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    • 7. 发明授权
    • Photoacid generator and photoresist comprising same
    • 光生酸产生剂和包含其的光致抗蚀剂
    • US08900794B2
    • 2014-12-02
    • US13630456
    • 2012-09-28
    • Rohm and Haas Electronic Materials LLC
    • Emad AqadCheng-Bai XuMingqi LiShintaro YamadaWilliam Williams, III
    • G03F7/038G03F7/039G03F7/029G03F7/09C07C309/65
    • G03F7/30C07C309/65C07C311/09C07C2603/74C07D313/08C07D313/10C07D327/04C07D493/18C07D497/18G03F7/0045G03F7/0046G03F7/038G03F7/0397G03F7/2041
    • A photoacid generator compound has the formula (I): [A-(CHR1)p]k-(L)-(CH2)m—(C(R2)2)n—SO3−Z+  (I) wherein A is a substituted or unsubstituted, monocyclic, polycyclic, or fused polycyclic C5 or greater cycloaliphatic group optionally comprising O, S, N, F, or a combination comprising at least one of the foregoing, R1 is H, a single bond, or a substituted or unsubstituted C1-30 alkyl group, wherein when R1 is a single bond, R1 is covalently bonded to a carbon atom of A, each R2 is independently H, F, or C1-4 fluoroalkyl, wherein at least one R2 is not hydrogen, L is a linking group comprising a sulfonate group, a sulfonamide group, or a C1-30 sulfonate or sulfonamide-containing group, Z is an organic or inorganic cation, p is an integer of 0 to 10,k is 1 or 2, m is an integer of 0 or greater, and n is an integer of 1 or greater. A precursor compound to the photoacid generator, a photoresist composition including the photoacid generator, and a substrate coated with the photoresist composition, are also disclosed.
    • 光生酸化合物具有式(I):其中A是取代基的[A-(CHR1)p] k-(L) - (CH2)m-(C(R2)2)n-SO3-Z +(I) 或任选包含O,S,N,F或包含前述至少之一的组合的未取代的单环,多环或稠合多环C 5或更多脂环族基团,R 1是H,单键或取代或未取代的C1 -30烷基,其中当R 1为单键时,R 1与A的碳原子共价连接,每个R 2独立地为H,F或C 1-4氟烷基,其中至少一个R 2不为氢,L为 包含磺酸酯基,磺酰胺基或C1-30磺酸酯或磺酰胺的基团的连接基团,Z是有机或无机阳离子,p是0至10的整数,k是1或2,m是整数 为0以上,n为1以上的整数。 还公开了光致酸产生剂的前体化合物,包含光致酸产生剂的光致抗蚀剂组合物和涂有光致抗蚀剂组合物的基材。