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    • 6. 发明申请
    • PROCESS FOR TRANSFERRING LAYERS
    • 传送层的过程
    • US20160141198A1
    • 2016-05-19
    • US14938492
    • 2015-11-11
    • Soitec
    • Marcel Broekaart
    • H01L21/683
    • H01L21/6835H01L21/02002H01L21/185H01L21/7806H01L2221/68313H01L2221/68327H01L2221/6834H01L2221/68363
    • The invention relates to a process for transferring an active layer to a final substrate using a temporary substrate, the active layer comprises a first side having a three-dimensional surface topology, the process comprising: a first step of bonding the first side of the active layer to one side of the temporary substrate; a second step of bonding a second side of the active layer to the final substrate; and a third step of separating the active layer and the temporary substrate; the process being characterized in that the side of the temporary substrate possesses a surface topology complementary to the surface topology of the first side of the active layer, so that the surface topology of the temporary substrate encapsulates the surface topology of the first side of the active layer in the bonding first step.
    • 本发明涉及一种使用临时衬底将活性层转移到最终衬底的方法,所述活性层包括具有三维表面拓扑结构的第一侧,所述方法包括:将活性物质的第一面接合的第一步骤 层到临时衬底的一侧; 将有源层的第二面接合到最终基板的第二步骤; 以及分离有源层和临时衬底的第三步骤; 该方法的特征在于,临时衬底的侧面具有与有源层的第一侧的表面拓扑互补的表面拓扑,使得临时衬底的表面拓扑封装有源层的第一侧的表面拓扑结构 接合第一步中的层。
    • 9. 发明授权
    • Method of manufacturing a semiconductor device and substrate carrier structure
    • 制造半导体器件和衬底载体结构的方法
    • US08216919B2
    • 2012-07-10
    • US13009673
    • 2011-01-19
    • Yuichi Kaneko
    • Yuichi Kaneko
    • H01L21/263
    • H01L21/6835H01L2221/68313H01L2221/6835
    • A substrate carrier structure includes a tray and a secondary electron absorbing material. The tray holds a semiconductor substrate having a first surface on which semiconductor device elements are formed. The secondary electron absorbing material is interposed between the tray and this first surface of the semiconductor substrate. When the semiconductor substrate is irradiated with charged particles to form lattice defects, the secondary electron absorbing material prevents unwanted trapping of secondary electrons emitted from the tray, and thereby reduces the variability of electrical characteristics of semiconductor device elements formed on the semiconductor substrate.
    • 衬底载体结构包括托盘和二次电子吸收材料。 托盘保持具有形成半导体器件元件的第一表面的半导体衬底。 二次电子吸收材料介于托盘和半导体衬底的第一表面之间。 当半导体衬底被带电粒子照射以形成晶格缺陷时,二次电子吸收材料防止从托盘发射的二次电子的不期望的捕获,从而减少形成在半导体衬底上的半导体器件元件的电特性的变化。
    • 10. 发明授权
    • Device and method for processing carrier tape
    • 载带处理装置及方法
    • US08118584B2
    • 2012-02-21
    • US10519207
    • 2003-06-23
    • Noriaki YukawaHiroshi Otsuka
    • Noriaki YukawaHiroshi Otsuka
    • B29C59/02
    • B29C51/18B29C51/261B29C2793/0018B29C2793/0036B65B15/04B65B47/04H01L21/6835H01L2221/68313Y10T156/1023Y10T428/24678
    • A carrier tape forming apparatus includes a tape paying-out unit for paying out a tape to be worked, a tape feeding unit for feeding the tape, a forming unit for effecting embossing on the tape, a perforating unit for perforating at least a feeding hole in the tape, and a tape taking-up unit for taking up the finished (embossed) tape thereabout. The apparatus includes also double-acting driving units provided as driving sources at least for the tape feeding unit, the forming unit and the tape taking-up unit, each driving unit being fluid-operated and movable along a straight path and a controller for independently controlling driving/stopping of the double-acting driving units for the forming unit and the tape taking-up unit in association with driving/stopping of said double-acting driving unit for the feeding unit.
    • 载带形成装置包括用于支付待加工的带的带子支付单元,用于馈送带的带馈送单元,用于在带上进行压花的成形单元,用于对至少一个进给孔进行穿孔的穿孔单元 在胶带中,以及用于在其上卷取成品(压花)胶带的胶带卷取单元。 该装置还包括至少用于带馈送单元,成形单元和带卷取单元作为驱动源设置的双作用驱动单元,每个驱动单元被流体操作并且可沿着直线路径移动,并且用于独立地控制器 与用于进给单元的所述双作用驱动单元的驱动/停止相关联地控制用于成形单元和带卷取单元的双作用驱动单元的驱动/停止。