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11. 发明申请

US20090215281A1 HDP-CVD SION FILMS FOR GAP-FILL 失效
标题翻译：用于GAP-FILL的HDP-CVD SION膜
公开(公告)号：US20090215281A1
公开(公告)日：2009-08-27
申请号：US12035603
申请日：2008-02-22
申请人： HEMANT P. MUNGEKAR , Young S. Lee , Agnieszka Jakubowicz , Zhong Qiang Hua , Rionard Purnawan , Sanjay Kamath , Walter Zygmunt
发明人： HEMANT P. MUNGEKAR , Young S. Lee , Agnieszka Jakubowicz , Zhong Qiang Hua , Rionard Purnawan , Sanjay Kamath , Walter Zygmunt
IPC分类号： H01L21/469 , H01L21/00 , H05H1/24
CPC分类号： C23C16/045 , C23C16/308 , C23C16/507 , H01L21/3145 , H01L27/14627 , H01L27/14629 , Y10T29/41
摘要： The present invention pertains to methods of depositing low stress/high index multi-layer films on a substrate using an HDP-CVD process. The multi-layer films include two lining layers and a bulk gap-fill layer and the HDP-CVD process employs a reduced substrate bias power during deposition of at least the second lining layer. Deposition of the three layers occurs at reduced deposition temperatures which further reduces the stress of the multi-layer film. The lower stress results in less defectivity which improves the films ability to maintain optical confinement of radiation.
摘要翻译：本发明涉及使用HDP-CVD工艺在衬底上沉积低应力/高折射率多层膜的方法。多层膜包括两个衬里层和大块间隙填充层，并且HDP-CVD工艺在沉积至少第二衬里层期间采用降低的衬底偏置功率。在降低的沉积温度下发生三层沉积，这进一步降低了多层膜的应力。较低的应力导致较少的缺陷率，这提高了膜保持辐射的光学限制的能力。

12. 发明申请

US20080121179A1 GAS BAFFLE AND DISTRIBUTOR FOR SEMICONDUCTOR PROCESSING CHAMBER 失效
标题翻译：用于半导体加工室的气体和分配器
公开(公告)号：US20080121179A1
公开(公告)日：2008-05-29
申请号：US11564150
申请日：2006-11-28
申请人： SOONAM PARK , Farhan Ahmad , Hemant P. Mungekar , Sanjay Kamath , Young S. Lee , Siqing Lu
发明人： SOONAM PARK , Farhan Ahmad , Hemant P. Mungekar , Sanjay Kamath , Young S. Lee , Siqing Lu
IPC分类号： C23C16/52 , C23C16/44
CPC分类号： C23C16/4405 , C23C16/45563 , C23C16/45591 , H01J37/3244 , H01J37/32449
摘要： Apparatus and methods for distributing gas in a semiconductor process chamber are provided. In an embodiment, a gas distributor for use in a gas processing chamber comprises a body. The body includes a baffle with a gas deflection surface to divert the flow of a gas from a first direction to a second direction. The gas deflection surface comprises a concave surface. The concave surface comprises at least about 75% of the surface area of the gas deflection surface. The concave surface substantially deflects the gas toward a chamber wall and provides decreased metal atom contamination from the baffle so that season times can be reduced.
摘要翻译：提供了用于在半导体处理室中分配气体的装置和方法。在一个实施例中，用于气体处理室的气体分配器包括主体。主体包括具有气体偏转表面的挡板以将气体的流动从第一方向转移到第二方向。气体偏转表面包括凹面。凹面包括至少约75％的气体偏转表面的表面积。凹面大致使气体朝向室壁偏转，并且提供了来自挡板的减少的金属原子污染物，从而可以减少季节时间。

13. 发明申请

US20070223383A1 METHOD AND SYSTEM FOR FLOW CONTROL BETWEEN A BASE STATION CONTROLLER AND A BASE TRANSCEIVER STATION 有权
标题翻译：基站控制器与基站收发站之间的流量控制方法与系统
公开(公告)号：US20070223383A1
公开(公告)日：2007-09-27
申请号：US11748412
申请日：2007-05-14
申请人： Sanjay Kamath , Michael Kongelf , Leif Woodahl
发明人： Sanjay Kamath , Michael Kongelf , Leif Woodahl
IPC分类号： H04L12/26
CPC分类号： H04W28/10 , H04L47/10 , H04L47/14 , H04L47/27 , H04L47/30 , H04L47/36 , H04W28/14 , H04W48/08 , H04W92/12
摘要： According to a disclosed embodiment, a flow indication counter is incremented each time a data packet is transmitted from a buffer. When the number of data packets transmitted equals or exceeds a threshold number, a flow indication message comprising the buffer window size is generated and transmitted to the base station controller. Further, flow indication messages can be generated and transmitted every threshold time interval, independently of the number of data packets transmitted to ensure that flow indication messages are sent at least every preset time interval. Moreover, a system for flow control can be constructed comprising a flow indication counter module configured to provide an updated number of data packets transmitted. The system further comprises a window size monitoring module which determines the buffer window size and a message generating module which generates a flow indication message comprising the buffer window size.
摘要翻译：根据所公开的实施例，每当从缓冲器发送数据分组时，流量指示计数器递增。当发送的数据包的数量等于或超过阈值数时，产生包括缓冲器窗口大小的流指示消息并将其发送到基站控制器。此外，流量指示消息可以在每个阈值时间间隔生成和发送，而与发送的数据分组的数量无关，以确保至少每预设时间间隔发送流量指示消息。此外，可以构造用于流控制的系统，其包括被配置为提供发送的更新数量的数据分组的流量指示计数器模块。该系统还包括确定缓冲器窗口大小的窗口大小监视模块和产生包括缓冲窗口大小的流指示消息的消息生成模块。

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