to optical components are provided including a housing enclosing an optical component, a container configured to hold a gas phase additive and operatively coupled to the housing; and a delivery system configured to introduce the gas phase additive from the container into the housing and to maintain the gas phase additive at a pre-selected partial pressure within the housing. The gas phase additive may have a greater affinity for the optical component than does a contaminant and may be present in an amount sufficient to inhibit laser induced damage resulting from contact between the contaminant and the optical component. The housing may be configured to maintain a sealed gas environment or vacuum.

2. 发明授权

US09323051B2 Systems and methods for inhibiting contamination enhanced laser induced damage (CELID) based on fluorinated self-assembled monolayers disposed on optics 有权
标题翻译：用于抑制污染的系统和方法基于设置在光学器件上的氟化自组装单层增强激光诱导损伤（CELID）
公开(公告)号：US09323051B2
公开(公告)日：2016-04-26
申请号：US13802042
申请日：2013-03-13
申请人： The Aerospace Corporation
发明人： Bruce H. Weiller , Jesse D. Fowler , Randy M. Villahermosa
IPC分类号： G02B1/00 , G02B27/00
CPC分类号： G02B27/0006 , Y10T428/31663
摘要： Embodiments of the present invention provide systems and methods for inhibiting contamination enhanced laser induced damage (CELID) based on fluorinated self-assembled monolayers (F-SAMs) disposed on optics. For example, a coating for inhibiting CELID to an optic disposed in a sealed gas environment or vacuum may include an F-SAM that includes a fluorinated hydrocarbon tail group covalently bound to the optic by a head group. The coating may be formed by heating the optic and a liquid-phase precursor of the F-SAM to generate a gas-phase precursor, and exposing the heated optic to the gas-phase precursor for a period of time sufficient for the gas-phase precursor to coalesce at and covalently bond to the optic and form the F-SAM. The optic may include silica, and the F-SAM may include a siloxane group covalently bound to the silica.
摘要翻译：本发明的实施方案提供了基于设置在光学器件上的氟化自组装单层（F-SAM）来抑制污染增强的激光诱导损伤（CELID）的系统和方法。例如，用于将CELID抑制到设置在密封气体环境或真空中的光学器件的涂层可以包括F-SAM，其包括通过头部基团共价结合到光学元件的氟化烃尾基团。可以通过加热F-SAM的光学元件和液相前体来形成涂层，以产生气相前体，并将加热的光学元件暴露于气相前体足以使气相的时间前体聚结并共价连接到光学元件并形成F-SAM。光学元件可以包括二氧化硅，并且F-SAM可以包括与二氧化硅共价结合的硅氧烷基团。

3. 发明申请

US20140268335A1 SYSTEMS AND METHODS FOR INHIBITING CONTAMINATION ENHANCED LASER INDUCED DAMAGE (CELID) BASED ON FLUORINATED SELF-ASSEMBLED MONOLAYERS DISPOSED ON OPTICS 有权
标题翻译：基于氟化物处理的荧光自组装单层抑制污染增强激光诱导损伤（CELID）的系统和方法
公开(公告)号：US20140268335A1
公开(公告)日：2014-09-18
申请号：US13802042
申请日：2013-03-13
申请人： THE AEROSPACE CORPORATION
发明人： Bruce H. WEILLER , Jesse D. Fowler , Randy M. Villahermosa
IPC分类号： G02B27/00
CPC分类号： G02B27/0006 , Y10T428/31663
摘要： Embodiments of the present invention provide systems and methods for inhibiting contamination enhanced laser induced damage (CELID) based on fluorinated self-assembled monolayers (F-SAMs) disposed on optics. For example, a coating for inhibiting CELID to an optic disposed in a sealed gas environment or vacuum may include an F-SAM that includes a fluorinated hydrocarbon tail group covalently bound to the optic by a head group. The coating may be formed by heating the optic and a liquid-phase precursor of the F-SAM to generate a gas-phase precursor, and exposing the heated optic to the gas-phase precursor for a period of time sufficient for the gas-phase precursor to coalesce at and covalently bond to the optic and form the F-SAM. The optic may include silica, and the F-SAM may include a siloxane group covalently bound to the silica.
摘要翻译：本发明的实施方案提供了基于设置在光学器件上的氟化自组装单层（F-SAM）来抑制污染增强的激光诱导损伤（CELID）的系统和方法。例如，用于将CELID抑制到设置在密封气体环境或真空中的光学器件的涂层可以包括F-SAM，其包括通过头部基团共价结合到光学元件的氟化烃尾基团。可以通过加热F-SAM的光学元件和液相前体来形成涂层，以产生气相前体，并将加热的光学元件暴露于气相前体足以使气相的时间前体聚结并共价连接到光学元件并形成F-SAM。光学元件可以包括二氧化硅，并且F-SAM可以包括与二氧化硅共价结合的硅氧烷基团。

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