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1. 发明授权

US06639035B1 Polymer for chemical amplified photoresist compositions 失效
标题翻译：化学放大光致抗蚀剂组合物用聚合物
公开(公告)号：US06639035B1
公开(公告)日：2003-10-28
申请号：US10154799
申请日：2002-05-28
申请人： Chi-Sheng Chen , Yen-Cheng Li , Meng-Hsum Cheng
发明人： Chi-Sheng Chen , Yen-Cheng Li , Meng-Hsum Cheng
IPC分类号： C08F12400
CPC分类号： C08F220/30 , G03F7/0395 , G03F7/0397
摘要： The present invention discloses a polymer having a repeated unit of the formula (II), wherein R1 is H, haloalkyl group or C1-C4 alkyl group; R2 is hydroxyl group, C1-C8 alkoxy group or C1-C8 thioalkyl group; G is (CH2)n, O or S, wherein n is 0, 1, 2, 3 or 4; Rc is a lactone group; and m is 1, 2 or 3. The polymer of the present invention can be used to form the chemical amplified photoresist composition, which can then be applied to general lithography processes, and particularly to the lithography of ArF, KrF or the like light source, and exhibit excellent resolution, figures and photosensitivity.
摘要翻译：本发明公开了具有式（II）重复单元的聚合物，其中R 1是H，卤代烷基或C 1 -C 4烷基; R 2是羟基，C 1 -C 8烷氧基或C 1 -C 8硫代烷基; G是（CH 2）n，O或S，其中n是0,1,2,3或4; Rc是一个内酯基团; 并且m为1,2或3.本发明的聚合物可用于形成化学放大光致抗蚀剂组合物，其可以应用于一般的光刻工艺，特别是ArF，KrF等的光刻，并具有优异的分辨率，数字和光敏性。

2. 发明授权

US06699951B2 Monomer and polymer for photoresist, photoresist composition, and phosphor layer composition for color cathode ray tube 失效
标题翻译：用于彩色阴极射线管的光致抗蚀剂，光致抗蚀剂组合物和荧光粉层组合物的单体和聚合物
公开(公告)号：US06699951B2
公开(公告)日：2004-03-02
申请号：US10076317
申请日：2002-02-14
申请人： Beom-Wook Lee , Ik-Chul Lim , Seung-Joon Yoo
发明人： Beom-Wook Lee , Ik-Chul Lim , Seung-Joon Yoo
IPC分类号： C08F12400
CPC分类号： C07D319/06 , C07D317/24 , C08F224/00 , G03F7/0382
摘要： Disclosed are a monomer, a polymer for a photoresist, a photoresist composition and a phosphor layer for a cathode ray tube. The polymer has the formula 1: wherein:R1 is H or CH3, R2 is (R)&agr;(CH2)&bgr;R′ or (R)&agr;((CH2)mO)&ggr;R′, wherein R is CO, CO2, O, OCO or OCO2, R′ is O, CO2, or OCO2, &agr; is 0 or 1, &bgr; is 0 to 5, m is 1 or 2, and &ggr; is 1 to 5, R4, which combines an acetal compound and a vinyl compound, is a saturated or unsaturated C1-C5 alkyl, a C1-C5 ether, or a C1-C5 carbonyl; R5 is a saturated or unsaturated C1-C5 alkyl, a C1-C5 ether, or a C1-C5 carbonyl; R6 and R8 are identical or are each independently a single bond, (R)&agr;(CH2)&bgr;R′ or (R)&agr;((CH2) mO)&ggr;R′, wherein R is CO, CO2, O, OCO or OCO2, R′ is O, CO2, or OCO2, &agr; is 0 or 1, &bgr; is 0 to 5, m is 1 or 2, and &ggr; is 1 to 5; R7 is a hydroxyl group; R9 is a carboxyl group; a, b, and c each represent the mole ratio of its corresponding monomer, wherein a and b each have a value of 0 to 0.99, and c has a value of 0.01 to 0.3; and n represents the degree of polymerization of each polymer and has a value of at least 2.
摘要翻译：公开了单体，用于光致抗蚀剂的聚合物，光致抗蚀剂组合物和用于阴极射线管的荧光体层。聚合物具有式1：其中：R1是H或CH3，R2是（R）α（CH2）βR'或（R）α（（CH2）mO）γR'，其中R是CO，CO 2，O，OCO 或OCO 2，R'为O，CO 2或OCO 2，α为0或1，β为0至5，m为1或2，γ为1至5，将缩合化合物和乙烯基化合物结合的R4，是饱和或不饱和的C 1 -C 5烷基，C 1 -C 5醚或C 1 -C 5羰基; R5是饱和或不饱和的C1-C5烷基，C1-C5醚或C1-C5羰基; R6和R8相同或各自独立地为单键，（R）α（CH2）βR'或（R）α（（CH2）mO）γR'，其中R为CO，CO 2，O，OCO或OCO 2，R '是O，CO 2或OCO 2，α为0或1，β为0至5，m为1或2，γ为1至5; R7是羟基; R9是羧基; a，b和c各自表示其相应单体的摩尔比，其中a和b各自具有0至0.99的值，c的值为0.01至0.3; n表示各聚合物的聚合度，其值为2以上。

3. 发明授权

US06794473B2 Acrylic acid (salt) polymer, its production process and uses 有权
标题翻译：丙烯酸（盐）聚合物，其生产工艺和用途
公开(公告)号：US06794473B2
公开(公告)日：2004-09-21
申请号：US10126587
申请日：2002-04-22
申请人： Shigeru Yamaguchi , Tsuyoshi Hirata , Shorbu Shioji
发明人： Shigeru Yamaguchi , Tsuyoshi Hirata , Shorbu Shioji
IPC分类号： C08F12400
CPC分类号： C08F20/06
摘要： The present invention provides: an acrylic acid (salt) polymer, which has a low molecular weight and a narrow molecular weight distribution and can display excellent dispersibility, or which has a high molecular weight and a high water solubility; a production process that enables easy production of this polymer; and an acrylic acid (salt) polymer composition comprising this polymer. The acrylic acid (salt) polymer is an acrylic acid (salt) polymer of which not less than 1 weight % of the entirety is accounted for by an acrylic acid (salt) polymer having a specific terminal structure. In addition, the production process for an acrylic acid (salt) polymer comprises the step of carrying out polymerization of a monomer component including an acrylic acid (salt), wherein an acrylic acid (salt) having a furfural content of 200 to 400 weight ppm is used as at least a portion of the acrylic acid (salt) in an amount of not smaller than 10 weight % of the entire monomer component.
摘要翻译：本发明提供：具有低分子量和窄分子量分布且可显示优异分散性或具有高分子量和高水溶性的丙烯酸（盐）聚合物; 能够容易地生产该聚合物的制造方法; 和包含该聚合物的丙烯酸（盐）聚合物组合物。丙烯酸（盐）聚合物是丙烯酸（盐）聚合物，其不小于整体的1重量％由具有特定末端结构的丙烯酸（盐）聚合物占据。此外，丙烯酸（盐）聚合物的制备方法包括进行包含丙烯酸（盐）的单体组分的聚合的步骤，其中糠醛含量为200-400重量ppm的丙烯酸（盐）用作至少一部分丙烯酸（盐），其量不小于整个单体成分的10重量％。

4. 发明授权

US06545112B2 Process for producing &bgr;-butyrolactone homopolymer or copolymer 失效
标题翻译：生产β-丁内酯均聚物或共聚物的方法
公开(公告)号：US06545112B2
公开(公告)日：2003-04-08
申请号：US09233204
申请日：1999-01-19
申请人： Yoji Hori , Yoshiharu Gonda , Toshimitsu Hagiwara
发明人： Yoji Hori , Yoshiharu Gonda , Toshimitsu Hagiwara
IPC分类号： C08F12400
CPC分类号： C08G63/823 , C08G61/08 , C08G63/08
摘要： The object of the invention is to provides a process in which a high-molecular-weight &bgr;-butyrolactone homopolymer or copolymer being biodegradable, absorbable into the living body, useful as a functional polymeric material and superior in physical characteristics is produced with high yield and good productivity. This object is solved by a process for producing the homopolymer or copolymer of the invention, which comprises ring-opening polymerization of sole &bgr;-butyrolactone subjected previously to acid removal and dehydration treatment, or of said &bgr;-butyrolactone with other lactones, in the presence of a tin compound represented by the following formula (1) and/or formula (2): wherein R1 and R2 and R4 to R7 independently represent an alkyl group containing 1 to 12 carbon atoms which may have a branched chain, or a cycloalkyl group containing 5 to 7 carbon atoms, or a phenyl or naphthyl group which may have a substituent group, R3 represents an alkylene group containing 2 to 12 carbon atoms which may have a substituent group, a cyclopentane-1,2-ylene group or a cyclohexane-1,2-ylene group, and n is an integer of 1 to 10.
摘要翻译：本发明的目的是提供一种方法，其中生产可降解的可分解生物降解的高分子量β-丁内酯均聚物或共聚物可用作生物体，用作功能性聚合物材料并且具有优异的物理特性，其产率高，良好的生产力。该目的通过本发明的均聚物或共聚物的制备方法来解决，该方法包括先前进行酸去除和脱水处理的底部β-丁内酯或所述β-丁内酯与其它内酯的开环聚合，的由下式（1）和/或式（2）表示的锡化合物：其中R 1和R 2和R 4至R 7独立地表示可以具有支链的含有1至12个碳原子的烷基或环烷基或者可以具有取代基的苯基或萘基，R3表示可以具有取代基的含有2〜12个碳原子的亚烷基，环戊烷-1,2-亚基或环己烷 -1,2-亚基，n为1〜10的整数。

5. 发明授权

US06512067B2 Polymer, resist composition and patterning process 有权
公开(公告)号：US06512067B2
公开(公告)日：2003-01-28
申请号：US09998200
申请日：2001-12-03
申请人： Tsunehiro Nishi , Mutsuo Nakashima , Tomohiro Kobayashi
发明人： Tsunehiro Nishi , Mutsuo Nakashima , Tomohiro Kobayashi
IPC分类号： C08F12400
CPC分类号： G03F7/0395 , C08F32/08 , G03F7/0045
摘要： A polymer comprising recurring units of formula (1-1) or (1-2) wherein R1, R2, R3 and R4 are H or C1-15 alkyl, R1 and R2, and R3 and R4, taken together, may form a ring; R5 and R6 are H, C1-15 alkyl, acyl or alkylsulfonyl groups or C2-15 alkoxycarbonyl or alkoxyalkyl groups which may have halogen substituents; and k=0 or 1, and having a Mw of 1,000-500,000 is novel. A resist composition comprising the polymer as a base resin is sensitive to high-energy radiation, has excellent sensitivity, resolution, etching resistance, and minimized swell and lends itself to micropatterning with electron beams or deep-UV.

6. 发明授权

US06395852B1 Flow enhancer for petroleum middle distillates 失效
标题翻译：石油中间馏分的流动增强剂
公开(公告)号：US06395852B1
公开(公告)日：2002-05-28
申请号：US09423116
申请日：1999-11-02
申请人： Dieter Faul , Bernd Wenderoth , Gabriele Dralle-Voss , Gunnar Schornick
发明人： Dieter Faul , Bernd Wenderoth , Gabriele Dralle-Voss , Gunnar Schornick
IPC分类号： C08F12400
CPC分类号： C10L1/1966 , C08F222/00 , C08F224/00 , C10L1/146 , C10L1/1973 , C10L1/2364
摘要： A copolymer of the monomers of the following components A to C and, if required, D, the total amount by weight of which is 100 mol %: a: from 20 to 80 mol % of at least one ethylenically unsaturated dicarboxylic acid or of an anhydride, ester and/or amide thereof as component A, b: from 1 to 79 mol % of at least one diketene of the general formula (I) where R1 and R2 independently are each hydrogen or C1-C30-alkyl, as component B, c: from 1 to 79 mol % of at least one vinyl ester, alkyl (meth)acrylate, (meth)acrylonitrile or mixtures thereof as component C and d: from 0 to less than 0.5 mol % or, if at least 20 mol % of component C are present, from 0 to 20 mol % of at least one further olefinically unsaturated monomer as component D, is used as a flow improver in mineral oil middle distillates.
摘要翻译：以下组分A至C的单体和如果需要的话，其总重量为100摩尔％的共聚物：a：20至80摩尔％的至少一种烯键式不饱和二羧酸或酸酐，酯和/或酰胺作为组分A，b：1至79mol％的至少一种通式（I）的二烯酮，其中R 1和R 2各自独立地为氢或C 1 -C 30 - 烷基，作为组分B ，c：1至79摩尔％的至少一种乙烯基酯，（甲基）丙烯酸烷基酯，（甲基）丙烯腈或其混合物作为组分C和d：0至小于0.5摩尔％，或如果至少20摩尔％的组分C，0至20摩尔％的至少一种作为组分D的烯属不饱和单体用作矿物油中间馏分中的流动改进剂。

7. 发明授权

US06806335B2 PolymEric compound and resin composition for photoresist 失效
标题翻译： PolymEric化合物和用于光致抗蚀剂的树脂组合物
公开(公告)号：US06806335B2
公开(公告)日：2004-10-19
申请号：US10375129
申请日：2003-02-28
申请人： Yoshinori Funaki , Kiyoharu Tsutsumi , Akira Takaragi
发明人： Yoshinori Funaki , Kiyoharu Tsutsumi , Akira Takaragi
IPC分类号： C08F12400
CPC分类号： C08F32/08 , C08F232/02 , G03F7/0045 , G03F7/039 , G03F7/0395 , G03F7/0397
摘要： A photoresist polymeric compound includes a monomer unit represented by following Formula (I): The polymeric compound may further include at least one of monomer units represented by Formulae (IIa) to (IIg) as described in the specification. The photoresist polymeric compound can exhibit high adhesion to substrates and can highly precisely form fine patterns.
摘要翻译：光致抗蚀剂聚合物包括由下式（I）表示的单体单元：聚合化合物还可包含如本说明书中所述的由式（IIa）至（IIg）表示的单体单元中的至少一种。光致抗蚀剂聚合物可以表现出对基材的高粘合性，并可高精度地形成精细图案。

8. 发明授权

US06657031B1 Reworkable thermosetting resin compositions 失效
标题翻译：可再结合的热固性树脂组合物
公开(公告)号：US06657031B1
公开(公告)日：2003-12-02
申请号：US09919577
申请日：2001-07-31
申请人： Lawrence N. Crane , Christopher K. Ober , Young Cheol Bae , Shuyan Yu , Jong-Wook Park
发明人： Lawrence N. Crane , Christopher K. Ober , Young Cheol Bae , Shuyan Yu , Jong-Wook Park
IPC分类号： C08F12400
CPC分类号： H01L24/98 , C08G59/18 , H01L21/56 , H01L21/563 , H01L23/293 , H01L24/29 , H01L24/81 , H01L24/83 , H01L2224/16145 , H01L2224/16225 , H01L2224/32225 , H01L2224/73203 , H01L2224/73204 , H01L2224/81052 , H01L2224/81801 , H01L2224/83192 , H01L2924/01005 , H01L2924/01006 , H01L2924/01011 , H01L2924/01012 , H01L2924/01013 , H01L2924/01015 , H01L2924/01018 , H01L2924/01019 , H01L2924/01023 , H01L2924/01027 , H01L2924/01033 , H01L2924/01039 , H01L2924/01075 , H01L2924/014 , H01L2924/19042 , H01L2924/00 , H01L2924/3512
摘要： This invention relates to thermosetting resin compositions useful for mounting semiconductor devices onto a circuit board, such as chip size or chip scale packages (“CSPs”), ball grid arrays (“BGAs”), land grid arrays (“LGAs”), and the like, each of which having a semiconductor chip, such as large scale integration (“LSI”), on a carrier substrate. The compositions of this invention are reworkable when subjected to appropriate conditions.
摘要翻译：本发明涉及用于将半导体器件安装到电路板上的热固性树脂组合物，例如芯片尺寸或芯片尺寸封装（“CSP”），球栅阵列（“BGAs”），焊盘网阵列（“LGAs”）和其中每个在载体基板上具有诸如大规模集成（“LSI”）的半导体芯片。当经受适当条件时，本发明的组合物可重复使用。

9. 发明授权

US06605678B2 Polymer, resist composition and patterning process 有权
公开(公告)号：US06605678B2
公开(公告)日：2003-08-12
申请号：US10307996
申请日：2002-12-03
申请人： Tsunehiro Nishi , Mutsuo Nakashima , Tomohiro Kobayashi
发明人： Tsunehiro Nishi , Mutsuo Nakashima , Tomohiro Kobayashi
IPC分类号： C08F12400
CPC分类号： G03F7/0395 , C08F32/08 , G03F7/0045
摘要： A polymer comprising recurring units of formula (1-1) or (1-2) wherein R1, R2, R3 and R4 are H or C1-15 alkyl, R1 and R2, and R3 and R4, taken together, may form a ring; R5 and R6 are H, C1-15 alkyl, acyl or alkylsulfonyl groups or C2-15 alkoxycarbonyl or alkoxyalkyl groups which may have halogen substituents; and k=0 or 1, and having a Mw of 1,000-500,000 is novel. A resist composition comprising the polymer as a base resin is sensitive to high-energy radiation, has excellent sensitivity, resolution, etching resistance, and minimized swell and lends itself to micropatterning with electron beams or deep-UV.

10. 发明授权

US06455653B1 Compositions and methods for the manufacture of ophthalmic lenses 失效
标题翻译：用于制造眼科镜片的组合物和方法
公开(公告)号：US06455653B1
公开(公告)日：2002-09-24
申请号：US09566407
申请日：2000-05-08
申请人： Ivan Nunez , Venkat Sekharipuram , Michele Alton
发明人： Ivan Nunez , Venkat Sekharipuram , Michele Alton
IPC分类号： C08F12400
CPC分类号： C08F222/1006 , C08F220/30 , G02B1/041 , Y10T428/31507 , Y10T428/31797 , Y10T428/31855 , Y10T428/31931
摘要： The invention provides compositions for producing lenses by casting. The compositions are useful in producing ophthalmic lens by casting of a surface or layer onto a preform.
摘要翻译：本发明提供了通过铸造制造镜片的组合物。该组合物可用于通过将表面或层浇铸到预成型体上来生产眼镜片。

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