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1. 发明授权

US08216891B2 LCD TFT array plate and fabricating method thereof 有权
标题翻译： LCD TFT阵列板及其制造方法
公开(公告)号：US08216891B2
公开(公告)日：2012-07-10
申请号：US12923551
申请日：2010-09-28
申请人： Yeong-Feng Wang , Liang-Bin Yu , Chih-Jui Pan , Chun-Hao Tung
发明人： Yeong-Feng Wang , Liang-Bin Yu , Chih-Jui Pan , Chun-Hao Tung
IPC分类号： H01L21/00 , H01L21/84
CPC分类号： H01L27/1288 , H01L27/1255
摘要： Lift-off method and half-tone photolithography are used to fabricate LCD TFT array plate. Only two photo masks are used to respectively define a first and a second metal layers to accomplish the LCD TFT array plate.
摘要翻译：用于制造LCD TFT阵列板的剥离法和半色调光刻法。仅使用两个光掩模来分别限定第一和第二金属层以完成LCD TFT阵列板。

2. 发明申请

US20110014738A1 LCD TFT array plate and fabricating method thereof 有权
标题翻译： LCD TFT阵列板及其制造方法
公开(公告)号：US20110014738A1
公开(公告)日：2011-01-20
申请号：US12923551
申请日：2010-09-28
申请人： Yeong-Feng Wang , Liang-Bin Yu , Chih-Jui Pan , Chun-Hao Tung
发明人： Yeong-Feng Wang , Liang-Bin Yu , Chih-Jui Pan , Chun-Hao Tung
IPC分类号： H01L21/84
CPC分类号： H01L27/1288 , H01L27/1255
摘要： Lift-off method and half-tone photolithography are used to fabricate LCD TFT array plate. Only two photo masks are used to respectively define a first and a second metal layers to accomplish the LCD TFT array plate.
摘要翻译：用于制造LCD TFT阵列板的剥离法和半色调光刻法。仅使用两个光掩模来分别限定第一和第二金属层以完成LCD TFT阵列板。

3. 发明授权

US07871868B2 LCD TFT array plate and fabricating method thereof 有权
公开(公告)号：US07871868B2
公开(公告)日：2011-01-18
申请号：US11907470
申请日：2007-10-12
申请人： Yeong-Feng Wang , Liang-Bin Yu , Chih-Jui Pan , Chun-Hao Tung
发明人： Yeong-Feng Wang , Liang-Bin Yu , Chih-Jui Pan , Chun-Hao Tung
IPC分类号： H01L21/00 , H01L21/84
CPC分类号： H01L27/1288 , H01L27/1255
摘要： Lift-off method and half-tone photolithography are used to fabricate LCD TFT array plate. Only two photo masks are used to respectively define a first and a second metal layers to accomplish the LCD TFT array plate.

4. 发明申请

US20080087893A1 LCD TFT array plate and fabricating method thereof 有权
标题翻译： LCD TFT阵列板及其制造方法
公开(公告)号：US20080087893A1
公开(公告)日：2008-04-17
申请号：US11907470
申请日：2007-10-12
申请人： Yeong-Feng Wang , Liang-Bin Yu , Chih-Jui Pan , Chun-Hao Tung
发明人： Yeong-Feng Wang , Liang-Bin Yu , Chih-Jui Pan , Chun-Hao Tung
IPC分类号： H01L29/04 , H01L21/84
CPC分类号： H01L27/1288 , H01L27/1255
摘要： Lift-off method and half-tone photolithography are used to fabricate LCD TFT array plate. Only two photo masks are used to respectively define a first and a second metal layers to accomplish the LCD TFT array plate.
摘要翻译：用于制造LCD TFT阵列板的剥离法和半色调光刻法。仅使用两个光掩模来分别限定第一和第二金属层以完成LCD TFT阵列板。

5. 发明申请

US20070153194A1 PIXEL UNIT AND DISPLAY DEVICE UTILIZING THE SAME 有权
标题翻译：像素单元和使用它的显示设备
公开(公告)号：US20070153194A1
公开(公告)日：2007-07-05
申请号：US11563718
申请日：2006-11-28
申请人： Yeong-Feng Wang , Chun-Hao Tung , Liang-Bin Yu
发明人： Yeong-Feng Wang , Chun-Hao Tung , Liang-Bin Yu
IPC分类号： G02F1/1343
CPC分类号： G02F1/136213 , G02F2001/13606
摘要： A pixel unit comprising a first metal layer and a second metal layer. The first metal layer comprises a gate electrode and a first electrode. The second metal layer comprises a drain electrode, a source electrode, and a second electrode. The drain electrode overlaps the gate electrode in a first overlapping region. The source electrode overlaps the gate electrode in a second overlapping region. The second electrode overlaps the first electrode in a third overlapping region. The size of the first electrode approximates that of the second electrode. The first electrode and the second electrode are staggered.
摘要翻译：一种像素单元，包括第一金属层和第二金属层。第一金属层包括栅电极和第一电极。第二金属层包括漏电极，源电极和第二电极。漏电极在第一重叠区域与栅电极重叠。源电极在第二重叠区域与栅电极重叠。第二电极在第三重叠区域与第一电极重叠。第一电极的尺寸近似于第二电极的尺寸。第一电极和第二电极交错。

6. 发明授权

US07659956B2 Pixel unit and display device utilizing the same 有权
标题翻译：像素单元和利用它的显示设备
公开(公告)号：US07659956B2
公开(公告)日：2010-02-09
申请号：US11563718
申请日：2006-11-28
申请人： Yeong-Feng Wang , Chun-Hao Tung , Liang-Bin Yu
发明人： Yeong-Feng Wang , Chun-Hao Tung , Liang-Bin Yu
IPC分类号： G02F1/1343
CPC分类号： G02F1/136213 , G02F2001/13606
摘要： A pixel unit comprising a first metal layer and a second metal layer. The first metal layer comprises a gate electrode and a first electrode. The second metal layer comprises a drain electrode, a source electrode, and a second electrode. The drain electrode overlaps the gate electrode in a first overlapping region. The source electrode overlaps the gate electrode in a second overlapping region. The second electrode overlaps the first electrode in a third overlapping region. The size of the first electrode approximates that of the second electrode. The first electrode and the second electrode are staggered.
摘要翻译：一种像素单元，包括第一金属层和第二金属层。第一金属层包括栅电极和第一电极。第二金属层包括漏电极，源电极和第二电极。漏电极在第一重叠区域与栅电极重叠。源电极在第二重叠区域与栅电极重叠。第二电极在第三重叠区域与第一电极重叠。第一电极的尺寸近似于第二电极的尺寸。第一电极和第二电极交错。

7. 发明授权

US08551822B2 Method for manufacturing array substrate 有权
标题翻译：阵列基板的制造方法
公开(公告)号：US08551822B2
公开(公告)日：2013-10-08
申请号：US12005289
申请日：2007-12-27
申请人： Chun-Hao Tung
发明人： Chun-Hao Tung
IPC分类号： H01L21/00
CPC分类号： H01L27/1288 , H01L27/1214
摘要： A method for manufacturing a substrate for a flat panel display device is disclosed. The present method uses photolithography with four masks to manufacture a TFT-LCD. After the third half-tone mask is used, the manufacturing of the TFTs and the defining of the pixel area of the substrate can be completed. The present method can avoid the alignment deviation and the generation of parasitic capacitance happened on the substrate made through the conventional photolithography with five masks. Therefore, the present method can reduce the costs and increase the yield. Moreover, the substrate for the TFT-LCD made by the present method can define a channel region in the semiconductor layer after the second half-tone mask. Hence, the subsequent manufacturing for forming a transparent conductive layer, a source, and a drain can be achieved by wet etching to effectively reduce the non-homogeneous etching for the channel region in the semiconductor layer.
摘要翻译：公开了一种用于制造平板显示装置用基板的方法。本方法使用具有四个掩模的光刻制造TFT-LCD。在使用第三半色调掩模之后，可以完成TFT的制造和衬底的像素区域的限定。本方法可以避免通过具有五个掩模的常规光刻制成的衬底上发生的对准偏差和寄生电容的产生。因此，本方法可以降低成本并提高产量。此外，通过本方法制造的用于TFT-LCD的衬底可以在第二半色调掩模之后限定半导体层中的沟道区。因此，用于形成透明导电层，源极和漏极的后续制造可以通过湿式蚀刻来实现，以有效地减少半导体层中的沟道区域的非均匀蚀刻。

8. 发明申请

US20090180066A1 PIXEL STRUCTURE, DISPLAY PANEL, ELECTRO-OPTICAL APPARATUS AND MANUFACTURING METHOD OF THE SAME 有权
标题翻译：像素结构，显示面板，电光设备及其制造方法
公开(公告)号：US20090180066A1
公开(公告)日：2009-07-16
申请号：US12111929
申请日：2008-04-29
申请人： Chun-Hao Tung , Kuo-Yu Huang
发明人： Chun-Hao Tung , Kuo-Yu Huang
IPC分类号： G02F1/1343 , G02F1/1335 , G02F1/1333
CPC分类号： G02F1/133553 , G02F1/133555
摘要： A pixel structure disposed on a substrate having a plurality of protrudent patterns is provided. An area where the protrudent patterns are disposed defines a first display area. The arrangement of the protrudent patterns forms a plurality of arc loci. The arc loci have a same arc center disposed at a corner of the first display area. The abovementioned protrudent patterns avails improvement of a displaying effect of the pixel structure.
摘要翻译：提供了设置在具有多个凸起图案的基板上的像素结构。突出图案的布置区域限定第一显示区域。突出图案的布置形成多个弧形轨迹。弧形轨迹具有设置在第一显示区域的角落处的相同弧中心。上述突出图案可以改善像素结构的显示效果。

9. 发明授权

US07811724B2 Method for fabricating color filter layer 有权
标题翻译：彩色滤光片的制作方法
公开(公告)号：US07811724B2
公开(公告)日：2010-10-12
申请号：US11695620
申请日：2007-04-03
申请人： Chun-Hao Tung , Jui-Yin Chung
发明人： Chun-Hao Tung , Jui-Yin Chung
IPC分类号： G02B5/20
CPC分类号： G03F7/0007 , G02F1/133516 , G02F1/136209 , G02F2001/136222
摘要： A method of fabricating a color filter layer is provided. First, an active device array substrate having an opaque metal pattern formed thereon is provided. Next, a back-side exposure process is performed on the active device array substrate using the opaque metal layer as a mask to form a black matrix defining a plurality of pixel regions. Next, a plurality of color filter patterns is formed in the pixel regions.
摘要翻译：提供了制造滤色器层的方法。首先，提供其上形成有不透明金属图案的有源器件阵列基板。接下来，使用不透明金属层作为掩模在有源器件阵列基板上进行背面曝光处理，以形成限定多个像素区域的黑矩阵。接下来，在像素区域中形成多个滤色器图案。

10. 发明申请

US20080153013A1 METHOD FOR FABRICATING COLOR FILTER LAYER 有权
标题翻译：彩色滤光片制作方法
公开(公告)号：US20080153013A1
公开(公告)日：2008-06-26
申请号：US11695620
申请日：2007-04-03
申请人： Chun-Hao Tung , Jui-Yin Chung
发明人： Chun-Hao Tung , Jui-Yin Chung
IPC分类号： G03F5/18
CPC分类号： G03F7/0007 , G02F1/133516 , G02F1/136209 , G02F2001/136222
摘要： A method of fabricating a color filter layer is provided. First, an active device array substrate having an opaque metal pattern formed thereon is provided. Next, a back-side exposure process is performed on the active device array substrate using the opaque metal layer as a mask to form a black matrix defining a plurality of pixel regions. Next, a plurality of color filter patterns is formed in the pixel regions.
摘要翻译：提供了制造滤色器层的方法。首先，提供其上形成有不透明金属图案的有源器件阵列基板。接下来，使用不透明金属层作为掩模在有源器件阵列基板上进行背面曝光处理，以形成限定多个像素区域的黑矩阵。接下来，在像素区域中形成多个滤色器图案。

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