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    • 7. 发明授权
    • Organically functionalized polysiloxane nanoparticles, method for the production thereof, and use thereof
    • 有机官能化聚硅氧烷纳米颗粒,其制备方法及其用途
    • US08962138B2
    • 2015-02-24
    • US13377064
    • 2010-06-10
    • Monika BauerHans-Juergen Glaesel
    • Monika BauerHans-Juergen Glaesel
    • B32B5/16C08G77/04C08G77/06C08G77/20C08G77/54C08G77/62C08K5/544C08L33/18
    • C08G77/04C08G77/54C08G77/62C08K5/544C08L33/18Y10T428/2982Y10T428/2991Y10T428/2998Y10T428/31663C08L2666/44
    • The present invention relates to polysiloxane nanoparticles having the following properties: an average particle size d50 (measured using REM recordings) in the range of 10-200 nm, a specific surface area Ao of at least 50 m2/g, a pore volume of at least 0.2 cm3/g, an average pore volume d50 of at least 0.8 nm, wherein the particles have groups that contain carbon, which groups are bonded to the silicon at least partially in the form of unsubstituted or substituted alkyl, alkenyl, aryl, arylalkyl, or alkylaryl groups. Said polysiloxane nanoparticles can be produced, among other things, in that either a silazane or a mixture of different silazanes having one or more —[Si(R)(R1)—NR2]— units and/or a silane or a mixture of different silanes having the formula R′x—SiX4-a or an oligosiloxane obtainable by means of hydrolytic condensation of said silane/said silanes or a mixture of such oligosiloxanes are provided in a solvent and brought in contact with a strongly alkaline medium in such a way that the pH is not below 13 after the addition thereof. In specific embodiments, synthesis in acid is also successful.
    • 本发明涉及具有以下特性的聚硅氧烷纳米粒子:10-200nm范围内的平均粒径d50(使用REM记录测定),比表面积Ao为至少50m 2 / g,孔体积为 至少0.2cm 3 / g,平均孔体积d50至少为0.8nm,其中所述颗粒具有含有碳的基团,所述基团至少部分地以未取代或取代的烷基,烯基,芳基,芳烷基 ,或烷基芳基。 可以制备所述聚硅氧烷纳米颗粒,其特征在于,硅氮烷或具有一个或多个 - [Si(R)(R 1)-NR 2] - 单元和/或硅烷或不同的混合物的不同硅氮烷的混合物 具有式R'x-SiX4-a的硅烷或通过所述硅烷/所述硅烷或这种低聚硅氧烷的混合物的水解缩合得到的低聚硅氧烷在溶剂中提供,并以这种方式与强碱性介质接触 加入后pH不低于13。 在具体实施方案中,酸中的合成也是成功的。
    • 8. 发明授权
    • Composition with increased stress cracking resistance
    • 具有增加的抗开裂性的组合物
    • US08227549B2
    • 2012-07-24
    • US12600840
    • 2008-04-09
    • Klaus SchultesWerner HoessNils Mehler
    • Klaus SchultesWerner HoessNils Mehler
    • C08L25/02C08L33/02C08L33/04C08L33/14C08L33/18C08L33/20C08L35/02
    • C08L33/08C08L25/12C08L33/10C08L2666/04
    • Composition containing, based in each case on its total weight, A) 50.0% by weight to 99.5% by weight of at least one (meth)acrylate (co)polymer and B) 0.5% by weight to 50.0% by weight of at least one copolymer obtainable by polymerization of a monomer mixture comprising i. 70% by weight to 92% by weight of a vinylaromatic monomer and ii. 8% by weight to 30% by weight of acrylonitrile or methacrylonitrile or mixtures thereof and iii. 0% by weight to 22% by weight of at least one further monomer, the composition having a haze according to ASTM D1003 of less than 2.0% at 23° C. and a haze according to ASTM D1003 of less than 4.0% at 40° C. and the composition containing at least one (meth)acrylate (co)polymer a) having a solution viscosity in chloroform at 25° C. (ISO 1628—part 6) of greater than 55 ml/g. The moldings obtainable from the composition are distinguished in particular by improved stress cracking resistance and are suitable in particular for coverings, finishes or films.
    • 包含基于每种情况的总重量的组合物A)50.0重量%至99.5重量%的至少一种(甲基)丙烯酸酯(共)聚合物,和B)至少0.5重量%至50.0重量% 一种共聚物,其通过单体混合物的聚合获得,所述单体混合物包含i。 70重量%至92重量%的乙烯基芳族单体,和ii。 8重量%至30重量%的丙烯腈或甲基丙烯腈或其混合物,iii。 0重量%至22重量%的至少一种其它单体,该组合物在-23℃下具有根据ASTM D1003的雾度小于2.0%,并且根据ASTM D1003的雾度小于4.0% 40℃,组合物含有至少一种在-25℃(ISO 1628-第6部分)中溶液粘度在55ml / g以上的(甲基)丙烯酸酯(共)聚合物)a)。 可从组合物获得的模制品特别是通过改进的耐应力开裂性来区分,特别适用于覆盖物,表面处理剂或膜。
    • 10. 发明申请
    • ABLATABLE ELEMENTS FOR MAKING FLEXOGRAPHIC PRINTING PLATES
    • 用于制作柔版印刷板的可拆卸元件
    • US20120094104A1
    • 2012-04-19
    • US13325093
    • 2011-12-14
    • Michael T. ReganDavid B. BaileyChristine J. Landry-Coltrain
    • Michael T. ReganDavid B. BaileyChristine J. Landry-Coltrain
    • C08L69/00C08L33/18
    • B41C1/05B41N1/12Y10S430/145
    • Flexographic printing plates and other relief images can be formed from a laser-ablatable element having a laser-ablatable layer that is from about 300 to about 4,000 μm thickness. The laser-ablatable layer includes a film-forming material that is a laser-laser-ablatable material or the film-forming material has dispersed therein a laser-ablatable material. The laser-ablatable material is a polymeric material that when heated to 300° C. at a rate of 10° C./minute, loses at least 60% of its mass to form at least one predominant low molecular weight product. The laser-ablatable material also comprises at least 0.01 weight % of a depolymerization catalyst that is a Lewis acid or organometallic based catalyst. The element can be imaged by ablation at an energy of at least 1 J/cm2 to provide a relief image.
    • 柔版印刷版和其它浮雕图像可以由具有约300至约4,000μm厚度的激光可烧蚀层的激光可烧蚀元件形成。 激光烧蚀层包括作为激光可激光材料的成膜材料,或者成膜材料中分散有激光可烧蚀材料。 激光可烧蚀材料是一种聚合材料,当以10℃/分钟的速率加热至300℃时,其损失至少60%的质量以形成至少一种主要的低分子量产物。 激光可烧蚀材料还包含至少0.01重量%的解聚催化剂,其是路易斯酸或有机金属基催化剂。 该元件可以以至少1J / cm 2的能量消融成像,以提供浮雕图像。