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11. 发明申请

WO2020168094A1 SIMULTANEOUS DEPTH PROFILE AND SPECTRAL MEASUREMENT 审中-公开
公开(公告)号：WO2020168094A1
公开(公告)日：2020-08-20
申请号：PCT/US2020/018133
申请日：2020-02-13
申请人： NIKON CORPORATION
发明人： SPARANO, Brian, Andrew , GOLDSTEIN, Goldie, Lynne , IVALDI, Juan, Carlos , SMITH, Daniel, Gene , HABOUB, Abdelmoula , RENWICK, Stephen, Paul
IPC分类号： G01B11/25 , G06T7/521
摘要： Techniques are disclosed for 3D spectral scanning for simultaneous depth profile and spectral measurement and for using 3D spectral scanning for material processing. A structured light source and a spectral imaging device are configured to acquire images of an object illuminated by the structured light source at different frequencies. Spectral segmentation and 3D reconstruction are performed using the images to identify material differences and a depth profile of the object. A computer representation of the object showing spatial dimensions and material differences in response to spectral segmentation and 3D reconstruction is generated as an output. The output informs detection and diagnosis of issues to automate material processing steps in industrial manufacturing and other applications.

12. 发明申请

WO2020072484A1 AN AUXILIARY FOCUS MEASUREMENT FOR A LASER RADAR 3D SCANNER 审中-公开
公开(公告)号：WO2020072484A1
公开(公告)日：2020-04-09
申请号：PCT/US2019/054054
申请日：2019-10-01
申请人： SMITH, Daniel, Gene , NIKON CORPORATION
发明人： SMITH, Daniel, Gene
IPC分类号： G01S7/481 , G01S17/08
摘要： An auxiliary focus system is coupled to a focus adjustment mechanism to simplify laser radar focusing. An auxiliary focus beam, a fringe projector, or a camera can be used to determine target distance so that focus can be set at an initial distance. In some cases, an electrical measurement beam modulation is used to determine the initial focus. A laser radar (LR) (400) includes a transceiver (402) that includes an LR laser (404), an LR detector (406), and a coupler (408) that directs an LR measurement beam from the LR laser (404) along an axis (410) and directs a return portion of an LR beam from a target to the LR detector (406). The laser radar (400) also includes an auxiliary (focus) transceiver (412) that includes a focus laser (414), a focus detector (416), and a focus coupler (418) that directs a focus beam from the focus laser (414) along an axis (420) and directs a return portion of a focus beam from a target to the focus detector (416). A beam scanner (422) is coupled to scan the beams over a region of interest at the target. A beam splitter (424) combines and separates focus and LR beams and a common objective (430) directs both beams to the target. The axes (410, 420) are displaced from each other so that the LR beam and the focus beam are incident to different portions of the target.Typically, the focus beam is directed to a target area in advance of exposure of the target area to the LR beam so that a focus estimate can be obtained prior an LR measurement. Both the LR detector (406) and the focus detector (416) produce electrical signals that are coupled to a controller (432) and are processed to establish a preliminary focus and recording a sample surface profile, respectively. Based on the focus signal, the controller (432) couples a control signal to a focus mechanism (434). Alternatively, a fringe projector directs a patterned beam to the target, the fringe image of which is used to estimate distance and initiate a focus adjustment. The methods and apparatus disclosed above can be used in a variety of manufacturing systems, such as for producing one or more components of a ship, airplane, or part of other systems or apparatus, and for evaluating and reprocessing such manufactured components

13. 发明申请

WO2018208912A2 ILLUMINATION SYSTEM WITH CURVED 1D-PATTERNED MASK FOR USE IN EUV-EXPOSURE TOOL 审中-公开
公开(公告)号：WO2018208912A2
公开(公告)日：2018-11-15
申请号：PCT/US2018/031796
申请日：2018-05-09
申请人： NIKON CORPORATION , SMITH, Daniel, Gene , WILLIAMSON, David, M. , FLAGELLO, Donis, G. , BINNARD, Michael, B.
发明人： SMITH, Daniel, Gene , WILLIAMSON, David, M. , FLAGELLO, Donis, G. , BINNARD, Michael, B.
IPC分类号： G03F7/20 , G02B17/06 , G21K1/06
摘要： A catoptric system having a reference axis and including a reflective pattern-source (carrying a substantially one-dimensional pattern) and a combination of two optical reflectors disposed sequentially to transfer EUV radiation incident onto the first optical component to the pattern-source the substantially one-dimensional pattern of which is disposed in a curved surface. In one case, such combination includes only two optical reflectors (each may contain multiple constituent components). The combination is disposed in a fixed spatial and optical relationship with respect to the pattern-source, and represents an illumination unit (IU) of a ID EUV exposure tool that additionally includes (includes a projection optical sub-system configured to form an optical image of the pattern-source on an image plane with the use of only two beams of radiation. These only two beams of radiation originate at the pattern-source from the EUV radiation transferred onto the pattern-source.

14. 发明申请

WO2018200536A3 ILLUMINATION SYSTEM WITH FLAT 1D-PATTERNED MASK FOR USE IN EUV-EXPOSURE TOOL 审中-公开
公开(公告)号：WO2018200536A3
公开(公告)日：2018-11-01
申请号：PCT/US2018/029160
申请日：2018-04-24
申请人： NIKON CORPORATION , SMITH, Daniel, Gene , WILLIAMSON, David, M.
发明人： SMITH, Daniel, Gene , WILLIAMSON, David, M.
IPC分类号： G03F7/20 , G02B17/06 , G21K1/06
摘要： A catoptric system having a reference axis and including a reflective pattern-source (carrying a substantially one-dimensional pattern) and a combination of only three optical components disposed sequentially to transfer EUV radiation incident the first optical component onto the pattern-source. The combination is disposed in a fixed spatial and optical relationship with respect to the patternsource, and represents an illumination unit (IU) of a 1D EUV exposure tool that additionally includes |includes a projection optic sub-system configured to form an optical image of the patternsource on an image plane with the use of only two beams of radiation. These only two beams of radiation originate at the pattern-source from the EUV radiation transferred onto the pattern-source.

15. 发明申请

WO2018194975A8 OPTICAL OBJECTIVE FOR OPERATION IN EUV SPECTRAL REGION 审中-公开
公开(公告)号：WO2018194975A8
公开(公告)日：2018-10-25
申请号：PCT/US2018/027785
申请日：2018-04-16
申请人： NIKON CORPORATION , SMITH, Daniel, Gene , WILLIAMSON, David, M.
发明人： SMITH, Daniel, Gene , WILLIAMSON, David, M.
IPC分类号： G03F7/20 , G02B17/06 , G21K1/06
摘要： A catoptric system having a reference axis and first, second, and third reflectors. The first reflector contains a pattern-source carrying a substantially one-dimensional pattern. A combination of the second and third reflectors is configured to form an optical image of the pattern, with a demagnification coefficient N > 1 in extreme UV light, and with only two beams of light that have originated at the first reflector as a result of irradiation of the first reflector with light incident upon it. An exposure apparatus employing the catoptric system and method of device manufacturing with the use of the exposure apparatus.

16. 发明申请

WO2021113300A1 POWDERBED CONTAINMENT FOR 3D BUILD PRINTING SYSTEM PARTS 审中-公开
公开(公告)号：WO2021113300A1
公开(公告)日：2021-06-10
申请号：PCT/US2020/062804
申请日：2020-12-02
申请人： NIKON CORPORATION
发明人： BINNARD, Michael, Birk , MARQUEZ, Johnathan, Agustin , SMITH, Daniel, Gene
IPC分类号： B22F3/105 , B29C64/153 , B29C64/241 , B29C64/393 , B33Y10/00 , B33Y30/00 , B33Y50/02 , B29C64/236 , B29C64/295 , B29C64/379 , B29C64/245 , B29C64/357 , B22F10/20 , B22F10/30 , B22F10/70 , B22F12/00 , B22F10/28 , B29C64/188 , B22F12/88
摘要： A processing machine used for building a part includes a mechanical assembly comprising a build table configured to support the part being built. The processing machine has no pre-fabricated powder-containment structure configured to surround or to contain the part as the part is being built. The processing machine also includes a powder supply assembly that distributes powder onto the build table to form a powder layer, and an energy system that directs an energy beam at a portion of the powder on the build table to form a portion of the part being built.

17. 发明申请

WO2021113151A2 ADDITIVE MANUFACTURING SYSTEM WITH THERMAL CONTROL OF MATERIAL 审中-公开
公开(公告)号：WO2021113151A2
公开(公告)日：2021-06-10
申请号：PCT/US2020/062490
申请日：2020-11-27
申请人： NIKON CORPORATION
发明人： GUO, Lexian , PHILLIPS, Alton, Hugh , SMITH, Daniel, Gene , TEMKOW, Gary, Michael , BINNARD, Michael, Birk , BJORK, Matthew, Parker-mccormick , COON, Paul, Derek , ROSA, Matthew, David , CHOI, Yeong , SUKIR, Shruthi , GOTO, Takakuni
IPC分类号： B22F12/13 , B22F12/17 , B22F12/20 , B22F12/37 , B22F12/00 , B22F12/44 , B22F10/28 , B22F10/362 , B22F10/368 , B22F12/52 , B22F12/90 , B29C64/153 , B33Y10/00 , B33Y30/00 , B33Y40/00 , B22F12/38 , B22F2203/11 , B29C64/241 , B29C64/245 , B29C64/255 , B29C64/295
摘要： A processing machine (10) for building an object (11 A) includes: (i) a build platform (44) that supports a material (12); (ii) a build chamber assembly; (iii) a material supply device (18) that deposits material onto the build platform (44) in a deposition area (34); (iv) an energy system (22) that selectively melts the material (12) in a melting area (36); (v) a heating assembly (26) that heats the material (12) in a heating area (38); (vi) a cooling assembly (28) that cools the material (12) in a cooling area (40); (vii) a mover assembly (32) that moves the build platform (44); and (viii) a control system (24) that controls the energy system (22), the heating assembly (26) and the cooling assembly (28) to actively control the temperature on the build platform (44).

18. 发明申请

WO2021003444A2 METROLOGY FOR ADDITIVE MANUFACTURING 审中-公开
公开(公告)号：WO2021003444A2
公开(公告)日：2021-01-07
申请号：PCT/US2020/040772
申请日：2020-07-02
申请人： NIKON CORPORATION , GOODWIN, Eric, Peter
发明人： DURKO, Heather, Lynn , SMITH, Daniel, Gene , MARQUEZ, Johnathan, Agustin , BINNARD, Michael, Birk , CHANG, Patrick, Shih , BJORK, Matthew, Parker-mccormick , COON, Paul, Derek , HERR, Brett, William , ISHIKAWA, Motofusa
IPC分类号： G01B11/25 , G01B9/02 , B33Y50/02 , G01B15/04 , B22F10/28 , B22F10/36 , B22F12/90 , B33Y10/00 , B33Y30/00 , G01B11/2527 , G01B11/2536 , G01B9/02097
摘要： 3D metrology techniques are disclosed for determining a changing topography of a substrate processed in an additive manufacturing system. Techniques include fringe scanning, simultaneous fringe projections, interferometry, and x-ray imaging. The techniques can be applied to 3D printing systems to enable rapid topographical measurements of a 3D printer powder bed, or other rapidly moving, nearly continuous surface to be tested. The techniques act in parallel to the system being measured to provide information about system operation and the topography of the product being processed. A tool is provided for achieving higher precision, increasing throughput, and reducing the cost of operation through early detection and diagnosis of operating problems and printing defects. These techniques work well with any powder bed 3D printing system, providing real-time metrology of the powder bed, the most recently printed layer, or both without reducing throughput.

19. 发明申请

WO2018194975A3 FIGOPTICAL OBJECTIVE FOR OPERATION IN EUV SPECTRAL REGION 审中-公开
公开(公告)号：WO2018194975A3
公开(公告)日：2018-10-25
申请号：PCT/US2018/027785
申请日：2018-04-16
申请人： NIKON CORPORATION , SMITH, Daniel, Gene , WILLIAMSON, David, M.
发明人： SMITH, Daniel, Gene , WILLIAMSON, David, M.
IPC分类号： G03F7/20 , G02B17/06 , G21K1/06
摘要： A catoptric system having a reference axis and first, second, and third reflectors. The first reflector contains a pattern-source carrying a substantially one-dimensional pattern. A combination of the second and third reflectors is configured to form an optical image of the pattern, with a demagnification coefficient N > 1 in extreme UV light, and with only two beams of light that have originated at the first reflector as a result of irradiation of the first reflector with light incident upon it. An exposure apparatus employing the catoptric system and method of device manufacturing with the use of the exposure apparatus.

20. 发明申请

WO2017199096A1 EUV LITHOGRAPHY SYSTEM FOR DENSE LINE PATTERNING 审中-公开
标题翻译：用于密集线图案的EUV光刻系统
公开(公告)号：WO2017199096A1
公开(公告)日：2017-11-23
申请号：PCT/IB2017/000696
申请日：2017-05-19
申请人： NIKON CORPORATION , FLAGELLO, Donis, G. , WILLIAMSON, David, M. , RENWICK, Stephen, P. , SMITH, Daniel, Gene , BINNARD, Michael, B.
发明人： FLAGELLO, Donis, G. , WILLIAMSON, David, M. , RENWICK, Stephen, P. , SMITH, Daniel, Gene , BINNARD, Michael, B.
IPC分类号： G03F7/20 , G02B5/18
摘要： Extreme ultra-violet (EUV) lithography ruling engine specifically configured to print one-dimensional lines on a target workpiece (156) includes source of EUV radiation (114) : a pattern-source (144) defining ID pattern : an illumination unit (IU) configured to irradiate the pattern-source (144) : and projection optics (PO) configured to optically image, with a reduction factor N>1, the ID pattern on image surface that is optically-conjugate to the ID pattern. Irradiation of the pattern-source (144) can be on-axis or off-axis. While ID pattern has first spatial frequency, its optical image has second spatial frequency that is at least twice the first spatial frequency. The pattern-source (144) can be flat or curved. The IU may include a relay reflector (126). A PO' s reflector may include multiple spatially-distinct reflecting elements (130, 134) aggregately forming such reflector. The engine is configured to not allow formation of optical image of any 2D pattern that has spatial resolution substantially equal to a pitch of the ID pattern of the pattern-source (144).
摘要翻译：专门配置成在目标工件（156）上印刷一维线的极紫外（EUV）刻蚀引擎包括EUV辐射源（114）：图案源（144） ID图案;配置为照射图案源（144）的照明单元（IU）;以及被配置为以缩减因子N> 1光学地成像光学共轭的图像表面上的ID图案的投影光学器件（PO）到ID模式。图案源（144）的照射可以是同轴的或离轴的。当ID图案具有第一空间频率时，其光学图像具有第二空间频率，其至少是第一空间频率的两倍。图案源（144）可以是平坦的或弯曲的。 IU可以包括中继反射器（126）。 PO的反射器可以包括聚集地形成这种反射器的多个空间不同的反射元件（130,134）。该引擎被配置为不允许形成空间分辨率基本上等于图案源（144）的ID图案的节距的任何2D图案的光学图像。

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