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    • 9. 发明授权
    • Method and structure for fabricating mechanical mirror structures using backside alignment techniques
    • 使用背面对准技术制造机械镜面结构的方法和结构
    • US07449284B2
    • 2008-11-11
    • US10843909
    • 2004-05-11
    • Xiao Charles Yang
    • Xiao Charles Yang
    • G03F7/00
    • B81C1/00484B81C2203/036B81C2203/051
    • A method for fabricating mechanical structures from bonding substrates. The method includes providing a bonded substrate structure, which includes a first substrate having a first thickness of silicon material and a first face. The bonded substrate also includes a second substrate having a second thickness and a second face. At least the first substrate or at least the second substrate (or both) has an alignment mark comprising a front-size zero mark within a portion of either the first thickness or the second thickness. The method includes applying a layer of photomasking material overlying a first backside surface of the first substrate. The method includes illuminating electromagnetic radiation using a coherent light source through the layer of photoresist material and through a portion of the first thickness. The method includes detecting an indication of the alignment mark using a signal associated with a portion of the electromagnetic radiation from a second backside of the second substrate. The method also includes exposing a portion of the layer of photomasking material once a pattern a portion of a reticle structure has been aligned using the alignment mark.
    • 一种从接合基板制造机械结构的方法。 该方法包括提供键合衬底结构,其包括具有第一厚度的硅材料和第一面的第一衬底。 键合衬底还包括具有第二厚度和第二面的第二衬底。 至少第一基板或至少第二基板(或两者)具有在第一厚度或第二厚度的一部分内包括前尺寸零标记的对准标记。 该方法包括施加覆盖在第一衬底的第一背面上的光掩模材料层。 该方法包括使用相干光源穿过光致抗蚀剂材料层并通过第一厚度的一部分来照射电磁辐射。 该方法包括使用与来自第二基板的第二背面的电磁辐射的一部分相关联的信号来检测对准标记的指示。 该方法还包括使用对准标记将掩模版结构的一部分的图案一旦曝光一部分光掩模材料层。