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1. 发明授权

US11450521B2 Laser sustained plasma light source with high pressure flow 有权
公开(公告)号：US11450521B2
公开(公告)日：2022-09-20
申请号：US17157782
申请日：2021-01-25
申请人： KLA Corporation
发明人： Anatoly Shchemelinin
IPC分类号： H01J61/02 , H01J61/16 , H01J61/52 , H01J61/28
摘要： A broadband radiation source is disclosed. The source may include a gas containment vessel configured to maintain a plasma and emit broadband radiation. The source may also include a recirculation gas loop fluidically coupled to the gas containment vessel. The recirculation gas loop may be configured to transport gas from one or more gas boosters configured to pressurize the low-pressure gas into a high-pressure gas and transport the high-pressure gas to the recirculation loop via an outlet. The system includes a pressurized gas reservoir fluidically coupled to the outlet of the one or more gas boosters and is configured to receive and store high pressure gas from the one or more gas boosters. The source includes a pressurized gas reservoir located between the one or more gas boosters and the gas containment vessel and is configured to receive and store high pressure gas from the one or more gas boosters.

2. 发明授权

US11373855B2 Excimer lamp 有权
公开(公告)号：US11373855B2
公开(公告)日：2022-06-28
申请号：US17397661
申请日：2021-08-09
申请人： Ushio Denki Kabushiki Kaisha
发明人： Hideaki Yagyu
IPC分类号： H01J61/54 , H01J61/12 , H01J61/16 , H01J61/30
摘要： An excimer lamp includes a discharge vessel in which a rare gas and a halogen are enclosed. The excimer lamp also includes at least one first electrode and at least one second electrode for generating a dielectric barrier discharge inside the discharge vessel. The discharge vessel has a discharge forming region and a non-discharge region such that discharging takes place in the discharge forming region and no discharging takes place in the non-discharge region. The discharge forming region is formed between the first electrode(s) and the second electrode(s). The non-discharge region communicates with the discharge forming region. The excimer lamp satisfies a following equation: (Vb×Ph)/Sd≥4.50 where Vb [mm3] represents a space volume inside the discharge vessel, Sd [mm2] represents an inner surface area of the discharge vessel in the discharge forming region, and Ph [Torr] represents a halogen-atoms partial pressure enclosed in the discharge vessel.

3. 发明申请

US20220189759A1 ULTRAVIOLET LIGHT-EMITTING MODULE AND DISINFECTING SYSTEM 有权
公开(公告)号：US20220189759A1
公开(公告)日：2022-06-16
申请号：US17452559
申请日：2021-10-27
申请人： The Boeing Company
发明人： Jamie J. Childress , Arthur E. Brockschmidt, JR.
IPC分类号： H01J61/52 , H01J61/16 , H01J61/30 , H01J61/40 , H01J61/54 , A61L2/10
摘要： Modules, systems and methods that disinfect surfaces using ultraviolet (UV) light are disclosed. In one aspect, a UV light-emitting module comprises an enclosure comprising a rear wall and a face plate spaced from the rear wall and comprising a light-transmitting aperture. At least one sidewall extends between the rear wall and the face plate, and at least one UV light emitter is within the enclosure. A ventilation opening is located in one or more walls selected from (1) the rear wall and (2) the at least one sidewall.

4. 发明申请

US20220068626A1 EXCIMER LAMP AND LIGHT IRRADIATION DEVICE 有权
公开(公告)号：US20220068626A1
公开(公告)日：2022-03-03
申请号：US17404046
申请日：2021-08-17
申请人： Ushio Denki Kabushiki Kaisha
发明人： Hideaki YAGYU
IPC分类号： H01J61/16 , H01J61/44
摘要： An excimer lamp is such that that an interior of a discharge vessel is filled with a first gas including krypton (Kr) or xenon (Xe); a second gas including chlorine (Cl) or bromine (Br); and a third gas which is at least one species selected from among the group consisting of argon (Ar), neon (Ne), and helium (He), and which exhibits a partial pressure Pb that is not less than a partial pressure Plg of the first gas.

5. 发明申请

US20210384027A1 ELECTRODE FOR A DISCHARGE CHAMBER 有权
公开(公告)号：US20210384027A1
公开(公告)日：2021-12-09
申请号：US17411155
申请日：2021-08-25
申请人： Cymer, LLC
发明人： Leyla Ramin
IPC分类号： H01J61/073 , H01J9/14 , H01J61/16 , H01S3/038 , H01S3/225
摘要： A discharge chamber for a deep ultraviolet (DUV) light source includes a housing; and a first electrode and a second electrode in the housing, the first electrode and the second electrode being separated from each other to form a discharge region between the first electrode and the second electrode, the discharge region being configured to receive a gain medium including at least one noble gas and a halogen gas. At least one of the first electrode and the second electrode includes a metal alloy including more than 33% and less than 50% zinc by weight.

6. 发明授权

US11181422B2 Spectrophotometer calibration methods and systems 有权
公开(公告)号：US11181422B2
公开(公告)日：2021-11-23
申请号：US17050678
申请日：2019-04-23
申请人： Agilent Technologies, Inc.
发明人： David Death , Philip Valmont Wilson
IPC分类号： G01J3/28 , G01J3/02 , G01J3/18 , G01J3/10 , H01J61/80 , G01J3/12 , H01J61/16
摘要： A method of calibrating a spectrophotometer comprising a flash lamp. The method comprises receiving light from the flash lamp at a monochromator of the spectrometer, wherein the flash lamp is a short arc noble gas flash lamp with transverse or axially aligned electrodes; configuring the monochromator to progressively transmit the received light at each of a plurality wavelengths of a selected range of wavelengths, wherein the range of wavelengths is associated with a wavelength feature according to a known spectral profile of the flash lamp, and wherein the wavelength feature is a self-absorption feature; and determining a spectrum of the flash lamp, wherein the spectrum comprises a corresponding power or intensity value for each of the plurality of wavelengths. The method further comprises determining a wavelength calibration error value for the wavelength feature by comparing the spectrum with a segment of a predetermined reference spectrum associated with the flash lamp, wherein the segment of the predetermined reference spectrum includes one or more wavelengths associated with the self-absorption feature; and calibrating the spectrophotometer based on the wavelength calibration error value.

7. 发明申请

US20210335593A1 ULTRAVIOLET IRRADIATION APPARATUS 有权
公开(公告)号：US20210335593A1
公开(公告)日：2021-10-28
申请号：US17312589
申请日：2019-12-05
申请人： Ushio Denki Kabushiki Kaisha
发明人： Shinji TANIGUCHI , Hideaki YAGYU , Manabu MORI
IPC分类号： H01J65/00 , H01J61/04 , H01J61/16 , A61L2/10
摘要： A ultraviolet irradiation apparatus includes: a first electrode block and a second electrode block located apart from each other in a first direction or located in an electrically-insulated state in the first direction; a recessed groove formed on a side surface of each of both the blocks; a first discharge lamp partially fitted into the recessed grooves formed in both the blocks and located across the both blocks; a power supply part for supplying electrical power to the first discharge lamp; a first current-carrying member electrically connecting the first electrode block and the power supply part; a second current-carrying member capable of electrically connecting the second electrode block and the power supply part at an electrical potential different from that of the first current-carrying member; and a light irradiation window for extracting ultraviolet light emitted from the first discharge lamp to outside.

8. 发明申请

US20210242009A1 LASER SUSTAINED PLASMA LIGHT SOURCE WITH HIGH PRESSURE FLOW 有权
公开(公告)号：US20210242009A1
公开(公告)日：2021-08-05
申请号：US17157782
申请日：2021-01-25
申请人： KLA Corporation
发明人： Anatoly Shchemelinin
IPC分类号： H01J61/02 , H01J61/28 , H01J61/52 , H01J61/16
摘要： A broadband radiation source is disclosed. The source may include a gas containment vessel configured to maintain a plasma and emit broadband radiation. The source may also include a recirculation gas loop fluidically coupled to the gas containment vessel. The recirculation gas loop may be configured to transport gas from one or more gas boosters configured to pressurize the low-pressure gas into a high-pressure gas and transport the high-pressure gas to the recirculation loop via an outlet. The system includes a pressurized gas reservoir fluidically coupled to the outlet of the one or more gas boosters and is configured to receive and store high pressure gas from the one or more gas boosters. The source includes a pressurized gas reservoir located between the one or more gas boosters and the gas containment vessel and is configured to receive and store high pressure gas from the one or more gas boosters.

9. 发明授权

US10964523B1 Laser-pumped plasma light source and method for light generation 有权
公开(公告)号：US10964523B1
公开(公告)日：2021-03-30
申请号：US16986424
申请日：2020-08-06
申请人： RnD-ISAN, Ltd , ISTEQ B.V.
发明人： Robert Rafilevich Gayasov , Denis Alexandrovich Glushkov , Yurii Borisovich Kiryukhin , Vladimir Mikhailovich Krivtsun , Aleksandr Andreevich Lash
IPC分类号： H01J61/62 , H01J61/16 , H01J61/30 , H01J61/52
摘要： The invention relates to plasma light sources with a continuous optical discharge (COD). The light source contains a gas filled chamber with a region of radiating plasma sustained by a focused beam of a CW laser. A density of gas particles in the chamber is less than 90·1019 cm−3 and a temperature of the chamber is in a range from 600 to 900 K or optionally higher. Preferably the density of gas particles is as low as possible and the temperature of the inner surface of the chamber at operation is as high as possible under providing a gas pressure in the chamber of about 50 bar or more. The technical result of the invention consists in providing COD sustaining conditions, which are optimal for achieving high stability and high brightness of the radiating plasma, in the creation on this basis of broadband light sources with ultra-high brightness and stability.

10. 发明申请

US20200328074A1 ELECTRODE FOR A DISCHARGE CHAMBER 审中-公开
公开(公告)号：US20200328074A1
公开(公告)日：2020-10-15
申请号：US16955952
申请日：2018-12-14
申请人： Cymer, LLC
发明人： Leyla Ramin
IPC分类号： H01J61/073 , H01J61/16 , H01S3/038 , H01S3/225 , H01J9/14
摘要： A discharge chamber for a deep ultraviolet (DUV) light source includes a housing; and a first electrode and a second electrode in the housing, the first electrode and the second electrode being separated from each other to form a discharge region between the first electrode and the second electrode, the discharge region being configured to receive a gain medium including at least one noble gas and a halogen gas. At least one of the first electrode and the second electrode includes a metal alloy including more than 33% and less than 50% zinc by weight.

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