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1. 发明授权

US11452855B2 Nipple areola complex stencil 有权
公开(公告)号：US11452855B2
公开(公告)日：2022-09-27
申请号：US17108706
申请日：2020-12-01
申请人： Mayo Foundation for Medical Education and Research
发明人： Alanna M. Rebecca , Solomon M. Azouz
IPC分类号： B41N1/24 , B41M1/12 , A61M37/00 , A61B5/00 , B41K1/32 , A61F2/52
摘要： Embodiments of the invention include a breast nipple areola complex tattoo stencil comprising first, second and third stencil sections. The first stencil section defines an areola area. The second stencil section defines a nipple area and tubercle areas. One or more registration elements on the first and/or second stencil sections enable registration of the second stencil section to the first stencil section. The third stencil section defines one or both of a nipple shading area and a nipple highlight area. One or more registration elements on the third and/or second stencil sections enable registration of the third stencil section to the second stencil section.

2. 发明授权

US11148453B2 High definition stencil 有权
公开(公告)号：US11148453B2
公开(公告)日：2021-10-19
申请号：US16676960
申请日：2019-11-07
申请人： The Boeing Company
发明人： William W. Kann , Minsu Kim , Niles Kinman
IPC分类号： B41F15/34 , B41F15/36 , B43L13/20 , B41N1/24 , B41C1/14 , B44D2/00 , B44D3/00 , B05C17/06 , B41M1/12
摘要： A stencil for use in stenciling complex symbols incorporates a stencil substrate employing a flexible material, having a plurality of symbols arranged thereon. A plurality of folding stiffeners are incorporated in the substrate, each stiffener being positioned to split symbols having stencil cutouts forming isolated elements within an interior of the symbol. The stiffeners are foldable about a vertex, to collapse into a raised position and bring together the split symbol, with the stiffeners supporting the isolated elements created by the cutouts and portions of the stencil cutouts forming the symbols that extend into coincident channels in the folding stiffeners, to bridge adjoining portions of said split characters.

3. 发明申请

US20210286911A1 PAINT DESIGN TEMPLATE PRODUCTION AND ASSOCIATED SYSTEMS AND METHODS 有权
公开(公告)号：US20210286911A1
公开(公告)日：2021-09-16
申请号：US16820490
申请日：2020-03-16
申请人： The Boeing Company
发明人： James Holliday , Ronald J. Steckman , William Joos , Andrew Figuracion , Jason Dill , Wayne Curtice, JR. , James Kotlik
IPC分类号： G06F30/12 , B41N1/24 , B05C17/06
摘要： Disclosed herein are a system and method for producing paint templates for painting a design on a target surface. The system includes a processor configured to generate a geo-file of paint template designs. The processor includes a design module configured to parse the design into a set of paint sub-designs and a template design module configured to generate the geo-file of paint template designs based on the set of paint sub-designs. The generated geo-file of paint template designs includes a paint template design that corresponds to a paint sub-design. The system further includes a plotter configured to produce a set of paint templates based on the geo-file of paint template designs. Each paint template design includes a set of alignment marks and each paint template is produced with a set of alignment apertures corresponding to the set of alignment marks.

4. 发明授权

US11049771B2 Semiconductor device and fingerprint identification device 有权
公开(公告)号：US11049771B2
公开(公告)日：2021-06-29
申请号：US16136792
申请日：2018-09-20
申请人： Vanguard International Semiconductor Corporation
发明人： Han-Liang Tseng , Hsin-Hui Lee , Hsueh-Jung Lin
IPC分类号： H01L21/77 , H01L27/146 , G02B27/30 , G02B5/20 , H01L21/02 , B41M1/12 , B41C1/14 , B41N1/24
摘要： A method for forming a semiconductor device is provided. The method includes providing a substrate, placing a first stencil having a first openwork pattern on the substrate, applying a first material onto the substrate through the first stencil, and removing the first stencil from the substrate. The first material includes a transparent material. The method also includes placing a second stencil having a second openwork pattern on the substrate, applying a second material onto the substrate through the second stencil, and removing the second stencil from the substrate. The second material includes a light-shielding material, and the second openwork pattern is different from the first openwork pattern.

5. 发明申请

US20200023633A1 METHOD OF PRODUCING A MULTILAYERED PRODUCT 审中-公开
公开(公告)号：US20200023633A1
公开(公告)日：2020-01-23
申请号：US16040713
申请日：2018-07-20
申请人： PROCRAFT DEVELOPMENT BV
发明人： Dirk Jan VAN HEIJNINGEN
IPC分类号： B41C1/14 , C09D5/00 , C09D183/04 , C09D11/107 , C09D11/101 , C09D11/037 , C09D11/0235 , C09J123/08 , C09J133/06 , C09J133/14 , C09J11/04 , B41N1/24
摘要： In embodiments, the present invention relates to a method of producing a multilayered printed item, comprising: (a) providing a coating of curable composition comprising a polymer powder, at least one plasticizer, and at least one monomer and/or oligomer, onto the substrate or a thereon previously applied layer or coating; (b) heating the curable coating composition to a temperature of about 70-120° C., to provide a gelled curable coating; (c) providing a coating of curable composition comprising a polymer powder, at least one plasticizer, and at least one monomer and/or oligomer, onto the previously applied layer or coating; (d) heating the other curable as above, to provide second gelled curable coating; (e) before crosslinking is performed, the multilayer-coated substrate formed is heated to a temperature of about 130-160° C.; and (f) crosslinking the heated multilayer-coated substrate, by irradiation and/or subjection to heat at a temperature of about 165-190° C.

6. 发明申请

US20190304837A1 SEMICONDUCTOR DEVICE AND METHOD FOR FORMING THE SAME 审中-公开
公开(公告)号：US20190304837A1
公开(公告)日：2019-10-03
申请号：US16136792
申请日：2018-09-20
申请人： Vanguard International Semiconductor Corporation
发明人： Han-Liang TSENG , Hsin-Hui LEE , Hsueh-Jung LIN
IPC分类号： H01L21/77 , G02B27/30 , H01L21/02 , B41M1/12 , B41N1/24 , G02B5/20
摘要： A method for forming a semiconductor device is provided. The method includes providing a substrate, placing a first stencil having a first openwork pattern on the substrate, applying a first material onto the substrate through the first stencil, and removing the first stencil from the substrate. The first material includes a transparent material. The method also includes placing a second stencil having a second openwork pattern on the substrate, applying a second material onto the substrate through the second stencil, and removing the second stencil from the substrate. The second material includes a light-shielding material, and the second openwork pattern is different from the first openwork pattern.

7. 发明授权

US10350879B2 Screen printing apparatus and methods 有权
公开(公告)号：US10350879B2
公开(公告)日：2019-07-16
申请号：US15500385
申请日：2015-07-31
申请人： CORNING INCORPORATED
发明人： Thomas Cutcher, Jr. , Christopher Paul Daigler , Christina Marie Laskowski , Kevin Ray Maslin
IPC分类号： B41F15/38 , B41F15/08 , B41F15/36 , B41M1/12 , B41M1/40 , B41F15/44 , B41F17/00 , B41N1/24
摘要： Disclosed herein are apparatuses for screen printing on a surface of a three-dimensional substrate comprising a substantially rigid, substantially planar frame having a perimeter defining a region within the perimeter having a given surface area; and a screen attached to the frame and extending across at least a portion of the surface area, wherein the screen comprises a first portion through which a liquid printing medium can pass onto a proximate three-dimensional substrate; and a second portion coated with an emulsion substantially preventing the liquid printing medium from passing through the second portion of the screen, wherein the screen has a fixed tension of less than about 20 N/cm. Methods and systems for screen printing on a surface of a three-dimensional substrate are also disclosed herein.

8. 发明授权

US10245823B2 Method for preparing a screen printing screen 有权
公开(公告)号：US10245823B2
公开(公告)日：2019-04-02
申请号：US15440391
申请日：2017-02-23
申请人： M&R Printing Equipment, Inc.
发明人： Andrew L. Oleson
IPC分类号： B41C1/14 , B41N1/24 , B41M1/12 , G03F1/00 , G03F7/12 , G03F7/20 , B41F15/34 , B41F15/10
摘要： A system or machine is disclosed which takes pre-stretched emulsion coated screens, digitally prints thereon and exposes them before further processing and use in a screen printing machine.

9. 发明申请

US20190084333A1 PRINTING METHOD, AND METHOD FOR MANUFACTURING SCREEN PRINTING PLATE 审中-公开
公开(公告)号：US20190084333A1
公开(公告)日：2019-03-21
申请号：US16133726
申请日：2018-09-18
申请人： MIMAKI ENGINEERING CO., LTD.
发明人： Masaru Ohnishi
IPC分类号： B41N1/24 , B41C1/14 , B41F15/36
摘要： A printing method that carries out printing using a mesh screen, which is a screen gauze including multiple holes, is provided. The printing method includes: a covering process of covering one surface of the mesh screen with a covering member; an entering process of entering the covering member to at least a middle of the hole from a side of the one surface with respect to the multiple holes of the mesh screen; a mask forming process of ejecting a mask forming liquid used to form a mask that covers one part of an other surface of the mesh screen from an ejection head, to form the mask; a peeling process of peeling the covering member from the mesh screen; and a print executing process of printing an image corresponding to a pattern of the mask on the medium using the mesh screen and the printing ink.

10. 发明授权

US10220645B2 Quick stencil kit 有权
公开(公告)号：US10220645B2
公开(公告)日：2019-03-05
申请号：US15982801
申请日：2018-05-17
申请人： Nikhil Gupta
发明人： Nikhil Gupta
IPC分类号： B65D71/00 , B41N1/24 , B65C5/02 , B65C11/02 , B41L13/02 , B44D2/00
摘要： A kit for creating stencils is provided, including a polymeric shell, multiple linear polymeric frames, multiple thermoplastic rubber polymeric alphanumeric stencil elements, a rolling ball marker, and a roll of markable web. The polymeric shell has a tray and a hingedly joined sealing top. The tray is generally rectangular with a peripheral sidewall and has a storage compartment each for the web roll, the stencil elements, the frames, and the marker. The sidewall adjacent the web roll compartment has an opening therethrough. The frames have an elongate central planar portion and a pair of parallel upraised crenellated sidewalls with stencil retention elements defined in the crenels. The frames also have mateable elements defined at each end to join the frames together. The stencil elements fit between the frame sidewalls and have elongate projections with stencil retention elements adapted to mate with the stencil retention elements defined in the frame crenels.

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