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1. 发明授权

US09976228B2 Method for producing colloidal crystal and colloidal crystal 有权
公开(公告)号：US09976228B2
公开(公告)日：2018-05-22
申请号：US14003583
申请日：2012-03-03
申请人： Junpei Yamanaka , Akiko Toyotama , Masaaki Yamamoto , Sachiko Onda , Tohru Okuzono , Fumio Uchida
发明人： Junpei Yamanaka , Akiko Toyotama , Masaaki Yamamoto , Sachiko Onda , Tohru Okuzono , Fumio Uchida
IPC分类号： C30B7/08 , C01B33/18 , C08J3/12 , C08J3/14 , C08J3/16 , C30B29/60 , C01B33/141 , C30B5/00 , C01G23/047
CPC分类号： C30B7/08 , C01B33/1415 , C01B33/18 , C01G23/047 , C08J3/12 , C08J3/126 , C08J3/14 , C08J3/16 , C08J2325/08 , C08J2433/12 , C30B5/00 , C30B29/60
摘要： [Problem] To provide a method for producing a colloidal crystal, wherein the method is easily controlled and is capable of dealing with a wide range of types of colloidal particle.[Solution] The method for producing a colloidal crystal in the present invention is characterized by comprising a preparation step of preparing a colloidal dispersion liquid, in which colloidal particles are dispersed in a liquid comprising an ionic surfactant and a colloidal crystal can be formed due to temperature changes, and a crystallization step of formation of a colloidal crystal by changing the temperature of the colloidal dispersion liquid from a temperature region in which the colloidal crystal is not formed to a temperature region in which the colloidal crystal is formed.

2. 发明申请

US20110251057A1 SILICA PARTICLE MANUFACTURING PROCESS 有权
标题翻译：二氧化硅颗粒制造工艺
公开(公告)号：US20110251057A1
公开(公告)日：2011-10-13
申请号：US12756526
申请日：2010-04-08
申请人： Bruce A. Keiser , Nicholas S. Ergang , Richard Mimna , Brett M. Showalter
发明人： Bruce A. Keiser , Nicholas S. Ergang , Richard Mimna , Brett M. Showalter
IPC分类号： B01J32/00 , C09D7/12
CPC分类号： C01B33/18 , C01B33/1415 , C01P2006/12 , C01P2006/14 , C01P2006/16
摘要： Methods of forming a silica-based products are disclosed. One method comprises: (a) providing a silica containing precursor (SCP) contained in solution that has a pH less than or equal to a pH of 7; (b) optionally doping the SCP with one or more metal species, wherein said doping occurs when the solution has a pH less than or equal to a pH of 7; (c) adjusting the pH of the solution to greater than 7; (d) adding an effective amount of salt to the solution so that the conductivity of the solution is greater than or equal to 4 mS, wherein said addition occurs prior to, simultaneous with, or after the pH adjustment in step 1c; (e) optionally filtering and drying the SCP; and (f) optionally reacting the dried product from step e with a functional group and optionally wherein the resultant functionalized dried product is at least one of the following: a functionalized metal oxide-doped or metal sulfide-doped silica product. Another method comprises: (a) providing a silica containing precursor (SCP) contained in solution that has a pH greater than 7; (b) adjusting the pH of the solution to less than or equal to 7; (c) optionally doping the SCP with one or more metal species, wherein said doping occurs when the solution has a pH less than or equal to a pH of 7; (d) adjusting the pH of the solution to greater than 7; (e) adding an effective amount of salt to the solution so that the conductivity of the solution is greater than or equal to 4 mS, wherein said addition occurs prior to, simultaneous with, or after the pH adjustment in step 2d; (f) optionally filtering and drying the SCP; and (g) optionally reacting the dried product from step f with a functional group and optionally wherein the resultant functionalized dried product is at least one of the following: a functionalized metal oxide-doped or metal sulfide-doped silica product.
摘要翻译：公开了形成二氧化硅基产品的方法。一种方法包括：（a）提供pH小于或等于7的溶液中含有的含二氧化硅的前体（SCP）; （b）任选地用一种或多种金属物质掺杂SCP，其中当溶液的pH小于或等于pH7时，发生所述掺杂; （c）将溶液的pH调节至大于7; （d）向溶液中加入有效量的盐使溶液的电导率大于或等于4mS，其中所述添加发生在步骤1c中的pH调节之前，同时或之后，（e）任选地过滤和干燥SCP; 和（f）任选地使来自步骤e的干燥产物与官能团反应，任选地其中所得官能化干燥产物是以下至少一种：官能化金属氧化物掺杂或金属硫化物掺杂二氧化硅产物。另一种方法包括：（a）提供包含在pH大于7的溶液中的含二氧化硅的前体（SCP）; （b）将溶液的pH调节至小于或等于7; （c）任选地用一种或多种金属物质掺杂SCP，其中当溶液的pH小于或等于pH7时，发生所述掺杂; （d）将溶液的pH调节至大于7; （e）向溶液中加入有效量的盐使溶液的电导率大于或等于4mS，其中所述添加发生在步骤2d中的pH调节之前，同时或之后; （f）任选地过滤和干燥SCP; 和（g）任选地使来自步骤f的干燥产物与官能团反应，任选地其中所得官能化干燥产物是以下至少一种：官能化金属氧化物掺杂或金属硫化物掺杂二氧化硅产物。

3. 发明授权

US07824643B2 Silicon dioxide dispersion 有权
标题翻译：二氧化硅分散体
公开(公告)号：US07824643B2
公开(公告)日：2010-11-02
申请号：US10524037
申请日：2003-07-29
申请人： Kai Schumacher , Monika Oswald
发明人： Kai Schumacher , Monika Oswald
IPC分类号： C01B33/12 , C01B33/18
CPC分类号： C01B33/1415 , C01B33/18 , C01B33/183 , C01P2002/54 , C01P2006/12 , C01P2006/22 , C01P2006/82 , C01P2006/90
摘要： Stable, aqueous dispersion containing silicon dioxide powder having a hydroxyl group density of 2.5 to 4.7 OH/nm2, which is obtained from a silicon dioxide powder produced by a flame hydrolysis process under acid conditions. The dispersion is produced by incorporating the silicon dioxide powder into an aqueous solution by means of a dispersing device. The dispersion can be used to produce glass articles.
摘要翻译：稳定的含有二氧化硅粉末的水性分散体，该二氧化硅粉末的羟基密度为2.5〜4.7HOH / nm 2，其由在酸性条件下通过火焰水解法生产的二氧化硅粉末得到。分散体是通过将二氧化硅粉末通过分散装置并入水溶液而制成的。分散体可用于生产玻璃制品。

4. 发明申请

US20060093542A1 Silicon dioxide dispersion 有权
标题翻译：二氧化硅分散体
公开(公告)号：US20060093542A1
公开(公告)日：2006-05-04
申请号：US10524037
申请日：2003-07-29
申请人： Kai Schumacher , Monika Oswald
发明人： Kai Schumacher , Monika Oswald
IPC分类号： C01B33/12
CPC分类号： C01B33/1415 , C01B33/18 , C01B33/183 , C01P2002/54 , C01P2006/12 , C01P2006/22 , C01P2006/82 , C01P2006/90
摘要： Stable, aqueous dispersion containing silicon dioxide powder having a hydroxyl group density of 2.5 to 4.7 OH/nm2, which is obtained from a silicon dioxide powder produced by a flame hydrolysis process under acid conditions. The dispersion is produced by incorporating the silicon dioxide powder into an aqueous solution by means of a dispersing device. The dispersion can be used to produce glass articles.
摘要翻译：稳定的含有二氧化硅粉末的水性分散体，该二氧化硅粉末的羟基密度为2.5-4.7HOH / nm 2，其由在酸性条件下通过火焰水解过程生产的二氧化硅粉末获得。分散体是通过将二氧化硅粉末通过分散装置并入水溶液而制成的。分散体可用于生产玻璃制品。

5. 发明申请

US20140069326A1 METHOD FOR PRODUCING COLLOIDAL CRYSTAL AND COLLOIDAL CRYSTAL 有权
标题翻译：生产胶体晶体和胶体晶体的方法
公开(公告)号：US20140069326A1
公开(公告)日：2014-03-13
申请号：US14003583
申请日：2012-03-03
申请人： Junpei Yamanaka , Akiko Toyotama , Masaaki Yamamoto , Sachiko Onda , Tohru Okuzono , Fumio Uchida
发明人： Junpei Yamanaka , Akiko Toyotama , Masaaki Yamamoto , Sachiko Onda , Tohru Okuzono , Fumio Uchida
IPC分类号： C30B7/08
CPC分类号： C30B7/08 , C01B33/1415 , C01B33/18 , C01G23/047 , C08J3/12 , C08J3/126 , C08J3/14 , C08J3/16 , C08J2325/08 , C08J2433/12 , C30B5/00 , C30B29/60
摘要： [Problem] To provide a method for producing a colloidal crystal, wherein the method is easily controlled and is capable of dealing with a wide range of types of colloidal particle.[Solution] The method for producing a colloidal crystal in the present invention is characterized by comprising a preparation step of preparing a colloidal dispersion liquid, in which colloidal particles are dispersed in a liquid comprising an ionic surfactant and a colloidal crystal can be formed due to temperature changes, and a crystallization step of formation of a colloidal crystal by changing the temperature of the colloidal dispersion liquid from a temperature region in which the colloidal crystal is not formed to a temperature region in which the colloidal crystal is formed.
摘要翻译： [问题]提供一种制备胶体晶体的方法，其中该方法易于控制并且能够处理各种类型的胶体颗粒。 [解决方案]本发明的胶体晶体的制造方法的特征在于，包括制备胶态分散液的制备工序，其中胶体粒子分散在包含离子型表面活性剂和胶态晶体的液体中，由于温度变化，以及通过将胶体分散液从未形成胶体晶体的温度区域的温度改变为形成胶体晶体的温度区域而形成胶体晶体的结晶步骤。

6. 发明申请

US20110171120A1 PROCESS FOR PREPARING A DISPERSION COMPRISING TITANIUM-SILICON MIXED OXIDE 审中-公开
标题翻译：制备包含钛 - 硅混合氧化物的分散体的方法
公开(公告)号：US20110171120A1
公开(公告)日：2011-07-14
申请号：US12677837
申请日：2008-09-25
申请人： Wolfgang Lortz , Kai Schumacher , Joerg Pietsch
发明人： Wolfgang Lortz , Kai Schumacher , Joerg Pietsch
IPC分类号： C01B39/00
CPC分类号： C01B33/141 , B82Y30/00 , C01B33/1415 , C01B33/1417 , C01B37/005 , C01G23/04 , C01G23/047 , C01P2002/52 , C01P2004/62 , C01P2004/64 , C01P2006/12 , C01P2006/19 , C01P2006/22 , C01P2006/80
摘要： Process for preparing an aqueous dispersion which has a pH of 9 to 14 and comprises particles of a pyrogenic titanium-silicon mixed oxide powder having a proportion of silicon dioxide of 75 to 99.99% by weight and of titanium dioxide of 0.01 to 25% by weight, whose mean aggregate diameter in the dispersion is not more than 200 nm, and at least one basic, quaternary ammonium compound.
摘要翻译：制备pH为9〜14的水性分散体的方法，包括二氧化硅的比例为75〜99.99重量％，二氧化钛为0.01〜25重量％的热解钛 - 硅混合氧化物粉末的粒子，其分散体中的平均聚集体直径不大于200nm，和至少一种碱性季铵化合物。

7. 发明授权

US07888396B2 Silicon dioxide dispersion 有权
公开(公告)号：US07888396B2
公开(公告)日：2011-02-15
申请号：US12536150
申请日：2009-08-05
申请人： Kai Schumacher , Monika Oswald
发明人： Kai Schumacher , Monika Oswald
IPC分类号： C01B33/14 , C01B33/113 , C01B33/12
CPC分类号： C01B33/1415 , C01B33/18 , C01B33/183 , C01P2002/54 , C01P2006/12 , C01P2006/22 , C01P2006/82 , C01P2006/90
摘要： Stable, aqueous dispersion containing silicon dioxide powder having a hydroxyl group density of 2.5 to 4.7 OH/nm2, which is obtained from a silicon dioxide powder produced by a flame hydrolysis process under acid conditions. The dispersion is produced by incorporating the silicon dioxide powder into an aqueous solution by means of a dispersing device. The dispersion can be used to produce glass articles.

8. 发明申请

US20100209339A1 SILICON-TITANIUM MIXED OXIDE POWDER, DISPERSION THEREOF AND TITANIUM-CONTAINING ZEOLITE PREPARED THEREFROM 审中-公开
标题翻译：硅 - 钛混合氧化物粉末，其分散剂及其制备的含钛的沸石
公开(公告)号：US20100209339A1
公开(公告)日：2010-08-19
申请号：US12678595
申请日：2008-09-25
申请人： Kai Schumacher , Martin Moerters , Helmut Mangold , Steffen Hasenzahl
发明人： Kai Schumacher , Martin Moerters , Helmut Mangold , Steffen Hasenzahl
IPC分类号： C01B39/02
CPC分类号： C01G23/07 , B01J21/08 , B01J29/89 , B01J35/1019 , C01B33/1415 , C01B33/1417 , C01B33/183 , C01B37/005 , C01P2006/12 , C01P2006/19 , C01P2006/80
摘要： Pyrogenic silicon-titanium mixed oxide powder having • a BET surface area of 200 to 400 m2/g, • a DBP number/BET surface area ratio of 0.5 to 1.2, • a silicon dioxide content of 93.5 to 95.4% by weight and a titanium dioxide content of 4.6 to 6.5% by weight, where the sum of the contents is greater than 99.7% by weight. Dispersion comprising the pyrogenic silicon-titanium mixed oxide powder. Process for preparing a titanium-containing zeolite proceeding from powder or dispersion.
摘要翻译：具有BET表面积为200〜400m2 / g的热解硅 - 钛混合氧化物粉末，DBP数/ BET表面积比为0.5〜1.2，二氧化硅含量为93.5〜95.4重量％，钛二氧化物含量为4.6〜6.5重量％，其中含量的总和大于99.7重量％。包含热解硅 - 钛混合氧化物粉末的分散体。从粉末或分散体制备含钛沸石的方法。

9. 发明申请

US20100071594A1 SILICON DIOXIDE DISPERSION 有权
公开(公告)号：US20100071594A1
公开(公告)日：2010-03-25
申请号：US12580384
申请日：2009-10-16
申请人： Kai SCHUMACHER , Monika Oswald
发明人： Kai SCHUMACHER , Monika Oswald
IPC分类号： C09D1/00
CPC分类号： C01B33/1415 , C01B33/18 , C01B33/183 , C01P2002/54 , C01P2006/12 , C01P2006/22 , C01P2006/82 , C01P2006/90
摘要： Stable, aqueous dispersion containing silicon dioxide powder having a hydroxyl group density of 2.5 to 4.7 OH/nm2, which is obtained from a silicon dioxide powder produced by a flame hydrolysis process under acid conditions. The dispersion is produced by incorporating the silicon dioxide powder into an aqueous solution by means of a dispersing device. The dispersion can be used to produce glass articles.

10. 发明授权

US08974762B2 Silica particle manufacturing process 有权
标题翻译：二氧化硅颗粒制造工艺
公开(公告)号：US08974762B2
公开(公告)日：2015-03-10
申请号：US13269159
申请日：2011-10-07
申请人： Nicholas S. Ergang , Bruce A. Keiser , Richard Mimna , Brett Showalter , Ian Saratovsky , Hung-Ting Chen
发明人： Nicholas S. Ergang , Bruce A. Keiser , Richard Mimna , Brett Showalter , Ian Saratovsky , Hung-Ting Chen
IPC分类号： C01B33/02 , C01F7/00 , C01B33/12 , C01B33/141 , C01B33/18 , C09C1/02 , C09C1/30 , C01B33/187
CPC分类号： C01B33/12 , C01B33/1415 , C01B33/18 , C01B33/187 , C01P2002/54 , C01P2006/12 , C01P2006/14 , C01P2006/16 , C09C1/02 , C09C1/3081
摘要： Methods of forming a silica-containing products are disclosed. One method comprises: (a) providing a silica containing precursor (SCP) contained in solution that has a pH less than or equal to a pH of 7; (b) optionally doping the SCP with one or more metal species; (d) adding an effective amount of salt to the solution so that the conductivity of the solution is greater than or equal to 4 mS; (e) optionally filtering and drying the SCP; and (f) optionally reacting the dried product from step e with a functional group. Another method comprises: (a) providing a silica containing precursor (SCP) contained in solution that has a pH greater than 7; (b) adjusting the pH of the solution to less than or equal to 7; (c) optionally doping the SCP with one or more metal species; (d) adjusting the pH of the solution to greater than 7; and (e) adding an effective amount of salt to the solution so that the conductivity of the solution is greater than or equal to 4 mS; (f) optionally filtering and drying the SCP. The SCP is then added to a hygroscopic solid such that the resulting product comprises a metal oxide-doped or metal sulfide-doped silica-containing product deposited on a substrate selected from hydrated alkaline earth oxide, lanthanide oxide, and combinations thereof.
摘要翻译：公开了形成含二氧化硅的产品的方法。一种方法包括：（a）提供pH小于或等于7的溶液中含有的含二氧化硅的前体（SCP）; （b）任选地用一种或多种金属物质掺杂SCP; （d）向溶液中加入有效量的盐使溶液的电导率大于或等于4mS; （e）任选地过滤和干燥SCP; 和（f）任选地使来自步骤e的干燥产物与官能团反应。另一种方法包括：（a）提供包含在pH大于7的溶液中的含二氧化硅的前体（SCP）; （b）将溶液的pH调节至小于或等于7; （c）任选地用一种或多种金属物质掺杂SCP; （d）将溶液的pH调节至大于7; 和（e）向溶液中加入有效量的盐，使溶液的电导率大于或等于4mS; （f）可选地过滤和干燥SCP。然后将SCP加入到吸湿固体中，使得所得产物包含沉积在选自水合碱土金属氧化物，镧系元素氧化物及其组合的底物上的金属氧化物掺杂或金属硫化物掺杂的含二氧化硅的产物。

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