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    • 2. 发明授权
    • Positive type photosensitive resin composition
    • 正型感光性树脂组合物
    • US08513350B2
    • 2013-08-20
    • US12037328
    • 2008-02-26
    • Yuuki Kimura
    • Yuuki Kimura
    • C08F30/08C08F130/08C08F230/08C08G77/18C08G77/04C08G77/20C08F16/00C08F16/36
    • G03F7/0758C08F230/08G03F7/0007G03F7/0233
    • A positive type photosensitive resin composition for forming patterned resin film is provided. The patterned resin film has high transparency, low dielectric constant, high solvent resistance, high water resistance, high acid resistance, high alkali resistance, high heat resistance, and excellent adhesive properties with the substrate, which is obtained by developing with an alkali solution. The positive type photosensitive resin composition contains copolymer of compound of formula (I) and 1,2-quinonediazido compound, or further mixes with other alkali-soluble polymers, in formula (I), R1 is hydrogen or alkyl group having 1-5 carbon atoms in which any hydrogen may be replaced by fluorine; and R2, R3 and R4 are independently hydroxyl group, alkyl group having 1-5 carbon atoms, alkoxyl group having 1-5 carbon atoms or —O(Si(ClH2l+1)2O)mSi(CpH2p+1)3, 1 is an integer of 1-5, m is 0 or an integer of 1-10, n is an integer of 1-5, and p is an integer of 1-5.
    • 提供了用于形成图案化树脂膜的正型感光性树脂组合物。 图案化树脂膜通过用碱溶液显影而具有高透明度,低介电常数,高耐溶剂性,高耐水性,高耐酸性,高耐碱性,高耐热性和与基材的优异粘合性能。 正型感光性树脂组合物含有式(I)化合物与1,2-醌二叠氮化合物的共聚物,或与式(I)中的其它碱溶性聚合物进一步混合,R 1为氢或具有1-5个碳原子的烷基 其中任何氢可被氟代替的原子; R2,R3和R4独立地是羟基,具有1-5个碳原子的烷基,具有1-5个碳原子的烷氧基或-O(Si(ClH2 + 1)2O)mSi(CpH2p + 1) 1-5的整数,m为0或1-10的整数,n为1-5的整数,p为1-5的整数。
    • 4. 发明授权
    • Method for producing crosslinked poly(meth)acrylate compound
    • 交联聚(甲基)丙烯酸酯化合物的制备方法
    • US07816457B2
    • 2010-10-19
    • US11569819
    • 2005-05-30
    • Nobutaka FujimotoKoji UedaMasato Fujikake
    • Nobutaka FujimotoKoji UedaMasato Fujikake
    • C08F20/02C08F16/00C08F26/06C08F2/00
    • H01M10/052C08F8/00C08F220/36C08F222/1006H01M4/137H01M4/1399H01M4/60H01M4/602C08F20/00
    • It is an object of the invention to provide a method of producing a crosslinked poly(meth)acrylic acid compound, in particular a method of producing a crosslinked poly(meth)acrylic acid nitroxide compound, which is a radical compound excellent in solvent stability.The invention is a method of producing a crosslinked poly(meth)acrylic acid compound resulting from crosslinking of a poly(meth)acrylic acid compound represented by the general formula (1): (in the formula, n Z1s represent a hydrogen atom(s) and/or an oxygen atom(s) having one unpaired electron, R represents a hydrogen atom or a methyl group and n represents an integer of 5 to 1000000), which method is characterized by comprising a polymerization step of polymerizing a (meth)acrylic acid compound represented by the general formula (2): (in the formula, Z2 represents a hydrogen atom when Z1 is a hydrogen atom, or a hydrogen atom or an oxygen atom having one unpaired electron when Z1 is an oxygen atom having one unpaired electron; and R represents the same group as R in the above general formula (1)) in the presence of a crosslinking agent.
    • 本发明的目的是提供一种生产交联聚(甲基)丙烯酸化合物的方法,特别是制备交联聚(甲基)丙烯酸氮氧化合物的方法,其是溶剂稳定性优异的自由基化合物。 本发明是由通式(1)表示的聚(甲基)丙烯酸化合物交联而得到的交联聚(甲基)丙烯酸化合物的制造方法:(式中,n Z1表示氢原子 )和/或具有一个不成对电子的氧原子,R表示氢原子或甲基,n表示5〜1000000的整数),该方法的特征在于包括聚合(甲基) 由通式(2)表示的丙烯酸化合物:(式中Z 1表示氢原子,Z 1表示氢原子时的氢原子,Z 1表示不成对的氧原子时的氢原子或具有1个不成对电子的氧原子) 电子; R表示与上述通式(1)中的R相同的基团)。
    • 5. 发明授权
    • Protected polyvinyl alcohol auxiliary for forming fine pattern and process for producing the same
    • 用于形成精细图案的保护性聚乙烯醇辅助剂及其制备方法
    • US07598320B2
    • 2009-10-06
    • US10550110
    • 2004-03-18
    • Masato NishikawaKiyohisa Takahashi
    • Masato NishikawaKiyohisa Takahashi
    • C08F16/00C08F8/00C08F6/00C08L29/00G03F7/40
    • G03F7/40C08F8/28C08F8/30C08F8/44C08F2810/20C08F16/06
    • A modified polyvinyl alcohol (PVA) protected with a protecting group of the present invention is one wherein an amount of high-molecular weight body components of the modified polyvinyl alcohol having a weight-average molecular weight of 250,000 or more as determined by polyethylene glycol standards according to a gel permeation chromatography is 1000 ppm or less in the modified polyvinyl alcohol. The modified PVA is prepared by removing a metal ion and an acid from the modified PVA such as acetalized PVA with ion exchange treatment and then heat-treating at 80° C. or higher. An auxiliary for fine pattern formation of the present invention comprises the aforementioned modified PVA, a water-soluble crosslinking agent, and water or a mixed solvent of water and a water-soluble organic solvent. The auxiliary for fine pattern formation is applied over a resist pattern 3 and a coated layer 4 is formed thereon. Then the resist pattern 3 and the coated layer 4 are heated and thereby an acid is diffused from the resist pattern 3 to the coated layer 4. As a result, the coated layer in the vicinity of the resist pattern surface is crosslinked and cured by the diffused acid. The coated layer is developed to form a hole pattern having crosslinked and cured layer on the resist pattern, of which the hole size is less than a limit resolution of the wavelength of a light-exposure and which have no development defects.
    • 用本发明的保护基保护的改性聚乙烯醇(PVA)是其中通过聚乙二醇标准测定的改性聚乙烯醇的重均分子量为25万以上的高分子量体成分的量 根据凝胶渗透色谱在改性聚乙烯醇中为1000ppm以下。 通过离子交换处理从改性PVA如缩醛化PVA中除去金属离子和酸,然后在80℃或更高温度下进行热处理制备改性PVA。 本发明的精细图案形成用辅助剂包括上述改性PVA,水溶性交联剂,水或水和水溶性有机溶剂的混合溶剂。 在抗蚀剂图案3上施加用于精细图案形成的辅助件,并且在其上形成涂层4。 然后加热抗蚀剂图案3和涂层4,从而将抗蚀剂图案3的酸扩散到涂层4.结果,抗蚀剂图案表面附近的涂层被交联并固化 扩散酸。 显影涂层以在抗蚀剂图案上形成具有交联和固化层的孔图案,其孔尺寸小于曝光波长的极限分辨率并且没有显影缺陷。
    • 6. 发明申请
    • ABSORBING STRUCTURE HAVING IMPROVED BLOCKING PROPERTIES
    • 具有改进阻塞特性的吸收结构
    • US20070254177A1
    • 2007-11-01
    • US11766399
    • 2007-06-21
    • Scott SmithBernfried MessnerMarkus Frank
    • Scott SmithBernfried MessnerMarkus Frank
    • C08F16/00
    • C08J3/12C08J3/128C08J3/245C08J2300/14C08J2333/00H01B7/288Y02A30/14Y10T428/31931
    • A process for producing an absorbing polymer structure (Pa) including the steps of obtaining a treated absorbing polymer structure (Pb) by increasing the absorption under load at a load of 0.3 or 0.9 psi (AUL) compared to an untreated absorbing polymer structure (Pu) by a first treatment of an outer region of the untreated absorbing polymer structure (Pu) and reducing the AUL compared to the treated polymer structure (Pb) by a second treatment of an outer region of the treated absorbing polymer structure (Pb). Such absorbing polymer structure (Pa) may be used in a composite and may be used in foams, moulded articles, fibers, sheets, films, cables, sealing materials, liquid-absorbing hygiene articles, carriers for plant growth-regulating and fungal growth-regulating agents, packaging materials and soil additives or building materials.
    • 一种制备吸收聚合物结构(Pa)的方法,包括以下步骤:与未处理的吸收聚合物结构(Pu)相比,在负载为0.3或0.9psi(AUL)的负载下增加吸收聚合物结构(Pb) )通过第一处理未处理的吸收性聚合物结构(Pu)的外部区域,并且通过对经处理的吸收性聚合物结构(Pb)的外部区域进行第二次处理,将AUL与经处理的聚合物结构(Pb)相比减少。 这种吸收聚合物结构(Pa)可以用于复合材料中,并且可以用于泡沫,模制品,纤维,片材,薄膜,电缆,密封材料,液体吸收卫生制品,用于植物生长调节的载体和真菌生长 - 调节剂,包装材料和土壤添加剂或建筑材料。
    • 9. 发明授权
    • Precursors of polymers containing isocyanurate units
    • 含有异氰脲酸酯单元的聚合物的前体
    • US5256748A
    • 1993-10-26
    • US722495
    • 1991-07-02
    • Didier VanhoyePaul Grosius
    • Didier VanhoyePaul Grosius
    • C07D251/32C07D251/34C08F16/00C08F20/34C08F220/34C08F290/00C08F299/06C08G18/32C08G18/38C08G18/64C08G18/67C08G18/78C08G73/06C08F26/08
    • C08G18/3853C07D251/34C08G18/672C08G18/7893
    • Oligomers of the formula ##STR1## wherein: (1) at least one A=--CH.sub.2 CHR.sup.1 COODOH (a) (R.sup.1 =H, CH.sub.3 and D=C.sub.1 -C.sub.4 alkylene), the other A's=H or C.sub.1 -C.sub.4 alkyl, it being possible for at least a part of the residues (a) to be converted into A.sup.1 =--CH.sub.2 CHR.sup.1 COODOCONHD.sup.1 NCO (D.sup.1 =divalent organic residue), it being possible for at least a part of the residues A.sup.1 to be converted into A.sup.2 =--CH.sub.2 CHR.sup.1 COODOCONHD.sup.1 NHCOOR.sup.2 (R.sup.2 =monovalent radical obtained by removal of OH from a monoalcohol containing a vinylidene group);(2) at least one A=D.sup.2 OCONHD'.sup.1 NHCOOR'.sup.2 (b) where D.sup.2 =C.sub.1 -C.sub.4 alkylene or --D.sup.3 --(--O--D.sup.3 --).sub.n --, with D.sup.3 =C.sub.1 -C.sub.4 alkylene and n=1-12; D'.sup.1 analogous to D.sup.1 ; R'.sup.2 analogous to R.sup.2 ; the other residue(s) A denoting --D.sup.2 OCONHD'.sup.1 NCO.These oligomers are intended especially to be copolymerized under ultraviolet radiation in a reactive diluent and in the presence of an initiator so as to form (co)polymers which have good hardness and good thermal resistance and which can be employed in the field of coatings, inks, and photopolymerizable adhesives.
    • 其中:(1)至少一个A = -CH 2 CHR 1 COODOH(a)(R 1 = H,CH 3和D = C 1 -C 4亚烷基),另一个A'= H或C 1 -C 4烷基, 残留物(a)的至少一部分可能被转化为A1 = -CH2CHR1COODOCONHD1NCO(D1 =二价有机残基),至少部分残基A1可能转化为A2 = -CH2CHR1COODOCONHD1NHCOOR2(R2 =通过从含有亚乙烯基的一元醇除去OH而获得的单价基团); (2)至少一个A = D2OCONHD'1NHCOOR'2(b)其中D2 = C1-C4亚烷基或-D3 - ( - O-D3-)n-,其中D3 = C1-C4亚烷基,n = 1-12 ; D'1类似于D1; R'2类似于R2; 其他残留物A表示-D2OCONHD'1NCO。 这些低聚物特别是在反应性稀释剂中和在引发剂的存在下在紫外线辐射下共聚以形成具有良好硬度和良好耐热性并且可用于涂料,油墨领域的(共)聚合物 ,和光聚合粘合剂。