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1. 发明授权

US10616988B2 Electromechanical linearly actuated electrode 有权
公开(公告)号：US10616988B2
公开(公告)日：2020-04-07
申请号：US15628278
申请日：2017-06-20
申请人： The ESAB Group Inc.
发明人： Andrew Raymond , David A. Tatham , Leonid Pekker , Daniel A. Cote , Geoffrey H. Putnam , Ryan Lynaugh
IPC分类号： B23K10/00 , H05H1/34 , H05H1/32
CPC分类号： H05H1/34 , B23K10/006 , H05H1/32 , H05H2001/3426 , H05H2001/3457 , H05H2001/3489
摘要： Approaches herein provide a plasma arc torch including a tip surrounding an electrode, the electrode having a proximal end and a distal end, and a shield surrounding the tip, the shield including an exit orifice proximate the distal end of the electrode. The torch may further include a linear actuating device coupled to the electrode for actuating the electrode such that the distal end of the electrode moves axially relative to the tip and the exit orifice of the shield. In some approaches, the linear actuating device is operable to actuate the electrode along a central longitudinal axis extending through the tip. In some approaches, the linear actuating device may include one of: a micro linear drive motor, a micro linear stepper motor, a voice coil, a solenoid coil, and a magnetostrictive actuator. In some approaches, the electrode is actuated during a welding or cutting cycle of the torch.

2. 发明授权

US10462890B2 Induction devices and methods of using them 有权
公开(公告)号：US10462890B2
公开(公告)日：2019-10-29
申请号：US16146745
申请日：2018-09-28
申请人： PERKINELMER HEALTH SCIENCES, INC.
发明人： Tak Shun Cheung , Chui Ha Cindy Wong
IPC分类号： H05H1/32 , H01J49/10 , H05H1/34 , H01J49/26 , H05H1/30
摘要： Certain embodiments described herein are directed to induction devices that can be used to sustain a plasma. In certain configurations, the induction device may comprise one or more radial fins electrically coupled to a base. The induction device may take numerous forms including, for example, coils and plate electrodes.

3. 发明授权

US10104755B2 Induction devices and methods of using them 有权
公开(公告)号：US10104755B2
公开(公告)日：2018-10-16
申请号：US15843481
申请日：2017-12-15
申请人： PERKINELMER HEALTH SCIENCES, INC.
发明人： Tak Shun Cheung , Chui Ha Cindy Wong
IPC分类号： H05H1/32 , H01J49/10 , H01J49/26 , H05H1/30 , H05H1/34
摘要： Certain embodiments described herein are directed to induction devices that can be used to sustain a plasma. In certain configurations, the induction device may comprise one or more radial fins electrically coupled to a base. The induction device may take numerous forms including, for example, coils and plate electrodes.

4. 发明授权

US10098191B2 Inductively coupled plasma arc device 有权
公开(公告)号：US10098191B2
公开(公告)日：2018-10-09
申请号：US14560808
申请日：2014-12-04
申请人： Foret Plasma Labs, LLC
发明人： Todd Foret
IPC分类号： H05B7/20 , F02C3/14 , F02C7/266 , H05H1/30 , H05H1/32 , H05H1/42 , F27B3/08 , H05B6/02 , H05H1/34
摘要： An inductively coupled plasma device includes a rotary furnace tube and an inductively coupled plasma source. The rotary furnace tube has a first end, a second end and a longitudinal axis. In a first embodiment, the inductively coupled plasma source is disposed proximate to the first end of the rotary furnace tube and is aligned with the longitudinal axis of the rotary furnace such that the inductively coupled plasma source discharges a plasma into the rotary furnace tube. In a second embodiment, the inductively coupled plasma source is a ground electrode disposed within and aligned with the longitudinal axis of the rotary furnace tube, and a second electromagnetic radiation source disposed around or within the rotary furnace tube that generates a wave energy. The inductively coupled plasma source discharges a plasma within the rotary furnace tube.

5. 发明授权

US09591737B2 Induction devices and methods of using them 有权
标题翻译：感应装置及其使用方法
公开(公告)号：US09591737B2
公开(公告)日：2017-03-07
申请号：US15087643
申请日：2016-03-31
申请人： PERKINELMER HEALTH SCIENCES, INC.
发明人： Tak Shun Cheung , Chui Ha Cindy Wong
IPC分类号： H05H1/32 , H05H1/30 , H01J49/10
CPC分类号： H05H1/32 , H01J49/105 , H01J49/26 , H05H1/30 , H05H1/3405
摘要： Certain embodiments described herein are directed to induction devices that can be used to sustain a plasma. In certain configurations, the induction device may comprise one or more radial fins electrically coupled to a base. The induction device may take numerous forms including, for example, coils and plate electrodes.
摘要翻译：本文描述的某些实施例涉及可用于维持等离子体的感应装置。在某些构造中，感应装置可以包括电耦合到基座的一个或多个径向翅片。感应装置可以采取许多形式，包括例如线圈和板电极。

6. 发明授权

US09561523B2 Controlled radical assisted polymerization 有权
标题翻译：受控自由基辅助聚合
公开(公告)号：US09561523B2
公开(公告)日：2017-02-07
申请号：US14370902
申请日：2013-01-09
申请人： Luxembourg Institute of Science and Technology (LIST)
发明人： Damien Lenoble
IPC分类号： A23G3/20 , B05D1/34 , B05D3/04 , B05D1/02 , C08J7/16 , C08J7/04 , B05B1/14 , B05D3/10 , H05H1/24 , H05H1/32 , B05D1/00
CPC分类号： B05D1/34 , B05B1/14 , B05D1/02 , B05D1/60 , B05D3/0493 , B05D3/107 , C08J7/047 , C08J7/16 , H01J2237/332
摘要： The present invention is directed to a method of forming a polymer coating on a substrate. The method comprising the steps of providing in an evacuated reaction chamber a substrate having a surface to be coated; and providing a first source of polymer forming material and a second source of radicals. According to the invention the first source and the second source are separated from each other and from the reaction chamber, and the polymer forming material as well as the radicals are, at least temporarily, conducted contemporaneously but spatially separated to the substrate's surface, so that a reaction of the polymer forming material with the radicals is avoided before they reach the substrate's surface. Further, the present invention is directed to a device for carrying out the method according to the invention.
摘要翻译：本发明涉及在基材上形成聚合物涂层的方法。该方法包括以下步骤：在抽空的反应室中提供具有待涂覆表面的基底; 并提供聚合物形成材料的第一来源和第二自由基源。根据本发明，第一源和第二源彼此分离并且与反应室分离，并且聚合物形成材料以及自由基至少暂时同时进行但空间上分离到基板的表面，使得聚合物形成材料与自由基的反应在它们到达基底的表面之前被避免。此外，本发明涉及一种用于实施根据本发明的方法的装置。

7. 发明申请

US20160309572A1 INDUCTION DEVICES AND METHODS OF USING THEM 审中-公开
公开(公告)号：US20160309572A1
公开(公告)日：2016-10-20
申请号：US15087643
申请日：2016-03-31
申请人： PERKINELMER HEALTH SCIENCES, INC.
发明人： Tak Shun Cheung , Chui Ha Cindy WONG
IPC分类号： H05H1/32 , H01J49/10 , H05H1/30
CPC分类号： H05H1/32 , H01J49/105 , H01J49/26 , H05H1/30 , H05H1/3405
摘要： Certain embodiments described herein are directed to induction devices that can be used to sustain a plasma. In certain configurations, the induction device may comprise one or more radial fins electrically coupled to a base. The induction device may take numerous forms including, for example, coils and plate electrodes.

8. 发明授权

US09427820B2 Thermal torch lead gas delivery methods and related systems and devices 有权
标题翻译：火炬铅气输送方法及相关系统及装置
公开(公告)号：US09427820B2
公开(公告)日：2016-08-30
申请号：US13904734
申请日：2013-05-29
申请人： Hypertherm, Inc.
发明人： Jonathan Mather , Liming Chen , Ross Angus Smith
IPC分类号： B23K10/00 , H05H1/32
CPC分类号： B23K10/006 , B23K10/00 , H05H1/32
摘要： In some aspects, methods of initiating a plasma arc in a plasma cutting system can include providing a plasma gas supply lead line extending between a power supply and a plasma arc cutting torch, where the lead line has a first segment proximate to the power supply and a second segment proximate to the torch, and an in-line valve within the lead line between the first segment and the second segment; selectively closing the in-line valve to capture a static volume of gas in the first segment; establishing a decayable volume of gas in the second segment; and initiating the plasma arc when a pressure of the decayable volume reaches a pressure value within a predetermined range.
摘要翻译：在一些方面，在等离子切割系统中启动等离子体电弧的方法可以包括提供在电源和等离子体电弧切割割炬之间延伸的等离子体气体供应引线，其中引线具有靠近电源的第一段，靠近所述割炬的第二段和所述第一段和所述第二段之间的所述引导线内的直列阀; 选择性地关闭在线阀以捕获第一段中的静态体积的气体; 在第二段建立可燃量的气体; 以及当所述可降解体积的压力达到预定范围内的压力值时启动所述等离子弧。

9. 发明授权

US08847101B2 Device and method for generating a plasma flow 有权
标题翻译：用于产生等离子体流的装置和方法
公开(公告)号：US08847101B2
公开(公告)日：2014-09-30
申请号：US12998872
申请日：2009-12-08
申请人： Stanislav Begounov , Sergey Goloviatinski , Ioulia Tsvetkova
发明人： Stanislav Begounov , Sergey Goloviatinski , Ioulia Tsvetkova
IPC分类号： B23K10/00 , H05H1/34 , H05H1/32
CPC分类号： H05H1/34 , H05H1/32 , H05H2001/3494
摘要： The invention relates to a device generating a plasma flow comprising an electrically conductive housing, tubular in shape, forming a central channel traversed by a vortex gas, a central electrode arranged coaxially in said channel and an electric power source intended to apply an electric voltage V between the electrode and the housing, characterized in that the mean diameter of the channel formed by the housing decreases progressively from an area situated substantially at the level of the free end of the electrode as far as an end area of said housing, said end area being configured in such a way that the minimum electric voltage Vcmin(0) to be applied in order to develop an electric arc between said electrode and said end area is strictly greater than said voltage V.
摘要翻译：本发明涉及一种产生等离子体流的装置，其包括形状为管状的导电壳体，形成由涡流气体穿过的中心通道，同轴地布置在所述通道中的中心电极和用于施加电压V 在电极和壳体之间，其特征在于，由壳体形成的通道的平均直径从基本上位于电极的自由端的水平面的区域逐渐减小，直到所述壳体的端部区域，所述端部区域被配置为使得为了在所述电极和所述端部区域之间产生电弧而施加的最小电压Vcmin（0）严格地大于所述电压V.

10. 发明授权

US07879203B2 Method and apparatus for cathodic arc ion plasma deposition 失效
标题翻译：阴极电弧离子等离子体沉积的方法和装置
公开(公告)号：US07879203B2
公开(公告)日：2011-02-01
申请号：US11609078
申请日：2006-12-11
申请人： Scott Andrew Weaver , William Thomas Carter , Paul Mario Marruso
发明人： Scott Andrew Weaver , William Thomas Carter , Paul Mario Marruso
IPC分类号： C23C14/00 , C23C16/00 , C25D17/00 , H05H1/24 , H05H1/32 , H01T14/00
CPC分类号： C23C14/325 , C23C14/16 , H01J37/32596 , H01J37/32614
摘要： A method and apparatus for depositing a coating material on a surface of a substrate by an ion plasma deposition process using a hollow cathode is disclosed. The cathode may be a substantially cylindrical hollow cathode. A plasma arc is formed on the outer circumference of the cathode to remove coating material from the cathode, which is then deposited on a surface of a substrate. An internal arc drive magnet is contained within the hollow bore of the cathode and cooling is provided to the magnet during operation.
摘要翻译：公开了一种通过使用空心阴极的离子等离子体沉积工艺将涂层材料沉积在衬底的表面上的方法和装置。阴极可以是基本上圆柱形的空心阴极。在阴极的外圆周上形成等离子体电弧，以从阴极去除涂层材料，然后将其沉积在衬底的表面上。内部电弧驱动磁体包含在阴极的中空孔内，并且在操作期间将冷却提供给磁体。

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