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    • 10. 发明申请
    • METHOD AND APPARATUS FOR ALIGNING NANOWIRES DEPOSITED BY AN ELECTROSPINNING PROCESS
    • 通过电泳工艺沉积纳米微粒的方法和装置
    • US20150251214A1
    • 2015-09-10
    • US14716489
    • 2015-05-19
    • Applied Materials, Inc.
    • Kurtis LESCHKIESSteven VERHAVERBEKERobert VISSER
    • B05D1/00D01F1/09D01D11/06B05B5/04D01D5/00
    • B05D1/007B05B5/04B22F2009/0888B22F2009/0892B22F2202/06D01D5/0061D01D5/0092D01D11/06D01F1/09D01F6/50
    • Embodiments of the invention generally include apparatus and methods for depositing nanowires in a predetermined pattern during an electrospinning process. An apparatus includes a nozzle for containing and ejecting a deposition material, and a voltage source coupled to the nozzle to eject the deposition material. One or more electric field shaping devices are positioned to shape the electric field adjacent to a substrate to control the trajectory of the ejected deposition material. The electric field shaping device converges an electric field at a point near the surface of the substrate to accurately deposit the deposition material on the substrate in a predetermined pattern. The methods include applying a voltage to a nozzle to eject an electrically-charged deposition material towards a substrate, and shaping one or more electric fields to control the trajectory of the electrically-charged deposition material. The deposition material is then deposited on the substrate in a predetermined pattern.
    • 本发明的实施方案通常包括用于在静电纺丝过程期间以预定图案沉积纳米线的装置和方法。 一种装置包括用于容纳和喷射沉积材料的喷嘴,以及耦合到喷嘴以喷射沉积材料的电压源。 定位一个或多个电场成形装置以使与基板相邻的电场成形以控制喷出的沉积材料的轨迹。 电场成形装置在基板表面附近的点收敛电场,以预定图案将沉积材料精确地沉积在基板上。 所述方法包括向喷嘴施加电压以向基板喷射带电荷的沉积材料,以及对一个或多个电场进行整形以控制带电沉积材料的轨迹。 然后将沉积材料以预定图案沉积在基板上。