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1. 发明申请

US20230060585A1 RESIST UNDERLYING FILM-FORMING COMPOSITION FOR NANOIMPRINTING 有权
公开(公告)号：US20230060585A1
公开(公告)日：2023-03-02
申请号：US17783453
申请日：2020-12-10
申请人： NISSAN CHEMICAL CORPORATION
发明人： Hikaru TOKUNAGA , Makoto NAKAJIMA
IPC分类号： G03F7/11 , C08G12/26 , C09D161/26 , C08G12/08 , C09D161/22 , C08G4/00 , C09D161/00 , G03F7/00 , G03F7/16 , H01L21/027 , H01L21/311 , H01L21/308
摘要： A composition for forming resist underlayer film for nanoimprinting includes novolac resin that has a repeating unit structure represented by formula (1). In formula (1), group A represents organic group having an aromatic ring, a condensed aromatic ring, or a condensed aromatic heterocycle, group B represents organic group having an aromatic ring or a condensed aromatic ring, group E represents a single bond or a branched or straight-chain C1-10 alkylene group that may be substituted and may include an ether bond and/or a carbonyl group, group D represents organic group that has 1 to 15 carbon atoms and is represented by formula (2) (in which R1, R2, and R3 each independently represent a fluorine atom, or a straight-chain, branched-chain, or cyclic alkyl group, and any two of R1, R2, and R3 may be bonded to one another to form a ring), and n represents a number from 1 to 5.

2. 发明授权

US11300879B2 Resist underlayer film forming composition containing triaryldiamine-containing novolac resin 有权
公开(公告)号：US11300879B2
公开(公告)日：2022-04-12
申请号：US16330062
申请日：2017-08-28
申请人： NISSAN CHEMICAL CORPORATION
发明人： Daigo Saito , Keisuke Hashimoto , Rikimaru Sakamoto
IPC分类号： G03F7/11 , C08G12/08 , G03F7/09 , C09D161/22 , G03F7/20 , H01L21/027 , H01L21/311 , G03F7/16 , G03F7/32
摘要： A material to form a resist underlayer film having properties achieving heat resistance, flattening properties, and etching resistance through lithography. A resist underlayer film forming composition including a polymer having a unit structure of Formula (1): (wherein R1 is an organic group having at least two amines and at least three C6-40 aromatic rings, R2 and R3 are each a hydrogen atom, a C1-10 alkyl group, a C6-40 aryl group, a heterocyclic group, or a combination thereof, and the alkyl group, the aryl group, and the heterocyclic group are optionally substituted with a halogen group, a nitro group, an amino group, a formyl group, an alkoxy group, or a hydroxy group, or R2 and R3 optionally form a ring together). The above mentioned composition t, wherein R1 is a divalent organic group derived from N,N′-diphenyl-1,4-phenylenediamine.

3. 发明申请

US20200379352A1 RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING SUBSTITUTED CROSSLINKABLE COMPOUND 审中-公开
公开(公告)号：US20200379352A1
公开(公告)日：2020-12-03
申请号：US16986921
申请日：2020-08-06
申请人： NISSAN CHEMICAL INDUSTRIES, LTD.
发明人： Keisuke HASHIMOTO , Kenji TAKASE , Tetsuya SHINJO , Rikimaru SAKAMOTO , Takafumi ENDO , Hirokazu NISHIMAKI
IPC分类号： G03F7/11 , C09D161/22 , C09D161/06 , C08G12/08 , G03F7/09 , G03F7/40 , C07C39/10 , C07C43/178 , H01L21/311
摘要： A resist underlayer film-forming composition includes a resin; and a crosslinkable compound of Formula (1) or Formula (2): wherein the crosslinkable compound of Formula (1) or Formula (2) is a compound obtained by reacting a compound of Formula (3) or Formula (4): with an ether compound comprising a hydroxy group or a C2-10 alcohol.

4. 发明授权

US09644065B2 PHT powder coating materials 有权
公开(公告)号：US09644065B2
公开(公告)日：2017-05-09
申请号：US14564159
申请日：2014-12-09
申请人： International Business Machines Corporation
发明人： Dylan J. Boday , Jeannette M. Garcia , James L. Hedrick , Rudy J. Wojtecki
IPC分类号： B05D1/12 , C08G12/08 , C09D179/04 , C09D181/02 , C09D179/06 , C09D5/03 , C09D161/22 , C08G12/46
CPC分类号： C08G12/08 , B05D1/12 , C08G12/46 , C09D5/03 , C09D161/22 , C09D179/04 , C09D179/06 , C09D181/02
摘要： A coating for an article may be made by applying a powder of a polyhemiaminal (PHA) polymer material to the article in a particulate form and then converting the PHA polymer material to a polyhexahydrotriazine (PHT) polymer material and fusing the particles into a monolithic coating by applying heat to the particles. The method generally includes forming a dilute reaction mixture comprising a formaldehyde reactant, a solvent, a primary aromatic diamine, and heating the reaction mixture to a temperature of between about 20° C. and about 120° C. for a short time to form a polymer. A particulate solid is precipitated by adding an excess volume of a non-solvent to the mixture. The powder may be applied to an article and then heated to fuse the powder into a coating and convert the PHA to PHT.

5. 发明授权

US09512332B2 Soluble, processable polyhemiaminals and polyhexahydrotriazines 有权
标题翻译：可溶性，可加工的聚合物和聚六氢三嗪
公开(公告)号：US09512332B2
公开(公告)日：2016-12-06
申请号：US14317468
申请日：2014-06-27
申请人： International Business Machines Corporation
发明人： Dylan J. Boday , Jeannette M. Garcia , James L. Hedrick , Rudy J. Wojtecki
IPC分类号： C07D251/00 , C09D179/04 , B05D1/30 , C08G12/08 , C09D161/22 , C08G73/02 , C08G73/06
CPC分类号： C09D179/04 , B05D1/30 , C08G12/08 , C08G73/0273 , C08G73/0638 , C09D161/22
摘要： Polyhexahydrotriazine (PHT) and polyhemiaminal (PHA) materials incorporating divalent or trivalent bridging groups tend to form highly cross-linked polymers. While highly cross-linked polymers have certain advantageous with respect to stability and various physical characteristics, they are difficult to process once formed. PHA and PHT materials incorporating a plurality of trivalent PHA/PHT groups, a plurality of divalent bridging groups, and a plurality of monovalent end groups are disclosed. According to an embodiment, the cross-link density and molecular weight can be controlled by the inclusion of the end groups. Lower cross-link density and molecular weight give PHA and PHT materials improved characteristics with respect to film and fiber formation methods. A method of coating a component or substrate with a polymer is also disclosed. Embodiments of the method can be used to form either a PHA or PHT film on a substrate, such as microelectronic component.
摘要翻译：掺有二价或三价桥连基团的聚六氢三嗪（PHT）和聚甲氨基（PHA）材料倾向于形成高度交联的聚合物。虽然高度交联的聚合物在稳定性和各种物理特性方面具有一定的优势，但一旦形成就难以加工。公开了包含多个三价PHA / PHT基团，多个二价桥连基团和多个一价端基的PHA和PHT材料。根据一个实施方案，交联密度和分子量可以通过包含端基来控制。较低的交联密度和分子量使得PHA和PHT材料相对于膜和纤维形成方法改善了特性。还公开了用聚合物涂覆组分或底物的方法。该方法的实施方案可用于在基底上形成PHA或PHT膜，例如微电子元件。

6. 发明申请

US20160326396A1 RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING NOVOLAC POLYMER HAVING SECONDARY AMINO GROUP 审中-公开
标题翻译：含有二级氨基酸组的NOVOLAC聚合物的耐下层膜成膜组合物
公开(公告)号：US20160326396A1
公开(公告)日：2016-11-10
申请号：US15108350
申请日：2014-12-15
申请人： NISSAN CHEMICAL INDUSTRIES, LTD.
发明人： Hirokazu NISHIMAKI , Keisuke HASHIMOTO , Rikimaru SAKAMOTO , Takafumi ENDO
IPC分类号： C09D161/22 , G03F7/09 , H01L21/308 , G03F7/32 , H01L21/033 , C08G12/08 , G03F7/20
CPC分类号： C09D161/22 , C08G12/08 , G03F7/091 , G03F7/094 , G03F7/11 , G03F7/20 , G03F7/2059 , G03F7/32 , H01L21/0332 , H01L21/3081
摘要： A resist underlayer film which has an excellent hard mask function and can form an excellent pattern shape. A resist underlayer film-forming composition to be used for a lithography process, including a novolac polymer obtained by reaction of an aldehyde compound and an aromatic compound having a secondary amino group. The novolac polymer contains a unit structure of Formula (1): A method for producing a semiconductor device, including the steps of: forming a resist underlayer film from the resist underlayer film-forming composition on a semiconductor substrate; forming a hard mask on the resist underlayer film; further forming a resist film on the hard mask; forming a resist pattern by irradiation with light or an electron beam and development; etching the hard mask by using the formed resist pattern; etching the resist underlayer film by using the patterned hard mask; and processing the semiconductor substrate by using the patterned underlayer film.
摘要翻译：一种制造半导体器件的方法，包括以下步骤：在半导体衬底上从抗蚀剂下层膜形成组合物形成抗蚀剂下层膜; 在抗蚀剂下层膜上形成硬掩模; 进一步在硬掩模上形成抗蚀剂膜; 通过用光或电子束的照射形成抗蚀剂图案和显影; 通过使用形成的抗蚀剂图案来蚀刻硬掩模; 通过使用图案化的硬掩模蚀刻抗蚀剂下层膜; 以及通过使用图案化的下层膜来处理半导体衬底。

7. 发明授权

US09263286B2 Diarylamine novolac resin 有权
标题翻译：二芳基胺酚醛清漆树脂
公开(公告)号：US09263286B2
公开(公告)日：2016-02-16
申请号：US14348461
申请日：2012-09-25
申请人： NISSAN CHEMICAL INDUSTRIES, LTD.
发明人： Rikimaru Sakamoto , Yasunobu Someya , Keisuke Hashimoto , Hirokazu Nishimaki
IPC分类号： C08G12/08 , H01L21/308 , C08L61/22 , G03F7/09 , C09D161/22 , C09D179/02 , C09D179/04 , C08G73/02 , C08G73/06 , C08L79/02 , C08L79/04
CPC分类号： H01L21/3081 , C08G12/08 , C08G73/026 , C08G73/0273 , C08G73/0672 , C08L61/22 , C08L79/02 , C08L79/04 , C09D161/22 , C09D179/02 , C09D179/04 , G03F7/091 , G03F7/094
摘要： A novel diarylamine novolac resin such as a phenylnaphthylamine novolac resin, and further a resist underlayer film-forming composition in which the resin is used in a lithography process for manufacturing a semiconductor device. A polymer including a unit structure (A) of Formula (1): (in Formula (1), each of Ar1 and Ar2 is a benzene ring or a naphthalene ring). A method for manufacturing a semiconductor device, including: forming an underlayer film on a semiconductor substrate with the resist underlayer film-forming composition; forming a hardmask on the underlayer film; forming a resist film on the hardmask; forming a resist pattern by irradiation with light or an electron beam followed by development; etching the hardmask with the resist pattern; etching the underlayer film with the hardmask thus patterned; and processing the semiconductor substrate with the underlayer film thus patterned.
摘要翻译：一种新型的二芳基胺酚醛清漆树脂，如苯基萘胺酚醛清漆树脂，还有一种抗蚀剂下层膜形成组合物，其中树脂用于制造半导体器件的光刻工艺。包含式（1）的单元结构（A）的聚合物：（式（1）中，Ar 1和Ar 2各自为苯环或萘环）。一种半导体器件的制造方法，其特征在于，包括：在所述半导体衬底上形成下层膜，并形成抗蚀剂下层膜组合物; 在下层膜上形成硬掩模; 在硬掩模上形成抗蚀剂膜; 通过用光或电子束的照射形成抗蚀剂图案，随后显影; 用抗蚀剂图案蚀刻硬掩模; 用如此图案化的硬掩模蚀刻下层膜; 并且利用如此构图的下层膜来处理半导体衬底。

8. 发明授权

US4309260A Heat-curable aqueous coating compositions 失效
标题翻译：可热固化的水性涂料组合物
公开(公告)号：US4309260A
公开(公告)日：1982-01-05
申请号：US205129
申请日：1980-11-10
申请人： Wilfried Bartz
发明人： Wilfried Bartz
IPC分类号： C09D4/00 , C08C19/36 , C08L51/04 , C09D5/44 , C09D109/00 , C09D121/00 , C09D161/00 , C09D161/22 , C25D13/00
CPC分类号： C09D5/4403 , C08C19/36 , Y10S524/901
摘要： A binder for a heat-curable aqueous coating composition for metallic surfaces comprises:(A) 60-95% by weight of a water-soluble and/or water-dispersible addition compound of 10-35% by weight of one or more .alpha.,.beta.-unsaturated dicarboxylic acids and 65-90% by weight of a butadiene polymer which is liquid at 20.degree. C., contains at least 50 mole % of butadiene units and has a molecular weight of 500 to 6,000, the addition compound being at least partially neutralized with a basic compound and partially esterified,and(B) 5-40% by weight of a water-soluble and/or water-dispersible crosslinking resin having, on the average, at least 2 chemically different reactive groups per mole,wherein the addition compound (A) is esterified to 10-70 equivalent percent, based on its acid number, with one or more unsaturated alcohols of the formula ##STR1## and wherein at least one of the reactive groups of the crosslinking resin (B) is of formula II ##STR2## wherein, for both formulae I and II, R.sup.1, R.sup.2 and R.sup.3 can be identical or different and each independently is hydrogen or methyl,R.sup.4 is hydrogen or C.sub.1-5 -alkyl, and n is 0 or 1.
摘要翻译：用于金属表面的可热固化水性涂料组合物的粘合剂包括：（A）60-95重量％的10-35重量％的一种或多种α，β-不饱和羧酸的水溶性和/或水分散性加成化合物， β-不饱和二羧酸和65-90重量％的在20℃下为液体的丁二烯聚合物，含有至少50摩尔％的丁二烯单元，分子量为500-6,000，加成化合物至少为用碱性化合物部分中和并部分酯化，和（B）5-40重量％的水溶性和/或水分散性交联树脂，其平均具有至少2个每摩尔化学上不同的反应性基团，其中加成化合物（A）基于其酸值与一个或多个下式的不饱和醇酯化为10-70当量，其中交联树脂（B）的至少一个反应性基团为式II其中，对于式I和II， R1，R2和R3可以相同或不同，各自独立地为氢或甲基，R4为氢或C1-5烷基，n为0或1。

9. 发明授权

US10752787B2 Tailorable surface topology for antifouling coatings 有权
公开(公告)号：US10752787B2
公开(公告)日：2020-08-25
申请号：US16675754
申请日：2019-11-06
申请人： International Business Machines Corporation , Agency for Science, Technology and Research
发明人： Amos Cahan , Xin Ding , Mareva B. Fevre , James L. Hedrick , Zhen Chang Liang , Nathaniel H. Park , Theodore G. van Kessel , Rudy J. Wojtecki , Yi Yan Yang
IPC分类号： C09D5/14 , C09D161/22 , A01N33/08 , A01N31/16 , C09D181/02 , A01N33/10 , B05D1/02 , B05D1/00 , B29C39/38 , B29C39/26 , A01N25/10 , C09D5/16 , G03F7/00 , B05D5/02
摘要： Embodiments are directed to a method of making an antifouling and bactericidal coating with tailorable surface topology. The method includes depositing a layer of branched polyethyleneimine (BPEI) and diamino-functionalized poly(propylene oxide) (PPO) in a mixture of water and organic solvent on a substrate to form a layer of BPEI/PPO. The method includes depositing a layer of glyoxal in a water-containing solution on the layer of BPEI/PPO. The method further includes curing the layer of BPEI/PPO and layer of glyoxal to form a homogenous, glyoxal crosslinked BPEI/PPO coating, where the curing induces local precipitation and alteration of the glyoxal crosslinked BPEI/PPO coating to provide a textured surface.

10. 发明授权

US10668502B2 Polymeric coatings and coating method 审中-公开
公开(公告)号：US10668502B2
公开(公告)日：2020-06-02
申请号：US15977904
申请日：2018-05-11
申请人： International Business Machines Corporation
发明人： Dylan J. Boday , Mareva B. Fevre , Jeannette M. Garcia , James L. Hedrick , Rudy J. Wojtecki
IPC分类号： C09D161/22 , C08G12/08 , B05D7/00 , B05D1/18 , B05D1/02 , C03C17/34 , C01B32/168 , B05D1/36 , B05D3/02 , B05D1/38 , B29C64/00 , C08G12/04 , B33Y70/00 , C03C17/32
摘要： Polymeric coatings and methods of forming polymeric coatings are described. In a method of forming a polymeric coating a first layer is deposited on a substrate. The first layer includes at least one highly soluble diamine component. A second layer is formed on the substrate to contact the first layer. The second layer includes paraformaldehyde and an aromatic diamine including two primary amine groups. Once formed, the first and second layers are heated. Heating causes the components of the first and second layers to cure. For example, the paraformaldehyde from the second layer diffuses into the first layer and reacts via hemiaminal-type chemistry with the high soluble diamine component. The coatings may be substantially homogenous or comprise a compositional gradient in thickness or along the substrate plane depending on deposition methods and other processing parameters.

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