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1. 发明授权

US10058889B2 Wear resistant and biocompatible coatings for medical devices and method of fabrication 有权
公开(公告)号：US10058889B2
公开(公告)日：2018-08-28
申请号：US14774318
申请日：2014-03-10
申请人： Kettering University
发明人： Mary Gilliam , Susan Farhat , Ali Zand
IPC分类号： B05D1/00 , B05D3/14 , A61L27/16 , A61L27/34 , C08L33/12 , A61L31/10 , B05D1/02
CPC分类号： B05D1/62 , A61L27/16 , A61L27/34 , A61L31/10 , A61L2420/02 , B05D1/02 , B05D3/144 , B05D3/147 , B05D3/148 , C08L33/12
摘要： A method of forming a biocompatible or biologically inert article for use in an application in which the article will make contact with at least one tissue, organ, or fluid within a human or animal body is provided. The method generally comprises providing an article having an external surface; selecting chemical precursors; using a means to direct one or more chemical precursors towards or to apply such chemical precursors to the external surface; activating the chemical precursors by exposing said precursors to atmospheric pressure plasma; and grafting and/or cross-linking the chemical precursors to form a solid coating adjacent to the external surface of the article.

2. 发明授权

US09999901B2 Method for manufacturing a superhydrophobic surface, surface so obtained and use of it 有权
公开(公告)号：US09999901B2
公开(公告)日：2018-06-19
申请号：US14434809
申请日：2013-10-02
申请人： Luxembourg Institute of Science And Technology (LIST)
发明人： Nicolas Boscher , David Duday , Patrick Choquet , Stephane Verdier
IPC分类号： H05H1/24 , B05D1/00 , B05D5/00 , B05D5/08 , C09D5/00 , C09D5/16 , C09D183/04
CPC分类号： B05D1/62 , B05D5/00 , B05D5/08 , B05D2350/38 , C09D5/00 , C09D5/1681 , C09D183/04 , Y10T428/24355
摘要： The invention is directed to a method for manufacturing a hydrophobic or superhydrophobic surface comprising the steps of: (a) providing a substrate with a surface roughness Ra between 0.1 and 1.0 μm and (b) exposing the substrate to a filamentary atmospheric pressure dielectric barrier discharge plasma which is fed by a reaction gas and siloxane-forming material in order to form a superhydrophobic siloxane layer over at least a portion of the surface of the substrate. Step (b) is operated with an electrical excitation frequency of 15,000 Hz to 35,000 Hz and a power density between 0.5 to 10 W·cm−2. The siloxane layer produced in step (b) shows thereby a micro-structure and a nano-structure with droplet “sticking” properties (high water sliding angle).

3. 发明授权

US09939556B2 Method for producing a reflection-reducing layer system and reflection-reducing layer system 有权
公开(公告)号：US09939556B2
公开(公告)日：2018-04-10
申请号：US15008392
申请日：2016-01-27
申请人： Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V.
发明人： Ulrike Schulz , Friedrich Rickelt , Peter Munzert , Hanno Heiβe , Heiko Knopf , Kevin Füchsel , Norbert Kaiser
IPC分类号： G02B1/10 , G02B1/118 , B29C59/14 , G02B1/111 , G02B1/14 , B05D1/00 , B05D3/14 , C23C14/28 , C23C14/06 , C23C14/10 , C23C14/12 , C23C14/32
CPC分类号： G02B1/118 , B05D1/60 , B05D1/62 , B05D3/145 , B05D3/148 , B29C59/14 , C23C14/06 , C23C14/10 , C23C14/12 , C23C14/28 , C23C14/32 , G02B1/111 , G02B1/14
摘要： A method for producing a reflection-reducing layer system on a substrate and a reflection-reducing layer system are disclosed. According to an embodiment the method includes depositing a refractive index gradient layer on the substrate by co-evaporation of an inorganic material and an organic material, wherein the refractive index gradient layer has a refractive index which decreases in a growth direction, depositing an organic layer above the refractive index gradient layer, and producing a nanostructure in the organic layer by a plasma etching process.

4. 发明授权

US09907352B2 Breathable waterproof sole for shoes 有权
公开(公告)号：US09907352B2
公开(公告)日：2018-03-06
申请号：US14661247
申请日：2015-03-18
申请人： GEOX S.p.A.
发明人： Mario Polegato Moretti , Antonio Ferrarese , Bruno Mattioni
IPC分类号： A43B7/08 , A43B7/12 , A43B7/00 , A43B9/02 , A43B13/02 , A43B13/12 , A43B7/06 , A43B23/02 , B05D1/00
CPC分类号： A43B7/125 , A43B7/06 , A43B7/08 , A43B7/087 , A43B9/02 , A43B13/026 , A43B13/12 , A43B13/125 , A43B23/0235 , B05D1/62 , Y10T428/249986
摘要： A waterproof breathable sole for shoes, which comprises, for at least part of its extension, at least two structural layers, a lower one provided with a supporting structure so as to form the tread, and an upper one that is permeable to water vapor. The lower layer has portions that are open onto the upper layer. A coating obtained by means of a plasma deposition treatment for waterproofing is provided on the upper layer. A layer is thus obtained that has structural functions and characteristics of resistance to damage and is at the same time waterproof and breathable.

5. 发明申请

US20180044793A1 CONTAINER PLASMA TREATMENT PROCESS COMPRISING A THERMAL IMAGING PHASE 审中-公开
公开(公告)号：US20180044793A1
公开(公告)日：2018-02-15
申请号：US15552992
申请日：2016-02-10
申请人： SIDEL PARTICIPATIONS
发明人： Thierry DEAU
IPC分类号： C23C16/52 , C23C16/26 , H01J37/32 , C23C16/511 , C23C16/04
CPC分类号： C23C16/52 , B05D1/62 , B05D7/02 , B05D7/20 , B29C59/142 , C23C16/045 , C23C16/26 , C23C16/511 , G01N21/8422 , G01N21/9081 , G01N25/72 , H01J37/32192 , H01J37/32394 , H01J37/32816 , H01J37/3299 , H05H2001/4607 , H05H2245/123
摘要： Disclosed is a process for treating a container with plasma, for depositing a barrier layer on an internal face of the container. This process includes: after the plasma has been extinguished, obtaining a thermal image of the container; comparing the thermal image of the container with a reference thermal image stored in memory; and, if the thermal image of the container differs from the reference thermal image, modifying at least one of the following parameters: internal pressure, external pressure, precursor gas flow rate, microwave frequency, microwave power, duration of the treatment.

6. 发明申请

US20170274123A1 PROCESS FOR MANUFACTURING A CUSTOMIZABLE MEDICAL DEVICE AND DEVICE OBTAINED BY SAID PROCESS 审中-公开
公开(公告)号：US20170274123A1
公开(公告)日：2017-09-28
申请号：US15503729
申请日：2015-08-13
申请人： Institut D'investigació Biomèdica De Bellvitge (IDIBELL) , Institut Químic De Sarriá, Cets Fundació Privada
发明人： Antoni Rosell Gratacos , Salvador Borros Gómez , Joan Gilabert Porres , Sara Martí Martí , Ana Montes Worboys , Victor Ramos Pérez , María Molina Molina
IPC分类号： A61L31/16 , A61L31/06 , A61F2/82 , C23C16/50 , C23C16/06
CPC分类号： A61L31/16 , A61F2/82 , A61L31/06 , A61L2300/104 , A61L2300/404 , A61L2300/416 , A61L2300/624 , A61L2400/12 , A61L2420/02 , B05D1/36 , B05D1/60 , B05D1/62 , C23C16/06 , C23C16/50 , C23C18/166 , C23C18/1893 , C23C18/2086 , C08L83/04
摘要： The invention relates to medical devices and, more in particular, to medical devices suitable for use as stents that contain an antimicrobial coating and, optionally, a drug customized to patients requirements. The invention also relates to methods for obtaining devices having the above features.

7. 发明授权

US09732419B2 Apparatus for forming gas blocking layer and method thereof 有权
公开(公告)号：US09732419B2
公开(公告)日：2017-08-15
申请号：US13769108
申请日：2013-02-15
申请人： Korea University Research and Business Foundation
发明人： MunPyo Hong , You Jong Lee , Yun-Sung Jang , Jun Young Lee
IPC分类号： C23C14/35 , H01J37/34 , C23C16/44 , C23C16/22 , C23C14/22 , C23C14/34 , B05D1/00 , C23C14/08 , C23C16/00 , H01J37/32 , H01L51/52
CPC分类号： C23C16/44 , B05D1/62 , C23C14/086 , C23C14/22 , C23C14/225 , C23C14/3464 , C23C14/35 , C23C16/00 , C23C16/22 , H01J37/32357 , H01J37/32422 , H01J37/3417 , H01J37/347 , H01J2237/332 , H01L51/5256
摘要： A gas blocking layer forming apparatus comprises a vacuum chamber that provides a space where a chemical vapor deposition process and a sputtering process are performed; a holding unit that is provided at a lower side within the vacuum chamber and mounts thereon a target object on which an organic/inorganic mixed multilayer gas blocking layer is formed; a neutral particle generation unit that is provided at an upper side within the vacuum chamber and generates a neutral particle beam having a high-density flux with a current density of about 10 A/m2 or more; and common sputtering devices that are provided at both sides of the neutral particle generation unit, wherein each common sputtering device has a sputtering target of which a surface is inclined toward a surface of the target object.

8. 发明授权

US09580681B2 Method of manufacturing patterned substrate for culturing cells, patterned substrate, and patterned cell chip 有权
标题翻译：制造用于培养细胞，图案化衬底和图案化细胞芯片的图案化衬底的方法
公开(公告)号：US09580681B2
公开(公告)日：2017-02-28
申请号：US14634190
申请日：2015-02-27
申请人： Sungkyunkwan University Foundation for Corporate Collaboration
发明人： Dong Geun Jung , Chang Rok Choi , Kyung Seop Kim
IPC分类号： C08F2/46 , C12N5/00 , B05D1/00 , B05D1/32
CPC分类号： C12N5/0068 , B01J2219/00509 , B01J2219/00527 , B01J2219/00605 , B01J2219/00612 , B01J2219/00614 , B01J2219/00619 , B01J2219/00621 , B01J2219/00635 , B01J2219/00637 , B01J2219/00743 , B01L3/5088 , B05D1/32 , B05D1/62 , C12M25/00 , C12N2533/12 , C12N2533/30 , C12N2535/10 , C12N2537/00 , C12N2539/00
摘要： A method of manufacturing a patterned substrate for culturing cells. The method includes the steps of: (1) preparing a substrate, (2) forming a first plasma polymer layer by integrating a first precursor material on the substrate using a plasma, wherein the first plasma layer inhibits cell adsorption, and wherein the first precursor material is a siloxane-based compound having a siloxane functional group with the Si—O—Si linkage, (3) placing a shadow mask having a predetermined pattern on the first plasma polymer layer thus formed, and (4) forming a second patterned plasma polymer layer by integrating a second precursor material using a plasma, wherein the second patterned plasma layer permits culturing of cells, whereby the patterned substrate is obtained.
摘要翻译：一种制造用于培养细胞的图案化底物的方法。该方法包括以下步骤：（1）制备衬底，（2）通过使用等离子体将基板上的第一前体材料整合形成第一等离子体聚合物层，其中第一等离子体层抑制细胞吸附，其中第一前体材料是具有Si-O-Si键的硅氧烷官能团的硅氧烷基化合物，（3）在如此形成的第一等离子聚合物层上放置具有预定图案的荫罩，和（4）形成第二图案化等离子体通过使用等离子体集成第二前体材料，其中第二图案化等离子体层允许细胞培养，由此获得图案化的基底。

9. 发明申请

US20170044199A1 HAFNIUM-CONTAINING FILM FORMING COMPOSITIONS FOR VAPOR DEPOSITION OF HAFNIUM-CONTAINING FILMS 审中-公开
标题翻译：含铪膜的成膜组合物用于含铪膜的蒸气沉积
公开(公告)号：US20170044199A1
公开(公告)日：2017-02-16
申请号：US15337840
申请日：2016-10-28
申请人： L'Air Liquide, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude
发明人： Christian DUSSARRAT , Jean-Marc GIRARD , Hana ISHII , Clément LANSALOT-MATRAS , Julien LIEFFRIG
IPC分类号： C07F17/00 , B05D1/00 , C09D7/12 , H01L27/108 , H01L21/285
CPC分类号： C07F17/00 , B05D1/60 , B05D1/62 , C23C16/40 , C23C16/405 , H01L21/285 , H01L27/108
摘要： Disclosed are Hafnium-containing film forming compositions comprising Silicon- and Hafnium-containing precursors having one of the following formulae: wherein each R1, R2, R3, R4, R5, R6, R7, Fe, R9 and R19 is independently selected from H; a C1-C5 linear, branched, or cyclic alkyl group; or a C1-C5 linear, branched, or cyclic fluoroalkyl group. Also disclosed are methods of synthesizing the disclosed compositions and using the same to deposit Hafnium-containing thin films on substrates via vapor deposition processes.
摘要翻译：其中每个R 1，R 2，R 3，R 4，R 5，R 6，R 7，Fe，R 9和R 19独立地选自H; C1-C5直链，支链或环状烷基; 或C 1 -C 5直链，支链或环状氟代烷基。还公开了合成所公开的组合物并使用其的方法来通过气相沉积工艺在基底上沉积含铪的薄膜。

10. 发明授权

US09556513B2 Molding, production method therefor, part for electronic devices and electronic device 有权
标题翻译：成型及其制造方法，电子设备和电子设备部件
公开(公告)号：US09556513B2
公开(公告)日：2017-01-31
申请号：US13818050
申请日：2011-07-27
申请人： Wataru Iwaya , Takeshi Kondo
发明人： Wataru Iwaya , Takeshi Kondo
IPC分类号： C23C14/48 , B29C59/14 , B05D7/04 , B05D1/00 , C08J7/04 , C08J7/12
CPC分类号： C23C14/48 , B05D1/62 , B05D7/04 , B05D2252/02 , B29C59/14 , B29C2059/147 , C08J7/045 , C08J7/047 , C08J7/123 , C08J2367/02 , C08J2433/12 , C08J2483/16 , Y10T428/31667
摘要： The invention is a formed article including a gas barrier layer, the gas barrier layer including a surface layer part that is formed of a material that includes at least a carbon atom, an oxygen atom, and a silicon atom, the surface layer part having a carbon atom content rate of more than 0 and not more than 70%, an oxygen atom content rate of 10 to 70%, a nitrogen atom content rate of 0 to 35%, and a silicon atom content rate of 20 to 55%, based on a total content rate of carbon atoms, oxygen atoms, nitrogen atoms, and silicon atoms; a method for producing the formed article; an electronic device member including the formed article; and an electronic device comprising the electronic device member. The formed article of the invention exhibits an excellent gas barrier capability, excellent transparency, and excellent bending resistance. The method for producing a formed article of the invention can efficiently, safely, and conveniently produce the formed article of the invention. The electronic device member of the invention may suitably be used for electronic devices such as displays and solar cells.
摘要翻译：本发明是一种包含气体阻隔层的成形制品，所述阻气层包括由至少包含碳原子，氧原子和硅原子的材料形成的表面层部分，所述表面层部分具有碳原子含有率大于0且不超过70％，氧原子含量率为10〜70％，氮原子含量率为0〜35％，硅原子含有率为20〜55％，基于碳原子，氧原子，氮原子和硅原子的总含量比; 一种生产成形品的方法; 包括所述成形制品的电子装置构件; 以及包括电子设备构件的电子设备。本发明的成型体具有优异的阻气性，优异的透明性和优异的耐弯曲性。本发明的成型体的制造方法能够有效，安全，方便地制造本发明的成型体。本发明的电子设备构件可以适用于诸如显示器和太阳能电池的电子设备。

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