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    • 60. 发明授权
    • IGBT having a vertical channel
    • IGBT具有垂直通道
    • US5831292A
    • 1998-11-03
    • US637304
    • 1996-04-24
    • Christopher HarrisAndrei KonstantinovErik Janzen
    • Christopher HarrisAndrei KonstantinovErik Janzen
    • H01L29/24H01L29/423H01L29/739H01L29/74H01L31/0312H01L31/111
    • H01L29/7395H01L29/42376H01L29/1608
    • A transistor of SiC having an insulated gate comprises a drain contact with a highly doped substrate layer formed on the drain. The substrate layer is of p-type or of n-type. For a p-type transistor, a highly doped n-type buffer layer may optionally be formed on top of the substrate layer. A low doped n-type drift layer, a highly doped p-type base layer, a highly doped n-type source region, and a source contact are then superimposed on the substrate layer. A vertical trench extends through the source region and the base layer to at least the drift layer. The trench has a wall next to these layers. A gate electrode extends vertically along the wall and at least over a vertical extension of the base layer. An insulating layer is arranged between the gate electrode and at least the base layer whereby an inversion channel is formed for electron transport from the source contact to the drain contact. An additional low doped p-type layer is arranged in the channel region laterally to the base layer, between the base layer and the insulating layer. The additional layer extends vertically over at least the base layer.
    • 具有绝缘栅极的SiC晶体管包括与形成在漏极上的高掺杂衬底层的漏极接触。 衬底层是p型或n型。 对于p型晶体管,高可掺杂的n型缓冲层可任选地形成在衬底层的顶部上。 然后将低掺杂n型漂移层,高掺杂的p型基极层,高掺杂的n型源极区和源极接触叠加在衬底层上。 垂直沟槽延伸穿过源极区域和基极层至少到漂移层。 沟槽在这些层旁边有一个墙壁。 栅电极沿着壁垂直延伸,并且至少在基层的垂直延伸部上延伸。 绝缘层设置在栅极电极和至少基极层之间,由此形成用于从源极接触到漏极接触的电子传输的反转沟道。 在沟道区域中,在基底层和绝缘层之间的基底层侧向布置有附加的低掺杂p型层。 附加层至少在基层上垂直延伸。