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    • 1. 发明授权
    • Use of photoresist in substrate vias during backside grind
    • 在背面研磨过程中在基板通孔中使用光致抗蚀剂
    • US06888223B2
    • 2005-05-03
    • US10405763
    • 2003-04-01
    • Donald W. BrouilletteJoseph D. DanaherTimothy C. KrywanczykAmye L. Wells
    • Donald W. BrouilletteJoseph D. DanaherTimothy C. KrywanczykAmye L. Wells
    • H01L21/768H01L23/048
    • H01L21/76898
    • A structure and method of formation. The substrate has front and back surfaces on opposite sides of the substrate. The substrate has a backside portion extending from the back surface to a second depth into the substrate as measured from the front surface. At least one via is formed in the substrate and extends from the front surface to a via depth into the substrate. The via depth is specific to each via. The via depth of each via is less than an initial thickness of the substrate. The second depth does not exceed the minimum via depth of the via depths. Organic material (e.g., photoresist) is inserted into each via. The organic material is subsequently covered with a tape, followed by removal of the backside portion of the substrate. The tape is subsequently removed from the organic material, followed by removal of the organic material from each via.
    • 一种结构和形成方法。 衬底在衬底的相对侧上具有前表面和后表面。 衬底具有从前表面测量的从后表面延伸到衬底的第二深度的背侧部分。 在衬底中形成至少一个通孔,并从前表面延伸到通孔深度进入衬底。 通孔深度特定于每个通孔。 每个通孔的通孔深度小于衬底的初始厚度。 第二深度不超过通孔深度的最小值。 将有机材料(例如光致抗蚀剂)插入每个通孔中。 随后用带覆盖有机材料,随后除去基材的背面部分。 随后从有机材料中取出胶带,然后从每个通孔中除去有机材料。