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1. 发明授权

US11548092B2 Surface texturing using energy pulses 有权
公开(公告)号：US11548092B2
公开(公告)日：2023-01-10
申请号：US16353119
申请日：2019-03-14
申请人： Medtronic, Inc.
发明人： Xiangnan He , David A. Ruben
IPC分类号： B23K26/0622 , B23K26/046 , B23K26/352 , B23K26/122 , B23K26/12 , B23K26/082 , A61N1/04
摘要： A system includes an energy source, a focusing system, and a controller. The energy source is configured to output energy pulses to the focusing system. A chamber surrounds at least a portion of a metallic substrate and contains a liquid in contact with a surface of the metallic substrate. The controller is configured to cause the energy source to output energy pulses and cause the focusing system to focus a focal volume of the energy pulses at or near the surface of the metallic substrate that is in contact with the liquid to create micro-scale or smaller surface texturing on the metallic substrate.

2. 发明申请

US20170291850A1 MICRO-HOLE ARRAY AND METHOD FOR MANUFACTURING SAME 审中-公开
公开(公告)号：US20170291850A1
公开(公告)日：2017-10-12
申请号：US15503492
申请日：2015-10-29
申请人： NIPPON ELECTRIC GLASS CO., LTD.
发明人： Masanori WADA , Toru HIRAO
IPC分类号： C03C23/00 , B23K26/122 , B23K26/00 , B23K26/382 , B23K26/402
CPC分类号： C03C23/0025 , B23K26/009 , B23K26/122 , B23K26/382 , B23K26/402 , B23K2103/54 , B32B3/266 , G02B6/36
摘要： Provided are a micro-hole array capable of accurately holding optical fibers or the like and a method for manufacturing a micro-hole array by which micro-holes having high shape accuracy can be formed. A micro-hole array has thirty or more through holes 3 formed per cm2 in a glass plate 2 with a thickness of 0.5 mm to 5 mm, both inclusive, the through holes 3 each having a cylindrical portion 5 having a cylindricity of 5% or less of a hole diameter d1 of the through hole 3.

3. 发明申请

US20160236296A1 Nanoparticle Manufacturing System 审中-公开
标题翻译：纳米颗粒制造系统
公开(公告)号：US20160236296A1
公开(公告)日：2016-08-18
申请号：US14621385
申请日：2015-02-13
申请人： Gold NanoTech Inc
发明人： SHAN-WEN TAN
IPC分类号： B23K26/122 , B23K26/12 , B23K26/00
CPC分类号： B22F9/04 , B22F2999/00 , B22F2202/01 , B22F3/003
摘要： The present invention provides a nanoparticle manufacturing system differing from conventional nanoparticle fabricating equipment. In this nanoparticle manufacturing system, a laser beam emitted from a laser source is directly guided to the surface of a target disposed in an ablation chamber through a light guide tube, such that the laser beam is prevented from being influenced by reflection and/or refraction effects occurring from the cooling liquid filled in the ablation chamber. Moreover, in this nanoparticle manufacturing system, a light guidance-out end of the light guide tube is controlled to be apart from the target surface by a specific distance (
摘要翻译：本发明提供了与常规纳米颗粒制造设备不同的纳米颗粒制造系统。在该纳米颗粒制造系统中，从激光源发射的激光束通过导光管直接引导到设置在消融室中的靶的表面，使得防止激光束受到反射和/或折射的影响从填充在消融室中的冷却液产生的效果。此外，在该纳米粒子制造系统中，导光管的导光端被控制为离开目标表面一定距离（<5mm）。因此，尽管由激光源提供的激光束是低功率激光束（<30mJ /脉冲），激光束能够通过激光烧蚀将目标有效地处理成多个纳米颗粒。

4. 发明申请

US20160167168A1 TOOL AND METHOD FOR REMOVING GAS HYDRATES FROM THE SURFACE OF SUBSEA OIL AND GAS EXPLORATION AND PRODUCTION EQUIPMENT THROUGH LASER RADIATION 审中-公开
标题翻译：通过激光辐射从后置油表面除去气体水合物和气体探测和生产设备的工具和方法
公开(公告)号：US20160167168A1
公开(公告)日：2016-06-16
申请号：US14436553
申请日：2013-10-18
申请人： Leone Pereira Masiero
发明人： Leone Pereira Masiero
IPC分类号： B23K26/122 , B23K26/046 , B23K26/00 , B23K26/36
CPC分类号： B23K26/122 , B08B7/0042 , B08B7/0071 , B08B9/023 , B23K26/046 , B23K26/1224 , B23K26/16 , B23K26/36 , B23K26/50 , E21B36/00 , E21B41/0007 , F17D1/05 , F17D3/16
摘要： A tool and related method for removing unwanted gas hydrates from the surface of equipment used in subsea exploration and production. The tool includes a main vessel and a power cable linked together by a connector. Inside the vessel a laser device is connected to an adjustable focus collimator by a cable, with the wavelength emitted by the laser being between 200 nm and 930 nm. When the radiation reaches the subsea exploration equipment it causes the heating thereof, which in turn heats the hydrate through conduction, breaking down the hydrate formation from the inside out. The front lid of the tools includes a window fitted with anti-reflection film that forms an interface between the vessel and the aqueous medium.
摘要翻译：用于从海底勘探和生产中使用的设备表面去除不需要的天然气水合物的工具和相关方法。该工具包括通过连接器连接在一起的主容器和电力电缆。在容器内部，激光装置通过电缆连接到可调节聚焦准直仪，激光发射的波长在200nm和930nm之间。当辐射到达海底勘探设备时，它会导致其加热，从而进一步通过传导加热水合物，从而将水合物形成从内向外分解。工具的前盖包括一个装有抗反射膜的窗口，该防反射膜在容器和水介质之间形成界面。

5. 发明授权

US11247932B2 Liquid-assisted laser micromachining systems and methods for processing transparent dielectrics and optical fiber components using same 有权
公开(公告)号：US11247932B2
公开(公告)日：2022-02-15
申请号：US16257853
申请日：2019-01-25
申请人： CORNING INCORPORATED
发明人： Jeffery Alan DeMeritt , Davide Domenico Fortusini , Andrey Kobyakov , David Mark Lance , Leonard Thomas Masters , Ulrich Wilhelm Heinz Neukirch , Alexander Mikhailovich Streltsov , James Scott Sutherland
IPC分类号： B23K26/38 , C03B33/08 , C03B33/02 , G02B6/36 , C03B33/04 , B23K26/384 , B23K26/00 , B23K26/06 , B23K26/40 , B23K26/122
摘要： The liquid-assisted micromachining methods include methods of processing a substrate made of a transparent dielectric material. A working surface of the substrate is placed in contact with a liquid-assist medium that comprises fluorine. A focused pulsed laser beam is directed through a first substrate surface and through the opposite working surface to form a focus spot in the liquid-assist medium. The focus spot is then moved over a motion path from its initial position in the liquid-assist medium through the substrate body in the general direction from the working surface to the first surface to create a modification of the transparent dielectric material that defines in the body a core portion. The core portion is removed to form the substrate feature, which can be a through or closed fiber hole that supports one or more optical fibers. Optical components formed using the processed substrate are also disclosed.

6. 发明授权

US09796047B2 Remote laser heating systems and methods 有权
公开(公告)号：US09796047B2
公开(公告)日：2017-10-24
申请号：US14768448
申请日：2014-02-25
申请人： Schlumberger Technology Corporation
发明人： Richard Saenger
IPC分类号： B23K26/122 , B23K26/21 , B23K26/12 , E21B43/11 , E21B43/119 , E21B47/12 , B23K26/211
CPC分类号： B23K26/122 , B23K26/1224 , B23K26/128 , B23K26/21 , B23K26/211 , E21B43/11 , E21B43/1195 , E21B47/123
摘要： Systems and methods are provided for laser heating in a fluid environment (30). Such a system may include a laser generator (12) and a laser output sub (16) separate from one another via an optical fiber (18). The laser generator may generate a heating laser pulse over the optical fiber. The laser output sub may emit the heating laser pulse to heat a substrate (22) in the fluid environment (30). To enable the heating laser pulse to pass between the laser output sub (16) and the substrate (22), the laser output sub may dispense a laser-transmissive optical grease or a laser-transmissive magnetic fluid, or may generate a vacuum cavitation bubble in the fluid between the laser output sub (16) and the substrate (22).

7. 发明授权

US09768016B2 Formation of heteroepitaxial layers with rapid thermal processing to remove lattice dislocations 有权
公开(公告)号：US09768016B2
公开(公告)日：2017-09-19
申请号：US14899552
申请日：2014-06-25
申请人： Ultratech, Inc.
发明人： Andrew M. Hawryluk , Ganesh Sundaram , Ritwik Bhatia
IPC分类号： H01L21/20 , H01L21/36 , H01L21/04 , H01L21/02 , B23K26/03 , B23K26/073 , B23K26/122 , B23K26/12 , C23C16/22 , C23C16/56 , H01L21/268 , H01L21/324 , H01L29/20 , B23K103/00
CPC分类号： H01L21/0262 , B23K26/034 , B23K26/0738 , B23K26/122 , B23K26/1224 , B23K2103/56 , C23C16/22 , C23C16/56 , H01L21/02381 , H01L21/02433 , H01L21/02458 , H01L21/0254 , H01L21/02598 , H01L21/02675 , H01L21/02694 , H01L21/268 , H01L21/3245 , H01L29/2003
摘要： Method and devices are disclosed for device manufacture of gallium nitride devices by growing a gallium nitride layer on a silicon substrate using Atomic Layer Deposition (ALD) followed by rapid thermal annealing. Gallium nitride is grown directly on silicon or on a barrier layer of aluminum nitride grown on the silicon substrate. One or both layers are thermally processed by rapid thermal annealing. Preferably the ALD process use a reaction temperature below 550° C. and preferable below 350° C. The rapid thermal annealing step raises the temperature of the coating surface to a temperature ranging from 550 to 1500° C. for less than 12 msec.

8. 发明授权

US09666432B2 Method and apparatus for forming device quality gallium nitride layers on silicon substrates 有权
公开(公告)号：US09666432B2
公开(公告)日：2017-05-30
申请号：US14909004
申请日：2014-09-17
申请人： Ultratech, Inc.
发明人： Ganesh Sundaram , Andrew M. Hawryluk , Daniel Stearns
IPC分类号： H01L29/15 , H01L31/0256 , H01L21/02 , C23C16/22 , H01L29/20 , H01L21/268 , B23K26/03 , B23K26/073 , B23K26/122 , C23C16/56 , H01L21/324 , B23K103/00
CPC分类号： H01L21/0262 , B23K26/034 , B23K26/0738 , B23K26/122 , B23K26/1224 , B23K2103/56 , C23C16/22 , C23C16/56 , H01L21/02381 , H01L21/02433 , H01L21/02458 , H01L21/0254 , H01L21/02598 , H01L21/02675 , H01L21/02694 , H01L21/268 , H01L21/3245 , H01L29/2003
摘要： Atomic Layer Deposition (ALD) is used for heteroepitaxial film growth at reaction temperatures ranging from 80-400° C. The substrate and film materials are preferably selected to take advantage of Domain Matched Epitaxy (DME). A laser annealing system is used to thermally anneal deposition layers after deposition by ALD. In preferred embodiments a silicon substrate is overlaid with an AIN nucleation layer and laser annealed. Thereafter a GaN device layers is applied over the AIN layer by an ALD process and then laser annealed. In a further example embodiment a transition layer is applied between the GaN device layer and the AIN nucleation layer. The transition layer comprises one or more different transition material layers each comprising a AlxGa1-x compound wherein the composition of the transition layer is continuously varied from AIN to GaN.

9. 发明授权

US09339891B2 Liquid phase laser ablation method and apparatus 有权
标题翻译：液相激光烧蚀方法及装置
公开(公告)号：US09339891B2
公开(公告)日：2016-05-17
申请号：US14000721
申请日：2012-02-13
申请人： Sanshiro Nagare
发明人： Sanshiro Nagare
IPC分类号： B23K26/122 , B82Y40/00 , B23K26/12 , B29C59/16 , B23K26/16 , B23K26/36 , B29C35/08
CPC分类号： B23K26/122 , B23K26/0622 , B23K26/0643 , B23K26/0648 , B23K26/082 , B23K26/1224 , B23K26/16 , B23K26/361 , B23K26/362 , B29C59/16 , B29C2035/0838 , B82Y40/00
摘要： A liquid phase laser ablation apparatus is provided, which includes a vessel for storing liquid in which a component to be atomized is arranged; a laser oscillating device for oscillating a laser light irradiated to the component through the liquid; a reflecting mirror configured to freely change an angle of incidence of the laser light with respect to a surface of the liquid; a focusing lens for focusing the laser light oscillated from the laser oscillating device; a cover body for covering an upper surface of the vessel; and a laser light introduction port provided on the cover body or a side surface of the vessel above the surface of the liquid. Accordingly, liquid will not adhere to optical components constituting the apparatus, there is little contamination and damage to the optical components, and laser ablation can occur in a continuous and stable manner for a long period of time.
摘要翻译：提供了一种液相激光烧蚀装置，其包括用于储存液体的容器，其中布置有被雾化的部件; 激光振荡装置，用于使通过所述液体照射到所述部件的激光振荡; 反射镜，被配置为自由地改变激光相对于液体的表面的入射角; 聚焦透镜，用于聚焦从激光振荡装置振荡的激光; 用于覆盖容器的上表面的盖体; 以及设置在所述盖体上的所述液体的表面上方的所述容器的侧面的激光导入口。因此，液体不会附着在构成装置的光学部件上，对光学部件的污染和损伤小，激光烧蚀可以长时间连续稳定地进行。

10. 发明授权

US11434570B2 Coating method of apatite using laser 有权
公开(公告)号：US11434570B2
公开(公告)日：2022-09-06
申请号：US17338110
申请日：2021-06-03
申请人： KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY
发明人： Hojeong Jeon , Seung Hoon Um , Jae Ho Park , Justin Jihong Chung , Hyunseon Seo , Hyung-Seop Han , Yu Chan Kim , Myoung-Ryul Ok , Hyun Kwang Seok
IPC分类号： C23C26/00 , B23K26/352 , B23K26/122 , C01B25/32
摘要： Provided is a method of forming an apatite coating, the method including immersing a substrate in an apatite-forming precursor solution including Ca2+ ions and PO43− ions, emitting a laser beam onto a surface of the substrate immersed in the precursor solution, and forming an apatite coating in a region exposed to the laser beam, wherein an output power of the laser beam is set within a range enabling the surface of the substrate to be melted.

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