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1. 发明授权

US07125588B2 Pulsed plasma CVD method for forming a film 失效
标题翻译：用于形成膜的脉冲等离子体CVD方法
公开(公告)号：US07125588B2
公开(公告)日：2006-10-24
申请号：US10728987
申请日：2003-12-08
申请人： Akiharu Miyanaga , Tohru Inoue , Shunpei Yamazaki
发明人： Akiharu Miyanaga , Tohru Inoue , Shunpei Yamazaki
IPC分类号： H05H1/30
CPC分类号： C23C16/26 , C23C16/515 , C23C16/517 , H01J37/32192 , H01J37/32266 , H01J37/32678 , Y10S427/103 , Y10S427/104
摘要： A method of forming an insulating ceramic film or a metallic film by a plasma CVD process in which a high density plasma is generated in the presence of a magnetic field wherein the electric power for generating the plasma has a pulsed waveform. The electric power typically is supplied by microwave, and the pulsed wave may be a complex wave having a two-step peak, or may be a complex wave obtained by complexing a pulsed wave with a stationary continuous wave.
摘要翻译：通过等离子体CVD法形成绝缘陶瓷膜或金属膜的方法，其中在存在用于产生等离子体的电力具有脉冲波形的磁场的情况下产生高密度等离子体。电力通常由微波提供，并且脉冲波可以是具有两步峰值的复波，或者可以是通过使脉冲波与静止连续波相互合成而获得的复波。

2. 发明申请

US20050106331A1 Plasma processing apparatus and method 审中-公开
标题翻译：等离子体处理装置及方法
公开(公告)号：US20050106331A1
公开(公告)日：2005-05-19
申请号：US11022812
申请日：2004-12-28
申请人： Naoki Hirose , Takashi Inujima , Toru Takayama
发明人： Naoki Hirose , Takashi Inujima , Toru Takayama
IPC分类号： H01L21/205 , C23C16/26 , C23C16/27 , C23C16/34 , C23C16/42 , C23C16/50 , C23C16/511 , C23F4/00 , H01J37/32 , H01L21/302 , H01L21/3065 , H05H1/46
CPC分类号： H01J37/32192 , C23C16/511 , H01J37/32623 , H01J37/32678 , Y10S427/104
摘要： A plasma processing apparatus and method is equipped with a vacuum chamber, helmholtz coils, a microwave generator and gas feeding systems. An auxiliary magnet is further provided in order to strengthen the magnetic field in the vacuum chamber to produce centrifugal drifting force which confine the plasma gas about the center position of the vacuum chamber.
摘要翻译：等离子体处理装置和方法配备有真空室，亥姆霍兹线圈，微波发生器和气体馈送系统。进一步提供辅助磁体以加强真空室中的磁场，以产生围绕真空室的中心位置限制等离子体气体的离心漂移力。

3. 发明授权

US06838126B2 Method for forming I-carbon film 失效
标题翻译：形成I-碳膜的方法
公开(公告)号：US06838126B2
公开(公告)日：2005-01-04
申请号：US10189422
申请日：2002-07-08
申请人： Naoki Hirose , Takashi Inujima , Toru Takayama
发明人： Naoki Hirose , Takashi Inujima , Toru Takayama
IPC分类号： H01L21/205 , C23C16/26 , C23C16/27 , C23C16/34 , C23C16/42 , C23C16/50 , C23C16/511 , C23F4/00 , H01J37/32 , H01L21/302 , H01L21/3065 , H05H1/24
CPC分类号： H01J37/32192 , C23C16/511 , H01J37/32623 , H01J37/32678 , Y10S427/104
摘要： A film comprising an i-carbon is formed by converting a reactive gas containing a carbon compound gas into plasma by a resonance using a microwave and a magnetic field.
摘要翻译：通过使用微波和磁场的共振将含有碳化合物气体的反应气体转化为等离子体来形成包含i-碳的膜。

4. 发明申请

US20040115365A1 Method for forming a film 失效
标题翻译：膜形成方法
公开(公告)号：US20040115365A1
公开(公告)日：2004-06-17
申请号：US10728987
申请日：2003-12-08
申请人： Semiconductor Energy Laboratory Co., Ltd.
发明人： Akiharu Miyanaga , Tohru Inoue , Shunpei Yamazaki
IPC分类号： H05H001/02
CPC分类号： C23C16/26 , C23C16/515 , C23C16/517 , H01J37/32192 , H01J37/32266 , H01J37/32678 , Y10S427/103 , Y10S427/104
摘要： A method for forming a film by a plasma CVD process in which a high density plasma is generated in the presence of a magnetic field is described, characterized by that the electric power for generating the plasma has a pulsed waveform. The electric power typically is supplied by microwave, and the pulsed wave may be a complex wave having a two-step peak, or may be a complex wave obtained by complexing a pulsed wave with a stationary continuous wave of an electromagnetic wave having the same or different wavelength as that of the pulsed wave. The process enables deposition of a uniform film having an excellent adhesion to the-substrate, at a reduced power consumption.
摘要翻译：描述了通过在存在磁场的情况下产生高密度等离子体的等离子体CVD工艺形成膜的方法，其特征在于用于产生等离子体的电力具有脉冲波形。电力通常由微波提供，并且脉冲波可以是具有两级峰值的复合波，或者可以是通过将脉冲波与具有相同的电磁波的静止连续波相结合而获得的复合波，波长与脉冲波的不同。该方法能够以降低的功耗沉积具有优异粘合性的均匀的膜。

5. 发明授权

US06572935B1 Optically transparent, scratch-resistant, diamond-like carbon coatings 失效
标题翻译：光学透明，耐刮擦，类金刚石碳涂层
公开(公告)号：US06572935B1
公开(公告)日：2003-06-03
申请号：US09428269
申请日：1999-10-27
申请人： Xiao-Ming He , Deok-Hyung Lee , Michael A. Nastasi , Kevin C. Walter , Michel G. Tuszewski
发明人： Xiao-Ming He , Deok-Hyung Lee , Michael A. Nastasi , Kevin C. Walter , Michel G. Tuszewski
IPC分类号： C23C1627
CPC分类号： C23C16/26 , H01J37/32412 , Y10S427/103 , Y10S427/104
摘要： A plasma-based method for the deposition of diamond-like carbon (DLC) coatings is described. The process uses a radio-frequency inductively coupled discharge to generate a plasma at relatively low gas pressures. The deposition process is environmentally friendly and scaleable to large areas, and components that have geometrically complicated surfaces can be processed. The method has been used to deposit adherent 100-400 nm thick DLC coatings on metals, glass, and polymers. These coatings are between three and four times harder than steel and are therefore scratch resistant, and transparent to visible light. Boron and silicon doping of the DLC coatings have produced coatings having improved optical properties and lower coating stress levels, but with slightly lower hardness.
摘要翻译：描述了用于沉积类金刚石（DLC）涂层的基于等离子体的方法。该过程使用射频感应耦合放电在相对低的气体压力下产生等离子体。沉积工艺对于大面积的环境友好和可扩展，并且可以处理具有几何复杂表面的部件。该方法已用于在金属，玻璃和聚合物上沉积100-400nm厚的DLC涂层。这些涂层比钢硬三至四倍，因此具有耐划伤性，对可见光透明。 DLC涂层的硼和硅掺杂已经产生具有改善的光学性能和较低涂层应力水平但具有稍低的硬度的涂层。

6. 发明申请

US20030021910A1 Plasma processing apparatus and method 失效
标题翻译：等离子体处理装置及方法
公开(公告)号：US20030021910A1
公开(公告)日：2003-01-30
申请号：US10189422
申请日：2002-07-08
申请人： Semiconductor Energy Laboratory Co., Ltd.
发明人： Naoki Hirose , Takashi Inujima , Toru Takayama
IPC分类号： C23C016/00 , C23C016/26
CPC分类号： H01J37/32192 , C23C16/511 , H01J37/32623 , H01J37/32678 , Y10S427/104
摘要： A plasma processing apparatus and method is equipped with a vacuum chamber, helmholtz coils, a microwave generator and gas feeding systems. An auxiliary magnet is further provided in order to strengthen the magnetic field in the vacuum chamber to produce centrifugal drifting force which confine the plasma gas about the, center position of the vacuum chamber.
摘要翻译：等离子体处理装置和方法配备有真空室，亥姆霍兹线圈，微波发生器和气体馈送系统。还提供辅助磁体，以便加强真空室中的磁场，以产生围绕真空室的中心位置限制等离子体气体的离心漂移力。

7. 发明授权

US6131533A Jig for forming hard carbon film over inner surface of guide bush using the jig 失效
标题翻译：夹具用于使用夹具在导套的内表面上形成硬质碳膜
公开(公告)号：US6131533A
公开(公告)日：2000-10-17
申请号：US910828
申请日：1997-08-15
申请人： Osamu Sugiyama , Yukio Miya , Ryota Koike , Takashi Toida , Toshiichi Sekine
发明人： Osamu Sugiyama , Yukio Miya , Ryota Koike , Takashi Toida , Toshiichi Sekine
IPC分类号： C23C16/02 , C23C16/04 , C23C16/26 , C23C16/503 , C23C16/509 , C23C16/00
CPC分类号： C23C16/0281 , C23C16/045 , C23C16/26 , C23C16/503 , C23C16/509 , Y10S279/906 , Y10S427/104 , Y10T279/17231 , Y10T279/18 , Y10T279/29 , Y10T82/2518 , Y10T82/2521
摘要： A hard carbon film is formed over an inner surface of a guide bush by fixing an auxiliary electrode support member for supporting an auxiliary electrode of a jig for forming a film in a center bore of the guide bush by an auxiliary electrode insulation member, disposing an auxiliary electrode in alignment with the axis of the center bore so as to face the inner surface, disposing legs, and a first electrode plate, a second electrode plate, and the insulation member which are fixed to the legs are placed on the bottom of a vacuum vessel placing the guide bush on the first electrode plate contacted electrically with a power source, while the projection of the auxiliary electrode support member projecting out of the auxiliary electrode insulation member is contacted electrically with the second electrode plate. The auxiliary electrode is grounded through the auxiliary electrode support member, the second electrode plate, the legs, and the vacuum vessel, a gas containing carbon is introduced into the vacuum vessel after evacuating the vacuum vessel, and a plasma is produced in the vacuum vessel by supplying electric power to the guide bush through the first electrode plate from the power source.
摘要翻译：通过辅助电极绝缘部件固定辅助电极支撑部件，该辅助电极支撑部件通过固定在辅助电极绝缘部件的引导衬套的中心孔中形成膜的夹具的辅助电极而形成在硬质碳膜的内表面上，辅助电极与中心孔的轴线对准，以面对内表面，设置腿，以及固定到腿部的第一电极板，第二电极板和绝缘构件放置在底部上真空容器将引导衬套放置在与电源电接触的第一电极板上，而从辅助电极绝缘构件突出的辅助电极支撑构件的突起与第二电极板电接触。辅助电极通过辅助电极支撑构件，第二电极板，支腿和真空容器接地，抽空真空容器后，将含碳气体引入真空容器中，并在真空容器中产生等离子体通过第一电极板从电源向引导衬套提供电力。

8. 发明授权

US6077572A Method of coating edges with diamond-like carbon 失效
标题翻译：用金刚石碳覆盖边缘的方法
公开(公告)号：US6077572A
公开(公告)日：2000-06-20
申请号：US878222
申请日：1997-06-18
申请人： Jeffrey A. Hopwood , David L. Pappas
发明人： Jeffrey A. Hopwood , David L. Pappas
IPC分类号： B43K1/00 , B26B21/60 , C23C16/26 , C23C16/27 , B05D3/06
CPC分类号： C23C16/26 , Y10S427/103 , Y10S427/104
摘要： A method of creating a diamond-like carbon film on a substrate, including the steps of exposing the substrate to a hydrocarbon gas environment and generating plasma in the environment of an electron density greater than approximately 5.times.10.sup.10 per cm.sup.3 and a sheath thickness less than about 2 mm under conditions of high ion flux and controlled, low energy ion bombardment.
摘要翻译：一种在衬底上形成类金刚石碳膜的方法，包括以下步骤：将基底暴露于烃气环境中，并在电子密度大于约5×10 10 / cm 3和小于约2的电子密度的环境中产生等离子体 mm在高离子通量和受控的低能离子轰击条件下。

9. 发明授权

US6037016A Capacitively coupled RF diamond-like-carbon reactor 失效
标题翻译：电容耦合RF金刚石样碳反应堆
公开(公告)号：US6037016A
公开(公告)日：2000-03-14
申请号：US77513
申请日：1998-05-29
申请人： David James Devlin , Don Mayo Coates , Thomas Arthur Archuleta , Robert Steven Barbero
发明人： David James Devlin , Don Mayo Coates , Thomas Arthur Archuleta , Robert Steven Barbero
IPC分类号： C23C16/26 , C23C16/27 , C23C16/50 , C23C16/505 , C23C16/54 , D06M10/02 , D06M10/06 , D06M11/74 , D06M101/36 , B05D3/06 , C23C16/00
CPC分类号： D06M11/74 , C23C16/26 , C23C16/545 , D06M10/025 , D06M10/06 , D06M2101/36 , Y10S427/104
摘要： A process of coating a non-conductive fiber with diamond-like carbon, including passing a non-conductive fiber between a pair of parallel metal grids within a reaction chamber, introducing a hydrocarbon gas into the reaction chamber, forming a plasma within the reaction chamber for a sufficient period of time whereby diamond-like carbon is formed upon the non-conductive fiber, is provided together with a reactor chamber for deposition of diamond-like carbon upon a non-conductive fiber, including a vacuum chamber, a cathode assembly including a pair of electrically isolated opposingly parallel metal grids spaced apart at a distance of less than about 1 centimeter, an anode, a means of introducing a hydrocarbon gas into said vacuum chamber, and a means of generating a plasma within said vacuum chamber.
摘要翻译： PCT No.PCT / US96 / 18438 Sec。 371日期：1998年5月29日 102（e）日期1998年5月29日PCT 1996年11月18日PCT公布。公开号WO97 / 20981 日期：1997年6月12日一种用类金刚石碳涂覆非导电纤维的方法，包括使非导电纤维在反应室内的一对平行金属网之间通过，将烃气体引入反应室，形成在反应室内等离子体足够长的时间，其中在非导电纤维上形成类金刚石碳，与反应室一起设置，用于将金刚石状碳沉积在非导电纤维上，该非导电纤维包括真空室一个阴极组件，其包括一对间隔开的距离小于约1厘米的电隔离的相对平行的金属栅极，阳极，将烃气体引入所述真空室中的装置，以及在所述真空室内产生等离子体的装置真空室。

10. 发明授权

US6035375A Cache memory with an allocable micro-cache 失效
标题翻译：使用可分配的微缓存缓存内存
公开(公告)号：US6035375A
公开(公告)日：2000-03-07
申请号：US683579
申请日：1996-07-15
申请人： Moshe Yanai , Natan Vishlitzky , Bruno Alterescu , Daniel Castel
发明人： Moshe Yanai , Natan Vishlitzky , Bruno Alterescu , Daniel Castel
IPC分类号： G06F12/08 , G06F12/12
CPC分类号： G06F12/121 , G06F12/0862 , G06F12/123 , G06F12/0866 , G06F2212/502 , G06F2212/6026 , Y10S427/104
摘要： A cache management system and method monitors and controls the contents of cache memory coupled to at least one host and at least one data storage device. A cache indexer maintains a current index of data elements which are stored in cache memory. A sequential data access indicator, responsive to the cache index and to a user selectable sequential data access threshold, determines that a sequential data access is in progress for a given process and provides an indication of the same. The system and method allocate a micro-cache memory to any process performing a sequential data access. In response to the indication of a sequential data access in progress and to a user selectable maximum number of data elements to be prefetched, a data retrieval requestor requests retrieval of up to the selected maximum number of data elements from a data storage device. A user selectable number of sequential data elements determines when previously used micro-cache memory locations will be overwritten. A method of dynamically monitoring and adjusting cache management parameters is also presented.
摘要翻译：缓存管理系统和方法监视和控制耦合到至少一个主机和至少一个数据存储设备的高速缓冲存储器的内容。缓存索引器维护存储在高速缓存中的数据元素的当前索引。响应于高速缓存索引和用户可选择的顺序数据访问阈值的顺序数据访问指示器确定针对给定进程的顺序数据访问正在进行并且提供其指示。该系统和方法为执行顺序数据访问的任何进程分配一个微型缓存。响应于正在进行的顺序数据访问的指示和用户可选择的最大数量的要被预取的数据元素，数据检索请求者请求从数据存储设备检索多达所选择的最大数量的数据元素。用户可选数量的顺序数据元素确定先前使用的微高速缓冲存储器位置将被覆盖。还提出了一种动态监控和调整缓存管理参数的方法。

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