会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 3. 发明授权
    • Barrier film and laminated material, container for wrapping and image display medium using the same, and manufacturing method for barrier film
    • 阻隔膜和层压材料,用于包装的容器和使用其的图像显示介质,以及阻挡膜的制造方法
    • US08673404B2
    • 2014-03-18
    • US12509601
    • 2009-07-27
    • Minoru Komada
    • Minoru Komada
    • C23C16/10C23C16/08C23C16/24B32B27/08H05H1/24
    • B32B27/08C23C14/10Y10T428/31663Y10T428/31667
    • An object of the present invention is to provide a barrier film having the extremely high barrier property and the better transparency, a method for manufacturing the same, and a laminated material, a container for wrapping and an image displaying medium using the barrier film. According to the present invention, there is provided a barrier film provided with a barrier layer on at least one surface of a substrate film, wherein the barrier layer is a silicon oxide film having an atomic ratio in a range of Si:O:C=100:160 to 190:30 to 50, a peak position of infrared-ray absorption due to Si—O—Si stretching vibration between 1030 to 1060 cm−1, a film density in a range of 2.5 to 2.7 g/cm3, and a distance between grains of 30 nm or shorter. Still more, there is provided a barrier film provided with a barrier layer on at least one surface of a substrate film, wherein the barrier layer is a silicon oxi-nitride film having an atomic ratio in a range of Si:O:N:C=100:80 to 110:40 to 70:30 to 50, a maximum peak of infrared-ray absorption due to Si—O stretching vibration and Si—N stretching vibration in a range of 900 to 1000 cm−1, a film density in a range of 2.7 to 3.0 g/cm3, and a distance between grains of 30 nm or shorter.
    • 本发明的目的是提供一种具有极高的阻隔性和更好的透明度的阻挡膜及其制造方法,以及叠层材料,用于包装的容器和使用阻挡膜的图像显示介质。 根据本发明,提供了一种在基材膜的至少一个表面上设置有阻挡层的阻挡膜,其中阻挡层是原子比在Si:O:C = 100:160〜190:30〜50,由于Si-O-Si伸缩振动在1030〜1060cm -1之间的红外线吸收的峰值位置,膜密度在2.5〜2.7g / cm 3的范围内, 颗粒之间的距离为30nm或更短。 另外,在衬底膜的至少一个表面上设置有阻挡层的阻挡膜,其中阻挡层是原子比在Si:O:N:C的范围内的氧化硅氮化物膜 = 100:80〜110:40〜70:30〜50,由于Si-O伸缩振动和Si-N伸缩振动在900〜1000cm -1范围内的红外线吸收的最大峰值,膜密度 在2.7〜3.0g / cm 3的范围内,粒子间的距离为30nm以下。