会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 20. 发明申请
    • Mixing energized and non-energized gases for silicon nitride deposition
    • 混合通电和无能气体用于氮化硅沉积
    • US20060162661A1
    • 2006-07-27
    • US11040712
    • 2005-01-22
    • Kee JungDale Du BoisLun TsueiLihua HuangMartin SeamonsSoovo SenReza ArghavaniMichael Kwan
    • Kee JungDale Du BoisLun TsueiLihua HuangMartin SeamonsSoovo SenReza ArghavaniMichael Kwan
    • H05H1/24C23C16/00H01L21/306C23F1/00B08B6/00
    • C23C16/45574C23C16/345C23C16/452C23C16/45565C23C16/50H01J37/3244H01L21/0217H01L21/3185
    • A dual channel gas distributor can simultaneously distribute plasma species of an first process gas and a non-plasma second process gas into a process zone of a substrate processing chamber. The gas distributor has a localized plasma box with a first inlet to receive a first process gas, and opposing top and bottom plates that are capable of being electrically biased relative to one another to define a localized plasma zone in which a plasma of the first process gas can be formed. The top plate has a plurality of spaced apart gas spreading holes to spread the first process gas across the localized plasma zone, and the bottom plate has a plurality of first outlets to distribute plasma species of the plasma of the first process gas into the process zone. A plasma isolated gas feed has a second inlet to receive the second process gas and a plurality of second outlets to pass the second process gas into the process zone. A plasma isolator is between the second inlet and second outlets to prevent formation of a plasma of the second process gas in the plasma isolated gas feed.
    • 双通道气体分配器可以将第一工艺气体和非等离子体第二工艺气体的等离子体种类同时分配到衬底处理室的工艺区域中。 气体分配器具有局部等离子体盒,其具有第一入口以接收第一工艺气体,以及相对的顶板和底板,其能够相对于彼此电偏置以限定局部等离子体区,其中第一工艺的等离子体 可以形成气体。 顶板具有多个间隔开的气体扩散孔,以将第一处理气体扩散通过局部等离子体区域,并且底板具有多个第一出口,用于将第一处理气体的等离子体的等离子体物质分配到处理区 。 等离子体隔离气体进料具有用于接收第二处理气体的第二入口和多个第二出口以将第二处理气体通入处理区。 等离子体隔离器位于第二入口和第二出口之间,以防止在等离子体隔离气体进料中形成第二工艺气体的等离子体。