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    • 5. 发明授权
    • Systems and methods for controlled wedge spacing in a storage device
    • 存储设备中控制楔形间距的系统和方法
    • US08780476B2
    • 2014-07-15
    • US13242983
    • 2011-09-23
    • Jeffrey P. Grundvig
    • Jeffrey P. Grundvig
    • G11B5/09
    • G11B20/1403G11B5/5965G11B20/10222
    • Various embodiments of the present invention provide systems and methods for data processing. For example, some embodiments of the present invention provide clock generation systems that include: a first clock multiplier circuit, a second clock multiplier circuit, a modulus accumulator circuit, and a data clock phase control circuit. The first clock multiplier circuit is operable to multiply a reference clock by a first multiplier to yield a first domain clock, and the second clock multiplier circuit is operable to multiply the reference clock by a second multiplier to yield a second domain clock. The modulus accumulator circuit is operable to yield a value indicating a fractional amount of the second domain clock that an edge of the second domain clock is offset from a trigger signal. The data clock phase control circuit is operable to phase shift the second domain clock by a phase amount corresponding to the fractional amount.
    • 本发明的各种实施例提供了用于数据处理的系统和方法。 例如,本发明的一些实施例提供了时钟产生系统,其包括:第一时钟乘法器电路,第二时钟乘法器电路,模数累加器电路和数据时钟相位控制电路。 第一时钟乘法器电路可操作以将参考时钟乘以第一乘法器以产生第一域时钟,并且第二时钟乘法器电路可操作以将参考时钟乘以第二乘法器以产生第二域时钟。 模数累加器电路可操作以产生指示第二域时钟的边缘与触发信号偏移的第二域时钟的分数量的值。 数据时钟相位控制电路可操作以将第二域时钟相移相应于分数量的相位量。
    • 10. 发明申请
    • METHOD OF AND SYSTEM FOR ELECTON BEAM LITHOGRAPHY OF MICRO-PATTERN AND DISC SUBSTRATE HAVING MICRO-PATTERN TO BE TRANSFERRED
    • 具有要转移的微图案的微图案和盘基底的电子束光刻方法和系统
    • US20090123870A1
    • 2009-05-14
    • US12269912
    • 2008-11-13
    • Toshihiro USAKazunori Komatsu
    • Toshihiro USAKazunori Komatsu
    • G03F7/20G11B5/82G21K5/04
    • G11B5/82B82Y10/00B82Y40/00G11B5/5965G11B5/59688G11B5/743G11B9/10H01J37/3174H01J2237/20
    • An electron beam lithographic method and system for forming a micro-pattern, including servo patterns each of which comprises a plurality of recessed servo elements in a track and groove patterns each of which comprises an inter-track groove extending along the track and to be formed on a discrete track medium, on the a resist coated disc substrate by scanning the resist-coated surface with an electron beam during rotation of the disc substrate. A sequential process of the electron beam lithography comprises the steps of forming the servo elements as an latent image in the resist-coated surface with an electron beam having an irradiation spot diameter smaller than a width of the servo element during rotation of the disc substrate and, subsequently, forming the inter-track grooves in a latent image in the resist-coated surface by intermittently scanning the resist-coated surface in a direction perpendicular to a track direction at regular intervals during rotation of the disc substrate so as thereby to form a continuous row of groove elements into which the inter-track groove is divided.
    • 一种用于形成微图案的电子束光刻方法和系统,包括伺服图案,每个伺服图案包括轨道和凹槽图案中的多个凹陷的伺服元件,每个凹槽的伺服元件包括沿着轨道延伸并形成的轨道间槽 在离散的轨道介质上,通过在盘基片旋转期间用电子束扫描抗蚀剂涂覆的表面,在抗蚀剂涂覆的盘基片上。 电子束光刻的顺序过程包括以下步骤:在光刻胶涂覆表面中形成具有照射光点直径小于光盘基片旋转期间的光阑直径的电子束的潜像的伺服元件,以及 随后,通过在盘基板的旋转期间以规则的间隔在垂直于轨道方向的方向间歇地扫描抗蚀剂涂覆表面,在抗蚀剂涂覆的表面中形成潜像中的轨道间凹槽,从而形成 连续排的槽元件,分隔槽间槽。