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    • 3. 发明申请
    • Electron Microscope and Measurement Method
    • 电子显微镜和测量方法
    • US20170025248A1
    • 2017-01-26
    • US15151792
    • 2016-05-11
    • The University of TokyoJEOL Ltd.
    • Naoya ShibataYuji KohnoHidetaka Sawada
    • H01J37/244H01J37/22H01J37/09H01J37/26
    • H01J37/244H01J37/09H01J37/226H01J37/26H01J37/28H01J2237/0453H01J2237/24578H01J2237/2614H01J2237/2802
    • An electron microscope is provided which can measure, with high sensitivity and high positional resolution, an amount of deflection of an electron beam occurring when it is transmitted through a sample. The electron microscope (100) is adapted to measure the amount of deflection of the electron beam (EB) when it is transmitted through the sample (S), and has an electron beam source (10) producing the electron beam (EB), an illumination lens system for focusing the electron beam (EB) onto the sample (S), an aperture (30) having an electron beam blocking portion (32) for providing a shield between a central portion (EB1) and an outer peripheral portion (EB2) of the cross section of the beam (EB) impinging on the sample (S), and a segmented detector (20) having a detection surface (22) for detecting the electron beam (EB) transmitted through the sample (S). The detection surface (22) is divided into a plurality of detector segments (D1-D4).
    • 提供了一种电子显微镜,其能够以高灵敏度和高位置分辨率测量当透射通过样品时发生的电子束的偏转量。 电子显微镜(100)适于测量电子束(EB)在透过样品(S)时的偏转量,并具有产生电子束(EB)的电子束源(10), 用于将电子束(EB)聚焦到样品(S)上的照明透镜系统,具有用于在中心部分(EB1)和外周部分(EB2)之间提供屏蔽的电子束阻挡部分(32)的孔(30) (EB))和分段检测器(20),其具有用于检测通过样品(S)传输的电子束(EB)的检测表面(22)。 检测表面(22)被分成多个检测器段(D1-D4)。