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1. 发明授权

US09829792B2 Monomer, polymer, positive resist composition, and patterning process 有权
公开(公告)号：US09829792B2
公开(公告)日：2017-11-28
申请号：US15204145
申请日：2016-07-07
申请人： Shin-Etsu Chemical Co., Ltd.
发明人： Koji Hasegawa , Jun Hatakeyama , Teppei Adachi
IPC分类号： G03F7/004 , G03F7/38 , C07C69/54 , C07C69/73 , C08F220/18 , C08F220/30 , G03F7/039 , C08F128/06 , C08F116/10 , C08F116/14 , C08F124/00 , C08F116/36 , G03F7/16 , G03F7/20 , G03F7/32 , C07D307/00 , C07C69/76 , C07C69/86
CPC分类号： G03F7/0392 , C07C69/54 , C07C69/73 , C07C69/76 , C07C69/86 , C07C2601/08 , C07C2601/14 , C07C2603/74 , C07D307/00 , C08F116/10 , C08F116/14 , C08F116/36 , C08F124/00 , C08F128/06 , C08F220/18 , C08F220/30 , C08F2220/302 , G03F7/0045 , G03F7/0046 , G03F7/039 , G03F7/0397 , G03F7/085 , G03F7/168 , G03F7/2002 , G03F7/322 , G03F7/38
摘要： A polymer comprising recurring units derived from a polymerizable monomer having two structures of hydroxyphenyl methacrylate having a hydroxy group substituted with an acid labile group is used as base resin in a positive resist composition, especially chemically amplified positive resist composition. The resist composition forms a resist film which is processed by lithography into a pattern of good profile having a high resolution, minimal edge roughness, and etch resistance.

2. 发明申请

US20170115566A1 RESIST COMPOSITION, PATTERNING PROCESS, AND BARIUM, CESIUM AND CERIUM SALTS 审中-公开
公开(公告)号：US20170115566A1
公开(公告)日：2017-04-27
申请号：US15331056
申请日：2016-10-21
申请人： SHIN-ETSU CHEMICAL CO., LTD.
发明人： Jun Hatakeyama , Takashi Sasami , Masaki Ohashi
IPC分类号： G03F7/039 , G03F7/16 , C07D307/00 , G03F7/32 , C07C309/12 , C07J31/00 , G03F7/004 , G03F7/20
CPC分类号： G03F7/0397 , C07C69/74 , C07C69/753 , C07C69/757 , C07C69/78 , C07C69/95 , C07C205/06 , C07C205/11 , C07C303/32 , C07C309/04 , C07C309/06 , C07C309/12 , C07C309/20 , C07C309/24 , C07C309/73 , C07C2601/02 , C07C2601/04 , C07C2601/08 , C07C2601/14 , C07C2601/18 , C07C2601/20 , C07C2602/08 , C07C2602/10 , C07C2602/24 , C07C2602/28 , C07C2602/42 , C07C2603/16 , C07C2603/18 , C07C2603/24 , C07C2603/50 , C07C2603/68 , C07C2603/74 , C07C2603/86 , C07D307/00 , C07J31/006 , C07J43/003 , C08F228/02 , G03F7/0045 , G03F7/0046 , G03F7/2037 , G03F7/2059
摘要： A resist composition comprising a base resin comprising acid labile group-containing recurring units and preferably acid generator-containing recurring units, and a sodium, magnesium, potassium, calcium, rubidium, strontium, yttrium, cesium, barium or cerium salt of α-fluorinated sulfonic acid bonded to an alkyl, alkenyl, alkynyl or aryl group exhibits a high resolution and sensitivity and forms a pattern of satisfactory profile with minimal LWR after exposure and development.

3. 发明申请

US20170008982A1 MONOMER, POLYMER, POSITIVE RESIST COMPOSITION, AND PATTERNING PROCESS 有权
标题翻译：单体，聚合物，积极抵抗组合物和图案过程
公开(公告)号：US20170008982A1
公开(公告)日：2017-01-12
申请号：US15204145
申请日：2016-07-07
申请人： Shin-Etsu Chemical Co., Ltd.
发明人： Koji Hasegawa , Jun Hatakeyama , Teppei Adachi
IPC分类号： C08F128/06 , C08F116/14 , C08F124/00 , C08F116/36 , C07C69/76 , G03F7/16 , G03F7/20 , G03F7/32 , C07C69/54 , C07D307/00 , C08F116/10 , G03F7/039
CPC分类号： G03F7/0392 , C07C69/54 , C07C69/73 , C07C69/76 , C07C69/86 , C07C2601/08 , C07C2601/14 , C07C2603/74 , C07D307/00 , C08F116/10 , C08F116/14 , C08F116/36 , C08F124/00 , C08F128/06 , C08F220/18 , C08F220/30 , C08F2220/302 , G03F7/0045 , G03F7/0046 , G03F7/039 , G03F7/0397 , G03F7/085 , G03F7/168 , G03F7/2002 , G03F7/322 , G03F7/38
摘要： A polymer comprising recurring units derived from a polymerizable monomer having two structures of hydroxyphenyl methacrylate having a hydroxy group substituted with an acid labile group is used as base resin in a positive resist composition, especially chemically amplified positive resist composition. The resist composition forms a resist film which is processed by lithography into a pattern of good profile having a high resolution, minimal edge roughness, and etch resistance.
摘要翻译：在正性抗蚀剂组合物，特别是化学增强的正性抗蚀剂组合物中，使用衍生自具有两个具有羟基被酸不稳定基取代的羟基苯基的具有羟基苯基的可聚合单体的重复单元的聚合物。抗蚀剂组合物形成抗蚀剂膜，其通过光刻加工成具有高分辨率，最小边缘粗糙度和耐蚀刻性的良好轮廓的图案。

4. 发明授权

US09278912B2 C13-hydroxy derivatives of oleanolic acid and methods of use thereof 有权
标题翻译：齐墩果酸的C13-羟基衍生物及其使用方法
公开(公告)号：US09278912B2
公开(公告)日：2016-03-08
申请号：US14023180
申请日：2013-09-10
申请人： REATA PHARMACEUTICALS, INC.
发明人： Xin Jiang , Christopher F. Bender , Melean Visnick
IPC分类号： A61K31/343 , A61K31/16 , A61K31/122 , C07C69/74 , C07C233/58 , C07C35/44 , C07D307/00 , C07C255/47 , C07J63/00
CPC分类号： C07C255/47 , C07D307/00 , C07J63/008
摘要： Disclosed herein are novel C13-hydroxy derivatives of oleanolic acid, including those of the formula: wherein the variables are defined herein. Also provided are pharmaceutical compositions, kits and articles of manufacture comprising such compounds. Methods and intermediates useful for making the compounds, and methods of using the compounds, for example, as antioxidant inflammation modulators, and compositions thereof are also provided.
摘要翻译：本文公开了齐墩果酸的新C13-羟基衍生物，包括下式的那些：其中变量在本文中定义。还提供了包含这些化合物的药物组合物，试剂盒和制品。还提供了可用于制备化合物的方法和中间体，以及使用该化合物的方法，例如抗氧化剂炎症调节剂及其组合物。

5. 发明申请

US20150284404A1 NOVEL BENZYL SULFONAMIDE COMPOUNDS USEFUL AS MOGAT-2 INHIBITORS 有权
标题翻译：新型苄基磺酰胺化合物可用作MOGAT-2抑制剂
公开(公告)号：US20150284404A1
公开(公告)日：2015-10-08
申请号：US14438435
申请日：2013-10-30
申请人： ELI LILLY AND COMPANY
发明人： Francisco Javier Agejas-Chicharro , Nuria Diaz Buezo , Joseph Michael Gruber , Douglas Richard Stack
IPC分类号： C07D491/056 , C07D311/76 , C07D265/30 , C07D265/36 , C07D309/04 , C07D319/20 , C07D307/87
CPC分类号： C07D491/056 , C07D207/00 , C07D207/14 , C07D217/00 , C07D217/24 , C07D263/00 , C07D263/58 , C07D265/30 , C07D265/36 , C07D273/00 , C07D307/00 , C07D307/22 , C07D307/79 , C07D307/87 , C07D309/00 , C07D309/04 , C07D311/00 , C07D311/58 , C07D311/76 , C07D319/00 , C07D319/12 , C07D319/20 , C07D491/052
摘要： The present invention provides compounds of Formula I. Wherein R1, L, and A are as described herein, or a pharmaceutical salt thereof, processes for preparing the compounds, and methods of treating a condition, such as hypertriglyceridemia, using the compounds.
摘要翻译：本发明提供式I化合物，其中R1，L和A如本文所述，或其药学盐，制备化合物的方法，以及使用该化合物治疗诸如高甘油三酯血症的病症的方法。

6. 发明授权

US09102687B2 Ingenol-3-acylates III and ingenol-3-carbamates 有权
标题翻译：茚基-3-酰化物III和烯醇-3-氨基甲酸酯
公开(公告)号：US09102687B2
公开(公告)日：2015-08-11
申请号：US13996989
申请日：2011-12-22
申请人： Gunnar Grue-Sørensen , Xifu Liang , Thomas Högberg , Kristoffer Månsson , Per Vedsø , Thomas Vifian
发明人： Gunnar Grue-Sørensen , Xifu Liang , Thomas Högberg , Kristoffer Månsson , Per Vedsø , Thomas Vifian
IPC分类号： C07D405/06 , C07D513/04 , C07C271/34 , C07C271/36 , C07C271/38 , C07D249/06 , C07D261/18 , C07D277/32 , C07D295/21 , C07D309/08 , C07D333/38 , C07D401/04 , C07D471/04 , C07D495/04 , C07D265/36 , C07D271/08 , C07D277/587 , C07D295/205 , C07D307/00 , C07D307/94
CPC分类号： C07D261/18 , A61K31/365 , A61K31/381 , A61K31/404 , A61K31/415 , A61K31/416 , A61K31/4192 , A61K31/42 , A61K31/472 , A61K31/502 , A61K31/5375 , A61K31/538 , C07C271/34 , C07C271/36 , C07C271/38 , C07C2603/86 , C07D209/08 , C07D209/42 , C07D213/79 , C07D215/50 , C07D217/26 , C07D231/14 , C07D231/56 , C07D233/90 , C07D237/28 , C07D239/28 , C07D249/04 , C07D249/06 , C07D261/20 , C07D263/34 , C07D265/36 , C07D271/08 , C07D277/32 , C07D277/56 , C07D277/587 , C07D295/182 , C07D295/205 , C07D295/21 , C07D307/00 , C07D307/68 , C07D307/94 , C07D309/08 , C07D333/38 , C07D333/40 , C07D401/04 , C07D405/06 , C07D471/04 , C07D493/08 , C07D495/04 , C07D513/04
摘要： The invention relates to compounds of general formula I wherein R is heteroaryl optionally substituted by R7; or R is heterocycloalkyl or heterocycloalkenyl, optionally substituted by R8; or R is X wherein X is —NR11R12; and pharmaceutically acceptable salts, hydrates, or solvates thereof, for use—alone or in combination with one or more other pharmaceutically active compounds—in therapy, for preventing, treating or ameliorating diseases or conditions responsive to stimulation of neutrophil oxidative burst, responsive to stimulation of keratinocyte IL-8 release or responsive to induction of necrosis.
摘要翻译：本发明涉及通式I的化合物，其中R是任选被R 7取代的杂芳基; 或R是任选被R 8取代的杂环烷基或杂环烯基; 或R为X，其中X为-NR 11 R 12; 其药学上可接受的盐，水合物或溶剂合物，用于单独或与一种或多种其它药学活性化合物组合用于治疗，用于预防，治疗或改善响应刺激的中性粒细胞氧化性突发的反应的疾病或病症的角质形成细胞IL-8释放或响应于坏死的诱导。

7. 发明授权

US09051248B2 Methods, compounds, and compositions for delivering 1,3-propanedisulfonic acid 有权
标题翻译：用于递送1,3-丙二磺酸的方法，化合物和组合物
公开(公告)号：US09051248B2
公开(公告)日：2015-06-09
申请号：US13389606
申请日：2010-08-06
申请人： Xianqi Kong , Nigel Levens , Abderrahim Bouzide , Stephane Ciblat , Richard Frenette , Johanne Renaud
发明人： Xianqi Kong , Nigel Levens , Abderrahim Bouzide , Stephane Ciblat , Richard Frenette , Johanne Renaud
IPC分类号： C07C309/65 , C07D319/06 , A61K31/366 , A61K31/365 , A61K31/255 , C07D309/22 , A61K31/351 , C07C309/05 , C07C311/06 , C07C311/51 , C07D213/64 , C07D213/65 , C07D231/12 , C07D307/33 , C07D307/58 , C07D307/77 , C07D327/10 , C07F9/09 , C07F9/40
CPC分类号： C07C309/65 , A61K31/255 , A61K31/351 , A61K31/365 , A61K31/366 , C07C309/05 , C07C311/06 , C07C311/51 , C07C2601/04 , C07C2601/14 , C07D213/64 , C07D213/65 , C07D231/12 , C07D307/00 , C07D307/33 , C07D307/58 , C07D307/77 , C07D309/22 , C07D319/06 , C07D327/00 , C07D327/10 , C07F9/091 , C07F9/4006 , C07F9/4043
摘要： The invention relates to methods, compounds, and compositions for delivering 1,3-propanedisulfonic acid (1,3PDS) in a subject, preferably a human subject. The invention encompasses compounds that will yield or generate 1,3PDS, either in vitro or in vivo. The invention also relates to sulfonate ester prodrugs of 1,3PDS as well as Gemini dimmers and oligomers of 1,3PDS for the prevention or treatment of associated diseases and conditions.
摘要翻译：本发明涉及在受试者，优选人受试者中递送1,3-丙二磺酸（1,3PDS）的方法，化合物和组合物。本发明包括在体外或体内产生或产生1,3PDS的化合物。本发明还涉及1,3PDS的磺酸酯前药以及用于预防或治疗相关疾病和病症的1,3PDS的双子座二聚体和寡聚体。

8. 发明申请

US20140342288A1 RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD, ACID GENERATOR AND COMPOUND 有权
标题翻译：辐射敏感性树脂组合物，抗蚀剂图案形成方法，酸发生器和化合物
公开(公告)号：US20140342288A1
公开(公告)日：2014-11-20
申请号：US14282270
申请日：2014-05-20
申请人： JSR CORPORATION
发明人： Hiroshi TOMIOKA , Takakazu KIMOTO , Yusuke ASANO
IPC分类号： G03F7/027 , G03F7/20
CPC分类号： G03F7/0045 , C07C25/18 , C07C309/04 , C07C309/12 , C07C309/13 , C07C309/17 , C07C309/39 , C07C321/28 , C07C381/12 , C07C2601/14 , C07C2603/74 , C07D307/00 , G03F7/0046 , G03F7/0397 , G03F7/11 , G03F7/162 , G03F7/168 , G03F7/2006 , G03F7/2041 , G03F7/327 , G03F7/40
摘要： The present invention provides a radiation-sensitive resin composition that contains a polymer having a structural unit that includes an acid-labile group; and an acid generator, wherein the acid generator includes a compound including a sulfonate anion having SO3−, wherein a hydrogen atom or an electron-donating group bonds to an α carbon atom with respect to SO3−, and an electron-withdrawing group bonds to a β carbon atom with respect to SO3−; and a radiation-degradable onium cation. The compound preferably has a group represented by the following formula (1-1) or (1-2). In the following formulae (1-1) and (1-2), R1 and R2 each independently represent a hydrogen atom or a monovalent electron-donating group. R3 represent a monovalent electron-withdrawing group. R4 represents a hydrogen atom or a monovalent hydrocarbon group.
摘要翻译：本发明提供了含有具有包含酸不稳定基团的结构单元的聚合物的辐射敏感性树脂组合物，和酸发生剂，其中酸产生剂包括包含具有SO 3 - 的磺酸根阴离子的化合物，其中氢原子或给电子基团相对于SO 3键与α碳原子键合，并且吸电子基团与一个碳原子相对于SO3-; 和辐射可降解的鎓阳离子。该化合物优选具有下式（1-1）或（1-2）表示的基团。在下式（1-1）和（1-2）中，R 1和R 2各自独立地表示氢原子或一价给电子基团。 R3表示一价吸电子基团。 R4表示氢原子或一价烃基。

9. 发明授权

US08741544B2 Salt, photoresist composition and method for producing photoresist pattern 有权
标题翻译：盐，光致抗蚀剂组合物和制造光致抗蚀剂图案的方法
公开(公告)号：US08741544B2
公开(公告)日：2014-06-03
申请号：US13589852
申请日：2012-08-20
申请人： Isao Yoshida , Yuichi Mukai , Koji Ichikawa
发明人： Isao Yoshida , Yuichi Mukai , Koji Ichikawa
IPC分类号： G03F7/00 , C07C317/06 , C07C309/19 , C07C309/07
CPC分类号： C07C381/12 , C07C309/06 , C07C309/10 , C07C309/12 , C07C309/17 , C07C2601/14 , C07C2603/74 , C07D307/00 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/2041
摘要： A photoresist composition containing a resin that is hardly soluble or insoluble, but which is soluble in an aqueous alkali solution by action of an acid, and a salt represented by formula (I): wherein Q1, Q2, L1, W1, W2, R1, R2, t1 and t2 are defined in the specification, and Z+ represents an organic cation.
摘要翻译：含有难溶性或不溶性但通过酸作用而溶于碱性水溶液的树脂的光致抗蚀剂组合物和式（I）表示的盐：其中Q1，Q2，L1，W1，W2，R1 在说明书中定义了R2，t1和t2，Z +表示有机阳离子。

10. 发明申请

US20130164675A1 ACRYLIC ESTER DERIVATIVE, HIGH-MOLECULAR COMPOUND AND PHOTORESIST COMPOSITION 有权
标题翻译：丙烯酸酯衍生物，高分子化合物和光催化剂组合物
公开(公告)号：US20130164675A1
公开(公告)日：2013-06-27
申请号：US13820855
申请日：2011-09-02
申请人： Osamu Nakayama , Manabu Yada
发明人： Osamu Nakayama , Manabu Yada
IPC分类号： G03F7/004
CPC分类号： G03F7/004 , C07D209/56 , C07D307/00 , C07D327/04 , C07D493/08 , C07D497/18 , C08F220/28 , C08F220/36 , C08F2220/1833 , G03F7/0397
摘要： The invention provides a novel acrylic ester derivative which can form a structural unit of a polymer to be incorporated into a photoresist composition; a polymer produced through polymerization of a raw material containing the acrylic ester derivative; and a photoresist composition which contains the polymer and which, as compared with the case of conventional ones, realizes formation of a high-resolution resist pattern having improved LWR. Specifically, the present invention provides, for example, an acrylic ester derivative represented by the following formula (1): wherein R1 represents a hydrogen atom, a methyl group, or a trifluoromethyl group; each of R2, R3, R5, R7, R8, and R10 represents a hydrogen atom, an alkyl group, a cycloalkyl group, or an alkoxy group; each of R4 and R6 represents a hydrogen atom, an alkyl group, a cycloalkyl group, or an alkoxy group, or R4 and R6 are linked together to form an alkylene group, —O—, or —S—; R9 represents a hydrogen atom, an alkyl group, a cycloalkyl group, an alkoxy group, or —COOR11; R11 represents an alkyl group; X represents —O— or >N—R12; R12 represents a hydrogen atom or an alkyl group; Y represents >C═O or >S(═O)n; n is an integer of 0 to 2; and the wavy lines represent that either R8 or R9 may be in an endo or exo position.
摘要翻译：本发明提供了一种新型的丙烯酸酯衍生物，其可形成待掺入光致抗蚀剂组合物中的聚合物的结构单元; 通过含有丙烯酸酯衍生物的原料的聚合制备的聚合物; 和含有聚合物的光致抗蚀剂组合物，与现有技术的情况相比，实现了具有改善的LWR的高分辨率抗蚀剂图案的形成。具体地说，本发明提供例如由下式（1）表示的丙烯酸酯衍生物：其中R1表示氢原子，甲基或三氟甲基; R 2，R 3，R 5，R 7，R 8和R 10各自表示氢原子，烷基，环烷基或烷氧基; R4和R6各自表示氢原子，烷基，环烷基或烷氧基，或R4和R6连接在一起形成亚烷基，-O-或-S-; R9表示氢原子，烷基，环烷基，烷氧基或-COOR11; R11表示烷基; X表示-O-或> N-R12; R12表示氢原子或烷基; Y表示> C = O或> S（= O）n; n为0〜2的整数，并且波浪线表示R8或R9可以处于内部或外部位置。

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