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    • 8. 发明授权
    • ESD protection device and method for producing the same
    • ESD保护装置及其制造方法
    • US09368253B2
    • 2016-06-14
    • US14206339
    • 2014-03-12
    • Murata Manufacturing Co., Ltd.
    • Takahiro SumiJun AdachiTakayuki Tsukizawa
    • H02H1/00H01B3/08H01T1/20H01T4/12H01T21/00H01B19/04H02H9/04H05K9/00H05F3/04H05K1/02
    • H01B3/08H01B19/04H01T1/20H01T4/12H01T21/00H02H9/04H05F3/04H05K1/0259H05K9/0079
    • An ESD protection device having high insulation reliability and good discharge properties is provided. In producing an ESD protection device that includes a first discharge electrode and a second discharge electrode arranged to oppose each other, a discharge supporting electrode formed so as to span between the first and second discharge electrodes, and an insulator substrate that retains the first and second discharge electrodes and the discharge supporting electrode, a paste for forming a discharge supporting electrode is used and this paste contains, in addition to a powder of an alkali metal compound and/or an alkaline earth metal compound, a metal powder with a network-forming oxide adhered to particle surfaces, a metal powder and a semiconductor powder with a network-forming oxide adhered to particle surfaces, or a metal powder with a network-forming oxide adhered to particle surfaces and a semiconductor powder with a network-forming oxide adhered to particle surfaces.
    • 提供具有高绝缘可靠性和良好放电特性的ESD保护装置。 在制造包括第一放电电极和彼此相对布置的第二放电电极的ESD保护装置时,形成为跨越第一和第二放电电极的放电支撑电极和保持第一和第二放电电极的绝缘体基板 放电电极和放电支持电极,使用用于形成放电支撑电极的糊料,并且该糊料除了含有碱金属化合物和/或碱土金属化合物的粉末之外还含有具有网络形成的金属粉末 氧化物附着于颗粒表面,金属粉末和附着于颗粒表面的网络形成氧化物的半导体粉末或附着于颗粒表面的网络形成氧化物的金属粉末和附着有网络形成氧化物的半导体粉末 颗粒表面。
    • 10. 发明申请
    • PROCESSING APPARATUS AND PROCESSING METHOD
    • 加工设备和加工方法
    • US20160125980A1
    • 2016-05-05
    • US14927887
    • 2015-10-30
    • Kabushiki Kaisha Toshiba
    • Hideaki HirabayashiYuji Nagashima
    • H01B19/04
    • H01B19/04
    • According to one embodiment, a processing apparatus includes a container, a processor, a supply unit, a recovery unit, a calculator, and a replenishing liquid supply unit. The container contains buffered hydrogen fluoride. The processor performs processing of a processing object using the buffered hydrogen fluoride. The supply unit supplies the buffered hydrogen fluoride to the processor. The buffered hydrogen fluoride is contained in the container. The recovery unit recovers the buffered hydrogen fluoride used in the processor and supplies the recovered buffered hydrogen fluoride to the container. The calculator calculates an evaporation amount of the buffered hydrogen fluoride. The replenishing liquid supply unit supplies the same amount of a replenishing liquid as the calculated evaporation amount of the buffered hydrogen fluoride to the buffered hydrogen fluoride. The replenishing liquid includes ammonia and water.
    • 根据一个实施例,处理设备包括容器,处理器,供应单元,恢复单元,计算器和补充液供应单元。 容器中含有缓冲氟化氢。 处理器使用缓冲的氟化氢来处理处理对象。 供应单元将缓冲的氟化氢供应到处理器。 缓冲的氟化氢包含在容器中。 回收单元回收处理器中使用的缓冲氟化氢,并将回收的缓冲氟化氢供应到容器中。 计算器计算缓冲氟化氢的蒸发量。 补充液体供应单元将缓冲氟化氢的计算蒸发量的相同量的补充液体提供给缓冲氟化氢。 补充液体包括氨和水。