专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US10593571B2 Substrate processing apparatus 有权
公开(公告)号：US10593571B2
公开(公告)日：2020-03-17
申请号：US15467001
申请日：2017-03-23
申请人： Tokyo Electron Limited
发明人： Hiroaki Inadomi , Tooru Nakamura , Kouji Kimoto , Yasuo Kiyohara , Satoshi Okamura , Satoshi Biwa , Nobuya Yamamoto , Katsuhiro Ookawa , Keiichi Yahata , Tetsuro Nakahara
IPC分类号： H01L21/67 , B08B3/02 , B08B3/08 , B08B3/10
摘要： Provided is a substrate processing apparatus including a liquid processing unit that performs a liquid processing on a substrate; a drying processing unit that performs a drying processing on the substrate in a wet state; a first conveyance unit that conveys the substrate to the liquid processing unit; a second conveyance unit that conveys the substrate in the wet state from the liquid processing unit to the drying processing unit; and a third conveyance unit that conveys the substrate before the liquid processing in the liquid processing unit and to convey the substrate after the drying processing from the drying processing unit. The first and second conveyance units and the drying processing unit are disposed on a side that faces the third conveyance unit, and the liquid processing unit is disposed on a side that faces the first and second conveyance units and is opposite to the third conveyance unit.

2. 发明授权

US10046372B2 Liquid processing apparatus 有权
公开(公告)号：US10046372B2
公开(公告)日：2018-08-14
申请号：US15209982
申请日：2016-07-14
申请人： Tokyo Electron Limited
发明人： Kazuya Goda , Yoshifumi Amano , Nobuya Yamamoto , Go Ayabe
IPC分类号： B08B13/00 , B08B3/04 , H01L21/67
摘要： A liquid processing apparatus includes a plurality of liquid processing units, a plurality of individual exhaust paths, a common exhaust path, a first outside air intake section, a first regulation valve, a second outside air intake section, and a second regulation valve. The liquid processing units perform a liquid processing on a processing target object. An exhaust gas from an inside of the liquid processing unit flows in the individual exhaust paths. The exhaust gas from the individual exhaust paths flows in the common exhaust path. The first outside air intake section is formed at the most upstream side to introduce outside air. The first regulation valve is provided in the first outside air intake section. The second outside air intake section is formed at a downstream side of the common exhaust path from the connection. The second regulation valve is provided in the second outside air intake section.

3. 发明申请

US20170287742A1 SUBSTRATE PROCESSING APPARATUS 审中-公开
公开(公告)号：US20170287742A1
公开(公告)日：2017-10-05
申请号：US15467001
申请日：2017-03-23
申请人： Tokyo Electron Limited
发明人： Hiroaki Inadomi , Tooru Nakamura , Kouji Kimoto , Yasuo Kiyohara , Satoshi Okamura , Satoshi Biwa , Nobuya Yamamoto , Katsuhiro Ookawa , Keiichi Yahata , Tetsuro Nakahara
IPC分类号： H01L21/67 , B08B3/08 , B08B3/02 , B08B3/10
摘要： Provided is a substrate processing apparatus including a liquid processing unit that performs a liquid processing on a substrate; a drying processing unit that performs a drying processing on the substrate in a wet state; a first conveyance unit that conveys the substrate to the liquid processing unit; a second conveyance unit that conveys the substrate in the wet state from the liquid processing unit to the drying processing unit; and a third conveyance unit that conveys the substrate before the liquid processing in the liquid processing unit and to convey the substrate after the drying processing from the drying processing unit. The first and second conveyance units and the drying processing unit are disposed on a side that faces the third conveyance unit, and the liquid processing unit is disposed on a side that faces the first and second conveyance units and is opposite to the third conveyance unit.

4. 发明申请

US20170028450A1 LIQUID PROCESSING APPARATUS 审中-公开
标题翻译：液体加工设备
公开(公告)号：US20170028450A1
公开(公告)日：2017-02-02
申请号：US15209982
申请日：2016-07-14
申请人： Tokyo Electron Limited
发明人： Kazuya Goda , Yoshifumi Amano , Nobuya Yamamoto , Go Ayabe
IPC分类号： B08B13/00 , B08B3/04
CPC分类号： B08B13/00 , H01L21/67017 , H01L21/67028 , H01L21/6708
摘要： A liquid processing apparatus includes a plurality of liquid processing units, a plurality of individual exhaust paths, a common exhaust path, a first outside air intake section, a first regulation valve, a second outside air intake section, and a second regulation valve. The liquid processing units perform a liquid processing on a processing target object. An exhaust gas from an inside of the liquid processing unit flows in the individual exhaust paths. The exhaust gas from the individual exhaust paths flows in the common exhaust path. The first outside air intake section is formed at the most upstream side to introduce outside air. The first regulation valve is provided in the first outside air intake section. The second outside air intake section is formed at a downstream side of the common exhaust path from the connection. The second regulation valve is provided in the second outside air intake section.
摘要翻译：液体处理装置包括多个液体处理单元，多个单独的排气路径，公共排气路径，第一外部空气进入部分，第一调节阀，第二外部空气进入部分和第二调节阀。液体处理单元对加工对象物进行液体处理。来自液体处理单元的内部的废气在各个排气路径中流动。来自各个排气通道的废气在公共排气路径中流动。第一外部空气进入部分形成在最上游侧以引入外部空气。第一调节阀设置在第一外部空气吸入部。第二外部空气进入部分形成在公共排气路径从连接处的下游侧。第二调节阀设置在第二外部空气吸入部。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式